Patents by Inventor Takanori Sato

Takanori Sato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160250494
    Abstract: A link mechanism for an arm portion includes an arm portion, a non-rotating arm attachment portion, a variable-length rod, and a fixed-length rod. The arm portion holds a medical instrument. The arm portion is attached to the arm attachment portion to be rotatable about an arm rotational axis as a center. The variable-length rod includes an elastic member which biases an elastic force to bring about a recovery against a pressing force. One end of the variable-length rod is pivotably attached to the arm attachment portion and the other end of the variable-length rod is pivotably connected to one end of the fixed-length rod. The fixed-length rod has its other end attached to the arm portion to be movable about the arm rotational axis upon rotation of the arm portion.
    Type: Application
    Filed: February 24, 2016
    Publication date: September 1, 2016
    Inventors: Takuya Sakaki, Motohisa Honma, Kohei Otaka, Takanori Sato, Akira Kaneshiro, Hiroshi Harada, Yasuhiro Kumada, Hiroshi Yokohama
  • Patent number: 9416718
    Abstract: An engine equipped with a secondary air supply device includes: a fuel tank disposed over a cylinder head for storing fuel of the engine; an exhaust muffler disposed beneath the fuel tank and below the exhaust port in a region lateral of the cylinder head; an exhaust pipe connecting the exhaust port to the exhaust muffler; a secondary air introduction pipe connected to the exhaust pipe for introducing air into the exhaust muffler; and a tailpipe for discharging exhaust gas of the exhaust muffler to the outside, the exhaust muffler and the fuel tank defining therebetween a space, the tailpipe being disposed to meander in the space.
    Type: Grant
    Filed: January 13, 2015
    Date of Patent: August 16, 2016
    Assignee: HONDA MOTOR CO., LTD.
    Inventors: Yusuke Ninomiya, Chisako Takahashi, Takanori Sato
  • Publication number: 20160233639
    Abstract: A laser oscillator according to this invention includes a resonator unit, heat exchangers, fans, a resonator temperature measuring unit, and a fan control unit. The resonator unit resonates a laser beam to be output. The heat exchangers are arranged adjacent to the resonator unit and are to be supplied with a cooling liquid. The fans are arranged at least at one of two opposite positions across both the resonator unit and the heat exchangers and generate airflow in one direction, which passes through both the resonator unit and the heat exchangers. The resonator temperature measuring unit measures the temperature of the resonator unit. The fan control unit controls the fans. The fan control unit switches the direction in which air is blown by the fans, based on the temperature of the resonator unit.
    Type: Application
    Filed: February 9, 2016
    Publication date: August 11, 2016
    Applicant: FANUC CORPORATION
    Inventor: Takanori Sato
  • Patent number: 9412617
    Abstract: Plasma etching is performed while suppressing bowing during etching of a multi-layer film. The plasma etching is performed multiple times using a processing gas containing HBr gas and C4F8 gas, and the etching gradually forms recesses from a SiN layer through a laminated film. By adding a gas containing boron to the processing gas during the etching at a predetermined timing and at a predetermined flow ratio while etching the laminated film, a protective film is formed on side walls of the SiN layer that are exposed to the recess.
    Type: Grant
    Filed: July 4, 2013
    Date of Patent: August 9, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kazuki Narishige, Takanori Sato, Manabu Sato
  • Publication number: 20160220657
    Abstract: The present invention relates recombinant viruses and the uses thereof. More particularly, the invention relates to novel recombinant Marek's disease viruses encoding polypeptide(s) of interest, and their use to express or deliver such polypeptides to animals, particularly poultry. The invention is particularly suited to vaccinate poultry against avian pathogens.
    Type: Application
    Filed: September 5, 2014
    Publication date: August 4, 2016
    Inventors: Motoyuki Esaki, Shuji Saitoh, Takanori Sato
  • Patent number: 9384992
    Abstract: A plasma processing method is provided for etching a multilayer film having a first film and a second film with differing dielectric constants alternatingly stacked on a substrate, and forming a hole with a predetermined shape in the multilayer film. The plasma processing method includes a first step of etching the multilayer film to a first depth using a gas mixture containing a CF based gas at a first flow rate and a bromine-containing gas, a chloride-containing gas, and/or an iodine-containing gas; a second step of etching the multilayer film to a second depth after the first step using a gas mixture containing the CF based gas at a second flow rate and the bromine-containing gas, the chloride-containing gas, and/or the iodine-containing gas; and a third step for over etching the multilayer film after the second step until the hole reaches a base layer.
