Abstract: A semiconductor device according to one embodiment of the present disclosure includes: a first low-permittivity region provided in a region that is between first metals in an in-plane direction of a semiconductor layer and below a lower surface of the first metal in a stacking direction of the semiconductor layer; and a second low-permittivity region provided in a region that is between a contact plug and the gate electrode in the in-plane direction and below the first low-permittivity region in the stacking direction. A planar region of the second low-permittivity region is at least partially different from that of the first low-permittivity region.

Abstract: There is provided a semiconductor device including: a semiconductor substrate; a gate insulating film provided on the semiconductor substrate; a gate electrode layer that is provided on the gate insulating film and contains impurity ions; and source or drain regions that are provided on the semiconductor substrate on both sides of the gate electrode layer and contain conductive impurities, in which a concentration of the impurity ions in the gate electrode layer is higher than concentrations of the conductive impurities in the source or drain regions.

Abstract: There is provided a gas separation apparatus for separating a specified gas from a gas to be treated containing a plurality of gases. The gas separation apparatus includes a plurality of serially-connected separation units that separate the specified gas from other gases by using a column, and a suction unit that controls an inside of the column to a reduced pressure. At least two of the plurality of separation units differ from each other in at least one separation condition.

Abstract: A flow cell 1 is provided with a flow channel 2 which has rounded corners 3 in section. A measuring sample under high pressure is introduced into the flow channel 2 formed in the flow cell 1 and particles existing in the measuring sample are measured. The measuring sample is in a liquid phase, a gaseous phase or a super critical phase above 1 MPa.

Abstract: An apparatus and a method for separating a specified gas from a gas to be treated containing the specified gas comprising at least one ingredient, which comprises allowing the gas to be treated to flow through a column without the use of another gas for transferring the gas to be treated, while keeping the inside of the column packed with a packing material at a reduced pressure. The above apparatus and method can be suitably used for separating a specified gas having a high purity at a low cost.

Abstract: A unit for separating an exhaust gas containing PFC gases including CF4 and C2F6 generated in a production process, wherein the exhaust gas is concentrated in a concentration device, and then separated chromatographically in a chromatographic separation device using nitrogen as a carrier gas. The chromatographic separation device is packed with molecular sieve 13X or F-9 or the like. The unit is capable of effectively separating CF4 and C2F6.

Abstract: There is provided a gas separation apparatus for separating a specified gas from a gas to be treated containing a plurality of gases. The gas separation apparatus includes a plurality of serially-connected separation units that separate the specified gas from other gases by using a column, and a suction unit that controls an inside of the column to a reduced pressure. At least two of the plurality of separation units differ from each other in at least one separation condition.

Abstract: An apparatus and a method for separating a specified gas from a gas to be treated containing the specified gas comprising at least one ingredient, which comprises allowing the gas to be treated to flow through a column without the use of another gas for transferring the gas to be treated, while keeping the inside of the column packed with a packing material at a reduced pressure. The above apparatus and method can be suitably used for separating a specified gas having a high purity at a low cost.

Abstract: A flow cell 1 is provided with a flow channel 2 which has rounded corners 3 in section. A measuring sample under high pressure is introduced into the flow channel 2 formed in the flow cell 1 and particles existing in the measuring sample are measured. The measuring sample is in a liquid phase, a gaseous phase or a super critical phase above 1 MPa.

Abstract: A unit for separating an exhaust gas containing PFC gases including CF4 and C2F6 generated in a production process, wherein the exhaust gas is concentrated in a concentration device, and then separated chromatographically in a chromatographic separation device using nitrogen as a carrier gas. The chromatographic separation device is packed with molecular sieve 13X or F-9 or the like. The unit is capable of effectively separating CF4 and C2F6.

Abstract: A degassing device (10), a hydrogen dissolving device (12), and a palladium catalyst column (17) are provided in that order downstream of a high-purity water production device (1), and an impurity removal device (19) is connected to the exit side of treated water of the palladium catalyst column (17). The impurity removal device (19) removes impurity ions which are eluted into the water to be treated or impurity particulates which mix in with the water to be treated during the treatment in the palladium catalyst column (17). The impurity removal device (19) comprises an ion exchange device (20) and a membrane treatment device (21) such as a ultrafiltration membrane device, a reverse osmosis membrane device or the like. By providing an impurity removal device (19) in this manner, it is possible to remove impurities generated during hydrogen peroxide removal treatment by the palladium catalyst and to prevent degradation in quality of hydrogen-dissolved water.

Abstract: Using a distillation separator, a gas to be treated is separated into a plurality of gas groups having different boiling points. Then, the specific gases included in each of the plurality of gas groups separated at the first separator and having similar boiling points are separated using a chromatographic separator. In this manner, specific gases can be separated from the gas to be treated containing a plurality of specific gases.

