Abstract: With respect to an inference method performed by at least one processor, the method includes inputting, by the at least one processor, into a learned model, non-processed object image data of a second object and data related to a second process for the second object, and inferring, by the at least one processor using the learned model, processed object image data of the second object on which the second process has been performed. The learned model has been trained so that an output obtained in response to non-processed object image data of a first object and data related to a first process for the first object being input approaches processed object image data of the first object on which the first process has been performed.

Abstract: A global optimum solution of a simulation parameter is derived using a shape simulator. A parameter deriving device includes a generating unit configured to generate a plurality of combinations of data indicating pre-processing shapes and data indicating post-processing shapes of substrates processed under a same processing condition, data indicating a pre-processing shape or a post-processing shape being different from data indicating a pre-processing shape or a post-processing shape included in another combination in the plurality of combinations, and a deriving unit configured to derive a value of a simulation parameter of a shape simulator that minimizes a sum of respective differences between data indicating predicted post-processing shapes and data indicating corresponding post-processing shapes, the predicted post-processing shapes being predicted by inputting the data indicating the pre-processing shapes included in the plurality of combinations into the shape simulator.

Abstract: A highly versatile data processing is implemented on data collected in a manufacturing process. A data processing device includes: a calculation part configured to collect a plurality of data groups associated with a predetermined step of a process, and calculate effects in the predetermined step for each of the plurality of data groups; a dividing part configured to divide a feature space such that a distribution of each of the plurality of data groups associated with the predetermined step in the feature space is classified for each of the calculated effects; and an output part configured to output specific data that specifies respective regions of the divided feature space.

Abstract: An information processing device includes: a recording means storing model data that reproduces a change of a workpiece, the model data being constructed, as an effect of process treatment, from differential data between initial state data and end state data of the workpiece, the end state data representing state of the workpiece to which the process treatment is applied under a predetermined process condition; an input receiving means for receiving an input of the initial state data and target end state data of the workpiece; a predicting means for predicting the end state data from the received initial state data, by using the model data and a combination of multiple model data in the recording means; and a determining means for determining a process condition of process treatment to be applied to the workpiece, based on a proximity between the predicted end state data and the target end state data.

Abstract: An evaluation apparatus includes a processor that performs operations including reading a simulation parameter of a topography simulator and first range information or second range information that are associated with each other, the simulation parameter being calculated to cause the topography simulator output topography information of a processed target object that is to be obtained by processing the unprocessed target object under a predetermined processing condition, providing topography information of a new unprocessed target object and the simulation parameter to the topography simulator to cause the topography simulator to predict topography information of a new processed target object that is processed under the predetermined processing condition, and outputting a result of comparing the topography information of the new unprocessed target object with the first range information or a result of comparing the topography information of the new processed target object with the second range information.

Abstract: A method for etching a ruthenium film includes a first step of etching the ruthenium film by plasma processing using oxygen-containing gas, and a second step of etching the ruthenium film by plasma processing using chlorine-containing gas. The first step and the second step are alternately performed. In the first step and the second step, the ruthenium film is etched at a target control temperature for a target processing time that are determined based on a pre-obtained relation between an etching amount per one cycle including the first step and the second step as a set, a control temperature of the ruthenium film, and processing times of each of the first step and the second step.

Abstract: An information processing device includes: a recording means storing model data that reproduces a change of a workpiece, the model data being constructed, as an effect of process treatment, from differential data between initial state data and end state data of the workpiece, the end state data representing state of the workpiece to which the process treatment is applied under a predetermined process condition; an input receiving means for receiving an input of the initial state data and target end state data of the workpiece; a predicting means for predicting the end state data from the received initial state data, by using the model data and a combination of multiple model data in the recording means; and a determining means for determining a process condition of process treatment to be applied to the workpiece, based on a proximity between the predicted end state data and the target end state data.

Abstract: An information processing device includes: a recording means storing model data that reproduces a change of a workpiece, the model data being constructed, as an effect of process treatment, from differential data between initial state data and end state data of the workpiece, the end state data representing state of the workpiece to which the process treatment is applied under a predetermined process condition; an input receiving means for receiving an input of the initial state data and target end state data of the workpiece; a predicting means for predicting the end state data from the received initial state data, by using the model data and a combination of multiple model data in the recording means; and a determining means for determining a process condition of process treatment to be applied to the workpiece, based on a proximity between the predicted end state data and the target end state data.

Abstract: An object of the invention is to provide: an alloy article that has excellent homogeneity in the alloy composition and microstructure as well as significant shape controllability, using an HEA with significant mechanical strength and high corrosion resistance; a method for manufacturing the alloy article; and a product using the alloy article. There is provided an alloy article comprising: Co, Cr, Fe, Ni, and Ti elements, each element in content of 5 to 35 atomic %; more than 0 atomic % to 8 atomic % of Mo %; and remainder substances of unavoidable impurities. And, ultrafine particles with an average diameter of 40 nm or less are dispersedly precipitated in matrix phase crystals of the alloy article.

Abstract: With respect to an inference method performed by at least one processor, the method includes inputting, by the at least one processor, into a learned model, non-processed object image data of a second object and data related to a second process for the second object, and inferring, by the at least one processor using the learned model, processed object image data of the second object on which the second process has been performed. The learned model has been trained so that an output obtained in response to non-processed object image data of a first object and data related to a first process for the first object being input approaches processed object image data of the first object on which the first process has been performed.

