Patents by Inventor Takanori Miyazaki

Takanori Miyazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240001334
    Abstract: The present application provides a material for efficiently removing active hydrogen-containing compounds such as alcohol compounds. The present application uses an active hydrogen-containing organic compound scavenger having a bromine content of from 38 to 78 wt % represented by the formula (1) (wherein R1 and R2 each independently represent a hydrogen atom or a C1-4 alkyl group, each R3 independently represents a hydrogen atom, a C1-4 alkyl group or a bromine atom, m represents at least one selected from the group consisting of 0, 1, 2 and 3, and n represents a real number of 0 or more) (wherein the isocyanate compound may be a single species or a mixture of two or more species, and in the case of a mixture, n represents an average n of the mixture).
    Type: Application
    Filed: December 2, 2021
    Publication date: January 4, 2024
    Applicant: TOSOH CORPORATION
    Inventors: Takanori MIYAZAKI, Tomohiro ARITA, Takeshi OKADA, Takeshi KANBARA
  • Publication number: 20230201958
    Abstract: The laser processing apparatus according to this disclosure includes a laser oscillator to generate laser light, a processing table to place a workpiece thereon, the workpiece having a protective sheet on a surface thereof, the protective sheet including a laser light absorbing layer, a laser head to process the workpiece with the laser light, and a control unit to adjust a position of the laser head so that a focal position of the laser light is brought to a position away from the surface of the workpiece toward the laser head, and to control power of the laser light so that marking is provided by causing the laser light absorbing layer to absorb the laser light and thus transforming the inside of the protective sheet.
    Type: Application
    Filed: May 29, 2020
    Publication date: June 29, 2023
    Applicant: Mitsubishi Electric Corporation
    Inventors: Takanori MIYAZAKI, Daisuke KASHIBA
  • Patent number: 10246393
    Abstract: In a cross coupling reaction, in a case where a halogen atom is selected as the leaving group of the raw material compound, a harmful halogen waste forms as a by-product after the reaction, and disposal of the waste liquid is complicated and environmental burden is high. In a carbon-hydrogen activation cross coupling reaction which requires no halogen atom as the leaving group, although no halogen waste forms as a by-product, the reaction substrate is considerably restricted, and the reaction remains a limited molecular construction method. A method for producing an aromatic compound, which comprises subjecting an aromatic nitro compound and a boronic acid compound to a cross coupling reaction in the presence of a metal catalyst.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: April 2, 2019
    Assignees: TOSOH CORPORATION, KYOTO UNIVERSITY
    Inventors: Hisao Eguchi, Takanori Miyazaki, Yoshiaki Nakao
  • Publication number: 20180118646
    Abstract: In a cross coupling reaction, in a case where a halogen atom is selected as the leaving group of the raw material compound, a harmful halogen waste forms as a by-product after the reaction, and disposal of the waste liquid is complicated and environmental burden is high. In a carbon-hydrogen activation cross coupling reaction which requires no halogen atom as the leaving group, although no halogen waste forms as a by-product, the reaction substrate is considerably restricted, and the reaction remains a limited molecular construction method. A method for producing an aromatic compound, which comprises subjecting an aromatic nitro compound and a boronic acid compound to a cross coupling reaction in the presence of a metal catalyst.
    Type: Application
    Filed: October 30, 2017
    Publication date: May 3, 2018
    Applicants: TOSOH CORPORATION, KYOTO UNIVERSITY
    Inventors: Hisao EGUCHI, Takanori MIYAZAKI, Yoshiaki NAKAO
  • Publication number: 20180093348
    Abstract: A laser beam machine cuts a workpiece into a plurality of parts and a remainder material. The machine includes a workpiece supporting unit including supports arranged at intervals and supporting the workpiece and a machining head radiating a laser beam to the workpiece. The machine includes a relative movement unit relatively moving the machining head and the workpiece supporting unit and a control apparatus controlling the relative movement unit and the machining head to cut the workpiece. The control apparatus forms, when cutting the workpiece, joints for coupling, to a partial remainder material that is a portion of the remainder material, both of a part that drops off from the supports after cutting and a part that cannot be attracted by the conveying and attracting unit after cutting such that the partial remainder material and the part are restricted from dropping from the supports and are attractable by the conveying and attracting unit.