Abstract: A degassing device (10), a hydrogen dissolving device (12), and a palladium catalyst column (17) are provided in that order downstream of a high-purity water production device (1), and an impurity removal device (19) is connected to the exit side of treated water of the palladium catalyst column (17). The impurity removal device (19) removes impurity ions which are eluted into the water to be treated or impurity particulates which mix in with the water to be treated during the treatment in the palladium catalyst column (17). The impurity removal device (19) comprises an ion exchange device (20) and a membrane treatment device (21) such as a ultrafiltration membrane device, a reverse osmosis membrane device or the like. By providing an impurity removal device (19) in this manner, it is possible to remove impurities generated during hydrogen peroxide removal treatment by the palladium catalyst and to prevent degradation in quality of hydrogen-dissolved water.

Abstract: A hydrogen dissolving device 2 is connected to a high-purity water processing device 1. Hydrogen is dissolved into the high-purity water in the hydrogen dissolving device 2 to produce hydrogen-dissolved water. The hydrogen-dissolved water is conveyed via a transport line 7 to a wash apparatus 5 or to an immersion apparatus 6. The hydrogen-dissolved water exiting from the transport line 7 inhibits oxidation of semiconductor devices during wash or immersion process.

Abstract: A discharge gas containing PFC gas including CF4 and NF3 generated from a manufacturing process (10) is adsorbed at an adsorbing device (18) and then desorbed using nitrogen as a purge gas. A desorbed gas with CF4 and NF3 concentrated can be obtained in this manner. The desorbed gas is then supplied to a chromatographic separator (20) for chromatographic separation with nitrogen as a carrier gas. In this manner, CF4 and NF3 within the PFC gas can be separated. In particular, because the gas is once concentrated at the adsorbing device (18), chromatographic separation of the gas constituents can be efficiently performed. By independently concentrating CF4 and NF3 obtained by the chromatographic separation, high purity gas constituents of the PFC gas can be obtained, and reused at the manufacturing process (10).

Abstract: A discharge gas containing PFC gas including CF4 and NF3 generated from a manufacturing process (10) is concentrated at a concentrator (18) and then chromatographically separated at a chromatographic separator (20) with nitrogen as a carrier gas. In this manner, CF4 and NF3 within the PFC gas can be separated. In particular, because the gas is once concentrated at the concentrator (18), chromatographic separation can be efficiently achieved. By independently concentrating CF4 and NF3 obtained by the chromatographic separation, high purity gas constituents of the PFC gas can be obtained, and reused at the manufacturing process (10).

Abstract: Using a distillation separator, a gas to be treated is separated into a plurality of gas groups having different boiling points. Then, the specific gases included in each of the plurality of gas groups separated at the first separating means and having similar oiling points are separated using a chromatographic separator. In this manner, specific gases can be separated from the gas to be treated containing a plurality of specific gases.

Abstract: A discharge gas containing PFC gas including CF4 and NF3 generated from a manufacturing process (10) is adsorbed at an adsorbing device (18) and then desorbed using nitrogen as a purge gas. A desorbed gas with CF4 and NF3 concentrated can be obtained in this manner. The desorbed gas is then supplied to a chromatographic separator (20) for chromatographic separation with nitrogen as a carrier gas. In this manner, CF4 and NF3 within the PFC gas can be separated. In particular, because the gas is once concentrated at the adsorbing device (18), chromatographic separation of the gas constituents can be efficiently performed. By independently concentrating CF4 and NF3 obtained by the chromatographic separation, high purity gas constituents of the PFC gas can be obtained, and reused at the manufacturing process (10).

Abstract: A discharge gas containing PFC gas including CF4 and NF3 generated from a manufacturing process (10) is concentrated at a concentrator (18) and then chromatographically separated at a chromatographic separator (20) with nitrogen as a carrier gas. In this manner, CF4 and NF3 within the PFC gas can be separated. In particular, because the gas is once concentrated at the concentrator (18), chromatographic separation can be efficiently achieved. By independently concentrating CF4 and NF3 obtained by the chromatographic separation, high purity gas constituents of the PFC gas can be obtained, and reused at the manufacturing process (10).

Abstract: A high-purity water producing equipment comprises a primary purification treatment system, a primary deionized water tank, a secondary purification treatment system for producing high-purity water from a primary deionized water, a circulatory system pipe for returning the produced high-purity water to a primary deionized water tank and a branch water feed system branched off from the circulatory system for feeding the high-purity water to a use point. An electrolytic unit for producing the anolyte EIW (electrolytic ionized water) to be catholyte EIW from the electrolysis of the high-purity water is provided as a bypass midway along the circulatory system. The anolyte EIW is added to the circulatory pipe downstream of the branching point toward the use point, when cleaning of units is necessary.