Patents by Inventor Takafumi Taguchi
Takafumi Taguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11097447Abstract: A method for producing a rubber member according to the present invention includes the steps of: supplying a rubber composition to a cylinder provided in an extruder; extruding the rubber composition to a downstream side of the cylinder while kneading the rubber composition in an internal space of the cylinder that includes a plurality of protruding members protruding from an inner wall surface of the cylinder; compressing the rubber composition at least once in the step of extruding the rubber composition to the downstream side; discharging a gas generated from the compressed rubber composition to outside of the cylinder; discharging, through a discharge outlet of the cylinder, the rubber composition after the gas has been generated; and molding the rubber composition that has been discharged through the discharge outlet into a predetermined rubber member shape.Type: GrantFiled: January 12, 2017Date of Patent: August 24, 2021Assignee: SUMITOMO RUBBER INDUSTRIES, LTD.Inventors: Tomoo Tanaka, Masayuki Sakamoto, Takafumi Taguchi, Sakae Okubo, Takuma Konishi
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Publication number: 20190358855Abstract: A method for producing a rubber member according to the present invention includes the steps of: supplying a rubber composition to a cylinder provided in an extruder; extruding the rubber composition to a downstream side of the cylinder while kneading the rubber composition in an internal space of the cylinder that includes a plurality of protruding members protruding from an inner wall surface of the cylinder; compressing the rubber composition at least once in the step of extruding the rubber composition to the downstream side; discharging a gas generated from the compressed rubber composition to outside of the cylinder; discharging, through a discharge outlet of the cylinder, the rubber composition after the gas has been generated; and molding the rubber composition that has been discharged through the discharge outlet into a predetermined rubber member shape.Type: ApplicationFiled: January 12, 2017Publication date: November 28, 2019Applicant: SUMITOMO RUBBER INDUSTRIES, LTD.Inventors: Tomoo TANAKA, Masayuki SAKAMOTO, Takafumi TAGUCHI, Sakae OKUBO, Takuma KONISHI
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Patent number: 9917049Abstract: According to one embodiment, a semiconductor device includes interconnects extending from a element formation area to the drawing area, and connected with semiconductor elements in the element formation area and connected with contacts in the drawing area. The interconnects are formed based on a pattern of a (n+1)th second sidewall film matching a pattern of a nth (where n is an integer of 1 or more) first sidewall film on a lateral surface of a sacrificial layer. A first dimension matching an interconnect width of the interconnects and an interconnects interval in the element formation area is (k1/2n)×(?/NA) or less when an exposure wavelength of an exposure device is ?, a numerical aperture of a lens of the exposure device is NA and a process parameter is k1. A second dimension matching an interconnect interval in the drawing area is greater than the first dimension.Type: GrantFiled: August 2, 2016Date of Patent: March 13, 2018Assignee: Toshiba Memory CorporationInventors: Fumiharu Nakajima, Toshiya Kotani, Hiromitsu Mashita, Takafumi Taguchi, Ryota Aburada, Chikaaki Kodama
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Publication number: 20160343658Abstract: According to one embodiment, a semiconductor device includes interconnects extending from a element formation area to the drawing area, and connected with semiconductor elements in the element formation area and connected with contacts in the drawing area. The interconnects are formed based on a pattern of a (n+1)th second sidewall film matching a pattern of a nth (where n is an integer of 1 or more) first sidewall film on a lateral surface of a sacrificial layer. A first dimension matching an interconnect width of the interconnects and an interconnects interval in the element formation area is (k1/2n)×(?/NA) or less when an exposure wavelength of an exposure device is ?, a numerical aperture of a lens of the exposure device is NA and a process parameter is k1. A second dimension matching an interconnect interval in the drawing area is greater than the first dimension.Type: ApplicationFiled: August 2, 2016Publication date: November 24, 2016Inventors: Fumiharu NAKAJIMA, Toshiya KOTANI, Hiromitsu MASHITA, Takafumi TAGUCHI, Ryota ABURADA, Chikaaki KODAMA