    Type: Application
    Filed: March 25, 2016
    Publication date: April 5, 2018
    Applicant: Mitsubishi Electric Corporation
    Inventors: Toshiki KOSHIMAE, Hiroko TAKADA, Takanori MIYAZAKI, Hibiki YAMAMOTO
  • Patent number: 9698352
    Abstract: To provide a novel amine compound which is especially suitable for a hole transport material for organic EL devices, and an organic EL device which employs such an amine compound and is excellent in the driving voltage, luminous efficiency and device lifetime An amine compound represented by the formula (1): (wherein X is a sulfur atom or an oxygen atom, each of R1 to R10 which are independent of one another, is a hydrogen atom, a deuterium atom or a phenyl group, and each of Ar1 and Ar2 which are independent of each other, is a C6-18 aromatic hydrocarbon group, a dibenzothienyl group or a dibenzofuranyl group, which, each independently, may have a substituent consisting of a methyl group, a methoxy group, a dibenzothienyl group, a dibenzofuranyl group or a 9-carbazolyl group.).
    Type: Grant
    Filed: September 26, 2013
    Date of Patent: July 4, 2017
    Assignee: TOSOH CORPORATION
    Inventors: Naoki Matsumoto, Takanori Miyazaki, Ryohei Takahashi
  • Patent number: 9650565
    Abstract: A carbazole compound represented by the following formula: wherein, when m=1, n=0, Ar1, Ar2, Ar3 and X2 are C6-50 aryl or C4-50 heteroaryl, provided that Ar1 and Ar2, or Ar3 and X2 may form together a ring; X1=C6-50 arylene; R1, R2, R4, R5 and R7 are H, halogen, amino, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl, R3 and R6 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl; when m=0, n=1-3, Ar3, Ar4 and Ar5 are C6-50 aryl or C4-50 heteroaryl, Ar4 and Ar5 may form together a ring; X1=C1-18 alkyl, C6-50 aryl or C4-50 heteroaryl; X2=C6-50 arylene; R1-R7 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl; when m=0, n=0, X1=C1-18 alkyl, C6-50 aryl or C4-50 heteroaryl; Ar3 and X2 are C6-50 aryl or C4-50 heteroaryl; R2=H, halogen, C1-18 alkyl, C1-18 alkoxy; R1 and R3-R7 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl. The carbazole compound is suitable for an organic EL device.
    Type: Grant
    Filed: October 20, 2010
    Date of Patent: May 16, 2017
    Assignee: TOSOH CORPORATION
    Inventors: Naoki Matsumoto, Takanori Miyazaki, Shinichi Ishikawa
  • Patent number: 9172045
    Abstract: A 4-aminocarbazole compound represented by formula (1): wherein Ar1-Ar4 represent substituted or unsubstituted aryl, thienyl, pyridyl, benzothienyl, dibenzothienyl, dibenzofuranyl, 4-carbazolyl, dibenzothienylphenyl, dibenzofuranylphenyl or 9-carbazolylphenyl group; R1-R7 represent substituted or unsubstituted aryl, heteroaryl or heteroarylphenyl group, or alkyl, alkoxy, cyano group, or hydrogen or halogen atom; n is integer of 0-2; and X represents substituted or unsubstituted (n+1)-valent aromatic hydrocarbon, heteroaromatic or heteroarylphenyl group. The 4-aminocarbazole compound provides an organic EL device exhibiting enhanced emitting efficiency and durability.
    Type: Grant
    Filed: October 25, 2012
    Date of Patent: October 27, 2015
    Assignee: TOSOH CORPORATION
    Inventors: Naoki Matsumoto, Takanori Miyazaki
  • Publication number: 20150243901
    Abstract: To provide a novel amine compound which is especially suitable for a hole transport material for organic EL devices, and an organic EL device which employs such an amine compound and is excellent in the driving voltage, luminous efficiency and device lifetime. An amine compound represented by the formula (1): (wherein X is a sulfur atom or an oxygen atom, each of R1 to R10 which are independent of one another, is a hydrogen atom, a deuterium atom or a phenyl group, and each of Ar1 and Ar2 which are independent of each other, is a C6-18 aromatic hydrocarbon group, a dibenzothienyl group or a dibenzofuranyl group, which, each independently, may have a substituent consisting of a methyl group, a methoxy group, a dibenzothienyl group, a dibenzofuranyl group or a 9-carbazolyl group.).
    Type: Application
    Filed: September 26, 2013
    Publication date: August 27, 2015
    Applicant: TOSOH CORPORATION
    Inventors: Naoki Matsumoto, Takanori Miyazaki, Ryohei Takahashi
  • Patent number: 9095953
    Abstract: Provided are a rear substrate surface polishing device polishing a rear surface of a substrate, a rear substrate surface polishing system including the rear substrate surface polishing device, a rear substrate surface polishing method used in the rear substrate surface polishing device, and a storage medium for storing a program implemented with the rear substrate surface polishing method. In particular, the rear surface of the substrate is polished by a substrate polishing unit in accordance with information acquired from a prior process performed prior to the polishing process of the rear surface of the substrate at the substrate polishing unit. Further, the substrate polishing unit polishes the substrate with a polishing area determined on the basis of information acquired from a prior process. Furthermore, the polishing is performed by using any one or all of a plurality of substrate polishing units determined on the basis of information acquired from a prior process.
