Patents by Inventor Tai Dung Nguyen
Tai Dung Nguyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160230556Abstract: A radial cam engine with an optimized cam configuration can provide improve performance over crankshaft internal combustion engines. The cam configuration can include a flat-top or flat bottom piston motion, multiple lobe cam configurations, matching piston force with torque/force ratio in combustion phase, asymmetry piston motions for improved power transfer during combustion phase, and/or offset piston and cam configurations. The radial cam engine can be used in vehicles, such as hybrid vehicles.Type: ApplicationFiled: April 18, 2016Publication date: August 11, 2016Inventors: Tai Dung Nguyen, Tue Nguyen, Donald James Duncalf
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Patent number: 9316101Abstract: A radial cam engine with an optimized cam configuration can provide improve performance over crankshaft internal combustion engines. The cam configuration can include a flat-top or flat bottom piston motion, multiple lobe cam configurations, matching piston force with torque/force ratio in combustion phase, asymmetry piston motions for improved power transfer during combustion phase, and/or offset piston and cam configurations. The radial cam engine can be used in vehicles, such as hybrid vehicles.Type: GrantFiled: May 27, 2014Date of Patent: April 19, 2016Inventors: Tai Dung Nguyen, Tue Nguyen, Donald James Duncalf
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Patent number: 9290098Abstract: The present invention discloses electric vehicles and methods to operate such vehicles, comprising an electric drive capable of moving the vehicles, together with a non-battery operative feature to enhance the performance of the vehicle, such as extending the range or increasing the power. The non-electrical enhanced feature is independent and not integrated with the electric drive, to enable the return of the vehicle design to pure electrical power with minimum modification.Type: GrantFiled: November 14, 2011Date of Patent: March 22, 2016Inventor: Tai Dung Nguyen
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Publication number: 20160040424Abstract: Building structures can be fabricated at an offsite, and then assembled at the construction site. The building structures can include beams and wall panels having metal attachments. The beams and wall panels can be assembled by coupling the metal attachments, for example, by welding.Type: ApplicationFiled: August 5, 2015Publication date: February 11, 2016Inventors: Tai Dung Nguyen, Trung Quoc Tran
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Patent number: 9121098Abstract: A NanoLayer Deposition (NLD) process for depositing composite films of tertiary, quaternary, pentanary, and hexary stoichiometric films is provided. The inventive deposition process is a cyclic process consisting of a sequence of thin film deposition and treatment steps to obtain a desired film stoichiometry. The deposition steps are not self-limiting as in atomic layer deposition. In one embodiment for depositing a compound oxide film, the deposition process comprises a first deposition, followed by a hydrogen-containing plasma treatment, a second deposition followed by a hydrogen-containing plasma treatment, and then a third deposition followed by a hydrogen-containing plasma and then an oxygen-containing plasma treatment to produce a stoichiometric quaternary film. The cyclic process is repeated until the desired overall film thickness is achieved. The inventive process is used to fabricate high k dielectric films, ferroelectric films, piezoelectric films, and other complex oxides.Type: GrantFiled: September 19, 2011Date of Patent: September 1, 2015Assignee: ASM International N.V.Inventors: Robert Anthony Ditizio, Tue Nguyen, Tai Dung Nguyen
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Publication number: 20150174824Abstract: A modular 3D printer system can include a base subsystem and multiple exchangeable components. The base subsystem can have a 3D motion module, a printhead module and a platform module. The multiple exchangeable components can include printheads having different configurations and functionalities, which can be exchangeably installed in the printhead module. The multiple exchangeable components can include platform supports having different configurations and functionalities, which can be exchangeably installed in the platform module.Type: ApplicationFiled: December 19, 2014Publication date: June 25, 2015Inventors: Karl Joseph Gifford, Daniel Joseph Hutchison, Tai Dung Nguyen, Tue Nguyen
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Patent number: 8940374Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, including introducing a first plurality of precursors to deposit a thin film and introducing a second plurality of precursors to modify the deposited thin film. The deposition using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film, including treatments such as modification of film composition and doping or removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film. The additional layer can react with the existing layer to form a compound layer, or can have minimum reaction to form a nanolaminate film.Type: GrantFiled: April 17, 2012Date of Patent: January 27, 2015Assignee: ASM International N.V.Inventors: Tue Nguyen, Tai Dung Nguyen