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Patent number: 9315647Abstract: The present invention provides a rubber composition that can enhance the fuel economy, wet-grip performance, abrasion resistance, and processability in a balanced manner, and also provides a pneumatic tire using this rubber composition. The present invention relates to a rubber composition that contains a rubber component, silica, and a compound represented by formula (1) below, wherein the rubber component contains, based on 100% by mass of the rubber component, not less than 5% by mass of a conjugated diene polymer containing a constituent unit based on a conjugated diene and a constituent unit represented by formula (I) below, at least one terminal of the polymer being modified with a specific compound; and an amount of the silica is 5 to 150 parts by mass per 100 parts by mass of the rubber component.Type: GrantFiled: March 23, 2012Date of Patent: April 19, 2016Assignee: SUMITOMO RUBBER INDUSTRIES, LTD.Inventors: Yoji Imoto, Kenichi Uesaka, Takafumi Taguchi, Naoya Omura, Tetsuya Kunisawa, Satomi Yamauchi
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Publication number: 20160070847Abstract: According to an embodiment, a pattern dimension calculation method includes setting a reference point on a first circuit pattern, calculating, as a size of area of an opposing pattern, a size of area of a range corresponding to the reference point of a second circuit pattern opposite to the reference point, and calculating a dimension of the first circuit pattern in accordance with the size of area of the opposing pattern.Type: ApplicationFiled: February 18, 2015Publication date: March 10, 2016Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Takafumi TAGUCHI, Takashi ICHIKAWA, Sadatoshi MURAKAMI, Norihisa SUZUKI
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Publication number: 20160013097Abstract: According to one embodiment, a semiconductor device includes interconnects extending from a element formation area to the drawing area, and connected with semiconductor elements in the element formation area and connected with contacts in the drawing area. The interconnects are formed based on a pattern of a (n+1)th second sidewall film matching a pattern of a nth (where n is an integer of 1 or more) first sidewall film on a lateral surface of a sacrificial layer. A first dimension matching an interconnect width of the interconnects and an interconnects interval in the element formation area is (k1/2n)×(?/NA) or less when an exposure wavelength of an exposure device is ?, a numerical aperture of a lens of the exposure device is NA and a process parameter is k1. A second dimension matching an interconnect interval in the drawing area is greater than the first dimension.Type: ApplicationFiled: September 18, 2015Publication date: January 14, 2016Inventors: Fumiharu NAKAJIMA, Toshiya KOTANI, Hiromitsu MASHITA, Takafumi TAGUCHI, Ryota ABURADA, Chikaaki KODAMA
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Patent number: 9181413Abstract: The invention provides a rubber composition that can enhance fuel economy, wet-grip performance, abrasion resistance, and handling stability in a balanced manner, and a pneumatic tire using this composition.Type: GrantFiled: April 17, 2012Date of Patent: November 10, 2015Assignee: SUMITOMO RUBBER INDUSTRIES, LTD.Inventors: Takafumi Taguchi, Kenichi Uesaka, Yoji Imoto, Satomi Yamauchi, Yoshihiro Kagawa
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Patent number: 9177854Abstract: According to one embodiment, a semiconductor device includes interconnects extending from a element formation area to the drawing area, and connected with semiconductor elements in the element formation area and connected with contacts in the drawing area. The interconnects are formed based on a pattern of a (n+1)th second sidewall film matching a pattern of a nth (where n is an integer of 1 or more) first sidewall film on a lateral surface of a sacrificial layer. A first dimension matching an interconnect width of the interconnects and an interconnects interval in the element formation area is (k1/2n)×(?/NA) or less when an exposure wavelength of an exposure device is ?, a numerical aperture of a lens of the exposure device is NA and a process parameter is k1. A second dimension matching an interconnect interval in the drawing area is greater than the first dimension.Type: GrantFiled: September 12, 2013Date of Patent: November 3, 2015Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Fumiharu Nakajima, Toshiya Kotani, Hiromitsu Mashita, Takafumi Taguchi, Ryota Aburada, Chikaaki Kodama
