Abstract: A method for determining an arrangement of first and second objects such that a gap between the first and second objects becomes a predetermined gap includes the steps of forming a light transmitting entry window on the first object, forming a light transmitting exit window on the first object at such a position that light would enter through the entry window the second object, reflect on the second object or on the first and second objects, and then enter the first object if the first and second objects are arranged in parallel at the predetermined gap, introducing light to the entry window to provide the second object with the light, detecting an intensity of light from the exit window, and determining the arrangement for the predetermined gap based on the detected light intensity.

Abstract: Stereoscopic shape measurement of a surface of a target is realized by measuring the target without coming into contact with the target by a first measuring unit which has no possibility of contacting the target, such as an optical profiler (Mirou interferometer method or the like), and then measuring the target again by a second measuring unit which has a possibility of contacting the target, such as an AFM, a stylus profiler or the like, by using the measurement result of the first measuring unit. An operation controller, controlling measurement operation of the second measuring unit, controls based on the measurement result of the first measuring unit the probe or stylus to scan the measurement target surface so as not to come strongly in contact with the surface.

Abstract: A position detecting system for producing relative positional information related to first and second objects, is wherein the system includes a light projecting device for projecting light toward the first and second objects disposed opposed to each other and having physical optic elements, the light projecting device being capable of projecting lights of different wavelengths, a light detecting device for detecting light emitted from the light projecting device and being influenced by both of the physical optic elements of the first and second objects, wherein relative positional information related to the first and second objects is produced on the basis of the detection by the light detecting device, and a spacing setting device for changing the spacing between the first and second objects in accordance with a wavelength of light to be projected by the light projecting device.

Abstract: A liquid crystal composition includes (1) an anti-ferroelectric liquid crystal compound of formula (1) and (2) a ferrielectric liquid crystal compound or racemic compound thereof. The composition ratio of (1) to (2) is in the range extending from a value which extends from within 5 mol % of the boundary compositional ratio on the anti-ferroelectric phase side and to within 25 mol % of the boundary compositional ratio on the ferrielectric phase side. The boundary compositional ratio is obtained on the basis of a liquid crystal phase diagram prepared on the basis of conoscopic image observations obtained by changing the mixing ratio of (1) and (2). The liquid crystal composition has the following properties: (b) an optical response in a positive voltage region and a negative voltage region and free or substantially free of hysteresis; and (c) excellent alignment stability.

Abstract: An X-ray mask structure for use in X-ray lithography includes an X-ray transmission film to be disposed opposed to a workpiece in X-ray exposure, the X-ray transmission film having an X-ray absorptive material corresponding to a pattern to be printed on the workpiece, and a thin film covering at least a portion of the X-ray transmission film, the thin film having an anti-reflection function with respect to alignment light to be projected to the thin film for direct or indirect detection of relative positional deviation between the mask structure and the workpiece.

Abstract: In an alignment method, in order to expose a pattern of a first object onto a second object, a plurality of marks on the second object are detected with a mark detection unit, and the first and second objects are aligned with each other. Before this process, the shape of a mark on the second object is measured, thereby obtaining an offset that should be reflected in a detection result of the mark detection unit. The shape of the mark is measured with a shape measurement unit (63) with no possibility of coming into contact with the mark, through calibration with reference to a shape measurement unit (64) with a possibility of coming into contact with the mark. The shape of the mark can be measured without contaminating or damaging the mark.

Abstract: An exposure apparatus includes an exposure device for effecting a multiplex pattern exposure of a photosensitive substrate before development and an alignment device for effecting alignment between the photosensitive substrate and the exposure device using a latent image of an alignment mark formed on the photosensitive substrate before one or some of the pattern exposures of the multiplex exposure. The latent image of the alignment mark is disposed outside a pattern provided by the pattern exposure.

Abstract: A foreign substance inspecting apparatus (12) for inspecting a foreign substance attaching to a wafer (2) includes an irradiation unit (14) for irradiating a periphery of the wafer with light in a direction substantially tangent to an outer circumference of the wafer while rotating the wafer, and a detection unit (18) for detecting presence/absence of a foreign substance with a predetermined height or more on the basis of the irradiating light. The foreign substance inspecting apparatus (12) detects a foreign substance that enters between a mask and wafer to fracture the mask, thereby preventing fracture of the mask.

Abstract: A method of detecting a relative positional deviation between first and second objects by use of a first alignment mark provided on the first object and a second alignment mark provided on the second object, wherein the first alignment mark includes a first grating lens and a second grating lens having a mirror image of the first grating lens, wherein the alignment mark includes a third grating lens and a fourth grating lens having a mirror image of the third grating lens. The incidence position information of first light coming via the first grating lens and the third grating lens and incident upon a predetermined plane, and the incidence position of second light coming via the second grating lens and the fourth grating lens and incident upon a predetermined plane, are detected, on the basis of which the relative positional deviation between the first and second objects in a predetermined direction is detected.

Abstract: A lithography system for exposing a photosensitive member includes a photosensitive member placement unit, and an interference optical system. The interference optical system produces interference fringes on the photosensitive member so that the interference fringes will be transferred to the photosensitive member. The interference fringes are aligned based on detected light that has passed through the interference optical system.

Abstract: A method of detecting a relative positional deviation between first and second objects by use of a first alignment mark provided on the first object and a second alignment mark provided on the second object, wherein the first alignment mark includes a first grating lens and a second grating lens having a mirror image of the first grating lens, and the alignment mark includes a third grating lens and a fourth grating lens having a mirror image of the third grating lens. The incidence position information of first light coming via the first grating lens and the third grating lens and incident upon a first predetermined plane, and the incidence position of second light coming via the second grating lens and the fourth grating lens and incident upon a second predetermined plane, are detected, on the basis of which the relative positional deviation between the first and second objects in a predetermined direction is detected.

