Patents by Inventor Takashi Kanatake
Takashi Kanatake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7062094Abstract: A method for losslessly transmitting data is provided. The data is separated into two or more portions and the second portion is subtracted from the first portion to find a difference. The first portion and the difference are transmitted, and then the second portion is reconstructed by adding the difference to the first portion. The data may comprise two or more images, with each image being a temporally displaced version of the preceding image. Each image may be divided into multiple areas, where the areas on each image correspond to the areas on the other images. A difference may be obtained by subtracting each area of an image from the corresponding area of the preceding image. The first image may then be transferred as a reference image along with the differences, and each image may be reconstructed by adding each difference to the corresponding area of the previous image.Type: GrantFiled: February 14, 2002Date of Patent: June 13, 2006Assignee: Disco CorporationInventors: Xiaoqi Zhou, Wenhui Mei, Takashi Kanatake, Kin Foong Chan
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Patent number: 6870604Abstract: A method for increasing a scan rate in a photolithography system by increasing a unit travel length while maintaining a minimum resolution is provided. The method includes determining the minimum resolution and a pixel spacing distance equal to the unit travel length. The method also includes calculating a window size based on the minimum resolution and the pixel spacing distance. A plurality of windows of the calculated size are established so that a pixel in a first window is offset from a pixel in a second window by the minimum resolution in a first dimension and the pixel spacing distance in a second dimension, and one of the plurality of windows is selected for projection onto a subject.Type: GrantFiled: April 23, 2003Date of Patent: March 22, 2005Assignee: Ball Semiconductor, Inc.Inventor: Takashi Kanatake
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Publication number: 20040004699Abstract: A system and method for increasing a scan rate in a photolithography system by increasing a unit travel length while maintaining a minimum resolution is provided. The method includes determining the minimum resolution and a pixel spacing distance equal to the unit travel length. The method also includes calculating a window size based on the minimum resolution and the pixel spacing distance. A plurality of windows of the calculated size are established so that a pixel in a first window is offset from a pixel in a second window by the minimum resolution in a first dimension and the pixel spacing distance in a second dimension, and one of the plurality of windows is selected for projection onto a subject.Type: ApplicationFiled: April 23, 2003Publication date: January 8, 2004Applicant: Ball Semiconductor, Inc.Inventor: Takashi Kanatake
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Patent number: 6663325Abstract: A transport system for a spherical object. The transport system has a supply of a first fluid and a passageway for communication of a spherical object in a path between an inlet and an outlet. At least part of the passageway is bounded by a first tube having a first annular wall with at least one opening through the first annular wall. The first tube guides flow of a spherical object in the first fluid from the inlet towards the outlet. The transport system further includes a source of vacuum in communication with the passageway through the at least one opening through the first annular wall. The source of vacuum produces a low pressure region which causes the first fluid in the passageway to be drawn from the passageway through the at least one opening through the first annular wall. The transport system further includes a supply of a second fluid which is in communication with a spherical object moving between the inlet and the outlet.Type: GrantFiled: May 31, 2000Date of Patent: December 16, 2003Assignees: Mitsui High-Tec, Inc., Nippon Pneumatics/Bluidics System Co., Ltd., Ball Semiconductor Inc.Inventors: Shuho Kai, Takashi Kanatake, Tashirou Arai, Kiyoshi Horii
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Publication number: 20030210382Abstract: A system and method for an imaging system is provided. The system utilizes light of at least two wavelengths to project an image. The image is first projected using light of a first wavelength from a device such as a cathode ray tube and is directed towards a diode array connectable to an integrated circuit (IC). The light may pass through a translucent substrate of the diode array and strike sensors associated with the diodes and connected to the IC. Sensors which receive the light may provide power to the associated diodes using a power circuit present on the IC. The diodes receiving power may then emit light of the second wavelength and the emitted light may pass back through the translucent substrate. The IC may provide amplification if desired.Type: ApplicationFiled: April 18, 2003Publication date: November 13, 2003Applicant: Ball Semiconductor, Inc.Inventors: Takashi Kanatake, Takashi Mukai
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Patent number: 6606739Abstract: A method for scaling a pixel location in a digital photolithography system by rotating a pixel panel is provided. The method determines the angle of rotation of the pixel panel relative to a subject and calculates the original location of the pixel to be scaled. The method calculates the desired location of the pixel and determines the angle through which the pixel panel should be rotated to align the pixel with the desired location in a first dimension. The scan rate of the pixel panel and the subject is altered to align the pixel with the desired location in a second dimension.Type: GrantFiled: December 19, 2001Date of Patent: August 12, 2003Assignee: Ball Semiconductor, Inc.Inventors: Takashi Kanatake, Wenhui Mei, Akira Ishikawa
