Abstract: A piston for an internal combustion engine includes a piston body made of an aluminum alloy material containing silicon and having a piston ring groove formed therein and an anodic oxide film formed on the piston ring groove, wherein a metal containing nickel and zinc is deposited around silicon particles in the anodic oxide film.

Abstract: A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate during an acceleration period and during a constant velocity period, obtains a correction value for a measurement error due to factors associated with acceleration based on the difference between the measurement results at the predetermined position, corrects the level of the substrate measured at a first measurement point using the obtained correction value when the substrate is exposed at a given position after the level of the substrate at the given position is measured at the first measurement point during the acceleration period.

Abstract: A semiconductor device manufacturing method for etching a substrate having a multilayer film formed by alternately stacking a first film and a second film, and a photoresist layer to form a step-shaped structure is provided. The step-shaped structure is formed by repeatedly performing a first step of plasma-etching the first film by using the photoresist layer as a mask, a second step of exposing the photoresist layer formed on the substrate to a plasma generated from a processing gas containing argon gas and hydrogen gas by applying a high frequency power to a lower electrode while applying a negative DC voltage to an upper electrode, a third step of trimming the photoresist layer, and a fourth step of plasma-etching the second film.

Abstract: The slant of a first mirror (21), the slant of a second mirror (22), and the laser output when the slant of the first mirror (21) is an initial value and when the slant of the first mirror (21) is made to move from the initial value by exactly a predetermined value in the positive and negative directions are used as the basis to calculate a first approximation curve of the laser output with respect to the slant of the first mirror (21) and second approximation curve of the laser output with respect to the slant of the second mirror (22), set a value which corresponds to a local maximum value of the first approximation curve as the slant of the first mirror (21), and set a value which corresponds to a local maximum value of the second approximation curve as the slant of the second mirror (21).

Abstract: The present invention measures an actual utilization frequency of data and controls a location of this data in a storage apparatus in a case where a host computer makes joint use of a storage apparatus and a cache apparatus. A portion of data used by an application program 1A is stored in a storage apparatus 2 and a cache apparatus 3. A management apparatus 4 detects an I/O load of a page (4A), and detects an I/O load of cache data (4B). The management apparatus 4 determines a corresponding relationship between the page and the cache data (4C), and adds the I/O load of the cache data to the I/O load of the page.

Abstract: In a semiconductor device manufacturing method, a target object including a multilayer film and a mask formed on the multilayer film is prepared in a processing chamber of a plasma processing apparatus. The multilayer film is formed by alternately stacking a silicon oxide film and a silicon nitride film. The multilayer film is etched by supplying a processing gas containing hydrogen gas, hydrogen bromide gas, nitrogen trifluoride gas and at least one of hydrocarbon gas, fluorohydrocarbon gas and fluorocarbon gas into the processing chamber of the plasma processing apparatus and generating a plasma of the processing gas in the processing chamber.

Abstract: A manufacturing method of a semiconductor manufacturing apparatus is provided for etching a multilayer film having a first film and a second film with differing dielectric constants alternatingly stacked on a substrate, and forming a hole with a predetermined shape in the multilayer film. The manufacturing method includes a first step of etching the multilayer film to a first depth using a gas mixture containing a CF based gas at a first flow rate and a bromine-containing gas, a chloride-containing gas, and/or an iodine-containing gas; a second step of etching the multilayer film to a second depth after the first step using a gas mixture containing the CF based gas at a second flow rate and the bromine-containing gas, the chloride-containing gas, and/or the iodine-containing gas; and a third step for over etching the multilayer film after the second step until the hole reaches a base layer.

Abstract: A method of installing a base isolation floor includes a base arrangement process for installing a plurality of plate-shaped bases, which are formed so that a plurality of upward convex curved surface portions are aligned on an upper surface, on double-sided tapes applied onto an upper surface of a floor over a plurality of columns to be substantially parallel to each other and thereby arranging the bases on the upper surface of the floor and a slide plate installation process for installing a plurality of plate-shaped slide plates having a substantially flat lower surface on the base.

Abstract: The present invention provides an exposure apparatus which transfers a pattern of a mask to a substrate, including a measurement unit configured to measure, at a first measurement point and a second measurement point, a height of a measurement target portion in a shot region of the substrate held by a stage, and a control unit configured to move the stage in a direction of height of the substrate based on a correction result of correcting, by a set correction value, a measured height of the measurement target portion at the first measurement point in a acceleration period of the stage, and when a measured height of the measurement target portion at the second measurement point in the constant speed period of the stage deviates from an allowable range, obtain a new correction value instead of the set correction value.

Abstract: The slant of a first mirror (21), the slant of a second mirror (22), and the laser output when the slant of the first mirror (21) is an initial value and when the slant of the first mirror (21) is made to move from the initial value by exactly a predetermined value in the positive and negative directions are used as the basis to calculate a first approximation curve of the laser output with respect to the slant of the first mirror (21) and second approximation curve of the laser output with respect to the slant of the second mirror (22), set a value which corresponds to a local maximum value of the first approximation curve as the slant of the first mirror (21), and set a value which corresponds to a local maximum value of the second approximation curve as the slant of the second mirror (21).

