Patents by Inventor Takahito Nakayama
Takahito Nakayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200020921Abstract: According to the present invention, a positive electrode is provided with: a positive electrode current collector; a positive electrode active material layer which contains a positive electrode active material that is configured from a lithium transition metal oxide; a protective layer which is arranged between the positive electrode current collector and the positive electrode active material layer; and a positive electrode tab which is bonded with the positive electrode current collector at a positive electrode tab bonding part where the positive electrode active material layer and the protective layer are not formed so that the positive electrode current collector is exposed. An end edge of the positive electrode active material layer facing the positive electrode tab and an end edge of the protective layer facing the positive electrode tab are arranged in different positions in the longitudinal direction of the positive electrode.Type: ApplicationFiled: September 25, 2019Publication date: January 16, 2020Applicant: Panasonic Intellectual Property Management Co., Ltd.Inventors: Tomoki Shiozaki, Daisuke Furusawa, Yuji Oura, Takahiro Takahashi, Takahito Nakayama, Hideharu Takezawa
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Publication number: 20200020924Abstract: A positive electrode is disclosed including a positive electrode collector containing aluminum, a positive electrode mixture layer containing a positive electrode active substance constituted from a lithium transition metal oxide, and a protective layer provided between the positive electrode collector and the positive electrode mixture layer. The protective layer contains inorganic compound particles and a conductive material, and has a recessed structure wherein the positive electrode mixture layer is recessed into the protective layer.Type: ApplicationFiled: September 24, 2019Publication date: January 16, 2020Applicant: Panasonic Intellectual Property Management Co., Ltd.Inventors: Hideharu Takezawa, Daisuke Furusawa, Yuji Oura, Takahiro Takahashi, Takahito Nakayama, Tomoki Shiozaki
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Publication number: 20200020950Abstract: A positive electrode used in a secondary cell that is an example of the present embodiment is provided with a positive electrode collector, an intermediate layer formed on the positive electrode collector, and a positive electrode mixture layer formed on the intermediate layer. The positive electrode mixture layer has a thermally expandable material and a positive electrode active material. The thermally expandable material content of the positive electrode mixture layer is at least 0.1% by mass and less than 5% by mass. The intermediate layer has an insulating inorganic material and a conductive agent. The insulating inorganic material content of the intermediate layer is 80-99% by mass.Type: ApplicationFiled: September 24, 2019Publication date: January 16, 2020Applicant: Panasonic Intellectual Property Management Co., Ltd.Inventors: Takahito Nakayama, Tomoki Shiozaki, Hideharu Takezawa, Daisuke Furusawa, Yuji Oura, Takahiro Takahashi
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Publication number: 20200020951Abstract: According to the present invention, a positive electrode is provided with: a positive electrode current collector which contains aluminum; a positive electrode mixture layer which contains a positive electrode active material that is configured of a lithium transition metal oxide; and an intermediate layer which is arranged between the positive electrode current collector and the positive electrode mixture layer. The intermediate layer contains inorganic compound particles, a conductive material and a binder; the circularity is from 5% to 75% (inclusive); the void fraction of the intermediate layer is from 30% to 69% (inclusive); and the average circularity of the inorganic compound particles is from 5% to 75% (inclusive).Type: ApplicationFiled: September 25, 2019Publication date: January 16, 2020Applicant: Panasonic Intellectual Property Management Co., Ltd.Inventors: Daisuke Furusawa, Tomoki Shiozaki, Hideharu Takezawa, Takahito Nakayama, Yuji Oura, Takahiro Takahashi
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Patent number: 10460902Abstract: In one embodiment, a charged particle beam writing apparatus includes a blanking circuit applying a blanking voltage to a blanking deflector, a stage on which a substrate is placed, a mark on the stage, a detector detecting an irradiation position of the charged particle beam based on irradiation of the mark with the charged particle beam, and a diagnostic electric circuitry that causes the charged particle beam to enter a predetermined defocused state relative to the mark, obtains a difference between a first irradiation position when the mark is scanned under first irradiation conditions and a second irradiation position when the mark is scanned under second irradiation conditions in which at least either of irradiation time and settling time in the first irradiation conditions is varied, and determines occurrence of a failure of the blanking circuit when the difference is a predetermined value or more.Type: GrantFiled: September 12, 2018Date of Patent: October 29, 2019Assignee: NuFlare Technology, Inc.Inventor: Takahito Nakayama