Abstract: A fluorine-substituted compound of the following general formula (1) or (2), and a ferrielectric liquid crystal composition comprising the above compound and a specific ferrielectric liquid crystal compound, wherein, in the formula (1), each of X1 and X2 is a hydrogen atom, or one of them is a hydrogen atom and the other is a fluorine atom, p is an integer of 0 to 3 and q is an integer of 1 to 3, and in the formula (2), each of X1 and x2 is a hydrogen atom, or one of them is a hydrogen atom and the other is a fluorine atom, p is an integer of 1 to 3 and q is an integer of 1 to 3.

Abstract: An anti-ferroelectric liquid crystal composition containing a phenyl triester compound of the formula (1), wherein R1 is a linear alkyl group having 6 to 12 carbon atoms, m is an integer of 0 to 3, n is an integer of 1 to 3, and X1 is a hydrogen atom or a fluorine atom, and an anti-ferroelectric liquid crystal compound of the formula (2),  wherein R2 is a linear alkyl group having 6 to 12 carbon atoms, X2 is a hydrogen atom or a fluorine atom, A is —CH3 or —CF3, r is 0 or 1 and C* is an asymmetric carbon, provided that when A is —CH3, r is 0 and p is an integer of 4 to 10, that when A is —CF3 and when r is 0, p is an integer of 6 to 8, and further than when A is —CF3 and when r is 1, q is an integer of 5 to 8 and p is 2 or 4.

Abstract: A method of manufacturing a chip type electronic component includes the steps of forming a multilayer body including a major surface and a side surface by laminating a plurality of substrates and at least one internal electrode interposed between two of the substrates, forming a groove between the two substrates at the side surface of the multilayer body so as to expose an end of the at least one internal electrode, and making the side surface of the multilayer body rough by performing barrel polishing on the multilayer body, the barrel polishing being performed in a barrel pot in which water, media, an abrasive powder and the multilayer body are provided and forming an external electrode on the side surface of the multilayer body, the external electrode being connected to the end of the internal electrode exposed at the groove.

Abstract: An antiferroelectric liquid crystal cell having a high-speed response and wide viewing angle characteristic free of an image sticking phenomenon is provided. This antiferroelectric liquid crystal cell is composed of an antiferroelectric liquid crystal material held between a pair of parallel substrates. The antiferroelectric liquid crystal material filled between the parallel substrates has such a characteristic that when a sinusoidal voltage value with a changing reference frequency is applied to the antiferroelectric liquid crystal cell, the imaginary part of the complex dielectric constant obtained by Fourier transform of the output voltage value output from the antiferroelectric liquid crystal cell has no local maximum value within the reference frequency range of 100 Hz to 5 kHz.

Abstract: In this exposure apparatus, a wafer formed with a first alignment mark and a mask formed with a second alignment mark at a position outside the exposure field angle are aligned. The exposure apparatus includes an alignment detection system for optically detecting any positional deviation between the first and second alignment marks, a calculator for calculating any positional deviation between a first pattern formed on the wafer and a second pattern formed on the mask on the basis of the detection result of the alignment detection system, the position of the first alignment mark in the wafer, and the position of the second alignment mark in the mask, and an actuator for driving a wafer stage on the basis of the calculation result of the calculator to make the first and second patterns overlap each other.

Abstract: Provided are an anti-ferroelectric liquid crystal composition consisting essentially of (a) a swallow-tailed compound of the formula (1), (b) an anti-ferroelectric liquid crystal compound of the formula (2), and (c) a phenyl ester compound of the formula (3), and a liquid crystal display device using the composition, ##STR1## The above anti-ferroelectric liquid crystal composition has an anti-ferroelectric phase in a broad temperature range, has a high response time I in the transition from an anti-ferroelectric state to a ferroelectric state and a proper response time II in the transition from a ferroelectric state to an anti-ferroelectric state, and can therefore provide an anti-ferroelectric liquid crystal display device having high display quality.

Abstract: A racemic compound of the formula (1) ##STR1## and an anti-ferroelectric liquid crystal composition consisting essentially of said racemic compound and one anti-ferroelectric liquid crystal compound of the formula (2) or a mixture of two or more compounds selected from anti-ferroelectric liquid crystal compounds of the formula (2), ##STR2## said composition of the present invention, exhibiting a small spontaneous polarization and a fast response so that a display device having a high display quality can be achieved.

Abstract: A swallow-tail-shaped liquid crystal compound of the following general formula (1), ##STR1## wherein A is --O--, --COO-- or a single bond (--), m is an integer of 4 to 12, and n is an integer of 2 to 4.The above swallow-tail-shaped liquid crystal compound of the present invention is a novel achiral anti-ferroelectric liquid crystal and can be converted to an optically active anti-ferroelectric liquid crystal by mixing it with an optically active compound as a chiral dopant.

Abstract: A racemic compound of the formula (1) ##STR1## and an anti-ferroelectric liquid crystal composition consisting essentially of said racemic compound and one anti-ferroelectric liquid crystal compound of the formula (2) or a mixture of two or more compounds selected from anti-ferroelectric liquid crystal compounds of the formula (2), ##STR2## said composition having excellent steepness of threshold, having an anti-ferroelectric phase in a broad temperature range and having the performance of a high response speed and a high contrast.