Patents by Inventor Takashi Kawabe

Takashi Kawabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5245493
    Abstract: A magnetic head for reading from and/or writing to a magnetic information storage medium has a substrate on which a plurality of thin films are formed in sequence. The films provide a magnetic circuit having a magnetic gap, a bottom pole piece and a top pole piece overlying said bottom pole piece. The top pole piece is formed as a tip portion adjoining the magnetic gap and a rear portion which makes magnetic contact with the tip portion. The rear portion is formed in the sequence after the tip portion. To ensure accurate thickness and width of the tip portion, a non-magnetic protective film is formed on the tip portion after the tip portion is formed and before the rear portion is formed.
    Type: Grant
    Filed: March 20, 1990
    Date of Patent: September 14, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Kawabe, Moriaki Fuyama, Shinji Narishige, Eizi Ashida, Makoto Morijiri, Masanori Tanabe, Hiroshi Fukui, Yutaka Sugita, Hiroshi Ikeda, Masaaki Hayashi, Kazuo Nakagoshi, Kanji Kawakami, Yokuo Saitoh, Shunichiro Kuwatsuka
  • Patent number: 5241440
    Abstract: A thin film magnetic head including conductor coils, a plurality of insulating layers to interpose and insulate the conductor coils and a magnetic gap layer between upper and lower magnetic cores, in which another insulating layer is provided on a stepped region formed by end faces of the plurality of insulating layers.
    Type: Grant
    Filed: June 29, 1992
    Date of Patent: August 31, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Eizi Ashida, Moriaki Fuyama, Hideki Yamazaki, Shinji Narishige, Makoto Morijiri, Takashi Kawabe, Shunichiro Kuwatsuka, Saburo Suzuki, Eisei Togawa
  • Patent number: 4971896
    Abstract: A method of forming a thin film pattern on a base having a step portion. This method comprises a first step of forming a thin film of given material on the base, a second step of forming a predetermined pattern of a first photoresist film on said thin film at one of a first portion including a lower part of the step portion and a second portion including an upper part of the step portion, a third step of forming a predetermined pattern of a second photoresist film on said thin film at the other of the first and second portions and a fourth step of applying ion-milling to said thin film of given material using masks said first and second photoresist film patterns formed on said thin film at the first and second portions.
    Type: Grant
    Filed: December 7, 1988
    Date of Patent: November 20, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Kawabe, Ataru Kobayashi, Moriaki Fuyama, Makoto Morijiri, Eiji Ashida, Masatoshi Tsuchiya, Tetsuya Okai, Masanobu Hanazono, Shinichi Hara, Shinji Narishige, Hiroshi Ikeda
  • Patent number: D293793
    Type: Grant
    Filed: May 7, 1985
    Date of Patent: January 19, 1988
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Jun Watanabe, Takashi Kawabe, Chiaki Tsukagoshi, Yoshimi Okamoto, Masafumi Nakanishi, Nobuhiko Hoshino, Takashi Suzuki