Patents by Inventor Tae-Hwan Oh

Tae-Hwan Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same
    Patent number: 7670748
    Abstract: A photoresist composition includes a cyclic compound, a photoacid generator, and an organic solvent. The cyclic compound includes any one selected from the group consisting of moieties having chemical structures represented by the formulae (1), (2), (3) and (4) set forth herein, and at least one moiety having the chemical structure represented by the formula (9) set forth herein.
    Type: Grant
    Filed: December 14, 2006
    Date of Patent: March 2, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyoung-Mi Kim, Young-Ho Kim, Jin-Baek Kim, Tae-Hwan Oh
  • Low voltage operational amplifier
    Patent number: 7449951
    Abstract: An operational amplifier includes a differential amplifier for amplifying differential input signals to generate differential amplified signals. The operational amplifier also includes first and second single-ended amplifiers that each amplify the differential amplified signals to respectively generate first and second single-ended output signals that are differential with respect to each-other.
    Type: Grant
    Filed: May 8, 2006
    Date of Patent: November 11, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Tae-Hwan Oh
  • Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same
    Publication number: 20070141511
    Abstract: A photoresist composition includes a cyclic compound, a photoacid generator, and an organic solvent. The cyclic compound includes any one selected from the group consisting of moieties having chemical structures represented by the formulae (1), (2), (3) and (4) set forth herein, and at least one moiety having the chemical structure represented by the formula (9) set forth herein.
    Type: Application
    Filed: December 14, 2006
    Publication date: June 21, 2007
    Inventors: Kyoung-Mi Kim, Young-Ho Kim, Jin-Baek Kim, Tae-Hwan Oh
  • Low voltage operational amplifier
    Publication number: 20060290427
    Abstract: An operational amplifier includes a differential amplifier for amplifying differential input signals to generate differential amplified signals. The operational amplifier also includes first and second single-ended amplifiers that each amplify the differential amplified signals to respectively generate first and second single-ended output signals that are differential with respect to each-other.
    Type: Application
    Filed: May 8, 2006
    Publication date: December 28, 2006
    Inventor: Tae-Hwan Oh
  • Polytrimethylene terephtalate conjugate fiber and method of preparing the same
    Publication number: 20050233140
    Abstract: Disclosed is a polytrimethylene terephtalate conjugate fiber having high self-crimpability, which is prepared by conjugate-spinning two types of polytrimethylene terephtalates having different intrinsic viscosities in which a difference between the intrinsic viscosities ranges from 0.05 to 0.15 into a side-by-side fiber. Also, the polytrimethylene terephtalate conjugate fiber prepared by the conjugate-spinning undergoes a false twisting process, leading to development of three-dimensional high self crimpability and sufficient bulky property in the resulting fiber.
    Type: Application
    Filed: March 11, 2003
    Publication date: October 20, 2005
    Applicant: HUVIS CORPORATION
    Inventors: Tae-Hwan Oh, Jung-Hun Hyun, Byeong-Il Kim, Jin-Soo Ham
  • MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS
    Patent number: 6936402
    Abstract: Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a polymer prepared from the monomer, methods for preparing the photoresist compositions, and methods for forming photoresist patterns using the photoresist compositions.
    Type: Grant
    Filed: February 24, 2004
    Date of Patent: August 30, 2005
    Assignee: Korea Advanced Institute Science & Technology
    Inventors: Jin-Baek Kim, Tae-Hwan Oh, Jae-Hak Choi, Jae-Jun Lee
  • Novel monomers containing an oxepan-2-one group, photoresist compositions comprising polymers prepared from the monomers, methods for preparing the compositions, and methods for forming photoresist patterns using the compositions
    Publication number: 20050042539
    Abstract: Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a polymer prepared from the monomer, methods for preparing the photoresist compositions, and methods for forming photoresist patterns using the photoresist compositions.
    Type: Application
    Filed: February 24, 2004
    Publication date: February 24, 2005
    Applicant: Korea Advanced Institute of Science and Technology
    Inventors: Jin-Baek Kim, Tae-Hwan OH, Jae-Hak Choi, Jae-Jun Lee