Patents by Inventor Takafumi Okuma
Takafumi Okuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240019242Abstract: A displacement sensor includes a first emission particles layer provided to be contactable with a measurement object, and in which first emission particles that emit light at a first wavelength by excitation energy are distributed over at least a one-dimensional extent, a second emission particles layer in which second emission particles that emit light at a second wavelength different from the first wavelength by the excitation energy are distributed over the above one-dimensional extent, and a spacer layer that separates the first emission particles layer and the second emission particles layer in a direction intersecting the above one-dimensional extent, and which includes an excitation energy absorbent that absorbs the excitation energy.Type: ApplicationFiled: September 26, 2023Publication date: January 18, 2024Inventors: YOSHIE TAKAHASHI, KAZUTO FUKUDA, TAKAFUMI OKUMA
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Publication number: 20230331573Abstract: A method for producing a fine-particle powder containing calcium oxide or calcium hydroxide includes: preparing a pulverized powder of shells or eggshells; introducing the pulverized powder of shells or eggshells into a controlled atmosphere, vaporizing the pulverized powder under thermal plasma and then solidifying the pulverized powder in a gas phase to produce fine particles containing calcium oxide or calcium hydroxide; and collecting a powder of the fine particles containing calcium oxide or calcium hydroxide produced with the thermal plasma.Type: ApplicationFiled: June 20, 2023Publication date: October 19, 2023Inventors: HISAO NAGAI, HIROKI MARUYAMA, TAKESHI KOIWASAKI, TAKAFUMI OKUMA
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Patent number: 11280027Abstract: A composite nitride-based film structure includes a bulk single crystal, a plurality of nitride microcrystals, and an amorphous nitride thin film. The plurality of nitride microcrystals is provided on the bulk single crystal, and has a specific orientation relationship with a crystal structure of the bulk single crystal. The nitride thin film is provided on the bulk single crystal, surrounds the nitride microcrystal, and covers a surface of the bulk single crystal.Type: GrantFiled: November 21, 2018Date of Patent: March 22, 2022Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Takahide Hirasaki, Daisuke Suetsugu, Takafumi Okuma
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Patent number: 11021788Abstract: A sputtering method of forming a thin film by allowing a target material to react with a gas includes narrowing down film deposition conditions from an existing period of nitrogen radicals by focusing on a nitriding process in thin-film forming processes when the thin film is formed by pulsing a waveform of electric current from a DC power supply at the time of generating plasma and applying the electric current to the target material.Type: GrantFiled: November 29, 2018Date of Patent: June 1, 2021Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Takafumi Okuma, Daisuke Suetsugu, Takahide Hirasaki
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Patent number: 10974220Abstract: A fine particle producing apparatus includes a reaction chamber extending vertically from the lower side to the upper side; a material supply device which is connected to a central part on one end side of the vertically lower side inside the reaction chamber and supplies a material particle into the reaction chamber of a vertically upper side from a material supply port; a first electrode arrangement region which protrudes in an inward radial direction to be disposed on an inner peripheral wall in the reaction chamber which is vertically above the material supply device, and includes a plurality of lower electrodes to which AC power is applied; a second electrode arrangement region which protrudes in an inward radial direction to be disposed on an inner peripheral wall in the reaction chamber which is vertically above the first electrode arrangement region, and includes a plurality of upper electrodes to which AC power is applied; a collector which is connected to the other end side in the reaction chamber ofType: GrantFiled: January 23, 2019Date of Patent: April 13, 2021Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Hisao Nagai, Takeshi Koiwasaki, Takafumi Okuma
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Patent number: 10898957Abstract: A production apparatus and method for fine particles are capable of increasing a production amount and producing fine particles at low cost by efficiently inputting a large amount of material to plasma. The production apparatus includes a material supply device, which includes a plurality of material supply ports that supply a material gas containing material particles and are arranged below a plurality of electrodes in a vertical direction inside a vacuum chamber. The material supply device further includes a first gas supply port that supplies a first shield gas arranged in an inner periphery of the plural material supply ports and plural second gas supply ports that supply a second shield gas arranged in an outer periphery of the plural material supply ports.Type: GrantFiled: March 15, 2018Date of Patent: January 26, 2021Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Masaaki Tanabe, Hisao Nagai, Takeshi Koiwasaki, Takafumi Okuma
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Patent number: 10882114Abstract: An apparatus and a method for producing fine particles includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles into the vacuum chamber from material feeing ports, and a plurality of electrodes connected to the vacuum chamber. Tip ends of the electrodes protrude into the vacuum chamber to generate plasma, and a collecting device is connected to the vacuum chamber and collects fine particles. The electrodes generate discharge inside the vacuum chamber and produce the fine particles from the material. The material feeding ports of the material feeding device are arranged in a lower side than (below) the plural electrodes in the vertical direction in the vacuum chamber.Type: GrantFiled: January 17, 2019Date of Patent: January 5, 2021Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Hisao Nagai, Takafumi Okuma
