Abstract: A method for producing a three-dimensional structure, a method for producing a vertical transistor, a vertical transistor wafer, and a vertical transistor substrate, capable of suppressing the emission of Si due to a heat treatment and making an interface between an oxide film and a core mainly consisting of Si relatively smooth include: forming a three-dimensional shape by processing (for example, by etching) a surface layer of a monocrystalline silicon substrate, the surface layer having an oxygen concentration of 1×1017 atoms/cm3 or more; and then forming an oxide film on the surface of the three-dimensional shape by performing a heat treatment. The three-dimensional structure has a shape having projections and recesses in a thickness direction of the silicon substrate, and a height in the thickness direction of the silicon substrate is between 1 nm and 1000 nm, and preferably between 1 nm and 100 nm.

Abstract: A skin- or hair-cleansing composition including a component (A), which is an aqueous gelling agent represented by general formula (1) described in the specification, and a component (B), which is an anionic surfactant, wherein the component (A) presents a viscosity of an aqueous solution containing 1 mass % of at 25° C. of 1,000 to 5,000 mPa·s and a clouding point of the aqueous solution containing 1 mass % of component (A) of 60° C. to 80° C., and has a weight average molecular weight of 10,000 to 30,000; a method for producing the aqueous gelling agent and a method for producing the skin- or hair-cleansing composition are provided.

Abstract: A vibration damping device including a supporting member rotating with a rotation element around a rotation center of the rotation element; a restoring force generation member coupled to the supporting member to transfer torque to and from the supporting member and configured to swing with rotation of the supporting member; and an inertia mass body coupled to the supporting member via the restoring force generation member and swinging around the rotation center with the restoring force generation member with rotation of the supporting member, in which the restoring force generation member swings around a swing center so that a relative position with respect to the inertia mass body does not change, and a distance between a center of gravity of the restoring force generation member and the swing center changes with a change in a swing angle of the restoring force generation member with respect to the inertia mass body.

Abstract: A vibration damping apparatus including a support member rotatable together with a rotational element, a restoration force generating member coupled to the support member to transmit and receive a torque with the support member, an inertial mass coupled to the support member via the restoration force generating member, a first guide surface on the restoration force generating member, a second guide surface on the inertial mass, and a coupling member having first and second rolling portions. The first and second guide surfaces are formed so that the first rolling portion rolls along the first guide surface and the second rolling portion rolls along the second guide surface along with rotation of the support member causing the restoration force generating member to swing about a rotation center of the rotational element along a radial direction of the support member and causing the inertial mass to swing about the rotation center.

Abstract: A cosmetic composition including component (A), which is an aqueous gelling agent represented by general formula (1) described in the specification, and a component (B), which is a polymeric thickening agent, wherein the component (A) presents a viscosity of an aqueous solution containing 1 mass % of at 25° C. of 1,000 to 5,000 mPa·s and a clouding point of the aqueous solution containing 1 mass % of component (A) of 60° C. to 80° C., and has a weight average molecular weight of 10,000 to 30,000; a method for producing the aqueous gelling agent and a method for producing the cosmetic composition are provided.

Abstract: A hair cosmetic composition including component (A), which is an aqueous gelling agent represented by general formula (1) described in the specification, and a component (B), which includes either one of or both of a cationic surfactant and a cationic polymer, wherein the component (A) presents a viscosity of an aqueous solution containing 1 mass % of at 25° C. of 1,000 to 5,000 mPa·s and a clouding point of the aqueous solution containing 1 mass % of component (A) of 60° C. to 80° C., and has a weight average molecular weight of 10,000 to 30,000; a method for producing the aqueous gelling agent and a method for producing the hair cosmetic composition are provided.

Abstract: A skin- or hair-cleansing composition including a component (A), which is an aqueous gelling agent represented by general formula (1) described in the specification, and a component (B), which is an anionic surfactant, wherein the component (A) presents a viscosity of an aqueous solution containing 1 mass % of at 25° C. of 1,000 to 5,000 mPa·s and a clouding point of the aqueous solution containing 1 mass % of component (A) of 60° C. to 80° C., and has a weight average molecular weight of 10,000 to 30,000; a method for producing the aqueous gelling agent and a method for producing the skin- or hair-cleansing composition are provided.

