Patents by Inventor Takahiro OKAWARA

Takahiro OKAWARA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180292586
    Abstract: Provided are a near infrared absorbing composition with which a cured film having excellent solvent resistance and thermal shock resistance can be manufactured, a near infrared cut filter, a method of manufacturing a near infrared cut filter, a solid image pickup element, a camera module, and an image display device. The near infrared absorbing composition includes: a resin A that satisfies the following condition a1; an infrared absorber B; and a solvent D. At least the resin A has a crosslinking group, or the near infrared absorbing composition further includes a compound C having a crosslinking group that is different from the resin A. condition a1: in a case where the resin A does not have a crosslinking group, a glass transition temperature of the resin A measured by differential scanning calorimetry is 0° C. to 100° C.
    Type: Application
    Filed: June 14, 2018
    Publication date: October 11, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Seiichi HITOMI, Takashi KAWASHIMA, Keisuke ARIMURA, Takahiro OKAWARA
  • Publication number: 20180188428
    Abstract: A near-infrared cut filter has a first infrared absorbing layer including an infrared absorber A, a second infrared absorbing layer including an infrared absorber C, and a resin layer disposed between the first infrared absorbing layer and the second infrared absorbing layer.
    Type: Application
    Filed: February 20, 2018
    Publication date: July 5, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Keisuke ARIMURA, Kazuto SHIMADA, Takahiro OKAWARA, Takashi KAWASHIMA, Hidenori TAKAHASHI
  • Publication number: 20180175090
    Abstract: A near infrared absorbing composition includes: a copper compound; a radical trapping agent; and a resin which generates a radical at 180° C. or higher.
    Type: Application
    Filed: February 20, 2018
    Publication date: June 21, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Takahiro OKAWARA, Takashi KAWASHIMA, Kazuto SHIMADA, Keisuke ARIMURA, Kouitsu SASAKI
  • Publication number: 20180136379
    Abstract: Provided are a laminate having an antireflection layer including inorganic particles, and an infrared light reflecting layer, in which the infrared light reflecting layer includes a first selective reflection layer which is formed by fixing a liquid crystal phase having a helical axis which rotates in a right direction, and a second selective reflection layer which is formed by fixing a liquid crystal phase having a helical axis which rotates in a left direction, a method for producing the laminate, a solid-state imaging device including the laminate, and a kit used for producing the laminate.
    Type: Application
    Filed: December 25, 2017
    Publication date: May 17, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Hirotaka TAKISHITA, Kazuto SHIMADA, Keisuke ARIMURA, Takahiro OKAWARA, Daisuke SASAKI, Keiji YAMAMOTO, Masaru YOSHIKAWA, Ryoji GOTO
  • Publication number: 20180120485
    Abstract: An infrared absorbing composition which is used for forming an infrared cut filter in a solid image pickup element having the infrared cut filter includes at least one infrared absorber having an absorption maximum at a wavelength of 650 nm or longer which is selected from polymethine colorants.
    Type: Application
    Filed: November 3, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Kazuya OOTA, Daisuke SASAKI, Yuki HIRAI, Takahiro OKAWARA, Kazuto SHIMADA, Keisuke ARIMURA
  • Publication number: 20180017722
    Abstract: To provide an infrared cut filter that has a wide view angle and excellent infrared shieldability and in which the generation of defects is suppressed, and a solid-state imaging device. An infrared cut filter has: a transparent base 1; an infrared absorbing film 2 that contains an infrared absorbing agent; and a dielectric multi-layer film 3, the infrared absorbing film 2 has a maximum absorption wavelength in a wavelength region of 600 nm or greater, and a ratio B/A of, to absorbance A at the maximum absorption wavelength before the infrared absorbing film 2 is dipped in at least one organic solvent selected from propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, methyl 3-methoxypropionate, ethyl lactate, acetone, and ethanol, absorbance B at the wavelength at which the absorbance A is measured after the infrared absorbing film 2 is dipped in the organic solvent for 2 minutes at 25° C. is 0.9 or greater.
    Type: Application
    Filed: September 27, 2017
    Publication date: January 18, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Keisuke ARIMURA, Kazuto SHIMADA, Daisuke SASAKI, Yuki HIRAI, Tokihiko MATSUMURA, Takahiro OKAWARA