Abstract: Provided are a photosensitive composition for pulse exposure including: a coloring material A; a photoradical polymerization initiator B; and a radically polymerizable compound C, in which a content of a radically polymerizable compound C1 having a weight-average molecular weight of 3000 or higher is 70 mass % or higher with respect to a total mass of the radically polymerizable compound C.

Abstract: The information processing device determines whether or not to re-lease the first vehicle after returning from the lease. The information processing device includes a control unit. The control unit is configured to acquire, for the first vehicle, a evaluation result of a state according to a predetermined evaluation method, and output that the first vehicle is to be leased again when the evaluation result indicates that the first vehicle does not require repair, and output that the first vehicle is to be sold when the evaluation result indicates that the first vehicle needs repair.

Abstract: A composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23° C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.

Abstract: Provided is a composition including colloidal silica particles; and a solvent, in which a viscosity at 25° C. is 4 mPa·s or lower. The colloidal silica particles are a composition in which a plurality of spherical silica particles are linked in a beaded shape or a composition in which a plurality of spherical silica particles are linked in a planar shape. The solvent includes a solvent A1 having a boiling point of 190° C. to 280° C. Provided is also a film forming method using the above-described composition.

Abstract: Provided are a coloring composition including a pigment A having a structure in which an aromatic ring group in which an electron-donating group is introduced into an aromatic ring is bonded to a diketopyrrolopyrrole skeleton, and a compound having a curable group, in which a content of the pigment A in a total solid content of the coloring composition is 35 mass % or more; a cured film formed of the coloring composition; a method for forming a pattern; a color filter; a solid-state imaging element; and an image display device.

Abstract: A composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23° C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.

Abstract: Provided are a near infrared absorbing composition with which a cured film having excellent solvent resistance and thermal shock resistance can be manufactured, a near infrared cut filter, a method of manufacturing a near infrared cut filter, a solid image pickup element, a camera module, and an image display device. The near infrared absorbing composition includes: a resin A that satisfies the following condition a1; an infrared absorber B; and a solvent D. At least the resin A has a crosslinking group, or the near infrared absorbing composition further includes a compound C having a crosslinking group that is different from the resin A. condition a1: in a case where the resin A does not have a crosslinking group, a glass transition temperature of the resin A measured by differential scanning calorimetry is 0° C. to 100° C.

Abstract: The composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23° C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.

Abstract: A method of producing a pattern includes a step of forming a photocurable composition layer on a support, using a photocurable composition including a color material and a resin and having an acid value of a solid content of 1 to 25 mgKOH/g; a step of patternwise exposing the photocurable composition layer; and a step of treating the photocurable composition layer in an unexposed area using a developer including an organic solvent, thereby performing development.

Abstract: Provided are a photosensitive composition for pulse exposure including: a coloring material A; a photoradical polymerization initiator B; and a radically polymerizable compound C, in which a content of a radically polymerizable compound C1 having a weight-average molecular weight of 3000 or higher is 70 mass % or higher with respect to a total mass of the radically polymerizable compound C.

Abstract: Provided is a photosensitive composition including a radically polymerizable compound, a photoradical polymerization initiator, and at least one selected from a chain transfer agent or a radical trapping agent.

Abstract: A photosensitive composition for pulse exposure includes: a near infrared absorber A; a photoinitiator B; and a compound C that is cured by reacting with an active species generated from the photoinitiator B.

Abstract: Provided is a photosensitive composition for exposure to light having a wavelength of 300 nm or shorter, the photosensitive composition including: a coloring material; and a polymerizable monomer, in which a total content of the polymerizable monomer and a photopolymerization initiator is 15 mass % or lower with respect to a total solid content of the photosensitive composition.

Abstract: Provided is a photosensitive composition for pulse exposure including: a coloring material A; a photoinitiator B; and a compound C that is cured by reacting with an active species generated from the photoinitiator B, in which the photoinitiator B includes a photoinitiator b1 that satisfies the following condition 1. Condition 1: after a propylene glycol monomethyl ether acetate solution including 0.035 mmol/L of the photoinitiator b1 is exposed to pulses of light having a wavelength of 355 nm under conditions of maximum instantaneous illuminance: 375000000 W/m2, pulse duration: 8 nanoseconds, and frequency: 10 Hz, a quantum yield q355 is 0.05 or higher.

Abstract: Provided is a photosensitive coloring composition with which a pixel having excellent adhesiveness with a support and excellent rectangularity can be formed. In addition, provided is also a method of manufacturing an optical filter including a pixel having excellent adhesiveness with a support and excellent rectangularity. This photosensitive coloring composition is a photosensitive coloring composition for exposure to light having a wavelength of 300 nm or shorter, the photosensitive coloring composition including a coloring material and a curable compound. In a case where a film having a thickness of 0.5 ?m after drying is formed using the photosensitive coloring composition, an optical density of the above-described film with respect to light having a wavelength of 248 nm is 1.6 or higher. It is preferable that a content of the coloring material is 50 mass % or higher with respect to a total solid content of the photosensitive coloring composition.

Abstract: Provided is a method of manufacturing an optical filter in which a pixel having excellent rectangularity can be accurately formed in a region that is partitioned by a partition wall or at a position corresponding to the region partitioned by the partition wall.

Abstract: Provided is a composition with which a film having a lower refractive index and reduced defects can be formed. In addition, provided are a film forming method and a method of manufacturing an optical sensor. This composition includes colloidal silica particles and a solvent. In the colloidal silica particles, an average particle size D1 that is measured using a dynamic light scattering method is 25 to 1000 nm and a ratio D1/D2 of the average particle size D1 to an average particle size D2 that is obtained from a specific surface area of the colloidal silica particles measured using a nitrogen adsorption method is 3 or higher. The solvent includes a solvent A1 having a boiling point of 245° C. or higher and a solubility parameter of lower than 11.3 (cal/cm3)0.5 and a solvent A2 having a boiling point of 120° C. or higher and lower than 245° C. and a solubility parameter of 11.3 (cal/cm3)0.5 or higher.

Abstract: An infrared absorbing composition which is used for forming an infrared cut filter in a solid image pickup element having the infrared cut filter includes at least one infrared absorber having an absorption maximum at a wavelength of 650 nm or longer which is selected from polymethine colorants.

Abstract: A photosensitive composition with which a cured film that includes a pattern having excellent rectangularity and suppressed thermal shrinkage can be formed is provided. A cured film formed of the photosensitive composition, an optical filter, a laminate, a pattern forming method, a solid image pickup element, an image display device, and an infrared sensor are provided. The photosensitive composition includes a near infrared absorber, a curable compound, a photoinitiator, and an ultraviolet absorber, in which in thermogravimetry, the ultraviolet absorber has a mass loss percentage of 5% or lower at 150° C. and has a mass loss percentage of 40% or higher at 220° C.

Abstract: The composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23° C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.