Abstract: A method for producing a three-dimensional structure, a method for producing a vertical transistor, a vertical transistor wafer, and a vertical transistor substrate, capable of suppressing the emission of Si due to a heat treatment and making an interface between an oxide film and a core mainly consisting of Si relatively smooth include: forming a three-dimensional shape by processing (for example, by etching) a surface layer of a monocrystalline silicon substrate, the surface layer having an oxygen concentration of 1×1017 atoms/cm3 or more; and then forming an oxide film on the surface of the three-dimensional shape by performing a heat treatment. The three-dimensional structure has a shape having projections and recesses in a thickness direction of the silicon substrate, and a height in the thickness direction of the silicon substrate is between 1 nm and 1000 nm, and preferably between 1 nm and 100 nm.

Abstract: A vibration damping device includes a support member that rotates, together with a rotary element to which torque from an engine is transmitted, about a center of rotation of the rotary element, a restoring force generation member that is coupled to the support member to transmit torque to and receive torque from the support member and that is swingable along with rotation of the support member, and an inertial mass body that is coupled to the support member via the restoring force generation member and that swings about the center of rotation in conjunction with the restoring force generation member along with rotation of the support member. The support member is disposed between at least a part of the restoring force generation member and at least a part of the inertial mass body in an axial direction.

Abstract: A vibration damping device includes: a supporting member that rotates integrally with a rotation element, to which torque from an engine is transmitted, around a rotation center of the rotation element; a restoring force generation member that is coupled to the supporting member so as to transmit and receive torque to and from the supporting member and that is configured to swing in accordance with rotation of the supporting member; and an inertia mass body that is coupled to the supporting member via the restoring force generation member and that swings around the rotation center in conjunction with the restoring force generation member in accordance with rotation of the supporting member, in which the restoring force generation member swings around a swing center that is set so that a relative position with respect to the inertia mass body does not change, and a distance between a center of gravity of the restoring force generation member and the swing center changes in accordance with a change in a swing a

Abstract: A skin- or hair-cleansing composition including a component (A), which is an aqueous gelling agent represented by general formula (1) described in the specification, and a component (B), which is an anionic surfactant, wherein the component (A) presents a viscosity of an aqueous solution containing 1 mass % of at 25° C. of 1,000 to 5,000 mPa·s and a clouding point of the aqueous solution containing 1 mass % of component (A) of 60° C. to 80° C., and has a weight average molecular weight of 10,000 to 30,000; a method for producing the aqueous gelling agent and a method for producing the skin- or hair-cleansing composition are provided.

Abstract: A hair cosmetic composition including component (A), which is an aqueous gelling agent represented by general formula (1) described in the specification, and a component (B), which includes either one of or both of a cationic surfactant and a cationic polymer, wherein the component (A) presents a viscosity of an aqueous solution containing 1 mass % of at 25° C. of 1,000 to 5,000 mPa·s and a clouding point of the aqueous solution containing 1 mass % of component (A) of 60° C. to 80° C., and has a weight average molecular weight of 10,000 to 30,000; a method for producing the aqueous gelling agent and a method for producing the hair cosmetic composition are provided.

Abstract: A vibration damping device including a support member that rotates with a rotary element that receives engine torque; a restoring force generating member coupled to the support member and swingable with rotation of the support member; an inertial mass body that, with rotation of the support member, swings about the center of rotation in conjunction with the restoring force generating member; a guided portion formed in either the restoring force generating member and the inertial mass body; and a guide portion formed in the other of the restoring force generating member and the inertial mass body and configured to guide the guided portion. As the guided portion is guided by the guide portion, the restoring force generating member swings with respect to the center of rotation in the radial direction of the support member and the inertial mass body swings about the center of rotation when the support member rotates.

