Patents by Inventor Takanori Miyazaki
Takanori Miyazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240001334Abstract: The present application provides a material for efficiently removing active hydrogen-containing compounds such as alcohol compounds. The present application uses an active hydrogen-containing organic compound scavenger having a bromine content of from 38 to 78 wt % represented by the formula (1) (wherein R1 and R2 each independently represent a hydrogen atom or a C1-4 alkyl group, each R3 independently represents a hydrogen atom, a C1-4 alkyl group or a bromine atom, m represents at least one selected from the group consisting of 0, 1, 2 and 3, and n represents a real number of 0 or more) (wherein the isocyanate compound may be a single species or a mixture of two or more species, and in the case of a mixture, n represents an average n of the mixture).Type: ApplicationFiled: December 2, 2021Publication date: January 4, 2024Applicant: TOSOH CORPORATIONInventors: Takanori MIYAZAKI, Tomohiro ARITA, Takeshi OKADA, Takeshi KANBARA
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Publication number: 20230201958Abstract: The laser processing apparatus according to this disclosure includes a laser oscillator to generate laser light, a processing table to place a workpiece thereon, the workpiece having a protective sheet on a surface thereof, the protective sheet including a laser light absorbing layer, a laser head to process the workpiece with the laser light, and a control unit to adjust a position of the laser head so that a focal position of the laser light is brought to a position away from the surface of the workpiece toward the laser head, and to control power of the laser light so that marking is provided by causing the laser light absorbing layer to absorb the laser light and thus transforming the inside of the protective sheet.Type: ApplicationFiled: May 29, 2020Publication date: June 29, 2023Applicant: Mitsubishi Electric CorporationInventors: Takanori MIYAZAKI, Daisuke KASHIBA
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Patent number: 10246393Abstract: In a cross coupling reaction, in a case where a halogen atom is selected as the leaving group of the raw material compound, a harmful halogen waste forms as a by-product after the reaction, and disposal of the waste liquid is complicated and environmental burden is high. In a carbon-hydrogen activation cross coupling reaction which requires no halogen atom as the leaving group, although no halogen waste forms as a by-product, the reaction substrate is considerably restricted, and the reaction remains a limited molecular construction method. A method for producing an aromatic compound, which comprises subjecting an aromatic nitro compound and a boronic acid compound to a cross coupling reaction in the presence of a metal catalyst.Type: GrantFiled: October 30, 2017Date of Patent: April 2, 2019Assignees: TOSOH CORPORATION, KYOTO UNIVERSITYInventors: Hisao Eguchi, Takanori Miyazaki, Yoshiaki Nakao
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Publication number: 20180118646Abstract: In a cross coupling reaction, in a case where a halogen atom is selected as the leaving group of the raw material compound, a harmful halogen waste forms as a by-product after the reaction, and disposal of the waste liquid is complicated and environmental burden is high. In a carbon-hydrogen activation cross coupling reaction which requires no halogen atom as the leaving group, although no halogen waste forms as a by-product, the reaction substrate is considerably restricted, and the reaction remains a limited molecular construction method. A method for producing an aromatic compound, which comprises subjecting an aromatic nitro compound and a boronic acid compound to a cross coupling reaction in the presence of a metal catalyst.Type: ApplicationFiled: October 30, 2017Publication date: May 3, 2018Applicants: TOSOH CORPORATION, KYOTO UNIVERSITYInventors: Hisao EGUCHI, Takanori MIYAZAKI, Yoshiaki NAKAO
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Publication number: 20180093348Abstract: A laser beam machine cuts a workpiece into a plurality of parts and a remainder material. The machine includes a workpiece supporting unit including supports arranged at intervals and supporting the workpiece and a machining head radiating a laser beam to the workpiece. The machine includes a relative movement unit relatively moving the machining head and the workpiece supporting unit and a control apparatus controlling the relative movement unit and the machining head to cut the workpiece. The control apparatus forms, when cutting the workpiece, joints for coupling, to a partial remainder material that is a portion of the remainder material, both of a part that drops off from the supports after cutting and a part that cannot be attracted by the conveying and attracting unit after cutting such that the partial remainder material and the part are restricted from dropping from the supports and are attractable by the conveying and attracting unit.Type: ApplicationFiled: March 25, 2016Publication date: April 5, 2018Applicant: Mitsubishi Electric CorporationInventors: Toshiki KOSHIMAE, Hiroko TAKADA, Takanori MIYAZAKI, Hibiki YAMAMOTO
