Abstract: An object is to provide a battery module with higher energy density. A battery module includes a plurality of battery cells each including a layered body and an exterior body, in which a first periphery of each of any general battery cells arranged in a layered direction of the layered bodies includes a first bend that is coupled to a first bottom surface formed on a circumference of the exterior body and that bends toward one side in the layered direction, and a first extension extending from the first bend toward the one side in the layered direction, and the first extension includes a first region extending from the first bend to another end in the layered direction of the next battery cell, and a second region extending from the other end in the layered direction of the next battery cell toward the one side in the layered direction.

Abstract: There is provided with a battery module capable of improving cooling and heating efficiency of a battery. The battery module comprises: a plurality of secondary batteries; a cooling and heating unit configured to cool or heat the secondary batteries; and a heat transfer member disposed between the secondary batteries and the cooling and heating unit, a highly viscous fluid in contact with the secondary batteries and an intermediate member in contact with and holding the highly viscous fluid are arranged between the secondary batteries and the heat transfer member.

Abstract: A battery cooling system includes a battery cooling flow path, a first inlet and outlet portion of the battery cooling flow path, a second inlet and outlet portion of the battery cooling flow path, an inflow-side three-way valve, an outflow-side three-way valve, a first supply flow path configured to connect a first outlet of the inflow-side three-way valve to the first inlet and outlet portion, a second supply flow path configured to connect a second outlet of the inflow-side three-way valve to the second inlet and outlet portion, a first discharge path configured to connect the first inlet of the outflow-side three-way valve to the second inlet and outlet portion, and a second discharge path configured to connect the second inlet of the outflow-side three-way valve to the first inlet and outlet portion.

Abstract: Disclosed is a salt represented by formula (I): wherein, in formula (I), Q1 and Q2 each independently represent a fluorine atom or the like, R1 and R2 each independently represent a hydrogen atom or the like, Z represents an integer of 0 to 6, X1 represents *—CO—O— or the like, where * represents a bonding site to C(R1)(R2) or C(Q1)(Q2), L1 represents a single bond or a saturated hydrocarbon group, and —CH2— included in the saturated hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—, A1 represents a divalent alicyclic hydrocarbon group which may have a substituent, Ra represents a cyclic hydrocarbon group which may have a substituent, and Z+ represents an organic cation.

Abstract: Disclosed is a salt represented by formula (I): wherein, in formula (I), Q1 and Q2 each independently represent a fluorine atom or the like, R1 and R2 each independently represent a hydrogen atom or the like, Z represents an integer of 0 to 6, X1 represents *—CO—O— or the like, where * represents a bonding site to C(R1)(R2) or C(Q1)(Q2), L1 represents a single bond or a saturated hydrocarbon group, and —CH2— included in the saturated hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—, A1 represents a divalent alicyclic hydrocarbon group which may have a substituent, Ra represents a cyclic hydrocarbon group which may have a substituent, and Z+ represents an organic cation.

Abstract: A resist composition contains (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1 and R2, m and n, R3 and R4, X1, R5 and Z1+ are defined in the specification.

Abstract: A resist composition has a resin which includes a structural unit having an acid-labile group, an acid generator, and a non-ionic compound having a group represented by the formula (a) and having no unsaturated bond: wherein Xa and Xb each independently represent an oxygen atom or a sulfur atom, X1 represents a divalent C1 to C12 saturated hydrocarbon group having a fluorine atom or a C1 to C6 fluorinated alkyl group, and * represents a binding site.

Abstract: A photoresist composition comprising a resin having an acid-labile group, an acid generator, and a compound represented by formula (I0).

Abstract: A salt represented by the formula (I): wherein R1 and R2 independently each represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent; A? represents an organic anion; and “m” and “n” independently each represent an integer of 1 or 2.

Abstract: A resist composition has a resin which includes a structural unit having an acid-labile group, an acid generator, and a non-ionic compound having a group represented by the formula (a) and having no unsaturated bond: wherein Xa and Xb each independently represent an oxygen atom or a sulfur atom, X1 represents a divalent C1 to C12 saturated hydrocarbon group having a fluorine atom or a C1 to C6 fluorinated alkyl group, and * represents a binding site.

Abstract: A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1, R2, m, n, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.

Abstract: A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.

Abstract: A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.

Abstract: A photoresist composition comprising a resin having an acid-labile group, an acid generator, and a compound represented by formula (I0).

Abstract: The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein R1 and R2 are independently in each occurrence a C1-C12 hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom, and m and n independently each represent an integer of 0 to 4.

Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, R3, R4, m? and n? are defined in the specification.

Abstract: A salt represented by the formula (I): wherein R1 and R2 independently each represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent; A? represents an organic anion; and “m” and “n” independently each represent an integer of 1 or 2.

Abstract: A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II), wherein R1, ring X1, R3, R4, m, and n are defined in the specification.

Abstract: Methods of forming photoresist patterns may include forming a photoresist layer on a substrate, exposing the photoresist layer using an exposure mask, forming a preliminary pattern by developing the exposed photoresist layer and treating a surface of the preliminary pattern using a treatment agent that includes a coating polymer.

Abstract: A resist composition of the present invention has (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator and (D) a compound represented by the formula (II). wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom, R3 and R4 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m? and n? independently represent an integer of 0 to 4.