Abstract: An apparatus to perform semiconductor processing includes a process chamber; a plasma generator for generating a plasma in the process chamber; and a helical ribbon electrode coupled to the output of the plasma generator.

Abstract: Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.

Abstract: An apparatus to perform semiconductor processing includes a process chamber; a plasma generator for generating a plasma in the process chamber, the plasma generator having a control input to control the generation of plasma, the plasma generator capable of providing a typical tune response time of less than one second for most plasma processes; and a controller coupled to the control input of the plasma generator to control the generation of the plasma.

Abstract: A system captures one or more images of a process chamber having a view port. The system includes a radiation source to generate radiation; and a camera coupled to the process chamber and adapted to receive the radiation from the radiation source illuminating the process chamber.