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Patent number: 9698352Abstract: To provide a novel amine compound which is especially suitable for a hole transport material for organic EL devices, and an organic EL device which employs such an amine compound and is excellent in the driving voltage, luminous efficiency and device lifetime An amine compound represented by the formula (1): (wherein X is a sulfur atom or an oxygen atom, each of R1 to R10 which are independent of one another, is a hydrogen atom, a deuterium atom or a phenyl group, and each of Ar1 and Ar2 which are independent of each other, is a C6-18 aromatic hydrocarbon group, a dibenzothienyl group or a dibenzofuranyl group, which, each independently, may have a substituent consisting of a methyl group, a methoxy group, a dibenzothienyl group, a dibenzofuranyl group or a 9-carbazolyl group.).Type: GrantFiled: September 26, 2013Date of Patent: July 4, 2017Assignee: TOSOH CORPORATIONInventors: Naoki Matsumoto, Takanori Miyazaki, Ryohei Takahashi
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Patent number: 9650565Abstract: A carbazole compound represented by the following formula: wherein, when m=1, n=0, Ar1, Ar2, Ar3 and X2 are C6-50 aryl or C4-50 heteroaryl, provided that Ar1 and Ar2, or Ar3 and X2 may form together a ring; X1=C6-50 arylene; R1, R2, R4, R5 and R7 are H, halogen, amino, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl, R3 and R6 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl; when m=0, n=1-3, Ar3, Ar4 and Ar5 are C6-50 aryl or C4-50 heteroaryl, Ar4 and Ar5 may form together a ring; X1=C1-18 alkyl, C6-50 aryl or C4-50 heteroaryl; X2=C6-50 arylene; R1-R7 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl; when m=0, n=0, X1=C1-18 alkyl, C6-50 aryl or C4-50 heteroaryl; Ar3 and X2 are C6-50 aryl or C4-50 heteroaryl; R2=H, halogen, C1-18 alkyl, C1-18 alkoxy; R1 and R3-R7 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl. The carbazole compound is suitable for an organic EL device.Type: GrantFiled: October 20, 2010Date of Patent: May 16, 2017Assignee: TOSOH CORPORATIONInventors: Naoki Matsumoto, Takanori Miyazaki, Shinichi Ishikawa
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Patent number: 9172045Abstract: A 4-aminocarbazole compound represented by formula (1): wherein Ar1-Ar4 represent substituted or unsubstituted aryl, thienyl, pyridyl, benzothienyl, dibenzothienyl, dibenzofuranyl, 4-carbazolyl, dibenzothienylphenyl, dibenzofuranylphenyl or 9-carbazolylphenyl group; R1-R7 represent substituted or unsubstituted aryl, heteroaryl or heteroarylphenyl group, or alkyl, alkoxy, cyano group, or hydrogen or halogen atom; n is integer of 0-2; and X represents substituted or unsubstituted (n+1)-valent aromatic hydrocarbon, heteroaromatic or heteroarylphenyl group. The 4-aminocarbazole compound provides an organic EL device exhibiting enhanced emitting efficiency and durability.Type: GrantFiled: October 25, 2012Date of Patent: October 27, 2015Assignee: TOSOH CORPORATIONInventors: Naoki Matsumoto, Takanori Miyazaki
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Publication number: 20150243901Abstract: To provide a novel amine compound which is especially suitable for a hole transport material for organic EL devices, and an organic EL device which employs such an amine compound and is excellent in the driving voltage, luminous efficiency and device lifetime. An amine compound represented by the formula (1): (wherein X is a sulfur atom or an oxygen atom, each of R1 to R10 which are independent of one another, is a hydrogen atom, a deuterium atom or a phenyl group, and each of Ar1 and Ar2 which are independent of each other, is a C6-18 aromatic hydrocarbon group, a dibenzothienyl group or a dibenzofuranyl group, which, each independently, may have a substituent consisting of a methyl group, a methoxy group, a dibenzothienyl group, a dibenzofuranyl group or a 9-carbazolyl group.).Type: ApplicationFiled: September 26, 2013Publication date: August 27, 2015Applicant: TOSOH CORPORATIONInventors: Naoki Matsumoto, Takanori Miyazaki, Ryohei Takahashi
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Patent number: 9095953Abstract: Provided are a rear substrate surface polishing device polishing a rear surface of a substrate, a rear substrate surface polishing system including the rear substrate surface polishing device, a rear substrate surface polishing method used in the rear substrate surface polishing device, and a storage medium for storing a program implemented with the rear substrate surface polishing method. In particular, the rear surface of the substrate is polished by a substrate polishing unit in accordance with information acquired from a prior process performed prior to the polishing process of the rear surface of the substrate at the substrate polishing unit. Further, the substrate polishing unit polishes the substrate with a polishing area determined on the basis of information acquired from a prior process. Furthermore, the polishing is performed by using any one or all of a plurality of substrate polishing units determined on the basis of information acquired from a prior process.Type: GrantFiled: June 13, 2011Date of Patent: August 4, 2015Assignee: Tokyo Electron LimitedInventors: Mitsunori Nakamori, Noritaka Uchida, Takehiko Orii, Takanori Miyazaki, Nobuhiko Mouri