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Patent number: 6537738Abstract: A digital photolithography system is provided that is capable of making smooth diagonal components. The system includes a computer for providing a first digital pattern to a digital pixel panel, such as a deformable mirror device (DMD). The DMD is capable of providing a first plurality of pixel elements for exposure onto a plurality of wafer sites. After exposure, the wafer can be scanned a distance less than the site length. The DMD then receives a second digital pattern for exposing a second plurality of pixel elements onto the plurality of sites of the subject. The exposed second plurality of pixel elements overlaps the exposed first plurality of pixel elements. This overlapping allows incremental changes to be made in the image being exposed, thereby accommodating the creation of diagonal components.Type: GrantFiled: August 8, 2000Date of Patent: March 25, 2003Assignee: Ball Semiconductor, Inc.Inventors: Wenhui Mei, Takashi Kanatake
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Publication number: 20030043582Abstract: A laser diode array light source includes a plurality of semiconductor diodes attached to a first substrate, with each diode having an aperture for emitting an output of light positioned on a side of the diode, the side being generally perpendicular to the first substrate. A second substrate is positioned adjacent to the first substrate and includes a plurality of reflective surfaces for redirecting each of the outputs of light. In this way, the light from the plurality of diodes can be commonly directed to provide a directional light source.Type: ApplicationFiled: August 29, 2001Publication date: March 6, 2003Applicant: Ball Semiconductor, Inc.Inventors: Kin Foong Chan, Wenhui Mei, Takashi Kanatake, Akira Ishikawa, Toshio Matsushita
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Patent number: 6529262Abstract: Disclosed is a method, system, and lense system for performing lithography on a substrate. The system includes a unique lense system for nonplanar substrates. The lense system includes a first lense section for receiving a pattern and producing a concave image of the pattern. The concave image can the be received by a second lense section for producing a nonplanar image of the pattern. The system also includes two light sources and a digital imaging device for projecting and exposing the pattern through the lense section and onto the substrate. Light from the first light source is used for exposing the pattern while light from second light source is used for receiving an alignment image. An image sensor, using the light from the second light source, detects an alignment image from the substrate. The alignment image is used to accommodate the projection of the pattern onto the substrate so that the pattern is properly aligned to the substrate.Type: GrantFiled: April 12, 2000Date of Patent: March 4, 2003Assignee: Ball Semiconductor, Inc.Inventors: Wenhui Mei, Takashi Kanatake
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Publication number: 20030025981Abstract: An apparatus and method for adjustably reflecting light is provided. The apparatus includes a base and, positioned above the base, a member having an upper surface and a lower surface. A reflective coating is applied to at least a portion of the upper surface. The system also includes a capacitive plate positioned between the member and the base. The capacitive plate is operable to deflect the member, which alters the orientation of the member relative to the base. A second member, which may be deformable, may be attached to the first member so that deformation of the second member alters the orientation of the first member relative to the base.Type: ApplicationFiled: July 31, 2001Publication date: February 6, 2003Applicant: Ball Semiconductor, Inc.Inventors: Akira Ishikawa, Takashi Kanatake, Wenhui Mei, Wade P. Farrow, Chad Mueller, Phillip Ahrens, Zhiqiang Feng, Kin Chan
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Patent number: 6509955Abstract: A system for performing digital lithography onto a subject is provided. The system utilizes pixel panels to generate pixel patterns. Mirrors are utilized to divert and align the pixel elements forming the patterns onto a subject. A gradient lens system positioned between the panels and the subject simultaneously directs the pixel elements to the subject. The pixel elements may overlapping, adjacent, or spaced as desired. The pixel elements may be directed to multiple surfaces simultaneously. One or more point array units may be utilized in the system to achieve higher resolution.Type: GrantFiled: May 16, 2001Date of Patent: January 21, 2003Assignee: Ball Semiconductor, Inc.Inventors: Wenhui Mei, Takashi Kanatake
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Patent number: 6493867Abstract: A digital photolithography system is provided that is capable of making smooth diagonal components. The system includes a computer for providing a first digital pattern to a digital pixel panel, such as a deformable mirror device (DMD). The DMD is capable of providing a first plurality of pixel elements for exposure onto a plurality of wafer sites. After exposure, the wafer can be scanned a distance less than the site length. The DMD then receives a second digital pattern for exposing a second plurality of pixel elements onto the plurality of sites of the subject. The exposed second plurality of pixel elements overlaps the exposed first plurality of pixel elements. This overlapping allows incremental changes to be made in the image being exposed, thereby accommodating the creation of diagonal components.Type: GrantFiled: November 14, 2000Date of Patent: December 10, 2002Assignee: Ball Semiconductor, Inc.Inventors: Wenhui Mei, Takashi Kanatake
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Publication number: 20020159044Abstract: A system for performing digital lithography onto a subject is provided. The system includes a telecentric lens system that utilizes a field lens for redirecting light without distortion. The field lens may be utilized with a microlens array, a grating, and other lenses to achieve a desired result. A Fresnel lens may be used in place of the field lens and may be combined with the microlens array into a diffraction optical element.Type: ApplicationFiled: April 2, 2002Publication date: October 31, 2002Applicant: Ball Semiconductor, Inc.Inventors: Wenhui Mei, Takashi Kanatake
