Patents by Inventor Tae Whan Kim

Tae Whan Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120161106
    Abstract: Provided are a photodetector (PD) using a graphene thin film and nanoparticles and a method of fabricating the same. The PD includes a graphene thin film having a sheet shape formed by means of a graphene deposition process using a vapor-phase carbon (C) source and a nanoparticle layer formed on the graphene thin film and patterned to define an electrode region of the graphene thin film, the nanoparticle layer being formed of nanoparticles without a matrix material. The PD has a planar structure using the graphene thin film as a channel and an electrode and using nanoparticles as a photovoltaic material (capable of forming electron-hole pairs due to photoelectron-motive force caused by ultraviolet (UV) light). Since the PD has a very simple structure, the PD may be fabricated at low cost with high productivity. Also, the PD includes the graphene thin film to reduce power consumption.
    Type: Application
    Filed: August 24, 2010
    Publication date: June 28, 2012
    Applicant: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION, HANYANG UNIVERSITY
    Inventors: Tae-Whan Kim, Jae-Hun Jung, Dong-Ick Son, Jung-Min Lee, Hee-Yeon Yang, Won-Il Park
  • Publication number: 20120097232
    Abstract: A solar cell using a p-i-n nanowire that may generate light by absorbing solar light in a wide wavelength region efficiently without generating light loss and may be manufactured with a simplified process and low cost.
    Type: Application
    Filed: July 6, 2010
    Publication date: April 26, 2012
    Applicant: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION, HANYANG UNIVERSITY
    Inventors: Tae-Whan Kim, Joo-Hyung You, Jae-Hun Jung, Jae-Seok Yi, Won-Il Park
  • Publication number: 20120098741
    Abstract: An electrophoretic display includes a substrate on which image gate lines and image signal lines are formed to intersect one another. An image switching thin-film transistor (TFT) is formed on the substrate and electrically connected to the image gate lines and the image signal lines. A sensing TFT is formed on the substrate and configured to sense infrared (IR) light and generate an IR sensing signal. An output switching TFT is formed on the substrate and connected to the sensing TFT. The output switching TFT outputs position information from the IR sensing signal. An IR filter insulating layer is formed on the substrate to cover the sensing TFT and configured to transmit only the IR light. A pixel electrode is formed on the IR filter insulating layer and electrically connected to the image switching TFT. An electrophoretic film is formed on the pixel electrode and includes a plurality of micro-capsules having pigment particles with positive and negative electrical charges.
    Type: Application
    Filed: June 17, 2010
    Publication date: April 26, 2012
    Applicant: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION, HANYANG UNIVERSITY
    Inventors: Tae-Whan Kim, Su-Hyeong Park, Dea-Uk Lee
  • Publication number: 20110101365
    Abstract: Provided are an electronic device and methods of fabricating the same, the electronic device include a device-substrate, a stacked structure, and an electrode. The stacked structure includes a graphene thin film between a first insulator and a second insulator. The electrode is disposed over the stacked structure.
    Type: Application
    Filed: October 12, 2010
    Publication date: May 5, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Tae-Whan Kim, Won-il Park, Dong-Ick Son, Jae-Ho Shim, Jung-Min Lee, Jae-Hun Jung
  • Patent number: 7927951
    Abstract: A non-volatile memory device includes a semiconductor substrate, first and second control gates, and first and second charge storage patterns. The semiconductor substrate includes a protruding active pin having a source region, a drain region and a channel region located between the source and drain regions. The first control gate is located on a first sidewall of the channel region, and the second control gate is located on a second sidewall of the channel region. The second control gate is separated from the first control gate. The first charge storage pattern is located between the first sidewall and the first control gate, and the second charge storage pattern is located between the second sidewall and the second control gate.
    Type: Grant
    Filed: November 30, 2010
    Date of Patent: April 19, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Whan Kim, Kae-Dal Kwack, Sang-Su Park
  • Publication number: 20110069555
    Abstract: A non-volatile memory device includes a semiconductor substrate, first and second control gates, and first and second charge storage patterns. The semiconductor substrate includes a protruding active pin having a source region, a drain region and a channel region located between the source and drain regions. The first control gate is located on a first sidewall of the channel region, and the second control gate is located on a second sidewall of the channel region. The second control gate is separated from the first control gate. The first charge storage pattern is located between the first sidewall and the first control gate, and the second charge storage pattern is located between the second sidewall and the second control gate.
    Type: Application
    Filed: November 30, 2010
    Publication date: March 24, 2011
    Applicants: Samsung Electronics Co., Ltd., Industry-University Cooperation Foundation, Hanyang-University
    Inventors: Tae-Whan Kim, Kae-Dal Kwack, Sang-Su Park
  • Patent number: 7897270
    Abstract: According to an embodiment of the present invention, an OLED display includes a substrate, a first electrode, a hole transport layer, a hole blocking layer, an emitting layer, and a second electrode. The first electrode is formed on the substrate. The hole transport layer is formed on the first electrode and includes a first material having a first highest occupied molecular orbital (HOMO) level and a first lowest unoccupied molecular orbital (LUMO) level. The hole blocking layer is formed on the hole transport layer and includes a second material having a second HOMO level and a second LUMO level. The emitting layer is formed on the hole blocking layer and includes a third material having a third HOMO level and a third LUMO level. The second electrode is formed on the emitting layer. Herein, the second HOMO level is higher than the first HOMO level and the third HOMO level.
