Patents by Inventor Takahiko Kato

Takahiko Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220121176
    Abstract: An information processing device includes: a recording means storing model data that reproduces a change of a workpiece, the model data being constructed, as an effect of process treatment, from differential data between initial state data and end state data of the workpiece, the end state data representing state of the workpiece to which the process treatment is applied under a predetermined process condition; an input receiving means for receiving an input of the initial state data and target end state data of the workpiece; a predicting means for predicting the end state data from the received initial state data, by using the model data and a combination of multiple model data in the recording means; and a determining means for determining a process condition of process treatment to be applied to the workpiece, based on a proximity between the predicted end state data and the target end state data.
    Type: Application
    Filed: December 27, 2021
    Publication date: April 21, 2022
    Inventors: Hironori Moki, Takahiko Kato
  • Patent number: 11237544
    Abstract: An information processing device includes: a recording means storing model data that reproduces a change of a workpiece, the model data being constructed, as an effect of process treatment, from differential data between initial state data and end state data of the workpiece, the end state data representing state of the workpiece to which the process treatment is applied under a predetermined process condition; an input receiving means for receiving an input of the initial state data and target end state data of the workpiece; a predicting means for predicting the end state data from the received initial state data, by using the model data and a combination of multiple model data in the recording means; and a determining means for determining a process condition of process treatment to be applied to the workpiece, based on a proximity between the predicted end state data and the target end state data.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: February 1, 2022
    Assignee: Tokyo Electron Limited
    Inventors: Hironori Moki, Takahiko Kato
  • Patent number: 11141791
    Abstract: An object of the invention is to provide: an alloy article that has excellent homogeneity in the alloy composition and microstructure as well as significant shape controllability, using an HEA with significant mechanical strength and high corrosion resistance; a method for manufacturing the alloy article; and a product using the alloy article. There is provided an alloy article comprising: Co, Cr, Fe, Ni, and Ti elements, each element in content of 5 to 35 atomic %; more than 0 atomic % to 8 atomic % of Mo %; and remainder substances of unavoidable impurities. And, ultrafine particles with an average diameter of 40 nm or less are dispersedly precipitated in matrix phase crystals of the alloy article.
    Type: Grant
    Filed: October 25, 2016
    Date of Patent: October 12, 2021
    Assignee: HITACHI METALS, LTD.
    Inventors: Tadashi Fujieda, Mamoru Hirota, Kosuke Kuwabara, Kinya Aota, Takahiko Kato, Akihiko Chiba, Yuichiro Koizumi, Kenta Yamanaka, Seiichi Watanabe
  • Publication number: 20210209413
    Abstract: With respect to an inference method performed by at least one processor, the method includes inputting, by the at least one processor, into a learned model, non-processed object image data of a second object and data related to a second process for the second object, and inferring, by the at least one processor using the learned model, processed object image data of the second object on which the second process has been performed. The learned model has been trained so that an output obtained in response to non-processed object image data of a first object and data related to a first process for the first object being input approaches processed object image data of the first object on which the first process has been performed.
    Type: Application
    Filed: March 2, 2021
    Publication date: July 8, 2021
    Inventors: Kosuke NAKAGO, Daisuke Motoki, Masaki Watanabe, Tomoki Komatsu, Hironori Moki, Masanobu Honda, Takahiko Kato, Tomohiko Niizeki
  • Patent number: 11049730
    Abstract: A method of processing a workpiece includes: forming a ruthenium film on the workpiece and disposing a mask on the ruthenium film; etching the ruthenium film through a plasma processing; forming a protective film on the workpiece through an atomic layer deposition method, the protective film including a first region extending along a side wall surface of the mask and a second region extending over the ruthenium film; and etching the protective film so as to remove the second region while leaving the first region. The etching the ruthenium film includes a first step of etching the ruthenium film through a plasma processing using an oxygen-containing gas, and a second step of etching the ruthenium film through a plasma processing using a chlorine-containing gas. The first step and the second step are alternately performed.
