Patents by Inventor Takashi Kamo

Takashi Kamo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190191991
    Abstract: An optical coherence tomographic device configured to acquire a tomographic image of a subjected eye is disclosed herein. The optical coherence tomographic device may include a light source of wavelength sweeping type; and a measurement optical system configured to irradiate the subjected eye with light outputted from the light source, where D/S×?>1.61 may be satisfied, with a diameter of the light outputted from the light source at an incident position to the subjected eye is D, a wavelength swept frequency of the light source is S, and a center wavelength of the light outputted from the light source is ?.
    Type: Application
    Filed: December 12, 2018
    Publication date: June 27, 2019
    Inventors: Yuji Nozawa, Chihiro Kato, Takashi Kamo
  • Publication number: 20190177229
    Abstract: The object of the present invention is to provide an antibacterial material capable of sustaining antibacterial properties for a long time. The object can be solved by a silver-containing calcium phosphate sintered body having silver particles therein, wherein an average particle diameter of the silver particles is 0.01 to 0.5 ?m.
    Type: Application
    Filed: February 28, 2017
    Publication date: June 13, 2019
    Applicants: Tokyo Institute of Technology, KYOCERA Corporation
    Inventors: Toshiyuki IKOMA, Tomoaki SUGIYAMA, Hiroaki IGASHIRA, Yugo FUKUYAMA, Michimasa KAMO, Masayuki KYOMOTO, Takashi SASAKI
  • Publication number: 20190086792
    Abstract: An exposure mask includes a substrate, and a plurality of first films and a plurality of second films located alternately over each other over selected portions of the substrate. The exposure mask further includes a third film selectively located over the first and second films. At least one first pattern is located over the substrate and does not include any of the first, second or third films. At least one second pattern is located over the substrate and includes the first and second films and does not include the third film. At least one third pattern is located over the substrate and includes the first, second and third films.
    Type: Application
    Filed: March 1, 2018
    Publication date: March 21, 2019
    Inventors: Takashi KAMO, Kosuke TAKAI
  • Publication number: 20180279872
    Abstract: A ophthalmic apparatus may include: a first light source configured to output first light to be irradiated to an anterior segment of a subject eye; and a second light source configured to output second light to be irradiated to a retina of the subject eye. The apparatus may be configured capable of executing a first examination using the first light reflected from the anterior segment and a second examination using the second light reflected from the retina. A wavelength of the second light outputted from the second light source may be smaller than a wavelength of the first light outputted from the first light source.
    Type: Application
    Filed: March 26, 2018
    Publication date: October 4, 2018
    Inventors: Keiichiro Okamoto, Takashi Kamo, Tomoki Hori
  • Patent number: 9977323
    Abstract: A reflective mask comprises a substrate, first and second stacked bodies, and an intermediate portion. The first stacked body is provided on a surface of the substrate. The first stacked body includes a plurality of first layers and a plurality of second layers. A refractive index for a first electromagnetic ray of the first layer is different from a refractive index for the first electromagnetic ray of the second layer. The second stacked body includes a plurality of third layers and a plurality of fourth layers. A refractive index for the first electromagnetic ray of the third layer is different from a refractive index for the first electromagnetic ray of the fourth layer. A reflectance to the first electromagnetic ray of each of the first stacked body and the second stacked body is higher than a reflectance to the first electromagnetic ray of the intermediate portion.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: May 22, 2018
    Assignee: Toshiba Memory Corporation
    Inventor: Takashi Kamo
  • Patent number: 9841667
    Abstract: A reflective photomask includes a substrate and a reflective layer on the substrate. The reflective layer has a top surface opposite to the substrate and a reflectivity distribution on the top surface. The reflective layer includes mask patterns, the mask patterns having sizes depending on the reflectivity distribution. The mask patterns include a first pattern and a second pattern, the first pattern having a first space size smaller than a second space size of the second pattern. The first pattern is provided in a first region of the top surface, and the second pattern is provided in a second region of the top surface, wherein a reflectivity in the first region is lower than a reflectivity in the second region.
    Type: Grant
    Filed: September 3, 2015
    Date of Patent: December 12, 2017
    Assignee: Toshiba Memory Corporation
    Inventor: Takashi Kamo
  • Publication number: 20170238799
    Abstract: An ophthalmic device is provided with an illumination optical system configured to irradiate light irradiated from a light source as parallel light to a subject's eye at an oblique angle, the light source is configured to emit coherent light; an image capturing optical system including a light receiving element and configured to capture a reflected image by receiving first reflected light and second reflected light by the light receiving element, the first reflected light being reflected from an anterior surface of a cornea of the subject's eye, the second reflected light being different from the first reflected light and reflected from a posterior surface of the cornea of the subject's eye; and a controller configured to calculate a thickness of the cornea by using the reflected image captured by the image capturing optical system.
