Patents by Inventor Takashi Kanemura

Takashi Kanemura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120108756
    Abstract: Provided is a process for the production of a fluorine-containing block copolymer, which suppresses the formation of a homopolymer as a by-product and which, regardless of whether the chain transfer constant of the iodine end is large or small, achieves nearly 100% conversion into a block copolymer. The process is characterized by reacting (A) a fluorine-containing polymer which has an iodine atom or a bromine atom at either or both terminals of the backbone chain and/or at a side-chain terminal with (M) a radical-polymerizable monomer in the presence of (C) a sulfur compound represented by general formula (2): (Y1)nH2-nS2O4 (wherein Y1 is a mono- or di-valent metal ion or an ammonium ion; and n is an integer of 0 to 2).
    Type: Application
    Filed: July 16, 2010
    Publication date: May 3, 2012
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuzo Komatsu, Kenichi Katsukawa, Haruhiko Mohri, Takashi Kanemura
  • Patent number: 7833957
    Abstract: The present invention provides a resist-removing solution for low-k film and a cleaning solution for via holes or capacitors, the solutions comprising hydrogen fluoride (HF) and at least one member selected from the group consisting of organic acids and organic solvents. The invention also provides a method of removing resist and a method of cleaning via holes or capacitors by the use of the solutions.
    Type: Grant
    Filed: August 21, 2003
    Date of Patent: November 16, 2010
    Assignee: Daikin Industries, Ltd.
    Inventors: Mitsushi Itano, Takashi Kanemura, Shingo Nakamura, Fumihiro Kamiya, Takehiko Kezuka
  • Patent number: 7700927
    Abstract: The present invention achieves a heating stage for a micro-sample, capable of efficient heating and accurate observation of the micro-sample. A micro-sample mount is a heating portion in coil form and is fixed at both ends to a base for the heating stage for the micro-sample. The base can be divided into two members at a base cut line, and the mount is fixed at one end to the first member and is fixed at the other end to the second member. A sample subjected to micro-sampling is mounted on the mount. The base is removed from the tip of a holder, and is mounted on a stage for the sample stage. A current is fed to the micro-sample mount through the members to thereby apply heat to a micro-sample for observation.
    Type: Grant
    Filed: May 19, 2008
    Date of Patent: April 20, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasuhira Nagakubo, Toshiaki Tanigaki, Katsuji Itou, Takashi Kanemura, Takayuki Asakawa
  • Publication number: 20080290290
    Abstract: The present invention achieves a heating stage for a micro-sample, capable of efficient heating and accurate observation of the micro-sample. A micro-sample mount is a heating portion in coil form and is fixed at both ends to a base for the heating stage for the micro-sample. The base can be divided into two members at a base cut line, and the mount is fixed at one end to the first member and is fixed at the other end to the second member. A sample subjected to micro-sampling is mounted on the mount. The base is removed from the tip of a holder, and is mounted on a stage for the sample stage. A current is fed to the micro-sample mount through the members to thereby apply heat to a micro-sample for observation.
    Type: Application
    Filed: May 19, 2008
    Publication date: November 27, 2008
    Inventors: Yasuhira NAGAKUBO, Toshiaki Tanigaki, Katsuji Itou, Takashi Kanemura, Takayuki Asakawa
  • Publication number: 20060138399
    Abstract: The present invention provides a resist-removing solution for low-k film and a cleaning solution for via holes or capacitors, the solutions comprising hydrogen fluoride (HF) and at least one member selected from the group consisting of organic acids and organic solvents. The invention also provides a method of removing resist and a method of cleaning via holes or capacitors by the use of the solutions.
    Type: Application
    Filed: August 21, 2003
    Publication date: June 29, 2006
    Inventors: Mitsushi Itano, Takashi Kanemura, Shingo Nakamura, Fumihiro Kamiya, Takehiko Kezuka
  • Publication number: 20060091355
    Abstract: The present invention relates to a removing solution for removing ashing residue formed by dry etching and/or ashing on a Cu/low-k multilevel interconnection structure, wherein the removing solution comprises 0.007 to 0.04 mol/kg of acid, a nonmetallic fluoride salt whose concentration is at least 20 times as great as that of the acid, and water.
    Type: Application
    Filed: October 27, 2005
    Publication date: May 4, 2006
    Inventors: Mitsushi Itano, Takehiko Kezuka, Takashi Kanemura
  • Publication number: 20060011584
    Abstract: An etching solution having an etch rate of 2 ?/minute or greater for a film having a relative dielectric constant of 8 or higher (a High-k film, and whose ratio of the etch rate of a thermal oxide (THOX) film to that of a High-k film is ([THOX etch rate]/[High-k film etch rate]) is 50 or less.