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Patent number: 8993805Abstract: A novel material having high hole-transporting ability and a high glass transition temperature and having long-lasting durability is obtained. A benzofluorene compound represented by formula (1) is used. (In the formula, M is a substituted or unsubstituted aryl group having 6-40 carbon atoms or a substituted or unsubstituted heteroaryl group having 5-40 carbon atoms; Ar1 to Ar4 each independently is a substituted or unsubstituted aryl group having 6-40 carbon atoms or a substituted or unsubstituted heteroaryl group having 5-40 carbon atoms, provided that at least one of Ar1 to Ar4 is a substituent represented by any of the following formulae (2) to (5); and p is an integer of 0-2.Type: GrantFiled: April 12, 2007Date of Patent: March 31, 2015Assignee: Tosoh CorporationInventors: Masakazu Nishiyama, Naoki Matsumoto, Takanori Miyazaki, Takeshi Kanbara
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Publication number: 20140296519Abstract: A 4-aminocarbazole compound represented by formula (1): wherein Ar1-Ar4 represent substituted or unsubstituted aryl, thienyl, pyridyl, benzothienyl, dibenzothienyl, dibenzofuranyl, 4-carbazolyl, dibenzothienylphenyl, dibenzofuranylphenyl or 9-carbazolylphenyl group; R1-R7 represent substituted or unsubstituted aryl, heteroaryl or heteroarylphenyl group, or alkyl, alkoxy, cyano group, or hydrogen or halogen atom; n is integer of 0-2; and X represents substituted or unsubstituted (n+1)-valent aromatic hydrocarbon, heteroaromatic or heteroarylphenyl group. The 4-aminocarbazole compound provides an organic EL device exhibiting enhanced emitting efficiency and durability.Type: ApplicationFiled: October 25, 2012Publication date: October 2, 2014Applicant: TOSOH CORPORATIONInventors: Naoki Matsumoto, Takanori Miyazaki
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Patent number: 8846214Abstract: An amine derivative represented by the following general formula (1) and exhibiting a temperature difference of 30° C. or more as defined by the difference of [decomposition temperature (° C.) minus sublimation temperature (° C.)]: wherein R1 and R2 independently represent a substituted or unsubstituted C6-40 aryl or C5-40 heteroaryl group; and R3 and R4 independently represent a hydrogen atom, a straight-chain, branched or cyclic C1-18 alkyl or C1-18 alkoxy group, or a substituted or unsubstituted C6-40 aryl or C5-40 heteroaryl group, provided that R3 and R4 may form together a cyclic hydrocarbon group. The amine derivative is useful as an organic electroluminescent material.Type: GrantFiled: June 2, 2010Date of Patent: September 30, 2014Assignee: Tosoh CorporationInventors: Shinichi Ishikawa, Naoki Matsumoto, Takanori Miyazaki, Yasushi Hara
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Patent number: 8344284Abstract: A laser machining nozzle herein obtained includes a main assist-gas nozzle (2) for emitting a laser beam (8) and a main assist-gas, and an auxiliary assist-gas nozzle (5) annularly surrounding the main assist-gas nozzle for emitting an auxiliary assist-gas, whereby a gold plating (12) is provided on an interior surface of the main assist-gas nozzle to reflect the laser beam, so that a temperature rise of the laser machining nozzle can be prevented, and even when the laser beam (8) is reflected on the interior surface of the laser machining nozzle, it is possible to reduce peeling of the gold plating (12) applied onto the interior surface of the laser machining nozzle.Type: GrantFiled: July 23, 2008Date of Patent: January 1, 2013Assignee: Mitsubishi Electric CorporationInventors: Takanori Miyazaki, Masaru Kanaoka, Taira Ogita
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Publication number: 20120203010Abstract: A carbazole compound represented by the following formula: wherein, when m=1, n=0, Ar1, Ar2, Ar3 and X2 are C6-50 aryl or C4-50 heteroaryl, provided that Ar1 and Ar2, or Ar3 and X2 may form together a ring; X1?C6-50 arylene; R1, R2, R4, R5 and R7 are H, halogen, amino, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl, R3 and R6 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl; when m=0, n=1-3, Ar3, Ar4 and Ar5 are C6-50 aryl or C4-50 heteroaryl, Ar4 and Ar5 may form together a ring; X1?C1-18 alkyl, C6-50 aryl or C4-50 heteroaryl; X2?C6-50 arylene; R1-R7 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl; when m=0, n=0, X1?C1-18 alkyl, C6-50 aryl or C4-50 heteroaryl; Ar3 and X2 are C6-50 aryl or C4-50 heteroaryl; R2?H, halogen, C1-18 alkyl, C1-18 alkoxy; R1 and R3-R7 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl. The carbazole compound is suitable for an organic EL device.Type: ApplicationFiled: October 20, 2010Publication date: August 9, 2012Applicant: TOSOH CORPORATIONInventors: Naoki Matsumoto, Takanori Miyazaki, Shinichi Ishikawa