    Type: Grant
    Filed: June 13, 2011
    Date of Patent: August 4, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Mitsunori Nakamori, Noritaka Uchida, Takehiko Orii, Takanori Miyazaki, Nobuhiko Mouri
  • Patent number: 8993805
    Abstract: A novel material having high hole-transporting ability and a high glass transition temperature and having long-lasting durability is obtained. A benzofluorene compound represented by formula (1) is used. (In the formula, M is a substituted or unsubstituted aryl group having 6-40 carbon atoms or a substituted or unsubstituted heteroaryl group having 5-40 carbon atoms; Ar1 to Ar4 each independently is a substituted or unsubstituted aryl group having 6-40 carbon atoms or a substituted or unsubstituted heteroaryl group having 5-40 carbon atoms, provided that at least one of Ar1 to Ar4 is a substituent represented by any of the following formulae (2) to (5); and p is an integer of 0-2.
    Type: Grant
    Filed: April 12, 2007
    Date of Patent: March 31, 2015
    Assignee: Tosoh Corporation
    Inventors: Masakazu Nishiyama, Naoki Matsumoto, Takanori Miyazaki, Takeshi Kanbara
  • Publication number: 20140296519
    Abstract: A 4-aminocarbazole compound represented by formula (1): wherein Ar1-Ar4 represent substituted or unsubstituted aryl, thienyl, pyridyl, benzothienyl, dibenzothienyl, dibenzofuranyl, 4-carbazolyl, dibenzothienylphenyl, dibenzofuranylphenyl or 9-carbazolylphenyl group; R1-R7 represent substituted or unsubstituted aryl, heteroaryl or heteroarylphenyl group, or alkyl, alkoxy, cyano group, or hydrogen or halogen atom; n is integer of 0-2; and X represents substituted or unsubstituted (n+1)-valent aromatic hydrocarbon, heteroaromatic or heteroarylphenyl group. The 4-aminocarbazole compound provides an organic EL device exhibiting enhanced emitting efficiency and durability.
    Type: Application
    Filed: October 25, 2012
    Publication date: October 2, 2014
    Applicant: TOSOH CORPORATION
    Inventors: Naoki Matsumoto, Takanori Miyazaki
  • Patent number: 8846214
    Abstract: An amine derivative represented by the following general formula (1) and exhibiting a temperature difference of 30° C. or more as defined by the difference of [decomposition temperature (° C.) minus sublimation temperature (° C.)]: wherein R1 and R2 independently represent a substituted or unsubstituted C6-40 aryl or C5-40 heteroaryl group; and R3 and R4 independently represent a hydrogen atom, a straight-chain, branched or cyclic C1-18 alkyl or C1-18 alkoxy group, or a substituted or unsubstituted C6-40 aryl or C5-40 heteroaryl group, provided that R3 and R4 may form together a cyclic hydrocarbon group. The amine derivative is useful as an organic electroluminescent material.
    Type: Grant
    Filed: June 2, 2010
    Date of Patent: September 30, 2014
    Assignee: Tosoh Corporation
    Inventors: Shinichi Ishikawa, Naoki Matsumoto, Takanori Miyazaki, Yasushi Hara
  • Patent number: 8344284
    Abstract: A laser machining nozzle herein obtained includes a main assist-gas nozzle (2) for emitting a laser beam (8) and a main assist-gas, and an auxiliary assist-gas nozzle (5) annularly surrounding the main assist-gas nozzle for emitting an auxiliary assist-gas, whereby a gold plating (12) is provided on an interior surface of the main assist-gas nozzle to reflect the laser beam, so that a temperature rise of the laser machining nozzle can be prevented, and even when the laser beam (8) is reflected on the interior surface of the laser machining nozzle, it is possible to reduce peeling of the gold plating (12) applied onto the interior surface of the laser machining nozzle.
    Type: Grant
    Filed: July 23, 2008
    Date of Patent: January 1, 2013
    Assignee: Mitsubishi Electric Corporation
    Inventors: Takanori Miyazaki, Masaru Kanaoka, Taira Ogita
  • Publication number: 20120203010
    Abstract: A carbazole compound represented by the following formula: wherein, when m=1, n=0, Ar1, Ar2, Ar3 and X2 are C6-50 aryl or C4-50 heteroaryl, provided that Ar1 and Ar2, or Ar3 and X2 may form together a ring; X1?C6-50 arylene; R1, R2, R4, R5 and R7 are H, halogen, amino, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl, R3 and R6 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl; when m=0, n=1-3, Ar3, Ar4 and Ar5 are C6-50 aryl or C4-50 heteroaryl, Ar4 and Ar5 may form together a ring; X1?C1-18 alkyl, C6-50 aryl or C4-50 heteroaryl; X2?C6-50 arylene; R1-R7 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl; when m=0, n=0, X1?C1-18 alkyl, C6-50 aryl or C4-50 heteroaryl; Ar3 and X2 are C6-50 aryl or C4-50 heteroaryl; R2?H, halogen, C1-18 alkyl, C1-18 alkoxy; R1 and R3-R7 are H, halogen, C1-18 alkyl, C1-18 alkoxy, C6-50 aryl or C4-50 heteroaryl. The carbazole compound is suitable for an organic EL device.