    Type: Application
    Filed: February 16, 2017
    Publication date: August 24, 2017
    Inventors: Guangchun BIAN, Takashi KAMO
  • Patent number: 9599909
    Abstract: According to one embodiment, an electrostatic chuck cleaner cleaning an adsorption face of an electrostatic chuck capable of attracting a reticle, and the cleaner includes: a plurality of substrates; adhesive layers provided on a major surface of each of the substrates, the adhesive layers being pressed against the adsorption face; and conductive layers provided on the major surface of each of the substrates, and the conductive layers being provided in a region other than a region where the adhesive layer being provided. The adhesive layers provided on the major surface of each of the substrates are disposed in different regions, and the entire adsorption face is pressed by the adhesive layers when the adhesive layers of the substrates are pressed against the adsorption face.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: March 21, 2017
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takashi Kamo, Yoshihito Kobayashi
  • Publication number: 20170075209
    Abstract: A reflective mask comprises a substrate, first and second stacked bodies, and an intermediate portion. The first stacked body is provided on a surface of the substrate. The first stacked body includes a plurality of first layers and a plurality of second layers. A refractive index for a first electromagnetic ray of the first layer is different from a refractive index for the first electromagnetic ray of the second layer. The second stacked body includes a plurality of third layers and a plurality of fourth layers. A refractive index for the first electromagnetic ray of the third layer is different from a refractive index for the first electromagnetic ray of the fourth layer. A reflectance to the first electromagnetic ray of each of the first stacked body and the second stacked body is higher than a reflectance to the first electromagnetic ray of the intermediate portion.
    Type: Application
    Filed: August 29, 2016
    Publication date: March 16, 2017
    Inventor: Takashi KAMO
  • Publication number: 20160274452
    Abstract: A reflective photomask includes a substrate and a reflective layer on the substrate. The reflective layer has a top surface opposite to the substrate and a reflectivity distribution on the top surface. The reflective layer includes mask patterns, the mask patterns having sizes depending on the reflectivity distribution. The mask patterns include a first pattern and a second pattern, the first pattern having a first space size smaller than a second space size of the second pattern. The first pattern is provided in a first region of the top surface, and the second pattern is provided in a second region of the top surface, wherein a reflectivity in the first region is lower than a reflectivity in the second region.
    Type: Application
    Filed: September 3, 2015
    Publication date: September 22, 2016
    Inventor: Takashi KAMO
  • Patent number: 9164371
    Abstract: According to one embodiment, a method of correcting defects in a reflection-type mask is provided, which comprises acquiring a mask-pattern image of the mask, by using a mask-defect correction apparatus includes a mechanism configured to detect a defect in the mask and a mechanism configured to correct the defect, acquiring a simulated wafer-transfer optical image for the mask, by using an AIMS configured to simulate a wafer-transfer optical image, thereby to determine whether the mask is defective, locating a mask defect, in a mask-pattern image acquired by the mask-defect correction apparatus, by referring to the simulated pattern image acquired by the AIMS, and correcting the defect by the mask-defect correction apparatus, on the basis of the position of the mask defect, thus detected.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: October 20, 2015
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventor: Takashi Kamo
  • Publication number: 20150261104
    Abstract: According to one embodiment, an electrostatic chuck cleaner cleaning an adsorption face of an electrostatic chuck capable of attracting a reticle, and the cleaner includes: a plurality of substrates; adhesive layers provided on a major surface of each of the substrates, the adhesive layers being pressed against the adsorption face; and conductive layers provided on the major surface of each of the substrates, and the conductive layers being provided in a region other than a region where the adhesive layer being provided. The adhesive layers provided on the major surface of each of the substrates are disposed in different regions, and the entire adsorption face is pressed by the adhesive layers when the adhesive layers of the substrates are pressed against the adsorption face.
    Type: Application
    Filed: August 22, 2014
    Publication date: September 17, 2015
    Inventors: TAKASHI KAMO, YOSHIHITO KOBAYASHI
  • Patent number: 8603707
    Abstract: According to one embodiment, an exposure method comprises exposing a desired pattern on a sample by use of a first reflection type mask on which the desired pattern to be exposed on the sample is formed and a defect is partially formed, and exposing a correction pattern on the sample by use of a second reflection type mask having the correction pattern of a reflection film formed at a position corresponding to the defect of the first reflection type mask.