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Publication number: 20190242632Abstract: Provided is a refrigeration apparatus that secures safety while suppressing an increase in cost. A refrigeration apparatus performs a refrigeration cycle in a refrigerant circuit including a compressor, a heat source-side heat exchanger, and a usage-side heat exchanger. The refrigeration apparatus comprises a usage-side fan providing an air flow, and a controller. The usage-side fan is disposed in a target space where inside air is cooled. The controller performs a refrigerant leak determination process to determine whether a refrigerant leak occurs, based on a state of a refrigerant in the refrigerant circuit. When the controller performs the refrigerant leak determination process to determine that a refrigerant leak occurs, then the controller performs leakage refrigerant agitation control to operate the usage-side fan so as to suppress local emergence of a region where the refrigerant leaks at a high concentration in the target space.Type: ApplicationFiled: October 17, 2017Publication date: August 8, 2019Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Satoru SAKAE, Takahito NAKAYAMA, Takenori MEZAKI
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Publication number: 20190237297Abstract: A charged particle beam writing method includes acquiring the deviation amount of the deflection position per unit tracking deflection amount with respect to each tracking coefficient of a plurality of tracking coefficients having been set for adjusting the tracking amount to shift the deflection position of a charged particle beam on the writing target substrate in order to follow movement of the stage on which the writing target substrate is placed, extracting a tracking coefficient based on which the deviation amount of the deflection position per the unit tracking deflection amount is closest to zero among the plurality of tracking coefficients, and writing a pattern on the writing target substrate with the charged particle beam while performing tracking control in which the tracking amount has been adjusted using the tracking coefficient extracted.Type: ApplicationFiled: January 29, 2019Publication date: August 1, 2019Applicant: NuFlare Technology, Inc.Inventors: Rieko NISHIMURA, Takahito NAKAYAMA
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Publication number: 20190122859Abstract: In one embodiment, a charged particle beam writing apparatus includes a writer writing a pattern on a substrate on a stage with a charged particle beam, a mark substrate disposed on the stage and having a mark, an irradiation position detector detecting an irradiation position of the charged particle beam on a mark surface, a height detector detecting a surface height of the substrate and the mark substrate, a drift correction unit calculating an amount of drift correction, and a writing control unit correcting the irradiation position of the charged particle beam by using the amount of drift correction. The mark substrate has a pattern region with a plurality of marks and a non-pattern region with no pattern therein, and at least part of the non-pattern region is disposed between different portions of the pattern region. The height detector detects a height of a detection point in the non-pattern region.Type: ApplicationFiled: October 15, 2018Publication date: April 25, 2019Applicant: NuFlare Technology, Inc.Inventor: Takahito NAKAYAMA
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Publication number: 20190122858Abstract: In one embodiment, a charged particle beam writing apparatus includes a writer writing a pattern on a substrate placed on a stage by irradiating the substrate with a charged particle beam, a height detector detecting a surface height of a mark on the stage, an irradiation position detector detecting an irradiation position of the charged particle beam on the mark surface by irradiation with the charged particle beam focused at the surface height of the mark, a drift correction unit calculating an amount of drift of the charged particle beam on the mark surface from the irradiation position detected by the irradiation position detector, and generating correction information for correcting a shift in irradiation position caused by a drift on the substrate surface based on the amount of drift, and a writing control unit correcting the irradiation position of the charged particle beam by using the correction information.Type: ApplicationFiled: October 15, 2018Publication date: April 25, 2019Applicant: NuFlare Technology, Inc.Inventor: Takahito NAKAYAMA
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Publication number: 20190115185Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: ApplicationFiled: December 10, 2018Publication date: April 18, 2019Applicant: NuFlare Technology, Inc.Inventors: Takahito NAKAYAMA, Takanao TOUYA
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Publication number: 20190080877Abstract: In one embodiment, a charged particle beam writing apparatus includes a blanking circuit applying a blanking voltage to a blanking deflector, a stage on which a substrate is placed, a mark on the stage, a detector detecting an irradiation position of the charged particle beam based on irradiation of the mark with the charged particle beam, and a diagnostic electric circuitry that causes the charged particle beam to enter a predetermined defocused state relative to the mark, obtains a difference between a first irradiation position when the mark is scanned under first irradiation conditions and a second irradiation position when the mark is scanned under second irradiation conditions in which at least either of irradiation time and settling time in the first irradiation conditions is varied, and determines occurrence of a failure of the blanking circuit when the difference is a predetermined value or more.Type: ApplicationFiled: September 12, 2018Publication date: March 14, 2019Applicant: NuFlare Technology, Inc.Inventor: Takahito NAKAYAMA