    Type: Grant
    Filed: April 4, 2019
    Date of Patent: June 29, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yu Nagatomo, Takahiko Kato
  • Patent number: 10932651
    Abstract: An adapter for an endoscope, the adapter including: a cylindrical body having an internal portion formed on the cylindrical body, the internal portion configured to matingly engage with each of distal and proximal external portions provided on a tip of the endoscope, the distal and proximal external portions being separated in a longitudinal direction of the cylindrical body by a portion of the tip that does not engage the internal portion; and wherein the cylindrical body further having an anti-slip portion formed on an exterior of the cylindrical body, the anti-slip portion having a plurality of recesses arranged circumferentially on the exterior, a position of the anti-slip portion in the longitudinal direction being set such that a position of the proximal external portion in the longitudinal direction does not overlap with the longitudinal position of the anti slip portion where the proximal external portion is engaged with the internal portion.
    Type: Grant
    Filed: August 23, 2017
    Date of Patent: March 2, 2021
    Assignee: OLYMPUS CORPORATION
    Inventor: Takahiko Kato
  • Publication number: 20210048794
    Abstract: An information processing device includes: a recording means storing model data that reproduces a change of a workpiece, the model data being constructed, as an effect of process treatment, from differential data between initial state data and end state data of the workpiece, the end state data representing state of the workpiece to which the process treatment is applied under a predetermined process condition; an input receiving means for receiving an input of the initial state data and target end state data of the workpiece; a predicting means for predicting the end state data from the received initial state data, by using the model data and a combination of multiple model data in the recording means; and a determining means for determining a process condition of process treatment to be applied to the workpiece, based on a proximity between the predicted end state data and the target end state data.
    Type: Application
    Filed: January 28, 2019
    Publication date: February 18, 2021
    Inventors: Hironori MOKI, Takahiko KATO
  • Publication number: 20200410413
    Abstract: A data processing apparatus includes: a first storage part that stores an analysis result that specifies each region when a feature space is divided such that a distribution of each data group associated with a predetermined step of a manufacturing process in the space is classified according to an effect calculated for each data group in the predetermined step; a second storage part that stores models each of which outputs the effect corresponding to each region, in association with each region, when the data groups classified into each region of the feature space are inputted; and an execution part for performing a simulation processing by using, among the models, a model stored in association with one region when a new data group associated with the predetermined step is acquired and when the one region into which the acquired new data group is classified is determined based on the analysis result.
    Type: Application
    Filed: June 25, 2020
    Publication date: December 31, 2020
    Inventors: Hironori MOKI, Takahiko KATO
  • Publication number: 20200402814
    Abstract: A method for etching a ruthenium film includes a first step of etching the ruthenium film by plasma processing using oxygen-containing gas, and a second step of etching the ruthenium film by plasma processing using chlorine-containing gas. The first step and the second step are alternately performed. In the first step and the second step, the ruthenium film is etched at a target control temperature for a target processing time that are determined based on a pre-obtained relation between an etching amount per one cycle including the first step and the second step as a set, a control temperature of the ruthenium film, and processing times of each of the first step and the second step.
    Type: Application
    Filed: September 4, 2020
    Publication date: December 24, 2020
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shigeru Tahara, Nobuaki Seki, Takahiko Kato
  • Publication number: 20200372303
    Abstract: A highly versatile data processing is implemented on data collected in a manufacturing process. A data processing device includes: a calculation part configured to collect a plurality of data groups associated with a predetermined step of a process, and calculate effects in the predetermined step for each of the plurality of data groups; a dividing part configured to divide a feature space such that a distribution of each of the plurality of data groups associated with the predetermined step in the feature space is classified for each of the calculated effects; and an output part configured to output specific data that specifies respective regions of the divided feature space.