    Type: Grant
    Filed: February 1, 2013
    Date of Patent: July 5, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kazuki Narishige, Takanori Sato, Manabu Sato
  • Publication number: 20160175879
    Abstract: There is provided an applicator that applies a coating liquid onto the upper surface of a web, and an application method which are capable of sufficiently enhancing the evenness of a coating surface. The applicator includes: a bar which rotates while coming into contact with the upper surface of the continuously travelling web via the coating liquid; and a barrier plate which is provided on an upstream side of the bar in a travelling direction of the web and allows the coating liquid to flow in a direction toward the web between the barrier plate and the bar, in which, when a distance between the barrier plate and an end edge portion of the bar, which is closest to the barrier plate, is referred to as A and a distance between the barrier plate and the web is referred to as B, A is 0.5 mm to 5 mm, B is 0.5 mm to 5 mm, and is satisfied.
    Type: Application
    Filed: March 3, 2016
    Publication date: June 23, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Akifumi KATO, Takanori SATO, Manabu HASHIGAYA, Takahiro SAKAMOTO
  • Patent number: 9355861
    Abstract: A semiconductor device manufacturing method for etching a substrate having a multilayer film formed by alternately stacking a first film and a second film, and a photoresist layer to form a step-shaped structure is provided. The step-shaped structure is formed by repeatedly performing a first step of plasma-etching the first film by using the photoresist layer as a mask, a second step of exposing the photoresist layer formed on the substrate to a plasma generated from a processing gas containing argon gas and hydrogen gas by applying a high frequency power to a lower electrode while applying a negative DC voltage to an upper electrode, a third step of trimming the photoresist layer, and a fourth step of plasma-etching the second film.
    Type: Grant
    Filed: February 26, 2013
    Date of Patent: May 31, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Manabu Sato, Kazuki Narishige, Takanori Sato
  • Publication number: 20160109683
    Abstract: The mounting fixture of the present invention is used for mounting a ring-shaped elastic seal member between a ring-shaped side surface of an optical component and a holder which holds the optical component. The mounting fixture of the present invention has a first abutting surface which can abut against a top surface of the optical component which intersects the side surface, a projecting part which is arranged so as to surround the first abutting surface and which projects out from the first abutting surface in a direction vertical to the first abutting surface, and a second abutting surface which is provided at the front end of the projecting part and can abut against the elastic seal member.
    Type: Application
    Filed: October 15, 2015
    Publication date: April 21, 2016
    Applicant: FANUC CORPORATION
    Inventor: Takanori Sato
  • Publication number: 20160108613
    Abstract: A vibration control wall structure, capable of damping vibration, includes a wall frame provided at a wall part of a building, a vibration control wall body provided at the wall frame, and a vibration control damper provided between the wall frame and the vibration control wall body. In the vibration control wall body, any one of an upper end portion and a lower end portion and both side end portions of a face material are fixed to a frame material, a plurality of face materials is provided inside the wall frame by connecting in a width direction via the frame material, and a gap part that separates both side portions of the vibration control wall body and the wall frame is formed so as to absorb displacement in an in-plane direction caused when vibration acting on the building is damped by the vibration control damper.
    Type: Application
    Filed: September 25, 2014
    Publication date: April 21, 2016
    Applicant: IDEAL BRAIN CO., LTD.
    Inventor: Takanori SATO
  • Patent number: 9268240
    Abstract: The present invention provides an exposure apparatus which transfers a pattern of a mask to a substrate, including a measurement unit configured to measure, at a first measurement point and a second measurement point, a height of a measurement target portion in a shot region of the substrate held by a stage, and a control unit configured to move the stage in a direction of height of the substrate based on a correction result of correcting, by a set correction value, a measured height of the measurement target portion at the first measurement point in a acceleration period of the stage, and when a measured height of the measurement target portion at the second measurement point in the constant speed period of the stage deviates from an allowable range, obtain a new correction value instead of the set correction value.
    Type: Grant
    Filed: February 12, 2014
    Date of Patent: February 23, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Takanori Sato
  • Publication number: 20160046676
    Abstract: The present invention relates to novel immunogenic polypeptides and their use in vaccine compositions. The invention also relates to nucleic acids, vectors and cells which express the polypeptides and the uses thereof. The polypeptides of the invention more specifically comprise an immunogenic domain and a cell membrane addressing domain which is derived from a B5R gene. The invention is particularly suited to produce vaccines for non-human animals, particularly for vaccinating swine against PCV2 infection.
    Type: Application
    Filed: April 10, 2014
    Publication date: February 18, 2016
    Inventor: TAKANORI SATO
  • Patent number: 9212480
    Abstract: A method of installing a base isolation floor includes a base arrangement process for installing a plurality of plate-shaped bases, which are formed so that a plurality of upward convex curved surface portions are aligned on an upper surface, on double-sided tapes applied onto an upper surface of a floor over a plurality of columns to be substantially parallel to each other and thereby arranging the bases on the upper surface of the floor and a slide plate installation process for installing a plurality of plate-shaped slide plates having a substantially flat lower surface on the base.
    Type: Grant
    Filed: September 21, 2012
    Date of Patent: December 15, 2015
    Assignee: IDEAL BRAIN CO., LTD.