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Patent number: 10192712Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: GrantFiled: September 29, 2017Date of Patent: January 29, 2019Assignee: NuFlare Technology, Inc.Inventors: Takahito Nakayama, Takanao Touya
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Publication number: 20180076002Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: ApplicationFiled: September 29, 2017Publication date: March 15, 2018Applicant: NuFlare Technology, Inc.Inventors: Takahito NAKAYAMA, Takanao Touya
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Patent number: 9824849Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: GrantFiled: November 17, 2015Date of Patent: November 21, 2017Assignee: NuFlare Technology, Inc.Inventors: Takahito Nakayama, Takanao Touya
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Patent number: 9417748Abstract: An input device which is a capacitive coupling type and can reduce visibility of wiring patterns of electrodes and interference fringes is provided. The input device is included in a display device including a plurality of pixels, and is configured to detect a contact position of a user. The input device includes a plurality of first electrodes, a plurality of second electrodes disposed so as to cross the first electrodes, and a plurality of third electrodes disposed between the second electrodes. Slits extending obliquely with respect to an extension direction of the second electrodes are formed between the third electrodes.Type: GrantFiled: October 22, 2014Date of Patent: August 16, 2016Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Akira Tokai, Hiroyuki Kado, Shigeo Kasahara, Naoki Kosugi, Toshiyuki Aoyama, Shuji Inoue, Kazushige Takagi, Manabu Inoue, Takahito Nakayama
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Patent number: 9373424Abstract: An electron beam writing apparatus comprising a stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an electrostatic lens provided with electrodes aligned in an axial direction of the electron beam disposed in the optical column, and a voltage supply device for applying positive voltage constantly to the electrostatic lens. A shield plate is disposed between the XY stage and the electron optical column to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam. The electrostatic lens is disposed immediately above the shield plate to change a focal position of the electron beam. A voltage supply device applies a positive voltage constantly to the electrostatic lens.Type: GrantFiled: February 15, 2013Date of Patent: June 21, 2016Assignee: NuFlare Technology, Inc.Inventors: Takanao Touya, Takahito Nakayama
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Publication number: 20160071682Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: ApplicationFiled: November 17, 2015Publication date: March 10, 2016Applicant: NuFlare Technology, Inc.Inventors: Takahito NAKAYAMA, Takanao TOUYA
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Patent number: 9236223Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: GrantFiled: January 15, 2014Date of Patent: January 12, 2016Assignee: NuFlare Technology, Inc.Inventors: Takahito Nakayama, Takanao Touya
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Publication number: 20150331531Abstract: An input device according to the technology disclosed herein is one which is disposed on a user side of a display device, and includes a pair of coordinate detection electrodes that are disposed to face each other via a dielectric element. One of the pair of the coordinate detection electrodes is disposed on flexible film bonded on a surface on the user side of the display device. Electrodes of the display device serve as the other of the pair of the coordinate detection electrodes. Flexible film includes an extension part which extends from a detection region where the one of the coordinate detection electrodes is disposed. The extension part includes wiring parts which electrically couple to the coordinate detection electrodes and electrically and mechanically couple to connection parts that are disposed on the display device.Type: ApplicationFiled: July 23, 2015Publication date: November 19, 2015Inventors: Toshiyuki AOYAMA, Shuji INOUE, Manabu INOUE, Shigeo KASAHARA, Hiroyuki KADO, Naoki KOSUGI, Kazushige TAKAGI, Akira TOKAI, Takahito NAKAYAMA
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Publication number: 20150268765Abstract: An input device having a touch sensor function includes a plurality of first electrodes; a plurality of second electrodes which are disposed facing the plurality of first electrodes, each second electrode coupled capacitively with the first electrode to output a detection signal based on a touch operation, a plurality of third electrodes each disposed in a region between adjacent second electrodes, and a plurality of first connection sections which have a resistance value not lower than 1 M?, and electrically connect the plurality of third electrodes to a predetermined electrode set to a predetermined potential.Type: ApplicationFiled: March 12, 2015Publication date: September 24, 2015Inventors: Takahito NAKAYAMA, Hiroyuki KADO, Toshiyuki AOYAMA, Shigeo KASAHARA, Naoki KOSUGI, Shuji INOUE, Manabu INOUE, Akira TOKAI, Kazushige TAKAGI