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Patent number: 10873824Abstract: An apparatus, method, and system each of which obtains sound data based on a plurality of sound signals respectively output from a plurality of microphones, receives a user instruction for enhancing directivity of sensitivity characteristics of at least one of the plurality of microphones in a specific direction, and generates sound data having the directivity in the specific direction, based on the obtained sound data.Type: GrantFiled: July 12, 2019Date of Patent: December 22, 2020Assignee: Ricoh Company, Ltd.Inventor: Takafumi Okuma
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Publication number: 20200255977Abstract: A composite nitride-based film structure includes a bulk single crystal, a plurality of nitride microcrystals, and an amorphous nitride thin film. The plurality of nitride microcrystals is provided on the bulk single crystal, and has a specific orientation relationship with a crystal structure of the bulk single crystal. The nitride thin film is provided on the bulk single crystal, surrounds the nitride microcrystal, and covers a surface of the bulk single crystal.Type: ApplicationFiled: November 21, 2018Publication date: August 13, 2020Inventors: TAKAHIDE HIRASAKI, DAISUKE SUETSUGU, TAKAFUMI OKUMA
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Publication number: 20190342692Abstract: An apparatus, method, and system each of which obtains sound data based on a plurality of sound signals respectively output from a plurality of microphones, receives a user instruction for enhancing directivity of sensitivity characteristics of at least one of the plurality of microphones in a specific direction, and generates sound data having the directivity in the specific direction, based on the obtained sound data.Type: ApplicationFiled: July 12, 2019Publication date: November 7, 2019Applicant: Ricoh Company, Ltd.Inventor: Takafumi Okuma
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Patent number: 10397723Abstract: An apparatus, method, and system each of which obtains sound data based on a plurality of sound signals respectively output from a plurality of microphones, receives a user instruction for enhancing directivity of sensitivity characteristics of at least one of the plurality of microphones in a specific direction, and generates sound data having the directivity in the specific direction, based on the obtained sound data.Type: GrantFiled: March 6, 2018Date of Patent: August 27, 2019Assignee: Ricoh Company, Ltd.Inventor: Takafumi Okuma
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Publication number: 20190247822Abstract: A fine particle producing apparatus includes a reaction chamber extending vertically from the lower side to the upper side; a material supply device which is connected to a central part on one end side of the vertically lower side inside the reaction chamber and supplies a material particle into the reaction chamber of a vertically upper side from a material supply port; a first electrode arrangement region which protrudes in an inward radial direction to be disposed on an inner peripheral wall in the reaction chamber which is vertically above the material supply device, and includes a plurality of lower electrodes to which AC power is applied; a second electrode arrangement region which protrudes in an inward radial direction to be disposed on an inner peripheral wall in the reaction chamber which is vertically above the first electrode arrangement region, and includes a plurality of upper electrodes to which AC power is applied; a collector which is connected to the other end side in the reaction chamber ofType: ApplicationFiled: January 23, 2019Publication date: August 15, 2019Inventors: HISAO NAGAI, TAKESHI KOIWASAKI, TAKAFUMI OKUMA
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Patent number: 10363540Abstract: A production apparatus for fine particles includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles from a material feeding port into the vacuum chamber, electrodes arranged in the vacuum chamber for generating plasma and a fine particle collection device connected to the vacuum chamber and collecting fine particles. The fine particles are produced from the material by generating electric discharge inside the vacuum chamber. The apparatus includes an inner chamber which forms an outside space with respect to the vacuum chamber installed between a wall of the vacuum chamber and a plasma generation region and gas supply pipes which supply a gas to the outside space between the wall of the vacuum chamber and a wall of the inner chamber.Type: GrantFiled: February 10, 2017Date of Patent: July 30, 2019Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Takeshi Koiwasaki, Hisao Nagai, Takafumi Okuma
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Publication number: 20190169738Abstract: To provide a sputtering method as a reactive sputtering method of forming a thin film by allowing a target material to react with a gas, in which film deposition conditions are narrowed down from an existing period of nitrogen radicals by focusing on a nitriding process in thin-film forming processes when the thin film is formed by pulsing a waveform of electric current from a DC power supply at the time of generating plasma and applying the electric current to the target material.Type: ApplicationFiled: November 29, 2018Publication date: June 6, 2019Inventors: TAKAFUMI OKUMA, DAISUKE SUETSUGU, TAKAHIDE HIRASAKI