    Inventor: Takanori Sato
  • Patent number: 9175490
    Abstract: To provide a seismic isolation apparatus which, as well as widening an applicable shaking range, can be easily configured and is low in height, a seismic isolation apparatus is configured of a low friction combination formed by a point contact between a planar hard base plate, which has a surface on which are disposed at least three convexly curved projections of a uniform height, and a glide plate which is a smooth, hard, flat plate.
    Type: Grant
    Filed: June 23, 2011
    Date of Patent: November 3, 2015
    Inventor: Takanori Sato
  • Publication number: 20150303069
    Abstract: Plasma etching is performed while suppressing bowing during etching of a multi-layer film. The plasma etching is performed multiple times using a processing gas containing HBr gas and C4F8 gas, and the etching gradually forms recesses from a SiN layer through a laminated film. By adding a gas containing boron to the processing gas during the etching at a predetermined timing and at a predetermined flow ratio while etching the laminated film, a protective film is formed on side walls of the SiN layer that are exposed to the recess.
    Type: Application
    Filed: July 4, 2013
    Publication date: October 22, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kazuki NARISHIGE, Takanori SATO, Manabu SATO
  • Publication number: 20150267580
    Abstract: An engine equipped with a secondary air supply device includes: a fuel tank disposed over a cylinder head for storing fuel of the engine; an exhaust muffler disposed beneath the fuel tank and below the exhaust port in a region lateral of the cylinder head; an exhaust pipe connecting the exhaust port to the exhaust muffler; a secondary air introduction pipe connected to the exhaust pipe for introducing air into the exhaust muffler; and a tailpipe for discharging exhaust gas of the exhaust muffler to the outside, the exhaust muffler and the fuel tank defining therebetween a space, the tailpipe being disposed to meander in the space.
    Type: Application
    Filed: January 13, 2015
    Publication date: September 24, 2015
    Applicant: HONDA MOTOR CO., LTD.
    Inventors: Yusuke Ninomiya, Chisako Takahashi, Takanori Sato
  • Publication number: 20150228500
    Abstract: In a semiconductor device manufacturing method, a target object including a multilayer film and a mask formed on the multilayer film is prepared in a processing chamber of a plasma processing apparatus. The multilayer film is formed by alternately stacking a silicon oxide film and a silicon nitride film. The multilayer film is etched by supplying a processing gas containing hydrogen gas, hydrogen bromide gas, nitrogen trifluoride gas and at least one of hydrocarbon gas, fluorohydrocarbon gas and fluorocarbon gas into the processing chamber of the plasma processing apparatus and generating a plasma of the processing gas in the processing chamber.
    Type: Application
    Filed: April 24, 2015
    Publication date: August 13, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kazuto OGAWA, Kazuki NARISHIGE, Takanori SATO
  • Publication number: 20150213103
    Abstract: A primary storage system receives, from a host computer, indivisible data which is a group of data indivisible for maintaining consistency and generated in the host computer by executing an application, stores the received indivisible data, transmits a plurality of journals each including a plurality of data pieces generated by dividing the indivisible data into predetermined sizes, to a secondary storage system, and transmits, to a management computer, journal information representing that each of the plurality of journals has been transmitted.
    Type: Application
    Filed: April 18, 2013
    Publication date: July 30, 2015
    Applicant: HITACHI, LTD.
    Inventors: Takanori Sato, Tomoaki Kakeda
  • Publication number: 20150184753
    Abstract: A mechanical seal having a seal cover that has a high versatility and is less prone to deformation even when secured to a housing by two bolts is provided. A mechanical seal 100 includes a rotating ring 40, a stationary ring 20, and a seal cover 10 to attach the stationary ring 20 to a housing 300. The seal cover 10 includes two U-shaped grooves 11 and two elongate holes 12 for bolting, which are disposed alternately and at regular intervals in a circumferential direction of the shaft hole, and elongate holes 12 are elongate in a radial direction of the shaft hole and innermost positions within the elongate holes 12 where bolt shanks can pass through are located further inward than innermost positions within the U-shaped grooves 11 where bolt shanks can pass through.
    Type: Application
    Filed: September 6, 2013
    Publication date: July 2, 2015
    Applicants: Eagle Industry Co., Ltd., EagleBurgmann Japan Co., Ltd.
    Inventors: Takashi Yanagisawa, Takanori Sato
  • Patent number: 9039913
    Abstract: In a semiconductor device manufacturing method, a target object including a multilayer film and a mask formed on the multilayer film is prepared in a processing chamber of a plasma processing apparatus. The multilayer film is formed by alternately stacking a silicon oxide film and a silicon nitride film. The multilayer film is etched by supplying a processing gas containing hydrogen gas, hydrogen bromide gas, nitrogen trifluoride gas and at least one of hydrocarbon gas, fluorohydrocarbon gas and fluorocarbon gas into the processing chamber of the plasma processing apparatus and generating a plasma of the processing gas in the processing chamber.
    Type: Grant
    Filed: July 31, 2014
    Date of Patent: May 26, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kazuto Ogawa, Kazuki Narishige, Takanori Sato