    Type: Application
    Filed: October 20, 2010
    Publication date: August 9, 2012
    Applicant: TOSOH CORPORATION
    Inventors: Naoki Matsumoto, Takanori Miyazaki, Shinichi Ishikawa
  • Publication number: 20120160818
    Abstract: A laser machining apparatus includes an irradiating section and a control section. The control section causes, in a first period, the irradiating section to perform a first cutting process for cutting a workpiece in a region between a first region and a second region in such a manner that a state in which the first region is retained by the second region in the workpiece is kept, and causes, in a second period later than the first period, the irradiating section to perform a second cutting process for cutting the workpiece within the region between the first region and the second region in the workpiece, where a rear surface is exposed because a part of the protective sheet has been melted in the first cutting process, to separate the first region from the second region together with dross adhering to the rear surface in the first cutting process.
    Type: Application
    Filed: May 24, 2011
    Publication date: June 28, 2012
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Takanori Miyazaki, Norihiro Seto
  • Publication number: 20120112177
    Abstract: An amine derivative represented by the following general formula (1) and exhibiting a temperature difference of 30° C. or more as defined by the difference of [decomposition temperature (° C.) minus sublimation temperature (° C.)]: wherein R1 and R2 independently represent a substituted or unsubstituted C6-40 aryl or C5-40 heteroaryl group; and R3 and R4 independently represent a hydrogen atom, a straight-chain, branched or cyclic C1-18 alkyl or C1-18 alkoxy group, or a substituted or unsubstituted C6-40 aryl or C5-40 heteroaryl group, provided that R3 and R4 may form together a cyclic hydrocarbon group. The amine derivative is useful as an organic electroluminescent material.
    Type: Application
    Filed: June 2, 2010
    Publication date: May 10, 2012
    Applicant: TOSOH CORPORATION
    Inventors: Shinichi Ishikawa, Naoki Matsumoto, Takanori Miyazaki, Yasushi Hara
  • Publication number: 20110312247
    Abstract: Provided are a rear substrate surface polishing device polishing a rear surface of a substrate, a rear substrate surface polishing system including the rear substrate surface polishing device, a rear substrate surface polishing method used in the rear substrate surface polishing device, and a storage medium for storing a program implemented with the rear substrate surface polishing method. In particular, the rear surface of the substrate is polished by a substrate polishing unit in accordance with information acquired from a prior process performed prior to the polishing process of the rear surface of the substrate at the substrate polishing unit. Further, the substrate polishing unit polishes the substrate with a polishing area determined on the basis of information acquired from a prior process. Furthermore, the polishing is performed by using any one or all of a plurality of substrate polishing units determined on the basis of information acquired from a prior process.
    Type: Application
    Filed: June 13, 2011
    Publication date: December 22, 2011
    Inventors: Mitsunori Nakamori, Noritaka Uchida, Takehiko Orii, Takanori Miyazaki, Nobuhiko Mouri
  • Publication number: 20110147351
    Abstract: A laser processing apparatus for piercing a workpiece and cutting the pierced workpiece by irradiating the workpiece with a laser beam. The apparatus includes: a laser beam projection unit for projecting the laser beam onto the workpiece with the focus position thereof set to lie within the workpiece and in the vicinity of the surface of the workpiece at least when piercing is started; and a laser oscillator that emits the laser beam as a pulsed laser having a frequency at which plasma is generated when the workpiece is irradiated with the laser beam at the focus position set through the laser beam projection unit when the piercing is started.
    Type: Application
    Filed: June 1, 2009
    Publication date: June 23, 2011
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Takanori Miyazaki, Takashi Inoue, Hiroyuki Murai
  • Patent number: 7803953
    Abstract: To provide a process for preparing an arylamine highly selectively and highly efficiently, which is also industrially superior without a fear of a side reaction when a strong base is employed. An aryl compound having an active group is reacted with an amine compound in the presence of a base by means of a catalyst for producing an arylamine which comprises a palladium compound having a tertiary phosphine group and a phase-transfer catalyst.
    Type: Grant
    Filed: June 1, 2007
    Date of Patent: September 28, 2010
    Assignee: Tosoh Corporation
    Inventors: Takanori Miyazaki, Masakazu Nishiyama, Naoki Matsumoto