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Publication number: 20020156639Abstract: A method for determining a usage fee for a digital photolithography system is provided. The method is implemented as a computer program in a computer system used with the digital photolithography system. A digital mask is first received into the computer system, the digital mask being a source of pattern information for a digital pattern generator. Whenever a portion of the digital mask is transferred to the digital pattern generator, the transfer is detected and a counter is updated, accordingly. This is done only if the first digital mask is new. The usage fee can thereby be determined from the counter.Type: ApplicationFiled: February 27, 2001Publication date: October 24, 2002Inventors: Akira Ishikawa, Takashi Kanatake
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Publication number: 20020135814Abstract: A method for losslessly transmitting data is provided. The data is separated into two or more portions and the second portion is subtracted from the first portion to find a difference. The first portion and the difference are transmitted, and then the second portion is reconstructed by adding the difference to the first portion. The data may comprise two or more images, with each image being a temporally displaced version of the preceding image. Each image may be divided into multiple areas, where the areas on each image correspond to the areas on the other images. A difference may be obtained by subtracting each area of an image from the corresponding area of the preceding image. The first image may then be transferred as a reference image along with the differences, and each image may be reconstructed by adding each difference to the corresponding area of the previous image.Type: ApplicationFiled: February 14, 2002Publication date: September 26, 2002Applicant: Ball Semiconductor, Inc.Inventors: Xiaoqi Zhou, Wenhui Mei, Takashi Kanatake, Kin Foong Chan
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Patent number: 6444976Abstract: A system and method of utilizing spherical and hemispherical shaped devices to function as an optical switch is disclosed. The optical switch can contain mirrors that turn on and off, or are fixed in place with a movable spherical device. Additionally, the optical switches can contain grating patterns to deflect an optical signal from its original path. The grating patterns can vary in design and pattern to deflect the optical signal in almost any direction, or to not let the optical signal continue. The optical switch can also include photo sensors along the exterior of the sphere or along the reflection device. The optical switch can also include an integrated circuits.Type: GrantFiled: April 25, 2000Date of Patent: September 3, 2002Assignee: Ball Semiconductor, Inc.Inventors: Akira Ishikawa, Takashi Kanatake, Wenhui Mei
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Patent number: 6430334Abstract: A system and method of optical switching utilizing a reflection device, the switch is disclosed. The system can include: an optical transmission path having an optical transmission medium, an input-side end and a first and a second output-side end; a radiation source associated with said input-side end for emitting a primary optical signal being coupled into said transmission path; a reflection device with the ability to be turned on and off selectively for receiving the primary optical signal and converting the primary optical signal into a secondary, modulated optical signal being reflected and coupled back into the second output-side end when the reflection device is on and wherein the primary optical signal is coupled into the first output-side end when the reflection device is off. The optical switch can contain mirrors that turn on and off, or are fixed in place while the switch is movable.Type: GrantFiled: April 25, 2000Date of Patent: August 6, 2002Assignee: Ball Semiconductor, Inc.Inventors: Akira Ishikawa, Takashi Kanatake, Wenhui “Bill” Mei
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Patent number: 6425669Abstract: A photolithography system and method for providing a pattern to a subject such as a wafer is provided. The system includes a pixel panel, such as a digital mirror device or a liquid crystal display, for generating for creating a plurality of pixel elements of the pattern. The pixel elements are simultaneously directed to a first site of the subject by a lense system. The system also includes a manipulator for moving the pixel elements, relative to the subject, to a second site of the subject so that a portion of the second site overlaps a portion of the first site.Type: GrantFiled: May 24, 2000Date of Patent: July 30, 2002Assignee: Ball Semiconductor, Inc.Inventors: Wenhui Mei, Takashi Kanatake, Karlton Powell
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Publication number: 20020092993Abstract: A method for scaling a pixel location in a digital photolithography system by rotating a pixel panel is provided. The method determines the angle of rotation of the pixel panel relative to a subject and calculates the original location of the pixel to be scaled. The method calculates the desired location of the pixel and determines the angle through which the pixel panel should be rotated to align the pixel with the desired location in a first dimension. The scan rate of the pixel panel and the subject is altered to align the pixel with the desired location in a second dimension.Type: ApplicationFiled: December 19, 2001Publication date: July 18, 2002Applicant: Ball Semiconductor, Inc.Inventors: Takashi Kanatake, Wenhui Mei, Akira Ishikawa
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Patent number: 6379867Abstract: A photolithography system and method for providing a mask image to a subject such as a wafer is provided. The mask images are divided into sub-patterns and sequentially provided to a pixel panel, such as a deformable mirror device or a liquid crystal display. The pixel panel converts each sub-pattern into a plurality of pixel elements. Each of the pixel elements is then simultaneously focused to discrete, non-contiguous portions of the subject through a microlense array. The subject and pixel elements are then moved (e.g., one or both may be moved) and the next sub-pattern in the sequence is provided to the pixel panel. As a result, light can be projected on the subject, according to the pixel elements, to create a contiguous image on the subject.Type: GrantFiled: January 10, 2000Date of Patent: April 30, 2002Assignee: Ball Semiconductor, Inc.Inventors: Wenhui Mei, Takashi Kanatake, Akira Ishikawa