Patents by Inventor Taimi Oketani

Taimi Oketani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning method and cleaning apparatus
    Patent number: 6279590
    Abstract: A cleaning apparatus in accordance with the present invention includes a first inflow section, provided on a first side surface of a cleaning tank having a substantially rectangular parallelopiped shape, having two inflow openings, a second inflow section, provided on a second side surface facing the first side surface, having inflow openings, and outflow openings for releasing a cleaning liquid flown in from the first and second inflow sections. The cleaning liquid flowing in from the inflow openings forms complex and strong flows in the cleaning tank, thus removing contaminants on a cleaning target evenly and efficiently without nonuniformity and preventing stagnation of the cleaning liquid in the cleaning tank. The cleaning liquid released in filtered by a circulatory section and is allowed to flow into the cleaning tank again through a pipe.
    Type: Grant
    Filed: July 24, 2000
    Date of Patent: August 28, 2001
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Tohru Okuda, Taimi Oketani, Masatoshi Hayashi, Yasuhiro Matsushima
  • RESIST FILM REMOVING COMPOSITION AND METHOD FOR MANUFACTURING THIN FILM CIRCUIT ELEMENT USING THE COMPOSITION
    Publication number: 20010013502
    Abstract: There is provided a resist film removing composition used in a manufacture of a thin film circuit element having an organic insulation film that can remove a resist film remaining after etching easily without swelling the organic insulation film. The resist film removing composition comprises 50 to 90% by weight of an alkanolamine having 3 or more carbon atoms, 8 to 40% by weight of a water-miscible solvent and 2 to 30% by weight of water.
    Type: Application
    Filed: October 21, 1998
    Publication date: August 16, 2001
    Applicant: SHARP CORPORATION; MITSUBISHI GAS CHEMICAL COMPANY INCORPORATED
    Inventors: MASAHIRO NOHARA, YUKIHIKO TAKEUCHI, TAIMI OKETANI, TAKETO MARUYAMA, TETSUYA KARITA, HISAKI ABE, TETSUO AOYAMA
  • Exposure apparatus
    Publication number: 20010009455
    Abstract: The present invention aims at preventing deterioration of flatness of a substrate and contamination of a substrate-holding surface of a substrate holder, which are caused by a resist leaking into the back surface of the substrate.
    Type: Application
    Filed: January 19, 2001
    Publication date: July 26, 2001
    Inventors: Yasunori Nishimura, Taimi Oketani, Tsuyoshi Naraki
  • Exposure method
    Publication number: 20010006764
    Abstract: The present invention aims at reducing the number of scanning exposure and at enhancing throughput.
    Type: Application
    Filed: December 22, 2000
    Publication date: July 5, 2001
    Inventors: Yasunori Nishimura, Taimi Oketani, Tsuyoshi Naraki
  • Method of cleaning a substrate in a cleaning tank using plural fluid flows
    Patent number: 6132523
    Abstract: A cleaning apparatus and method in accordance with the present invention includes a first inflow section, provided on a first side surface of a cleaning tank having a substantially rectangular parallelopiped shape, having two inflow openings, a second inflow section, provided on a second side surface facing the first side surface, having inflow openings, and outflow openings for releasing a cleaning liquid flown in from the first and second inflow sections. The cleaning liquid flowing in from the inflow openings forms complex and strong flows in the cleaning tank, thus removing contaminants on a cleaning target evenly and efficiently without nonuniformity and preventing stagnation of the cleaning liquid in the cleaning tank. The cleaning liquid released in filtered by a circulatory section and is allowed to flow into the cleaning tank again through a pipe.
    Type: Grant
    Filed: September 3, 1998
    Date of Patent: October 17, 2000
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Tohru Okuda, Taimi Oketani, Masatoshi Hayashi, Yasuhiro Matsushima
  • Coating device with movable fluid supply nozzle and rotatable substrate holder
    Patent number: 5782978
    Abstract: A fluid application apparatus of the present invention includes a rotatable substrate holding mechanism (4), a photoresist liquid supply portion (5) and a motor mechanism (26). The photoresist liquid supply portion (5) supplies resist fluid to a region smaller than the entire region of the substrate surface while moving in the horizontal direction relative to the substrate holding mechanism (4). The motor mechanism (26) rotates the substrate holding mechanism (4) to diffuse the resist fluid over the entire surface of the substrate and form a resist layer having a predetermined thickness.
    Type: Grant
    Filed: June 16, 1997
    Date of Patent: July 21, 1998
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Kazuo Kinose, Takeshi Yonezawa, Taimi Oketani, Tomoo Yamamoto