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Publication number: 20140360446Abstract: A radial cam engine with an optimized cam configuration can provide improve performance over crankshaft internal combustion engines. The cam configuration can include a flat-top or flat bottom piston motion, multiple lobe cam configurations, matching piston force with torque/force ratio in combustion phase, asymmetry piston motions for improved power transfer during combustion phase, and/or offset piston and cam configurations. The radial cam engine can be used in vehicles, such as hybrid vehicles.Type: ApplicationFiled: May 27, 2014Publication date: December 11, 2014Applicant: THIEN TON CONSULTING SERVICES COMPANY LIMITEDInventors: Tai Dung Nguyen, Tue Nguyen, Donald James Duncalf
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Patent number: 8770158Abstract: A radial cam engine with an optimized cam configuration can provide improve performance over crankshaft internal combustion engines. The cam configuration can include a flat-top or flat bottom piston motion, multiple lobe cam configurations, matching piston force with torque/force ratio in combustion phase, asymmetry piston motions for improved power transfer during combustion phase, and/or offset piston and cam configurations. The radial cam engine can be used in vehicles, such as hybrid vehicles.Type: GrantFiled: June 5, 2013Date of Patent: July 8, 2014Assignee: Thien Ton Consulting Services Co., Ltd.Inventors: Tai Dung Nguyen, Tue Nguyen, Donald James Duncalf
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Patent number: 8658259Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The nanolayer deposition process is a cyclic sequential deposition process, comprising the first step of introducing a first plurality of precursors to deposit a thin film with the deposition process not self-limiting, then a second step of purging the first set of precursors and a third step of introducing a second plurality of precursors to modify the deposited thin film. The deposition step in the NLD process using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film such as a modification of film composition, a doping or a removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film.Type: GrantFiled: March 26, 2010Date of Patent: February 25, 2014Assignee: ASM International N.V.Inventors: Tue Nguyen, Tai Dung Nguyen
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Publication number: 20120289061Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, including introducing a first plurality of precursors to deposit a thin film and introducing a second plurality of precursors to modify the deposited thin film. The deposition using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film, including treatments such as modification of film composition and doping or removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film. The additional layer can react with the existing layer to form a compound layer, or can have minimum reaction to form a nanolaminate film.Type: ApplicationFiled: May 25, 2012Publication date: November 15, 2012Applicant: ASM INTERNATIONAL N.V.Inventors: Tue Nguyen, Tai Dung Nguyen
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Publication number: 20120258257Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, including introducing a first plurality of precursors to deposit a thin film and introducing a second plurality of precursors to modify the deposited thin film. The deposition using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film, including treatments such as modification of film composition and doping or removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film. The additional layer can react with the existing layer to form a compound layer, or can have minimum reaction to form a nanolaminate film.Type: ApplicationFiled: April 17, 2012Publication date: October 11, 2012Applicant: ASM INTERNATIONAL N.V.Inventors: Tue Nguyen, Tai Dung Nguyen
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Publication number: 20120202353Abstract: A process to deposit a thin film by chemical vapor deposition includes evacuating a chamber of gases; exposing a device to a gaseous first reactant, wherein the first reactant deposits on the device to form the thin film having a plurality of monolayers in thickness; evacuating the chamber of gases; exposing the device, coated with the first reactant, to a gaseous second reactant under a plasma treatment, wherein the thin film is treated by the first reactant; and repeating the previous steps.Type: ApplicationFiled: April 17, 2012Publication date: August 9, 2012Applicant: ASM INTERNATIONAL N.V.Inventors: Robert Anthony Ditizio, Tue Nguyen, Tai Dung Nguyen
