Patents by Inventor Takahiro Iwahama

Takahiro Iwahama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7115541
    Abstract: A catalyst of the invention includes an imide compound having a N-substituted cyclic imide skeleton represented by following Formula (I): wherein R is a hydroxyl-protecting group. Preferred R is a hydrolyzable protecting group. R may be a group obtained from an acid by eliminating an OH group therefrom. Such acids include, for example, carboxylic acids, sulfonic acids, carbonic acid, carbamic acid, sulfuric acid, nitric acid, phosphoric acids and boric acids. The catalyst may include the imide compound and a metallic compound in combination. In the presence of the catalyst, (A) a compound capable of forming a radical is allowed to react with (B) a radical scavenging compound and thereby yields an addition or substitution reaction product of the compound (A) and the compound (B) or a derivative thereof. This catalyst can produce an organic compound with a high selectivity in a high yield as a result of, for example, an addition or substitution reaction under mild conditions.
    Type: Grant
    Filed: November 8, 2001
    Date of Patent: October 3, 2006
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yasutaka Ishii, Tatsuya Nakano, Takahiro Iwahama, Naruhisa Hirai
  • Publication number: 20060160247
    Abstract: A polymeric compound having a repeated unit corresponding to an unsaturated carboxylic acid hemiacetal ester represented by the following formula (1); wherein Ra is a hydrogen atom, a halogen atom, an alkyl group of carbon number 1 to 6 or a haloalkyl group of carbon number 1 to 6, Rb is a hydrocarbon group having a hydrogen atom at a first poison, Rc is a hydrogen atom or a hydrocarbon group and Rd is an organic group having a cyclic skeleton. This polymeric compound, further, may have a repeated unit corresponding to at least one monomer selected from a monomer having a lactone skeleton, a monomer having a cyclic ketone skeleton, a monomer having an acid anhydride group and a monomer having an imide group [except for a repeated unit corresponding to the said unsaturated carboxylic acid hemiacetal ester] and/or a repeated unit corresponding to at least one monomer selected from a monomer having a hydroxyl group and others.
    Type: Application
    Filed: January 17, 2005
    Publication date: July 20, 2006
    Inventors: Hiroshi Koyama, Keizo Inoue, Takahiro Iwahama, Mari Sumida
  • Publication number: 20040181098
    Abstract: Aromatic vinyl ether compounds represented by Formula (1) or by Formula (2) 1
    Type: Application
    Filed: October 23, 2003
    Publication date: September 16, 2004
    Applicant: Emory University
    Inventors: Takahiro Iwahama, Tatsuya Nakano
  • Publication number: 20040171885
    Abstract: An allyl-containing compound represented by following Formula (3): 1
    Type: Application
    Filed: February 26, 2004
    Publication date: September 2, 2004
    Inventors: Yasutaka Ishii, Takahiro Iwahama, Tatsuya Nakano
  • Patent number: 6768023
    Abstract: A process produces an organic compound by allowing (A) a compound capable of generating a free radical to react with (B) at least one of esters and salts of nitrous acid in the presence of a nitrogen-containing cyclic compound constitutively having a skeleton represented by following Formula (i) in its ring: wherein X is an oxygen atom or an —OR group, and wherein R is a hydrogen atom or a hydroxyl-protecting group. Examples of the nitrogen-containing cyclic compound are cyclic imide compounds having a cyclic imide skeleton represented by following Formula (I): wherein n is 0 or 1; X is an oxygen atom or an —OR group, and wherein R is a hydrogen atom or a hydroxyl-protecting group.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: July 27, 2004
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yasutaka Ishii, Tatsuya Nakano, Takahiro Iwahama
  • Publication number: 20030171618
    Abstract: A process produces an organic compound by allowing (A) a compound capable of generating a free radical to react with (B) at least one of esters and salts of nitrous acid in the presence of a nitrogen-containing cyclic compound constitutively having a skeleton represented by following Formula (i) in its ring: 1
    Type: Application
    Filed: March 6, 2003
    Publication date: September 11, 2003
    Inventors: Yasutaka Ishii, Tatsuya Nakano, Takahiro Iwahama
  • Patent number: 6548713
    Abstract: The process of this invention efficiently produces a compound having an alkyl group or alkenyl group bonded at the alpha position of an electron attractive group, or a derivative thereof, by catalytic radical addition reaction. The process reacts a compound containing an electron attractive group of Formula (1) as defined in the specification with a compound containing an unsaturated carbon-carbon bond of Formula (2) or (7) as defined in the specification to produce a compound of Formula (3) or (8) as defined in the specification. The invention is characterized by carrying out the reaction in the presence of oxygen and a catalytic compound of a Group 7, 8, or 9 element of the Periodic Table of Elements.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: April 15, 2003
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yasutaka Ishii, Takahiro Iwahama, Satoshi Sakaguchi, Tatsuya Nakano
  • Publication number: 20030013603
    Abstract: A catalyst of the invention includes an imide compound having a N-substituted cyclic imide skeleton represented by following Formula (I): 1
    Type: Application
    Filed: July 15, 2002
    Publication date: January 16, 2003
    Inventors: Yasutaka Ishii, Tatsuya Nakano, Takahiro Iwahama, Naruhisa Hirai
  • Publication number: 20020165416
    Abstract: A process of the present invention produces an organic compound by allowing a compound containing an electron attractive group of following Formula (1): 1
    Type: Application
    Filed: November 9, 2001
    Publication date: November 7, 2002
    Inventors: Yasutaka Ishii, Takahiro Iwahama, Satoshi Sakaguchi, Tatsuya Nakano