Abstract: The present invention provides a detection apparatus for detecting a position of a detection target, including an illumination optical system configured to perform dark-field illumination on a reference mark, and a detection optical system including a sensor configured to detect light from the reference mark and an optical system configured to guide the light from the reference mark to the sensor, and configured to detect a position of the reference mark in a first direction, wherein the reference mark includes one mark element in the first direction, and a width of the mark element in the first direction is set such that two edges of the mark element in the first direction are detected as one peak when the sensor detects the light from the reference mark.

Abstract: This disclosure provides a detection apparatus configured to detect a moire pattern generated by grid patterns having grid pitches different from each other including: an image-pickup unit configured to pick up an image of the moire pattern; an imaging optical system configured to cause the image-pickup unit to image the moire pattern; and a processing unit configured to process an image-pickup result of the moire pattern imaged by the image-pickup unit, wherein a mark including a plurality of patterns having a width not larger than the resolving power of the imaging optical system arranged in a measuring direction and changed in duty ratio between the widths and intervals of the plurality of patterns is imaged by the image-pickup unit, and the processing unit evaluates the detection apparatus by processing the image-pickup result of the mark picked up by the image-pickup unit.

Abstract: An imprint apparatus includes a substrate holding unit. A generation unit generates heating distribution data indicating distribution of a heat value to be applied to a region to be processed. A heating unit gives heat to the region to be processed to deform the region. An obtaining unit which obtains first information defined based on a difference of shapes of the region and a pattern portion of the mold, and second information about a deformation amount of the region. The second information is obtained, by trying deformation of the region to be processed by the heating unit while the substrate holding unit attracts the substrate. A patterning unit forms the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated, in which the generation unit generates the heating distribution data based on the obtained first and second information.

Abstract: An imprint apparatus which forms a pattern of an imprint material in a region to be processed on a substrate by using a mold includes an observing unit configured to include a light source which emits first light and a receiving unit which receives the first light which is emitted from the light source, is reflected by the region to be processed, and passes through the mold; a deforming unit configured to thermally deform the region to be processed by illumination with second light; and a combining member which combines the first light of the light source and the second light from the deforming unit and guides the first light and the second light to the region to be processed.

Abstract: This disclosure provides a detection apparatus configured to detect a moire pattern generated by grid patterns having grid pitches different from each other including: an image-pickup unit configured to pick up an image of the moire pattern; an imaging optical system configured to cause the image-pickup unit to image the moire pattern; and a processing unit configured to process an image-pickup result of the moire pattern imaged by the image-pickup unit, wherein a mark including a plurality of patterns having a width not larger than the resolving power of the imaging optical system arranged in a measuring direction and changed in duty ratio between the widths and intervals of the plurality of patterns is imaged by the image-pickup unit, and the processing unit evaluates the detection apparatus by processing the image-pickup result of the mark picked up by the image-pickup unit.

Abstract: The present invention provides a detection apparatus for detecting a position of a detection target, including an illumination optical system configured to perform dark-field illumination on a reference mark, and a detection optical system including a sensor configured to detect light from the reference mark and an optical system configured to guide the light from the reference mark to the sensor, and configured to detect a position of the reference mark in a first direction, wherein the reference mark includes one mark element in the first direction, and a width of the mark element in the first direction is set such that two edges of the mark element in the first direction are detected as one peak when the sensor detects the light from the reference mark.

Abstract: An exposure apparatus includes an illumination system which illuminates an original, a projection optical system which projects a pattern of the original onto a substrate, a measurement device configured to measure optical characteristics of at least one of the illumination system or the projection optical system, and a control unit configured to correct, the measurement results obtained by the measurement device, depending on a polarization state included in illumination light from the illumination system.

Abstract: An apparatus includes an optical system for illuminating an original, a measurement device which includes an image sensor arranged on a substrate stage, and is configured to measure a characteristic of the optical system based on a light intensity distribution that is formed on an image sensing plane of the image sensor via the optical system and a measurement pattern, a calibration pattern arranged to form a light intensity distribution having a known shape on the image sensing plane, and a controller configured to calibrate the measurement device based on the light intensity distribution by the calibration pattern, and a theoretical light intensity distribution that is expected to be formed on the image sensing plane by the calibration pattern, wherein the calibration pattern is arranged around a region where the measurement pattern is arranged.

Abstract: The present invention provides an exposure apparatus which exposes a substrate via a liquid, comprising a measurement substrate including a transmission part configured to transmit a light beam having passed through a projection optical system, a light-receiving unit including a light-receiving surface configured to receive the light beam transmitted through the liquid and the transmission part, and a calculator configured to arithmetically convert a light intensity distribution, on the light-receiving surface, of the light beam received by the light-receiving surface into a light intensity distribution on a pupil plane of the projection optigottacal system, based on information indicating a correlation between a position coordinate on the light-receiving surface and a position coordinate on the pupil of the projection optical system.

Abstract: An exposure apparatus includes an illumination system which illuminates an original, a projection optical system which projects a pattern of the original onto a substrate, a measurement device configured to measure optical characteristics of at least one of the illumination system and the projection optical system, and a control unit configured to correct, the measurement results obtained by said measurement device, depending on a polarization state included in illumination light from the illumination system.

Abstract: An apparatus includes an optical system for illuminating an original, a measurement device which includes an image sensor arranged on a substrate stage, and is configured to measure a characteristic of the optical system based on a light intensity distribution that is formed on an image sensing plane of the image sensor via the optical system and a measurement pattern, a calibration pattern arranged to form a light intensity distribution having a known shape on the image sensing plane, and a controller configured to calibrate the measurement device based on the light intensity distribution by the calibration pattern, and a theoretical light intensity distribution that is expected to be formed on the image sensing plane by the calibration pattern, wherein the calibration pattern is arranged around a region where the measurement pattern is arranged.

Abstract: An exposure method includes the steps of (a) calculating a pupil transmittance distribution in a projection optical system based on a first effective light source distribution of the projection optical system acquired by a measuring apparatus of an exposure apparatus, and a second effective light source distribution derived from a pupil plane light intensity distribution measured on a plate plane using light that has passed the projection optical system without a reticle, (b) calculating an imaging performance by using a result of the pupil transmittance distribution calculating step and the first or second effective light source distributions, (c) adjusting at least one of the effective light source distribution or the projection optical system by using the imaging performance, and (d) exposing the plate based on at least one of the effective light source distribution and the projection optical system that have been adjusted.

Abstract: The present invention provides an exposure apparatus which exposes a substrate via a liquid, comprising a measurement substrate includes a transmission part configured to transmit a light beam having passed through a projection optical system, a light-receiving unit including a light-receiving surface configured to receive the light beam transmitted through the liquid and the transmission part, and a calculator configured to arithmetically convert a light intensity distribution, on the light-receiving surface, of the light beam received by the light-receiving surface into a light intensity distribution on a pupil plane of the projection optical system, based on information indicating a correlation between a position coordinate on the light-receiving surface and a position coordinate on the pupil of the projection optical system.

Abstract: A measuring apparatus used for an exposure apparatus that includes an illumination optical system that illuminates a reticle using light from a light source, a reticle stage that supports and drives the reticle, and a projection optical system that projects a pattern of the reticle onto a plate measures an effective light source distribution as an incident angular distribution of the light on a reticle plane of the reticle includes a relaying optical system configured to guide the light that has passed the illumination optical system, and a housing that contains the relaying optical system and is mounted on the reticle stage in place of the reticle.