    Type: Application
    Filed: December 25, 2018
    Publication date: November 26, 2020
    Inventors: Atsushi SUZUKI, Takahiko KATO
  • Patent number: 10787725
    Abstract: An object of the invention is to provide: an HEA article that has excellent homogeneity in the alloy composition and microstructure as well as significant shape controllability, using an HEA with significant mechanical strength and high corrosion resistance; a method for manufacturing the HEA article; and a product using the HEA article. There is provided an HEA article comprising: Co, Cr, Fe, Ni, and Ti elements, each element in content of 5 to 35 atomic %; more than 0 atomic % to 8 atomic % of Mo %; and remainder substances of unavoidable impurities.
    Type: Grant
    Filed: November 8, 2016
    Date of Patent: September 29, 2020
    Assignee: Hitachi Metals, Ltd.
    Inventors: Tadashi Fujieda, Kousuke Kuwabara, Mamoru Hirota, Kinya Aota, Takahiko Kato, Akihiko Chiba, Yuichiro Koizumi, Kenta Yamanaka
  • Patent number: 10770308
    Abstract: A method for etching a ruthenium film includes a first step of etching the ruthenium film by plasma processing using oxygen-containing gas, and a second step of etching the ruthenium film by plasma processing using chlorine-containing gas. The first step and the second step are alternately performed. In the first step and the second step, the ruthenium film is etched at a target control temperature for a target processing time that are determined based on a pre-obtained relation between an etching amount per one cycle including the first step and the second step as a set, a control temperature of the ruthenium film, and processing times of each of the first step and the second step.
    Type: Grant
    Filed: March 21, 2019
    Date of Patent: September 8, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Shigeru Tahara, Nobuaki Seki, Takahiko Kato
  • Patent number: 10757303
    Abstract: An endoscope apparatus includes: an image pickup device; a glass lid that is provided on a distal end side ahead of a light receiving surface of the image pickup device and is fixed to a front face of the image pickup device in an integrated manner; and a frame body that covers at least a part of the image pickup device and the glass lid. The frame body includes a fixing region for fixing an image pickup circuit portion provided on a proximal end side opposite to the front face of the image pickup device, and a non-fixing region that keeps the distal end side relative to the light receiving surface of the image pickup device and the glass lid fixed to the light receiving surface of the image pickup device in a non-fixed state.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: August 25, 2020
    Assignee: OLYMPUS CORPORATION
    Inventor: Takahiko Kato
  • Patent number: 10702944
    Abstract: An alloy structure has an arbitrary shape dimension which has high uniformity in the distribution of the element composition. The alloy structure contains Fe and at least four elements, which are selected from the group consisting of elements from atomic number 13 to atomic number 79 included in Group 3 to Group 16 of the periodic table of the elements and have a ratio of the atomic radius to an Fe atom of 0.83 or more but 1.17 or less, each of Fe and the four elements is contained in an atomic concentration range of 5 at % or more but 30 at % or less, a difference in atomic concentration between at least four elements among the at least four elements and Fe is in a range of less than 3 at %, and the alloy structure has, a column crystal in which the at least four elements and Fe are solid-dissolved.
    Type: Grant
    Filed: July 17, 2015
    Date of Patent: July 7, 2020
    Assignee: HITACHI METALS, LTD.
    Inventors: Takahiko Kato, Kousuke Kuwabara, Tadashi Fujieda, Kinya Aota, Isamu Takahashi, Hiroyuki Satake, Kenji Yamaga, Hajime Murakami
  • Patent number: 10576538
    Abstract: An alloy structure which has high uniformity in the distribution of the element composition and the mechanical strength and excellent high-temperature strength and corrosion resistance, contains Fe and at least four elements, which are selected from the group consisting of elements from atomic number 13 to atomic number 79, included in Group 3 to Group 16 of the periodic table of the elements, and have a ratio of the atomic radius to an Fe atom of 0.83 or more but 1.17 or less, each of the elements in an atomic concentration range of 5 at % or more but 30 at % or less, a difference in atomic concentration among the at least four elements and Fe is in a range of less than 3 at %, and the alloy structure has, as a main crystal, a column crystal in which the at least four elements and Fe are solid-dissolved.
    Type: Grant
    Filed: July 17, 2015
    Date of Patent: March 3, 2020
    Assignee: HITACHI METALS, LTD.