    Type: Grant
    Filed: December 29, 2006
    Date of Patent: March 1, 2011
    Assignees: Samsung Electronics Co., Ltd., Industry-University Cooperation Foundation Hanyang University
    Inventors: Tae-Whan Kim, Dong-Chul Choo, Chang-Uk Kim
  • Publication number: 20110041980
    Abstract: Example embodiments are directed to an electronic device and a method for manufacturing the same. The electronic device includes a polymer thin film and an electrode. The polymer thin film includes nanoparticles. The electrode is formed by attaching a graphene thin film of a sheet shape formed through graphene deposition using a vapor carbon supply source to the polymer thin film. In the method, a graphene thin film of a sheet shape is formed through graphene deposition using a vapor carbon supply source. A polymer solution with distributed nanoparticles is prepared. The polymer solution with distributed nanoparticles is spin-coated on a substrate. A polymer thin film comprising the nanoparticles is formed by drying the spin-coated polymer solution. An electrode is formed by attaching the graphene thin film onto the polymer thin film.
    Type: Application
    Filed: August 20, 2010
    Publication date: February 24, 2011
    Inventors: Tae-Whan Kim, Won-il Park, Dong-Ick Son, Hee-Yeon Yang, Jung-Min Lee, Jae-Hun Jung
  • Patent number: 7863673
    Abstract: A non-volatile memory device includes a semiconductor substrate, first and second control gates, and first and second charge storage patterns. The semiconductor substrate includes a protruding active pin having a source region, a drain region and a channel region located between the source and drain regions. The first control gate is located on a first sidewall of the channel region, and the second control gate is located on a second sidewall of the channel region. The second second control gate is separated from the first control gate. The first charge storage pattern is located between the first sidewall and the first control gate, and the second charge storage pattern is located between the second sidewall and the second control gate.
    Type: Grant
    Filed: February 13, 2009
    Date of Patent: January 4, 2011
    Assignees: Samsung Electronics Co., Ltd., Industry-University Cooperation Foundation, Hanyang-University
    Inventors: Tae-Whan Kim, Kae-Dal Kwack, Sang-Su Park
  • Patent number: 7858978
    Abstract: A nonvolatile organic bistable memory device includes a substrate, a lower electrode disposed on the substrate, a lower charge injection layer disposed on the lower electrode, an insulating polymer layer including nanoparticles disposed on the lower charge injection layer, an upper charge injection layer disposed on the insulating polymer layer, and an upper electrode disposed on the upper charge injection layer. The lower and upper charge injection layers each include fullerenes and/or carbon nanotubes.
    Type: Grant
    Filed: December 3, 2008
    Date of Patent: December 28, 2010
    Assignees: Samsung Electronics Co., Ltd., Industry-University Cooperation Foundation
    Inventors: Tae-Whan Kim, Fushan Li, Young-Ho Kim, Jae-Hun Jung
  • Patent number: 7829445
    Abstract: Provided may be a method of fabricating a flash memory device having metal nano particles. The method of manufacturing a flash memory device may include forming a metal oxide thin layer on a semiconductor substrate, forming a floating gate of an amorphous metal silicon oxide thin layer by performing a thermal treatment process on the semiconductor substrate where the metal oxide thin layer is formed, and forming metal nano particles in the floating gate by projecting an electron beam on the floating gate, the metal nano particles being surrounded by a silicon oxide layer.
    Type: Grant
    Filed: October 24, 2008
    Date of Patent: November 9, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Whan Kim, Jae-Hun Jung, Jae-Won Shin, Jeong-Yong Lee
  • Publication number: 20100105178
    Abstract: Provided may be a method of fabricating a flash memory device having metal nano particles. The method of manufacturing a flash memory device may include forming a metal oxide thin layer on a semiconductor substrate, forming a floating gate of an amorphous metal silicon oxide thin layer by performing a thermal treatment process on the semiconductor substrate where the metal oxide thin layer is formed, and forming metal nano particles in the floating gate by projecting an electron beam on the floating gate, the metal nano particles being surrounded by a silicon oxide layer.
    Type: Application
    Filed: October 24, 2008
    Publication date: April 29, 2010
    Inventors: Tae-Whan Kim, Jae-Hun Jung, Jae-Won Shin, Jeong-Yong Lee
  • Patent number: 7706159
    Abstract: A charge pump for a DC-DC converter includes an input terminal receiving an input voltage, an output terminal outputting an output voltage, a plurality of charge pumping stages connected in series between the input terminal and the output terminal, and a voltage level shifter shifting voltage levels of first and second gate clock signals so that received first and second gate clock signals have a predetermined amplitude. Therefore, the charge pump can increase power efficiency by maximizing a magnitude of VGS. A DC-DC converter using the charge pump can also be applied to a portable device, for minimizing power consumption, and a method for improving power efficiency of the DC-DC converter is provided.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: April 27, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Whan Kim, Kae-Dal Kwack, Hong-Jae Shin
  • Patent number: 7696682
    Abstract: An organic light emitting device according to embodiment of the present invention comprises: a substrate; a first electrode formed on the substrate; a light-emitting member formed on the first electrode, and comprising multi-layer structure; and a second electrode formed on the light-emitting member, wherein the second electrode comprises Mg—Ag alloy which contains Mg of 1-10 wt % and a concentration gradient of the Mg—Ag alloy is formed from the top of the emitting-light member.
