Abstract: An exposure apparatus including an obtainment unit configured to obtain, for each of a plurality of exposure regions on a substrate, surface positions in a height direction in the exposure region, and a control unit configured to control, based on the obtained surface positions, driving of a substrate stage in the height direction, wherein the control unit obtains an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region from the obtained surface positions obtained, and for a first exposure region for which information related to the approximate surface does not exceed a predetermined range, controls the driving based on a correction value related to the driving obtained from an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region that has been exposed prior to the first exposure region.

Abstract: An exposure apparatus including an obtainment unit configured to obtain, for each of a plurality of exposure regions on a substrate, surface positions in a height direction in the exposure region, and a control unit configured to control, based on the obtained surface positions, driving of a substrate stage in the height direction, wherein the control unit obtains an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region from the obtained surface positions obtained, and for a first exposure region for which information related to the approximate surface does not exceed a predetermined range, controls the driving based on a correction value related to the driving obtained from an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region that has been exposed prior to the first exposure region.

Abstract: A detection apparatus includes an image sensing device having an image sensing plane including a first periodic structure; and an optical system configured to illuminate a detection target including a second periodic structure different from the first periodic structure, and form an image of light from the detection target on the image sensing plane. Light having entered the image sensing plane generates a plurality of diffracted light beams of different orders in accordance with the first periodic structure. A normal of the image sensing plane is tilted with respect to an optical axis of the optical system such that the optical axis is located between diffracted light beams of adjacent orders not less than a first order among the plurality of diffracted light beams.

Abstract: An imprint method of curing an imprint material in a state in which the imprint material on a substrate and a mold are in contact with each other, includes curing the imprint material by applying first light to the imprint material using a first light source and applying second light to the imprint material using a second light source, thereby forming a plurality of patterns made of a cured product of the imprint material. An intensity distribution of the second light applied to the imprint material by the second light source in the curing is adjusted such that a distribution of evaluation values of the plurality of patterns formed through the curing satisfies a target distribution.

Abstract: An exposure apparatus including an obtainment unit configured to obtain, for each of a plurality of exposure regions on a substrate, surface positions in a height direction in the exposure region, and a control unit configured to control, based on the obtained surface positions, driving of a substrate stage in the height direction, wherein the control unit obtains an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region from the obtained surface positions obtained, and for a first exposure region for which information related to the approximate surface does not exceed a predetermined range, controls the driving based on a correction value related to the driving obtained from an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region that has been exposed prior to the first exposure region.

Abstract: An imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold including a pattern formation area, the imprint apparatus includes a detection unit configured to detect a contact state of the imprint material on the substrate with the mold, a light modulation element configured to control an intensity distribution of irradiation light irradiating the substrate, and a control unit configured to control a timing of irradiating the substrate with the irradiation light having the intensity distribution controlled by the light modulation element based on a detection result of the detection unit.

Abstract: A position detection apparatus comprises an obtaining unit that obtains an image of a moiré that occurs due to first and second diffraction gratings overlapping; and a processor configured to perform a periodic analysis of a luminance distribution of the obtained image of the moiré, obtain a phase measurement value of the luminance distribution, and obtain a relative positioning between the first and second diffraction gratings, wherein the processor determines a phase shift amount for making the obtained phase measurement value be a value outside of a predetermined range including a discontinuous part of the phase, and performs a phase shift to shift the obtained phase measurement value by the determined phase shift amount, and obtains the relative positioning based on the phase-shifted phase measurement value.

Abstract: A detection apparatus that detects a position deviation between an original and a substrate is provided. The apparatus includes an illumination optical system configured to illuminate a first diffraction grating arranged on the original and a second diffraction grating arranged on the substrate, and a detection optical system configured to detect interference light formed by diffracted light diffracted by the first diffraction grating and diffracted light diffracted by the second diffraction grating. The illumination optical system performs dipole illumination by light including two poles in a pupil plane of the illumination optical system, and polarization directions of light beams emitted from the two poles, respectively, and incident on the substrate are orthogonal to each other.

Abstract: An imprint apparatus forms a pattern of an imprint material in a shot area of the substrate using the mold, and includes a heating mechanism that changes a shape of the substrate by irradiating the shot area of the substrate with light, wherein the heating mechanism includes a plurality of optical modulators that forms an illuminance distribution in the shot area of the substrate, and light beams from the plurality of optical modulators illuminate mutually different areas of the shot area.

Abstract: An imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold including a pattern formation area, the imprint apparatus includes a detection unit configured to detect a contact state of the imprint material on the substrate with the mold, a light modulation element configured to control an intensity distribution of irradiation light irradiating the substrate, and a control unit configured to control a timing of irradiating the substrate with the irradiation light having the intensity distribution controlled by the light modulation element based on a detection result of the detection unit.

