Patents by Inventor Taishi Furukawa

Taishi Furukawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ruthenium complex, process for producing the same and process for producing thin film
    Patent number: 6605735
    Abstract: A ruthenium-containing thin film is produced by the chemical vapor deposition method etc. with the use of an organometallic ruthenium compound represented by the general formula (1), specific example of which is (2,4-dimethyl-pentadienyl)(ethylcyclopentadienyl)ruthenium: or an organometallic ruthenium compound represented by the general formula (7), specific example of which is carbonylbis(2-methyl-1,3-pentadiene)ruthenium: as the precursor.
    Type: Grant
    Filed: September 9, 2002
    Date of Patent: August 12, 2003
    Assignee: Tosoh Corporation
    Inventors: Kazuhisa Kawano, Kenichi Sekimoto, Noriaki Oshima, Tetsuo Shibutami, Shuji Kumagai, Taishi Furukawa
  • RUTHENIUM COMPLEX, PROCESS FOR PRODUCING THE SAME AND PROCESS FOR PRODUCING THIN FILM
    Publication number: 20030088116
    Abstract: A ruthenium-containing thin film is produced by the chemical vapor deposition method etc.
    Type: Application
    Filed: September 9, 2002
    Publication date: May 8, 2003
    Applicant: TOSOH CORPORATION
    Inventors: Kazuhisa Kawano, Kenichi Sekimoto, Noriaki Oshima, Tetsuo Shibutami, Shuji Kumagai, Taishi Furukawa