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Publication number: 20120160818Abstract: A laser machining apparatus includes an irradiating section and a control section. The control section causes, in a first period, the irradiating section to perform a first cutting process for cutting a workpiece in a region between a first region and a second region in such a manner that a state in which the first region is retained by the second region in the workpiece is kept, and causes, in a second period later than the first period, the irradiating section to perform a second cutting process for cutting the workpiece within the region between the first region and the second region in the workpiece, where a rear surface is exposed because a part of the protective sheet has been melted in the first cutting process, to separate the first region from the second region together with dross adhering to the rear surface in the first cutting process.Type: ApplicationFiled: May 24, 2011Publication date: June 28, 2012Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Takanori Miyazaki, Norihiro Seto
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Publication number: 20120112177Abstract: An amine derivative represented by the following general formula (1) and exhibiting a temperature difference of 30° C. or more as defined by the difference of [decomposition temperature (° C.) minus sublimation temperature (° C.)]: wherein R1 and R2 independently represent a substituted or unsubstituted C6-40 aryl or C5-40 heteroaryl group; and R3 and R4 independently represent a hydrogen atom, a straight-chain, branched or cyclic C1-18 alkyl or C1-18 alkoxy group, or a substituted or unsubstituted C6-40 aryl or C5-40 heteroaryl group, provided that R3 and R4 may form together a cyclic hydrocarbon group. The amine derivative is useful as an organic electroluminescent material.Type: ApplicationFiled: June 2, 2010Publication date: May 10, 2012Applicant: TOSOH CORPORATIONInventors: Shinichi Ishikawa, Naoki Matsumoto, Takanori Miyazaki, Yasushi Hara
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Publication number: 20110312247Abstract: Provided are a rear substrate surface polishing device polishing a rear surface of a substrate, a rear substrate surface polishing system including the rear substrate surface polishing device, a rear substrate surface polishing method used in the rear substrate surface polishing device, and a storage medium for storing a program implemented with the rear substrate surface polishing method. In particular, the rear surface of the substrate is polished by a substrate polishing unit in accordance with information acquired from a prior process performed prior to the polishing process of the rear surface of the substrate at the substrate polishing unit. Further, the substrate polishing unit polishes the substrate with a polishing area determined on the basis of information acquired from a prior process. Furthermore, the polishing is performed by using any one or all of a plurality of substrate polishing units determined on the basis of information acquired from a prior process.Type: ApplicationFiled: June 13, 2011Publication date: December 22, 2011Inventors: Mitsunori Nakamori, Noritaka Uchida, Takehiko Orii, Takanori Miyazaki, Nobuhiko Mouri
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Publication number: 20110147351Abstract: A laser processing apparatus for piercing a workpiece and cutting the pierced workpiece by irradiating the workpiece with a laser beam. The apparatus includes: a laser beam projection unit for projecting the laser beam onto the workpiece with the focus position thereof set to lie within the workpiece and in the vicinity of the surface of the workpiece at least when piercing is started; and a laser oscillator that emits the laser beam as a pulsed laser having a frequency at which plasma is generated when the workpiece is irradiated with the laser beam at the focus position set through the laser beam projection unit when the piercing is started.Type: ApplicationFiled: June 1, 2009Publication date: June 23, 2011Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Takanori Miyazaki, Takashi Inoue, Hiroyuki Murai
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Patent number: 7803953Abstract: To provide a process for preparing an arylamine highly selectively and highly efficiently, which is also industrially superior without a fear of a side reaction when a strong base is employed. An aryl compound having an active group is reacted with an amine compound in the presence of a base by means of a catalyst for producing an arylamine which comprises a palladium compound having a tertiary phosphine group and a phase-transfer catalyst.Type: GrantFiled: June 1, 2007Date of Patent: September 28, 2010Assignee: Tosoh CorporationInventors: Takanori Miyazaki, Masakazu Nishiyama, Naoki Matsumoto