Abstract: A display filter and a display apparatus including the display filter, which can increase a contrast ratio, increase brightness, and have a great electromagnetic (EM) radiation-shielding effect, are provided. The display filter includes: a filter base; and an external light-shielding layer formed on a surface of the filter base, wherein the external light-shielding layer includes a base substrate including a transparent resin and light-shielding patterns spaced apart on a surface of the base substrate at predetermined intervals, and including a conductive material.

Abstract: An external light-shielding layer, a display filter including the external light-shielding layer and a display apparatus including the display filter to enhance brightness, a viewing angle, and a contrast ratio. The external light-shielding layer including: a base substrate including a transparent resin; and wedge-shaped light-shielding patterns spaced apart from each other in a surface of the base substrate at predetermined intervals, and made of a resin including a coloring agent having a concentration of about 0.5% to about 1.5% by weight.

Abstract: An external light-shielding layer capable of enhancing a visible light transmittance and a contrast ratio and preventing Moire fringe and Newton ring phenomena, a display filter including the external light-shielding layer, and a display device including the display filter. The external light-shielding layer includes a transparent resin matrix, and a plurality of light-shielding patterns formed on the transparent resin matrix and spaced apart from each other in a predetermined interval, wherein a bias angle (?) formed between a traveling direction of the light-shielding patterns and the longer side of the matrix is in a range of about 5 to 80 degrees.

Abstract: A display filter capable of enhancing the visible light transmittance and contrast ratio for a bright room condition and a display device including the same. The display filter includes a filter base, and an external light-shielding layer, disposed on a surface of the filter base, including a matrix made of a transparent resin and a plurality of wedge-shaped black stripes arranged parallel to each other at a surface of the matrix.

Abstract: An electromagnetic wave shielding filter that has low electric conductivity, high visible light transmittance and good durability, a method of manufacturing the electromagnetic wave shielding filter, and a PDP apparatus including the electromagnetic wave shielding filter. The electromagnetic wave shielding filter includes a laminate structure including multiple stacks each consisting of a niobium oxide layer, a first protective layer having a ZnO as a main component, and a metal layer sequentially laminated in that order, the multiple stacks formed by repeatedly laminating the respective layers at least three times, and a niobium oxide layer formed on the laminate structure.

Abstract: Techniques and systems for applying analytical computations of stresses to layers with embedded line features to obtain stress information, to design microstructures, and to design and control fabrication processes.

Abstract: Techniques for evaluating curvatures in line features embedded in a different material layer formed on a substrate. A model based a uniform layer formed over a substrate may be used to represent a structure with parallel line features embedded in a layer formed over the substrate. The curvatures of the uniform layer due to an elastic distortion along a first direction substantially parallel to the line features and along a second direction orthogonal to the first direction are determined. Next, the curvatures of the uniform layer may be used as respective curvatures of each of the line features.

Abstract: Methods and systems for evaluating curvatures in line features embedded in a different material layer formed on substrates.

Abstract: A method of depositing a (200)-oriented platinum thin film on a substrate, including the steps of forming a oxygen containing platinum layer on the surface of a silicon wafer heated to a temperature range over room temperature and not exceeding 700° C. under a mixed gaseous atmosphere of oxygen and inert gas and annealing the substrate at a temperature between 400° C. and 1000° C. The platinum thin film formed according to the present invention in (200)-oriented and does not have any conventional defects such as hillocks or voids.