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Publication number: 20120123623Abstract: The present invention discloses electric vehicles and methods to operate such vehicles, comprising an electric drive capable of moving the vehicles, together with a non-battery operative feature to enhance the performance of the vehicle, such as extending the range or increasing the power. The non-electrical enhanced feature is independent and not integrated with the electric drive, to enable the return of the vehicle design to pure electrical power with minimum modification.Type: ApplicationFiled: November 14, 2011Publication date: May 17, 2012Inventor: Tai Dung Nguyen
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Publication number: 20120021138Abstract: A NanoLayer Deposition (NLD) process for depositing composite films of tertiary, quaternary, pentanary, and hexary stoichiometric films is provided. The inventive deposition process is a cyclic process consisting of a sequence of thin film deposition and treatment steps to obtain a desired film stoichiometry. The deposition steps are not self-limiting as in atomic layer deposition. In one embodiment for depositing a compound oxide film, the deposition process comprises a first deposition, followed by a hydrogen-containing plasma treatment, a second deposition followed by a hydrogen-containing plasma treatment, and then a third deposition followed by a hydrogen-containing plasma and then an oxygen-containing plasma treatment to produce a stoichiometric quaternary film. The cyclic process is repeated until the desired overall film thickness is achieved. The inventive process is used to fabricate high k dielectric films, ferroelectric films, piezoelectric films, and other complex oxides.Type: ApplicationFiled: September 19, 2011Publication date: January 26, 2012Applicant: TEGAL CORPORATIONInventors: Robert Anthony Ditizio, Tue Nguyen, Tai Dung Nguyen
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Patent number: 7867905Abstract: Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.Type: GrantFiled: May 31, 2006Date of Patent: January 11, 2011Assignee: Tegal CorporationInventors: Tue Nguyen, Tai Dung Nguyen, Craig Alan Bercaw
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Publication number: 20100285237Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, comprising introducing a first plurality of precursors to deposit a thin layer with the deposition process not self limiting, followed by introducing a second plurality of precursors for plasma treating the thin deposited layer. The plasma can be isotropic, anisotropic, or a combination of isotropic and anisotropic to optimize the effectiveness of the treatment of the thin deposited layers.Type: ApplicationFiled: May 19, 2010Publication date: November 11, 2010Applicant: TEGAL CORPORATIONInventors: Robert Anthony Ditizio, Tue Nguyen, Tai Dung Nguyen
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Publication number: 20100190353Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The nanolayer deposition process is a cyclic sequential deposition process, comprising the first step of introducing a first plurality of precursors to deposit a thin film with the deposition process not self-limiting, then a second step of purging the first set of precursors and a third step of introducing a second plurality of precursors to modify the deposited thin film. The deposition step in the NLD process using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film such as a modification of film composition, a doping or a removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film.Type: ApplicationFiled: March 26, 2010Publication date: July 29, 2010Applicant: TEGAL CORPORATIONInventors: Tue Nguyen, Tai Dung Nguyen
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Patent number: 7713592Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The nanolayer deposition process is a cyclic sequential deposition process, comprising the first step of introducing a first plurality of precursors to deposit a thin film with the deposition process not self limiting, then a second step of purging the first set of precursors and a third step of introducing a second plurality of precursors to modify the deposited thin film. The deposition step in the NLD process using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film such as a modification of film composition, a doping or a removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film.Type: GrantFiled: February 4, 2003Date of Patent: May 11, 2010Inventors: Tue Nguyen, Tai Dung Nguyen
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Patent number: 7678705Abstract: An apparatus to perform semiconductor processing includes a process chamber; a plasma generator for generating a plasma in the process chamber; and a helical ribbon electrode coupled to the output of the plasma generator.Type: GrantFiled: July 5, 2001Date of Patent: March 16, 2010Assignee: Tegal CorporationInventors: Tue Nguyen, Tai Dung Nguyen