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Patent number: 9012560Abstract: The present invention provides a rubber composition that can enhance the fuel economy, wet-grip performance, and abrasion resistance in a balanced manner, and a pneumatic tire using this rubber composition. The present invention relates to a rubber composition that contains a rubber component, silica, and a silane coupling agent, wherein the rubber component contains, based on 100% by mass of the rubber component, not less than 5% by mass of a conjugated diene polymer containing a constituent unit based on a conjugated diene and a constituent unit represented by formula (I) below, at least one terminal of the polymer being modified with a specific compound; an amount of the silica is 5 to 150 parts by mass per 100 parts by mass of the rubber component; and the silane coupling agent contains a mercapto group.Type: GrantFiled: March 22, 2012Date of Patent: April 21, 2015Assignee: Sumitomo Rubber Industries, Ltd.Inventors: Tetsuya Kunisawa, Tsuyoshi Tsuchida, Kenichi Uesaka, Isamu Tsumori, Reika Otake, Noboru Okabe, Naoya Omura, Tatsuhiro Tanaka, Takafumi Taguchi, Kenya Watanabe, Toru Iizuka
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Patent number: 8997812Abstract: The present invention relates to a pneumatic tire having an inner liner formed from a rubber composition that includes a butyl rubber in which the Mooney viscosity measured at 130° C. of an unvulcanized rubber of the rubber composition is at least 45, wherein the average value and standard deviation of the butyl rubber gauge of shoulder portion of a finished tire satisfy: (Standard deviation of butyl rubber gauge)/(Average value of butyl rubber gauge)?0.060. The rubber gauge of the tire exhibits improved uniformity and is superior in air permeability resistance.Type: GrantFiled: August 20, 2008Date of Patent: April 7, 2015Assignee: Sumitomo Rubber Industries, Ltd.Inventor: Takafumi Taguchi
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Patent number: 8857482Abstract: The present invention provides a rubber composition for a tread which enables improvement in fuel economy, breaking performance, and abrasion resistance in a balanced manner; a method for producing the rubber composition; and a heavy-load tire. The present invention relates to a rubber composition for a tread of a heavy-load tire, including a modified natural rubber having a phosphorus content of 200 ppm or less, and carbon black.Type: GrantFiled: July 27, 2012Date of Patent: October 14, 2014Assignee: Sumitomo Rubber Industries, Ltd.Inventors: Takafumi Taguchi, Naoya Ichikawa
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Publication number: 20140018490Abstract: The invention provides a rubber composition that can enhance fuel economy, wet-grip performance, abrasion resistance, and handling stability in a balanced manner, and a pneumatic tire using this composition.Type: ApplicationFiled: April 17, 2012Publication date: January 16, 2014Applicant: SUMITOMO RUBBER INDUSTRIES, LTD.Inventors: Takafumi Taguchi, Kenichi Uesaka, Yoji Imoto, Satomi Yamauchi, Yoshihiro Kagawa
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Publication number: 20140017887Abstract: According to one embodiment, a semiconductor device includes interconnects extending from a element formation area to the drawing area, and connected with semiconductor elements in the element formation area and connected with contacts in the drawing area. The interconnects are formed based on a pattern of a (n+1)th second sidewall film matching a pattern of a nth (where n is an integer of 1 or more) first sidewall film on a lateral surface of a sacrificial layer. A first dimension matching an interconnect width of the interconnects and an interconnects interval in the element formation area is (k1/2n)×(?/NA) or less when an exposure wavelength of an exposure device is ?, a numerical aperture of a lens of the exposure device is NA and a process parameter is k1. A second dimension matching an interconnect interval in the drawing area is greater than the first dimension.Type: ApplicationFiled: September 12, 2013Publication date: January 16, 2014Applicant: Kabushiki Kaisha ToshibaInventors: Fumiharu NAKAJIMA, Toshiya Kotani, Hiromitsu Mashita, Takafumi Taguchi, Ryota Aburada, Chikaaki Kodama
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Patent number: 8617999Abstract: A method of manufacturing a semiconductor device, which forms a pattern by performing pattern transformation steps multiple times, comprises setting finished pattern sizes for patterns to be formed in each consecutive two pattern transformation steps among the plurality of pattern transformation steps based on a possible total amount of in-plane size variation of the patterns to be formed in the consecutive two pattern transformation steps.Type: GrantFiled: February 16, 2012Date of Patent: December 31, 2013Assignee: Kabushiki Kaisha ToshibaInventors: Hiromitsu Mashita, Toshiya Kotani, Fumiharu Nakajima, Takafumi Taguchi, Chikaaki Kodama