    Inventors: Takahiko Kato, Kousuke Kuwabara, Tadashi Fujieda, Kinya Aota, Isamu Takahashi, Kenji Yamaga, Hiroyuki Satake, Hajime Murakami
  • Publication number: 20190351702
    Abstract: The present invention provides a non-pneumatic tire including an inner tube (6) attachable to an axle (15a), an outer tube (4) configured to surround the inner tube from an outer side in a tire radial direction, and an elastically deformable connecting member (3) configured to connect the inner tube and the outer tube to each other, the non-pneumatic tire including at least one of a detection section configured to detect occurrences of scratching, damage, or deterioration in the non-pneumatic tire; and a reporting section (33) configured to report occurrences of scratching, damage, or deterioration in the non-pneumatic tire.
    Type: Application
    Filed: November 21, 2017
    Publication date: November 21, 2019
    Inventors: Akihiko ABE, Hiroshi SATOU, Takanori SHOJI, Masashi NISHIDA, Mitsunobu KAWANO, Takahiko KATO
  • Publication number: 20190335068
    Abstract: An endoscope apparatus includes: an image pickup device; a glass lid that is provided on a distal end side ahead of a light receiving surface of the image pickup device and is fixed to a front face of the image pickup device in an integrated manner; and a frame body that covers at least a part of the image pickup device and the glass lid. The frame body includes a fixing region for fixing an image pickup circuit portion provided on a proximal end side opposite to the front face of the image pickup device, and a non-fixing region that keeps the distal end side relative to the light receiving surface of the image pickup device and the glass lid fixed to the light receiving surface of the image pickup device in a non-fixed state.
    Type: Application
    Filed: April 25, 2019
    Publication date: October 31, 2019
    Applicant: OLYMPUS CORPORATION
    Inventor: Takahiko KATO
  • Publication number: 20190311915
    Abstract: A method of processing a workpiece includes: forming a ruthenium film on the workpiece and disposing a mask on the ruthenium film; etching the ruthenium film through a plasma processing; forming a protective film on the workpiece through an atomic layer deposition method, the protective film including a first region extending along a side wall surface of the mask and a second region extending over the ruthenium film; and etching the protective film so as to remove the second region while leaving the first region. The etching the ruthenium film includes a first step of etching the ruthenium film through a plasma processing using an oxygen-containing gas, and a second step of etching the ruthenium film through a plasma processing using a chlorine-containing gas. The first step and the second step are alternately performed.
    Type: Application
    Filed: April 4, 2019
    Publication date: October 10, 2019
    Inventors: Yu Nagatomo, Takahiko Kato
  • Publication number: 20190295856
    Abstract: A method for etching a ruthenium film includes a first step of etching the ruthenium film by plasma processing using oxygen-containing gas, and a second step of etching the ruthenium film by plasma processing using chlorine-containing gas. The first step and the second step are alternately performed. In the first step and the second step, the ruthenium film is etched at a target control temperature for a target processing time that are determined based on a pre-obtained relation between an etching amount per one cycle including the first step and the second step as a set, a control temperature of the ruthenium film, and processing times of each of the first step and the second step.
    Type: Application
    Filed: March 21, 2019
    Publication date: September 26, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shigeru TAHARA, Nobuaki SEKI, Takahiko KATO
  • Patent number: 10373846
    Abstract: A substrate processing method includes a first process of supplying a first gas to a substrate; and a second process of supplying a second gas to the substrate after the first process. When a distance from an edge of the substrate to a boundary between a processing space and a gas exhaust space is L, a cross sectional area of a space orthogonal to a flow of the second gas is S(x), a supply flow rate of the second gas is Q, a pressure within the processing space is P and a diffusion coefficient of the first gas to the second gas is D, at least one of the distance L, the cross sectional area S(x) and the supply flow rate Q in the second process is adjusted such that a Peclet number Pe calculated by expression (3) becomes larger than 1.
    Type: Grant
    Filed: May 31, 2017
    Date of Patent: August 6, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takahiko Kato, Weiting Chen