    Type: Grant
    Filed: June 27, 2006
    Date of Patent: April 13, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Whan Kim, Dong-Chul Choo, Hee-Cheol Im
  • Patent number: 7622864
    Abstract: A manufacturing method of an organic light emitting diode (“OLED”) includes forming an anode on a substrate, forming an inorganic buffer layer on the anode, forming a hole transport layer on the buffer layer, forming a light emission layer on the hole transport layer, forming an electron transport layer on the light emission layer, and forming a cathode on the electron transport layer. The forming an inorganic buffer layer includes thermal evaporation and oxidation.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: November 24, 2009
    Assignees: Samsung Electronics Co., Ltd., Industry-University Cooperation Foundation, Hanyang University
    Inventors: Tae-Whan Kim, Dong-Chul Choo
  • Patent number: 7615446
    Abstract: In one aspect, a charge trap flash memory device is provided which includes a semiconductor substrate, source and drain regions which are spaced apart in an active region of the semiconductor substrate to define a channel region therebetween, a tunneling dielectric layer located on the channel region, an organic polymer thin film located on the tunneling dielectric layer, metal or metal oxide nano-crystals embedded in the organic polymer thin film, and a gate located on the organic polymer thin film.
    Type: Grant
    Filed: October 13, 2006
    Date of Patent: November 10, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-whan Kim, Young-ho Kim, Jae-ho Kim, Jea-hun Jung, Chong-seung Yoon
  • Patent number: 7592663
    Abstract: A flash memory device with a nanoscale floating gate and a method of manufacturing thereof are disclosed. At least one embodiment of the present invention provides a much simpler and easier method of manufacturing nanocrystals (or nanocrystallines) for the flash memory device than the conventional method. Since the nanocrystals are homogeneously dispersed as a polymer layer without agglomeration, size and density of the nanoparticles may be controlled. Additionally, one embodiment of the present invention provides memory devices with nanoscale floating gates, and related methods of manufacture, of high efficiency and cost effectiveness by employing electrically and chemically more stable nanoscale floating gates compared to conventional ones.
    Type: Grant
    Filed: September 28, 2006
    Date of Patent: September 22, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Whan Kim, Young-Ho Kim, Chong-Seung Yoon, Jae-Ho Kim, Jae-Hun Jung, Sung-Keun Lim, Mun-Seop Song
  • Publication number: 20090206385
    Abstract: A non-volatile memory device includes a semiconductor substrate, first and second control gates, and first and second charge storage patterns. The semiconductor substrate includes a protruding active pin having a source region, a drain region and a channel region located between the source and drain regions. The first control gate is located on a first sidewall of the channel region, and the second control gate is located on a second sidewall of the channel region. The second control gate is separated from the first control gate. The first charge storage pattern is located between the first sidewall and the first control gate, and the second charge storage pattern is located between the second sidewall and the second control gate.
    Type: Application
    Filed: February 13, 2009
    Publication date: August 20, 2009
    Applicants: SAMSUNG ELECTRONICS CO., LTD., INDUSTRY-UNIVERSITY COOPERATION FOUNDATION
    Inventors: Tae-Whan KIM, Kae-Dal KWACK, Sang-Su PARK
  • Publication number: 20090146140
    Abstract: A nonvolatile organic bistable memory device includes a substrate, a lower electrode disposed on the substrate, a lower charge injection layer disposed on the lower electrode, an insulating polymer layer including nanoparticles disposed on the lower charge injection layer, an upper charge injection layer disposed on the insulating polymer layer, and an upper electrode disposed on the upper charge injection layer. The lower and upper charge injection layers each include fullerenes and/or carbon nanotubes.
    Type: Application
    Filed: December 3, 2008
    Publication date: June 11, 2009
    Applicants: SAMSUNG ELECTRONICS CO., LTD., INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY
    Inventors: Tae-Whan KIM, Fushan LI, Young-Ho KIM, Jae-Hun JUNG
  • Publication number: 20090108327
    Abstract: Provided may be a gate pattern, flash memory and methods of manufacturing and operating the same. A gate pattern may include a floating gate on a tunneling dielectric layer, an inter-gate dielectric layer on the floating gate, a first control gate on the inter-gate dielectric layer, and a second control gate on the inter-gate dielectric layer and spaced apart from the first control gate. Each of the control gates sets four states according to an application time of a program voltage applied to the control gates. Thus, one control gate may program 2-bit data.
    Type: Application
    Filed: October 24, 2008
    Publication date: April 30, 2009
    Inventors: Tae-Whan Kim, Kyeong-Rock Kim, Kae-Dal Kwack