    Type: Application
    Filed: August 4, 2003
    Publication date: January 19, 2006
    Inventors: Mitsushi Itano, Takashi Kanemura, Hiroshi Momota, Daisuke Watanabe
  • Patent number: 6503865
    Abstract: A method of preparing pentafluoroethane wherein chlorine-containing carbon compounds are fluorinated in the presence of chromium catalysts that are in an amorphous state and wherein the main component is chromium compounds with the addition of at least one metal element selected from the group composed of indium, gallium, cobalt, nickel, zinc and aluminum and the average valence of the chromium in said chromium compounds is not less than +3.5 but not more than +5.0. And said chromium catalysts and a preparation method thereof. A method of preparing pentafluoroethane wherein the total yield of chlorofluoroethane by-products can be decreased without significantly deteriorating the generation activity of the pentafluoroethane and compounds which can be recycled in the reaction system. And to provide catalysts for this fluorination and a preparation method thereof.
    Type: Grant
    Filed: June 18, 2002
    Date of Patent: January 7, 2003
    Assignee: Daikin Industries Ltd.
    Inventors: Takashi Kanemura, Takashi Shibanuma
  • Patent number: 6433233
    Abstract: A method of preparing pentafluoroethane wherein chlorine-containing carbon compounds are fluorinated in the presence of chromium catalysts that are in an amorphous state and wherein the main component is chromium compounds with the addition of at least one metal element selected from the group composed of indium, gallium, cobalt, nickel, zinc and aluminum and the average valence of the chromium in said chromium compounds is not less than +3.5 but not more than +5.0. And said chromium catalysts and a preparation method thereof. A method of preparing pentafluoroethane wherein the total yield of chlorofluoroethane by-products can be decreased without significantly deteriorating the generation activity of the pentafluoroethane and compounds which can be recycled in the reaction system. And to provide catalysts for this fluorination and a preparation method thereof.
    Type: Grant
    Filed: June 12, 2000
    Date of Patent: August 13, 2002
    Assignee: Daikin Industries, Ltd.
    Inventors: Takashi Kanemura, Takashi Shibanuma
  • Patent number: 6268541
    Abstract: The invention provides a process for the preparation of 1,1,1,2,2-pentafluoroethane by fluorinating in the gas phase a halogenated hydrocarbon feedstock containing 2-chloro-1,1,1,2-tetrafluoroethane with hydrogen fluoride, the process being characterized in that: (i) a fluorinated chromium oxide obtained by fluorinating a chromium oxide represented by the formula: CrOm (1.5<m<3) is used as the catalyst, (ii) the mixing ratio (by mole) of hydrogen fluoride to halogenated hydrocarbon feedstock ranges from 1.5 to 10, and (iii) the fluorination is conducted at a temperature of 250 to 350° C. The process makes it possible to prepare easily HFC-125 reduced in the contents of CFCs.
    Type: Grant
    Filed: April 5, 2000
    Date of Patent: July 31, 2001
    Assignee: Daikin Industries, Ltd.
    Inventors: Satoru Kono, Takashi Shibanuma, Takashi Kanemura, Toshikazu Yoshimura, Kazuhiro Takahashi
  • Patent number: 6080900
    Abstract: A halogenated hydrocarbon is effectively fluorinated by reacting the halogenated hydrocarbon with hydrogen fluoride in the presence of a fluorination catalyst which comprises a partially fluorinated chromium oxide containing at least one metal selected from the group consisting of ruthenium and platinum.
    Type: Grant
    Filed: September 7, 1993
    Date of Patent: June 27, 2000
    Assignee: Daikin Industries Limited
    Inventors: Takashi Shibanuma, Takashi Kanemura, Satoshi Koyama
  • Patent number: 5751108
    Abstract: In an electroluminescent device wherein a first electrode, a first insulating layer, a luminescent layer, a second insulating layer, and a second electrode are laminated in that order on a transparent electrode, the luminescent layer is made of ZnS as a host material and Tb, O, F, and Cl as additives Cl/Tb and Cl/F atomic ratios in the luminescent layer are each between 0.002 and 0.2 inclusively, and Cl concentration in the luminescent layer is between 0.002 at % and 0.2 at % inclusively. By adding a predetermined amount of Cl as mentioned above, the luminescent efficiency and luminescent brightness of the electroluminescent device can be improved.
    Type: Grant
    Filed: August 26, 1996
    Date of Patent: May 12, 1998
    Assignee: Nippondenso Co., Ltd.
    Inventors: Takashi Kanemura, Masayuki Suzuki, Yutaka Hattori, Nobuei Ito, Tadashi Hattori, Shigeo Kanazawa