Abstract: A vibration damping device including a support member rotabable about the center of rotation of a rotary element; a restoring force generation member coupled to the support member; an inertial mass body coupled to the support member via the restoring force generation member; and a guided portion and a guide portion provided alternately on one of the restoring force generation member or the inertial mass body. The guide portion guides the guided portion so the restoring force generation member swings along the radial direction of the center of rotation and the inertial mass body swings about the center of rotation when the support member is rotated. A component of a centrifugal force acting on the restoring force generation member is transferred from the guided portion to the guide portion. The restoring force generation member includes two mass bodies facing each other and disposed on sides of the inertial mass body.

Abstract: A cosmetic composition including component (A), which is an aqueous gelling agent represented by general formula (1) described in the specification, and a component (B), which is a polymeric thickening agent, wherein the component (A) presents a viscosity of an aqueous solution containing 1 mass % of at 25° C. of 1,000 to 5,000 mPa·s and a clouding point of the aqueous solution containing 1 mass % of component (A) of 60° C. to 80° C., and has a weight average molecular weight of 10,000 to 30,000; a method for producing the aqueous gelling agent and a method for producing the cosmetic composition are provided.

Abstract: Provided is an aqueous gelling agent composition, including: compound (A) represented by the general formula (1); and compound (B) represented by the general formula (2), wherein a mass ratio of compound (A) to compound (B), (A): (B), is from 95:5 to 85:15: where R1, R2, R8, R9, R10, R11, R15, and R16 each independently represent a hydrocarbon group having 4 to 20 carbon atoms, R3, R5, R7, R12, and R14 each independently represent a divalent hydrocarbon group having 2 to 4 carbon atoms, R4, R6, and R13 each independently represent a divalent hydrocarbon group having 3 to 16 carbon atoms, a, e, j, and m each independently represent a number of 10 to 100, d represents a number of 100 to 500, and g represents a number of 1 to 10.

Abstract: A vibration damping apparatus includes a support member configured to rotate together with a rotational element, a restoration force generating member coupled to the support member so as to transmit and receive a torque with the support member, an inertial mass coupled to the support member via the restoration force generating member, a first guide surface provided on the restoration force generating member, a second guide surface provided on the inertial mass, and a coupling member having first and second rolling portions. The first and second guide surfaces are formed so that the first rolling portion rolls along the first guide surface and the second rolling portion rolls along the second guide surface along with rotation of the support member to cause the restoration force generating member to swing relative to a rotation center of the rotational element along a radial direction of the support member and cause the inertial mass to swing about the rotation center.

Abstract: A method for producing a three-dimensional structure, a method for producing a vertical transistor, a vertical transistor wafer, and a vertical transistor substrate, capable of suppressing the emission of Si due to a heat treatment and making an interface between an oxide film and a core mainly consisting of Si relatively smooth include: forming a three-dimensional shape by processing (for example, by etching) a surface layer of a monocrystalline silicon substrate, the surface layer having an oxygen concentration of 1×1017 atoms/cm3 or more; and then forming an oxide film on the surface of the three-dimensional shape by performing a heat treatment. The three-dimensional structure has a shape having projections and recesses in a thickness direction of the silicon substrate, and a height in the thickness direction of the silicon substrate is between 1 nm and 1000 nm, and preferably between 1 nm and 100 nm.

Abstract: A rotary inertia mass damper of a damper device is configured to include a planetary gear that includes a driven member with outer teeth, first and second input plate member as a carrier which rotatably supports a plurality of pinion gears, and a ring gear that meshes with the plurality of pinion gears and works as the mass body. The outer teeth of the driven member are arranged to be disposed outside first and second springs in a radial direction of the damper device. The driven member, the plurality of pinion gears and the ring gear are arranged to at least partially overlap with the first and second springs as viewed in the radial direction. A motion of the ring gear in the axial direction is restricted by the plurality of pinion gears.

Abstract: A vibration damping device includes a support member that rotates, together with a rotary element to which torque from an engine is transmitted, about a center of rotation of the rotary element, a restoring force generation member that is coupled to the support member to transmit torque to and receive torque from the support member and that is swingable along with rotation of the support member, and an inertial mass body that is coupled to the support member via the restoring force generation member and that swings about the center of rotation in conjunction with the restoring force generation member along with rotation of the support member. The support member is disposed between at least a part of the restoring force generation member and at least a part of the inertial mass body in an axial direction.