Abstract: A method of processing a workpiece includes: forming a ruthenium film on the workpiece and disposing a mask on the ruthenium film; etching the ruthenium film through a plasma processing; forming a protective film on the workpiece through an atomic layer deposition method, the protective film including a first region extending along a side wall surface of the mask and a second region extending over the ruthenium film; and etching the protective film so as to remove the second region while leaving the first region. The etching the ruthenium film includes a first step of etching the ruthenium film through a plasma processing using an oxygen-containing gas, and a second step of etching the ruthenium film through a plasma processing using a chlorine-containing gas. The first step and the second step are alternately performed.

Abstract: An adapter for an endoscope, the adapter including: a cylindrical body having an internal portion formed on the cylindrical body, the internal portion configured to matingly engage with each of distal and proximal external portions provided on a tip of the endoscope, the distal and proximal external portions being separated in a longitudinal direction of the cylindrical body by a portion of the tip that does not engage the internal portion; and wherein the cylindrical body further having an anti-slip portion formed on an exterior of the cylindrical body, the anti-slip portion having a plurality of recesses arranged circumferentially on the exterior, a position of the anti-slip portion in the longitudinal direction being set such that a position of the proximal external portion in the longitudinal direction does not overlap with the longitudinal position of the anti slip portion where the proximal external portion is engaged with the internal portion.

Abstract: An information processing device includes: a recording means storing model data that reproduces a change of a workpiece, the model data being constructed, as an effect of process treatment, from differential data between initial state data and end state data of the workpiece, the end state data representing state of the workpiece to which the process treatment is applied under a predetermined process condition; an input receiving means for receiving an input of the initial state data and target end state data of the workpiece; a predicting means for predicting the end state data from the received initial state data, by using the model data and a combination of multiple model data in the recording means; and a determining means for determining a process condition of process treatment to be applied to the workpiece, based on a proximity between the predicted end state data and the target end state data.

Abstract: A data processing apparatus includes: a first storage part that stores an analysis result that specifies each region when a feature space is divided such that a distribution of each data group associated with a predetermined step of a manufacturing process in the space is classified according to an effect calculated for each data group in the predetermined step; a second storage part that stores models each of which outputs the effect corresponding to each region, in association with each region, when the data groups classified into each region of the feature space are inputted; and an execution part for performing a simulation processing by using, among the models, a model stored in association with one region when a new data group associated with the predetermined step is acquired and when the one region into which the acquired new data group is classified is determined based on the analysis result.

Abstract: A method for etching a ruthenium film includes a first step of etching the ruthenium film by plasma processing using oxygen-containing gas, and a second step of etching the ruthenium film by plasma processing using chlorine-containing gas. The first step and the second step are alternately performed. In the first step and the second step, the ruthenium film is etched at a target control temperature for a target processing time that are determined based on a pre-obtained relation between an etching amount per one cycle including the first step and the second step as a set, a control temperature of the ruthenium film, and processing times of each of the first step and the second step.

Abstract: A highly versatile data processing is implemented on data collected in a manufacturing process. A data processing device includes: a calculation part configured to collect a plurality of data groups associated with a predetermined step of a process, and calculate effects in the predetermined step for each of the plurality of data groups; a dividing part configured to divide a feature space such that a distribution of each of the plurality of data groups associated with the predetermined step in the feature space is classified for each of the calculated effects; and an output part configured to output specific data that specifies respective regions of the divided feature space.

Abstract: An object of the invention is to provide: an HEA article that has excellent homogeneity in the alloy composition and microstructure as well as significant shape controllability, using an HEA with significant mechanical strength and high corrosion resistance; a method for manufacturing the HEA article; and a product using the HEA article. There is provided an HEA article comprising: Co, Cr, Fe, Ni, and Ti elements, each element in content of 5 to 35 atomic %; more than 0 atomic % to 8 atomic % of Mo %; and remainder substances of unavoidable impurities.

Abstract: A method for etching a ruthenium film includes a first step of etching the ruthenium film by plasma processing using oxygen-containing gas, and a second step of etching the ruthenium film by plasma processing using chlorine-containing gas. The first step and the second step are alternately performed. In the first step and the second step, the ruthenium film is etched at a target control temperature for a target processing time that are determined based on a pre-obtained relation between an etching amount per one cycle including the first step and the second step as a set, a control temperature of the ruthenium film, and processing times of each of the first step and the second step.

Abstract: An endoscope apparatus includes: an image pickup device; a glass lid that is provided on a distal end side ahead of a light receiving surface of the image pickup device and is fixed to a front face of the image pickup device in an integrated manner; and a frame body that covers at least a part of the image pickup device and the glass lid. The frame body includes a fixing region for fixing an image pickup circuit portion provided on a proximal end side opposite to the front face of the image pickup device, and a non-fixing region that keeps the distal end side relative to the light receiving surface of the image pickup device and the glass lid fixed to the light receiving surface of the image pickup device in a non-fixed state.

Abstract: An alloy structure has an arbitrary shape dimension which has high uniformity in the distribution of the element composition. The alloy structure contains Fe and at least four elements, which are selected from the group consisting of elements from atomic number 13 to atomic number 79 included in Group 3 to Group 16 of the periodic table of the elements and have a ratio of the atomic radius to an Fe atom of 0.83 or more but 1.17 or less, each of Fe and the four elements is contained in an atomic concentration range of 5 at % or more but 30 at % or less, a difference in atomic concentration between at least four elements among the at least four elements and Fe is in a range of less than 3 at %, and the alloy structure has, a column crystal in which the at least four elements and Fe are solid-dissolved.