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Publication number: 20190151955Abstract: An apparatus and a method for producing fine particles capable of increasing the production and producing fine particles at low costs by feeding a large quantity of material efficiently into the plasma. The apparatus includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles into the vacuum chamber from material feeding ports, a plurality of electrodes connected to the vacuum chamber, tip ends of which protrude into the vacuum chamber to generate plasma and a collecting device connected to the vacuum chamber and collecting fine particles, which generates discharge inside the vacuum chamber and produces the fine particles from the material, in which the material feeding ports of the material feeding device are arranged in a lower side than the plural electrodes in the vertical direction in the vacuum chamber.Type: ApplicationFiled: January 17, 2019Publication date: May 23, 2019Inventors: HISAO NAGAI, TAKAFUMI OKUMA
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Patent number: 10252339Abstract: To provide an apparatus and a method of producing fine particles capable of increasing evaporation efficiency of a material, increasing the production of fine particles and reducing costs by heating the inputted material by a gas heated by thermal plasma. A fine particle production apparatus includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles from a material feeding port into the vacuum chamber, electrodes arranged in the vacuum chamber for generating plasma and a collection device connected to the vacuum chamber and collecting fine particles, which produces the fine particles from the material by generating electric discharge inside the vacuum chamber, in which the collection device and the material feeding device are connected by piping, and a material heating and circulation device which heats the material by heat of a gas inside the chamber heated by the plasma through the piping is provided.Type: GrantFiled: August 30, 2016Date of Patent: April 9, 2019Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Hisao Nagai, Takeshi Koiwasaki, Daisuke Suetsugu, Takafumi Okuma
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Patent number: 10226821Abstract: An apparatus and a method for producing fine particles capable of increasing the production and producing fine particles at low costs by feeding a large quantity of material efficiently into the plasma. The apparatus includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles into the vacuum chamber from material feeing ports, a plurality of electrodes connected to the vacuum chamber, tip ends of which protrude into the vacuum chamber to generate plasma and a collecting device connected to the vacuum chamber and collecting fine particles, which generates discharge inside the vacuum chamber and produces the fine particles from the material, in which the material feeding ports of the material feeding device are arranged in a lower side than the plural electrodes in the vertical direction in the vacuum chamber.Type: GrantFiled: October 16, 2015Date of Patent: March 12, 2019Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Hisao Nagai, Takafumi Okuma
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Patent number: 10124406Abstract: A production apparatus for fine particles includes a vacuum chamber, a material supply device, a plurality of electrodes arranged and a collection device connecting to the other end of the vacuum chamber and collecting fine particles, which generates plasma and produces fine particles from the material particles, in which a first electrode arrangement region on the material supply port's side and a second electrode arrangement region apart from the first electrode arrangement region to the collection device's side which respectively cross a direction in which the material flows between the vicinity of the material supply port and the collection device are provided in the intermediate part of the vacuum chamber, and both the first electrode arrangement region and the second electrode arrangement region are provided with a plurality of electrodes respectively to form the electrodes in multi-stages.Type: GrantFiled: March 7, 2018Date of Patent: November 13, 2018Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Hisao Nagai, Takeshi Koiwasaki, Masaaki Tanabe, Takafumi Okuma
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Publication number: 20180304374Abstract: A production apparatus and method for fine particles are capable of increasing a production amount and producing fine particles at low cost by efficiently inputting a large amount of material to plasma. The production apparatus includes a material supply device, which includes a plurality of material supply ports that supply a material gas containing material particles and are arranged below a plurality of electrodes in a vertical direction inside a vacuum chamber. The material supply device further includes a first gas supply port that supplies a first shield gas arranged in an inner periphery of the plural material supply ports and plural second gas supply ports that supply a second shield gas arranged in an outer periphery of the plural material supply ports.Type: ApplicationFiled: March 15, 2018Publication date: October 25, 2018Inventors: MASAAKI TANABE, HISAO NAGAI, TAKESHI KOIWASAKI, TAKAFUMI OKUMA
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Publication number: 20180290208Abstract: A production apparatus for fine particles includes a vacuum chamber, a material supply device, a plurality of electrodes arranged and a collection device connecting to the other end of the vacuum chamber and collecting fine particles, which generates plasma and produces fine particles from the material particles, in which a first electrode arrangement region on the material supply port's side and a second electrode arrangement region apart from the first electrode arrangement region to the collection device's side which respectively cross a direction in which the material flows between the vicinity of the material supply port and the collection device are provided in the intermediate part of the vacuum chamber, and both the first electrode arrangement region and the second electrode arrangement region are provided with a plurality of electrodes respectively to form the electrodes in multi-stages.Type: ApplicationFiled: March 7, 2018Publication date: October 11, 2018Inventors: HISAO NAGAI, TAKESHI KOIWASAKI, MASAAKI TANABE, TAKAFUMI OKUMA