    Type: Grant
    Filed: March 16, 2012
    Date of Patent: December 10, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Takashi Kamo
  • Patent number: 8535854
    Abstract: According to one embodiment, a reflective exposure mask comprises a first layer formed on a substrate and including a first light absorbing part which absorbs exposure light and a light reflecting part which reflects the exposure light, and a second layer formed on the light reflecting part and including a second light absorbing part which absorbs the exposure light.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: September 17, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Takashi Kamo
  • Publication number: 20130059234
    Abstract: According to one embodiment, an exposure method comprises exposing a desired pattern on a sample by use of a first reflection type mask on which the desired pattern to be exposed on the sample is formed and a defect is partially formed, and exposing a correction pattern on the sample by use of a second reflection type mask having the correction pattern of a reflection film formed at a position corresponding to the defect of the first reflection type mask.
    Type: Application
    Filed: March 16, 2012
    Publication date: March 7, 2013
    Inventor: Takashi KAMO
  • Patent number: 8354180
    Abstract: An electrode plate (20) for storage batteries is immersed into an aqueous solution (18) containing phosphoric acid, an ethoxy alcohol, ammonium bifluoride, sulfonic acid and sodium xylenesulfonate, and the aqueous solution (18) is stirred by a screw stirrer (22). The aqueous solution (18) is kept at about 30° C. by a heater (14), and the active material of the electrode (20) is separated therefrom. The aqueous solution (18) contains the respective solutes in the following mass ratios: 15-20 parts by mass of the phosphoric acid; 3-7 parts by mass of the ethoxy alcohol; 2-6 parts by mass of the ammonium bifluoride; 4-8 parts by mass of the sulfonic acid; and 1-3 parts by mass of the sodium xylenesulfonate.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: January 15, 2013
    Assignees: Panasonic EV Energy Co., Ltd., Omega Techno Modeling Co., Ltd.
    Inventors: Takashi Kamo, Kyoichi Shukuri, Shunji Kuramoto
  • Publication number: 20120307218
    Abstract: According to one embodiment, a method of correcting defects in a reflection-type mask is provided, which comprises acquiring a mask-pattern image of the mask, by using a mask-defect correction apparatus includes a mechanism configured to detect a defect in the mask and a mechanism configured to correct the defect, acquiring a simulated wafer-transfer optical image for the mask, by using an AIMS configured to simulate a wafer-transfer optical image, thereby to determine whether the mask is defective, locating a mask defect, in a mask-pattern image acquired by the mask-defect correction apparatus, by referring to the simulated pattern image acquired by the AIMS, and correcting the defect by the mask-defect correction apparatus, on the basis of the position of the mask defect, thus detected.
    Type: Application
    Filed: March 19, 2012
    Publication date: December 6, 2012
    Inventor: Takashi KAMO
  • Publication number: 20120141927
    Abstract: According to one embodiment, a method for manufacturing a reflective mask includes producing a reflective mask includes a substrate, a reflection layer provided on a front surface of the substrate and configured to reflect exposure light, an absorption layer provided on the reflection layer and configured to absorb the exposure light, and a conductive layer provided on a back surface of the substrate and held on an electrostatic chuck of an exposure apparatus, transferring a mask pattern of the reflective mask to a wafer, measuring misalignment between a basic pattern of the wafer and a transfer pattern transferred to the wafer, and recessing the conductive layer within a range smaller than a thickness of the conductive layer so as to reduce the misalignment.
    Type: Application
    Filed: September 15, 2011
    Publication date: June 7, 2012
    Inventor: Takashi KAMO
  • Patent number: 8173332
    Abstract: A reflection-type exposure mask includes a multilayer reflective film in a main surface and serving as a high reflective region to an exposure light, and an absorber pattern on the multilayer reflective film and serving as a low reflective region to the exposure light, wherein a phase difference between reflection lights of the exposure light from the multilayer reflective film and the absorber pattern is in a range of 180°±10°, and the absorber pattern includes first and second linear patterns having longitudinal directions intersecting at right angles, contrast values of optical images of the first and second linear patterns formed on a wafer is to be 0.6 or more when one of the longitudinal directions of the first and second patterns agree with an incident direction of the exposure light to the main surface viewed from above the main surface.
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: May 8, 2012
    Assignees: Kabushiki Kaisha Toshiba, Renesas Technology Corp.
    Inventors: Takashi Kamo, Osamu Suga
  • Publication number: 20110151358
    Abstract: According to one embodiment, a reflective exposure mask comprises a first layer formed on a substrate and including a first light absorbing part which absorbs exposure light and a light reflecting part which reflects the exposure light, and a second layer formed on the light reflecting part and including a second light absorbing part which absorbs the exposure light.
    Type: Application
    Filed: December 20, 2010
    Publication date: June 23, 2011
    Inventor: Takashi KAMO