Abstract: The present invention provides an illumination apparatus which performs oblique illumination, the apparatus including a first optical element formed with an array of a plurality of optical components each configured to generate a point light source, and a second optical element configured to receive light from the first optical element and form an illumination region, with a power thereof in one direction being different from a power thereof in a direction perpendicular to the one direction, wherein at least one of the first optical element and the second optical element has a rotation angle about an optical axis thereof so as to perform compensate for distortion of the illumination region by the oblique illumination.

Abstract: An exposure apparatus comprises a projection optical system for projecting a pattern of a mask, a substrate stage for holding a substrate, and a measurement device installed on the substrate stage, including a plate on which a substrate-side mark is formed, and a sensor for detecting light transmitted through a mask-side mark, the projection optical system, and the substrate-side mark, and configured to measure an amount of the light detected by the sensor. The substrate-side mark includes a central mark arranged in a center of a sensitive region of the sensor, and a peripheral mark arranged in a periphery of the central mark. The central mark is used in measurement of the light amount, including driving the substrate stage in a direction parallel to an optical axis of the projection optical system.

Abstract: An imprint apparatus includes a substrate holding unit. A generation unit generates heating distribution data indicating distribution of a heat value to be applied to a region to be processed. A heating unit gives heat to the region to be processed to deform the region. An obtaining unit which obtains first information defined based on a difference of shapes of the region and a pattern portion of the mold, and second information about a deformation amount of the region. The second information is obtained, by trying deformation of the region to be processed by the heating unit while the substrate holding unit attracts the substrate. A patterning unit forms the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated, in which the generation unit generates the heating distribution data based on the obtained first and second information.

Abstract: A position detector includes a detection unit configured to detect light from a first diffraction grating including a first pattern disposed in a first direction, and light from a second diffraction grating including a second pattern disposed in the first direction, and a control unit configured to obtain a relative position between the first and the second diffraction gratings based on the light detected by the detection unit. The position detector has a third pattern formed in a second direction different from the first direction at edges of the first pattern of the first diffraction grating, the third pattern has a width smaller than a width of the first pattern of the first diffraction grating.

Abstract: A position detector includes a detection unit configured to detect light from a first diffraction grating including a first pattern disposed in a first direction, and light from a second diffraction grating including a second pattern disposed in the first direction, and a control unit configured to obtain a relative position between the first and the second diffraction gratings based on the light detected by the detection unit. The position detector has a third pattern formed in a second direction different from the first direction at edges of the first pattern of the first diffraction grating, the third pattern has a width smaller than a width of the first pattern of the first diffraction grating.

Abstract: An exposure apparatus comprises a projection optical system for projecting a pattern of a mask, a substrate stage for holding a substrate, and a measurement device installed on the substrate stage, including a plate on which a substrate-side mark is formed, and a sensor for detecting light transmitted through a mask-side mark, the projection optical system, and the substrate-side mark, and configured to measure an amount of the light detected by the sensor. The substrate-side mark includes a central mark arranged in a center of a sensitive region of the sensor, and a peripheral mark arranged in a periphery of the central mark. The central mark is used in measurement of the light amount, including driving the substrate stage in a direction parallel to an optical axis of the projection optical system.

Abstract: An imprint apparatus which forms a pattern of an imprint material in a region to be processed on a substrate by using a mold includes an observing unit configured to include a light source which emits first light and a receiving unit which receives the first light which is emitted from the light source, is reflected by the region to be processed, and passes through the mold; a deforming unit configured to thermally deform the region to be processed by illumination with second light; and a combining member which combines the first light of the light source and the second light from the deforming unit and guides the first light and the second light to the region to be processed.

Abstract: An imprint apparatus forms a pattern of an imprint material in a shot area of the substrate using the mold, and includes a heating mechanism that changes a shape of the substrate by irradiating the shot area of the substrate with light, wherein the heating mechanism includes a plurality of optical modulators that forms an illuminance distribution in the shot area of the substrate, and light beams from the plurality of optical modulators illuminate mutually different areas of the shot area.

Abstract: A position detector includes a detection unit configured to detect light from a first diffraction grating including a first pattern disposed in a first direction, and light from a second diffraction grating including a second pattern disposed in the first direction, and a control unit configured to obtain a relative position between the first and the second diffraction gratings based on the light detected by the detection unit. The position detector has a third pattern formed in a second direction different from the first direction at edges of the first pattern of the first diffraction grating, the third pattern has a width smaller than a width of the first pattern of the first diffraction grating.

Abstract: The present invention provides an illumination apparatus which performs oblique illumination, the apparatus including a first optical element formed with an array of a plurality of optical components each configured to generate a point light source, and a second optical element configured to receive light from the first optical element and form an illumination region, with a power thereof in one direction being different from a power thereof in a direction perpendicular to the one direction, wherein at least one of the first optical element and the second optical element has a rotation angle about an optical axis thereof so as to perform compensate for distortion of the illumination region by the oblique illumination.