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Publication number: 20130310512Abstract: The present invention provides a rubber composition that can enhance the fuel economy, wet-grip performance, abrasion resistance, and processability in a balanced manner, and also provides a pneumatic tire using this rubber composition. The present invention relates to a rubber composition that contains a rubber component, silica, and a compound represented by formula (1) below, wherein the rubber component contains, based on 100% by mass of the rubber component, not less than 5% by mass of a conjugated diene polymer containing a constituent unit based on a conjugated diene and a constituent unit represented by formula (I) below, at least one terminal of the polymer being modified with a specific compound; and an amount of the silica is 5 to 150 parts by mass per 100 parts by mass of the rubber component.Type: ApplicationFiled: March 23, 2012Publication date: November 21, 2013Applicant: SUMITOMO RUBBER INDUSTRIES, LTD.Inventors: Yoji Imoto, Kenichi Uesaka, Takafumi Taguchi, Naoya Omura, Tetsuya Kunisawa, Satomi Yamauchi
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Publication number: 20130303679Abstract: The present invention provides a rubber composition that can enhance the fuel economy, wet-grip performance, and abrasion resistance in a balanced manner, and a pneumatic tire using this rubber composition. The present invention relates to a rubber composition that contains a rubber component, silica, and a silane coupling agent, wherein the rubber component contains, based on 100% by mass of the rubber component, not less than 5% by mass of a conjugated diene polymer containing a constituent unit based on a conjugated diene and a constituent unit represented by formula (I) below, at least one terminal of the polymer being modified with a specific compound; an amount of the silica is 5 to 150 parts by mass per 100 parts by mass of the rubber component; and the silane coupling agent contains a mercapto group.Type: ApplicationFiled: March 22, 2012Publication date: November 14, 2013Applicant: SUMITOMO RUBBER INDUSTRIES, LTD.Inventors: Tetsuya Kunisawa, Tsuyoshi Tsuchida, Kenichi Uesaka, Isamu Tsumori, Reika Otake, Noboru Okabe, Naoya Omura, Tatsuhiro Tanaka, Takafumi Taguchi, Kenya Watanabe, Toru Iizuka
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Publication number: 20130030083Abstract: The present invention provides a rubber composition for a tread which enables improvement in fuel economy, breaking performance, and abrasion resistance in a balanced manner; a method for producing the rubber composition; and a heavy-load tire. The present invention relates to a rubber composition for a tread of a heavy-load tire, including a modified natural rubber having a phosphorus content of 200 ppm or less, and carbon black.Type: ApplicationFiled: July 27, 2012Publication date: January 31, 2013Inventors: Takafumi TAGUCHI, Naoya Ichikawa
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Patent number: 8336005Abstract: A pattern dimension calculation method according to one embodiment calculates a taper shape of a mask member used as a mask when a circuit pattern is processed in an upper layer of the circuit pattern formed on a substrate. The method calculates an opening angle facing the mask member from a shape prediction position on the circuit pattern on the basis of the taper shape. The method calculates a dimension of the circuit pattern according to the opening angle formed at the shape prediction position.Type: GrantFiled: March 17, 2011Date of Patent: December 18, 2012Assignee: Kabushiki Kaisha ToshibaInventors: Takafumi Taguchi, Toshiya Kotani, Hiromitsu Mashita, Fumiharu Nakajima, Ryota Aburada, Chikaaki Kodama
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Publication number: 20120311511Abstract: A mask inspection method according to the embodiments, original data corresponding to a semiconductor integrated circuit pattern to be formed on a substrate is created. After that, original production simulation which mocks an original production process is performed on the original data to derive information relating to an original pattern shape in the case of forming an original pattern corresponding to the original data on an original. After that, whether or not the information relating to an original pattern shape satisfies a predetermined value decided based on the original production process is determined.Type: ApplicationFiled: February 17, 2012Publication date: December 6, 2012Inventors: Takafumi TAGUCHI, Toshiya Kotani, Chikaaki Kodama, Fumiharu Nakajima