Patents by Inventor Takanori Yasuda

Takanori Yasuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fine pattern forming process using a resist composition sensitive to deep ultraviolet light
    Patent number: 5780206
    Abstract: A resist composition for deep ultraviolet light comprising (a) one of the following resin components (i)-(iii): (i) a resin which becomes alkali-soluble by eliminating protective groups by the action of an acid, (ii) a combination of an alkali-soluble resin and a dissolution-inhibiting compound, and (iii) a combination of an alkali-soluble resin and a crosslinkable compound, (b) an acid generater, (c) a special anthracene derivative, and (d) a solvent, is suitable for forming a pattern using deep ultraviolet light, KrF excimer laser light, etc., on a highly reflective substrate having level differences due to absorption of undesirable reflected deep ultraviolet light.
    Type: Grant
    Filed: July 23, 1997
    Date of Patent: July 14, 1998
    Assignees: Wako Pure Chemical Industries, Ltd., Matsushita Electric Industrial Co., Ltd.
    Inventors: Fumiyoshi Urano, Takanori Yasuda, Akiko Katsuyama, Kazuhiro Yamashita
  • Resist composition for deep ultraviolet light
    Patent number: 5695910
    Abstract: A resist composition for deep ultraviolet light comprising (a) one of the following resin components (i)-(iii): (i) a resin which becomes alkali-soluble by eliminating protective groups by the action of an acid, (ii) a combination of an alkali-soluble resin and a dissolution-inhibiting compound, and (iii) a combination of an alkali-soluble resin and a crosslinkable compound, (b) an acid generater, (c) a special anthracene derivative, and (d) a solvent, is suitable for forming a pattern using deep ultraviolet light, KrF excimer laser light, etc., on a highly reflective substrate having level differences due to absorption of undesirable reflected deep ultraviolet light.
    Type: Grant
    Filed: August 26, 1996
    Date of Patent: December 9, 1997
    Assignees: Wako Pure Chemical Industries, Ltd., Matsushita Electrical Industrial Co., Ltd.
    Inventors: Fumiyoshi Urano, Takanori Yasuda, Akiko Katsuyama, Kazuhiro Yamashita
  • Negative working resist composition
    Patent number: 5389491
    Abstract: A negative working resist composition comprising (a) an alkali-soluble resin, (b) an aromatic compound having at least two groups of the formula: --OCH.sub.2 OR.sup.1 wherein R.sup.1 is alkyl or aralkyl, (c) a photoacid generator, and (d) a solvent, can form fine patterns with high resolution when exposed to deep UV, KrF excimer laser light, etc. due to high light transmittance and high sensitivity.
    Type: Grant
    Filed: June 28, 1993
    Date of Patent: February 14, 1995
    Assignees: Matsushita Electric Industrial Co., Ltd., Wako Pure Chemical Industries, Ltd.
    Inventors: Yoshiyuki Tani, Masayuki Endo, Fumiyoshi Urano, Takanori Yasuda