Abstract: According to the present invention, a laser oscillator includes at least two mirrors and mirror holding units for holding the at least two mirrors such that the two mirrors can be inclined with respect to an optical axis. Each of the mirror holding units includes two inclination adjustment units configured to incline corresponding mirror, a pivot point portion configured to function as a pivot point when the mirror is inclined, and one inclination measuring unit configured to measure an inclination amount of the mirror inclined by the two inclination adjustment units. The inclination measuring unit is disposed in a region other than on straight lines connecting the pivot point portion with each of the inclination adjustment units.

Abstract: The present invention measures an actual utilization frequency of data and controls a location of this data in a storage apparatus in a case where a host computer makes joint use of a storage apparatus and a cache apparatus. A portion of data used by an application program 1A is stored in a storage apparatus 2 and a cache apparatus 3. A management apparatus 4 detects an I/O load of a page (4A), and detects an I/O load of cache data (4B). The management apparatus 4 determines a corresponding relationship between the page and the cache data (4C), and adds the I/O load of the cache data to the I/O load of the page.

Abstract: There is provided a semiconductor device manufacturing method for forming a step-shaped structure in a substrate by etching the substrate having thereon a multilayer film and a photoresist film on the multilayer film and serving as an etching mask. The multilayer film is formed by alternately layering a first film having a first permittivity and a second film having a second permittivity different from the first permittivity. The method includes a first process for plasma-etching the first film by using the photoresist film as a mask; a second process for exposing the photoresist film to hydrogen-containing plasma; a third process for trimming the photoresist film; and a fourth process for etching the second film by using the trimmed photoresist film and the plasma-etched first film as a mask. The step-shaped structure is formed in the multilayer film by repeatedly performing the first process to the fourth process in this sequence.

Abstract: A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate at a first measurement point during the acceleration period and a second measurement point during the constant velocity period, obtains a correction value for a measurement error due to factors associated with acceleration based on the measurement results, corrects the measured level using the obtained correction value and exposes the substrate so that the level at a given position on the substrate becomes equal to the corrected level, when the substrate is exposed at the given position after the level is measured while the stage accelerates, and exposes the substrate so that the level at a given position on the substrate becomes equal to the measured level measured, when the substrate is exposed after the level of the substrate at the given position is measured while the stage moves at a constant velocity.

Abstract: A piston for an internal combustion engine includes a piston body made of an aluminum alloy material containing silicon and having a piston ring groove formed therein and an anodic oxide film formed on the piston ring groove, wherein a metal containing nickel and zinc is deposited around silicon particles in the anodic oxide film.

Abstract: The present invention measures an actual utilization frequency of data and controls a location of this data in a storage apparatus in a case where a host computer makes joint use of a storage apparatus and a cache apparatus. A portion of data used by an application program 1A is stored in a storage apparatus 2 and a cache apparatus 3. A management apparatus 4 detects an I/O load of a page (4A), and detects an I/O load of cache data (4B). The management apparatus 4 determines a corresponding relationship between the page and the cache data (4C), and adds the I/O load of the cache data to the I/O load of the page.

Abstract: A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate at a first measurement point during the acceleration period and a second measurement point during the constant velocity period, obtains a correction value for a measurement error due to factors associated with acceleration based on the measurement results, corrects the measured level using the obtained correction value and exposes the substrate so that the level at a given position on the substrate becomes equal to the corrected level, when the substrate is exposed at the given position after the level is measured while the stage accelerates, and exposes the substrate so that the level at a given position on the substrate becomes equal to the measured level measured, when the substrate is exposed after the level of the substrate at the given position is measured while the stage moves at a constant velocity.

Abstract: A device for forming a tailored blank plate 12 having a thick plate 14 connected to a thin plate 16 to a desired configuration is provided with a press device 10 and a re-strike device 100. The press device 10 is provided with a first punch part 18, a first die part 20 and holder parts 22 and 22. Between the first punch part 18 and the first die part 20, the tailored blank plate 12 is mounted and positioned so that a stepped part 12b intersects orthogonally to punch protruding parts 50a and 50b of the first punch part 18 and punch recessed parts 72a and 72b of the first die part 20 to press-form the tailored blank plate 12. Then, the press-formed tailored blank plate 212 is moved to the re-strike device 100 to carry out a re-striking process by a second punch part 102 and a second die part 104, so as obtain the tailored blank plate 300 of a final shape.

Abstract: A battery holding device includes: a battery housing portion which is adapted to house a battery; and a conductive terminal which is disposed in a sidewall portion of the battery housing portion, and which is to be in contact with an electrode terminal of the battery. The sidewall portion of the battery housing portion is formed with: a first cutout that is formed along a first direction; and a second cutout that is formed along a second direction different from the first direction and that communicates with the first direction.

Abstract: The present invention measures an actual utilization frequency of data and controls a location of this data in a storage apparatus in a case where a host computer makes joint use of a storage apparatus and a cache apparatus. A portion of data used by an application program 1A is stored in a storage apparatus 2 and a cache apparatus 3. A management apparatus 4 detects an I/O load of a page (4A), and detects an I/O load of cache data (4B). The management apparatus 4 determines a corresponding relationship between the page and the cache data (4C), and adds the I/O load of the cache data to the I/O load of the page.