Patents by Inventor Takashi Kino
Takashi Kino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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COMPOSITE POLYIMIDE SUBSTRATE, COMPOSITE POLYIMIDE COMPOSITION, AND PRINTED CIRCUIT BOARD USING SAME
Publication number: 20240343027Abstract: The present invention is applicable in the field of substrates for high-frequency circuits, and for example, relates to a composite polyimide substrate, a composite polyimide composition, and a printed circuit board using same. The composite polyimide substrate according to the present invention may include: a substrate main body including a polyimide of which at least a portion has been substituted with a polyester group; and polytetrafluoroethylene (PTFE) particles included in the substrate main body.Type: ApplicationFiled: August 13, 2021Publication date: October 17, 2024Applicant: LG ELECTRONICS INC.Inventors: Takashi KINO, Dongjoo YOU, Jeayoul JOUNG, Junseok LEE, Seongmoon CHO, Eungmin LEE -
Patent number: 11845246Abstract: Provided is a film including a matrix layer formed with polyimide for a matrix obtained from pyromellitic dianhydride and m-tolidine, a first adhesive layer formed on one surface of the matrix layer and formed with first thermoplastic polyimide, and a second adhesive layer formed on the other surface of the matrix layer and formed with second thermoplastic polyimide, wherein maximum height roughness of a first interface between the matrix layer and the first adhesive layer and maximum height roughness of a second interface between the matrix layer and the second adhesive layer are 1.0 ?m or less.Type: GrantFiled: January 9, 2020Date of Patent: December 19, 2023Assignee: LG CHEM, LTD.Inventors: Takashi Kino, Soonyong Park, Youngseok Park
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Publication number: 20230279184Abstract: A composition comprising a polyimide or a precursor thereof including a tetracarboxylic dianhydride residue and an amine residue having at least one aromatic group, and a clay mineral modified with an organic cation having at least one aromatic group, wherein the content of the clay mineral with respect to 100 parts by mass of the polyimide or a precursor thereof is more than 3.0 parts to 10 parts by mass, and wherein the cured product is colorless and transparent, or a polyimide film having a coefficient of linear expansion of 10 ppm or less, a glass transition temperature of 450° C. or more, a Yellow index of 10 or less, and a total light transmittance of 80% or more.Type: ApplicationFiled: August 20, 2021Publication date: September 7, 2023Applicant: LG CHEM, LTD.Inventors: Takashi KINO, Chan Hyo PARK, Jinyoung PARK, Kyunghwan KIM, Seongku KIM, Su Kyeong KIM, Takashi YAMASHITA
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Publication number: 20230006157Abstract: The present disclosure is directed to providing a support substrate for a display device capable of obtaining high transparency while accomplishing thinning and flexibility of an organic EL display device. In view of the above, the present disclosure provides a support substrate for a display device including a TFT glass substrate having a thickness of 10 ?m to 150 ?m, and a polyimide resin layer having a thickness of 150 nm or less installed in contact with the TFT glass substrate.Type: ApplicationFiled: July 13, 2020Publication date: January 5, 2023Applicant: L G CHEM, LTD.Inventors: Takashi KINO, Chan Hyo PARK, Jinyoung PARK, Su Kyeong KIM, Takashi YAMASHITA
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Publication number: 20210268781Abstract: Provided is a film including a matrix layer formed with polyimide for a matrix obtained from pyromellitic dianhydride and m-tolidine, a first adhesive layer formed on one surface of the matrix layer and formed with first thermoplastic polyimide, and a second adhesive layer formed on the other surface of the matrix layer and formed with second thermoplastic polyimide, wherein maximum height roughness of a first interface between the matrix layer and the first adhesive layer and maximum height roughness of a second interface between the matrix layer and the second adhesive layer are 1.0 ?m or less.Type: ApplicationFiled: January 9, 2020Publication date: September 2, 2021Inventors: Takashi KINO, Soonyong PARK, Youngseok PARK
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Patent number: 11085135Abstract: Provided is a knitting method of a bag-shaped knitted fabric that can make a setup portion inconspicuous in knitting a bag-shaped knitted fabric from a closed end region in which a tube diameter changes. A knitting method of a bag-shaped knitted fabric for knitting a bag-shaped knitted fabric including a closed end region and a remaining part other than the closed end region, including: a step A of forming a setup portion in which a knitting yarn is alternately held on a front needle bed and a back needle bed; a step B of forming the closed end region by repeating, sequentially from one end side in a knitting width direction of the setup portion toward another end side thereof, C-shaped knitting in which the one end side serves as a turn back side; and a step C of knitting the remaining part of the bag-shaped knitted fabric, following a termination in a wale direction of the closed end region.Type: GrantFiled: July 10, 2020Date of Patent: August 10, 2021Assignee: Shima Seiki Mfg., Ltd.Inventors: Takashi Kino, Miku Kobayashi
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Publication number: 20210025089Abstract: Provided is a knitting method of a bag-shaped knitted fabric that can make a setup portion inconspicuous in knitting a bag-shaped knitted fabric from a closed end region in which a tube diameter changes. A knitting method of a bag-shaped knitted fabric for knitting a bag-shaped knitted fabric including a closed end region and a remaining part other than the closed end region, including: a step A of forming a setup portion in which a knitting yarn is alternately held on a front needle bed and a back needle bed; a step B of forming the closed end region by repeating, sequentially from one end side in a knitting width direction of the setup portion toward another end side thereof, C-shaped knitting in which the one end side serves as a turn back side; and a step C of knitting the remaining part of the bag-shaped knitted fabric, following a termination in a wale direction of the closed end region.Type: ApplicationFiled: July 10, 2020Publication date: January 28, 2021Applicant: SHIMA SEIKI MFG., LTD.Inventors: Takashi KINO, Miku KOBAYASHI
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Patent number: 9976236Abstract: There is provided a method for producing a shoe upper with which a shoe upper can be produced with high productivity, and a shoe upper obtained with the method for producing the shoe upper. An instep cover section (3) and a sole cover section (2) are integrally knitted in a seamless manner by carrying out process ? and then carrying out process ? or by carrying out process ? and then carrying out process ? with a flat knitting machine including at least a pair of a front and a back needle bed. [Process ?] Knitting a main body left portion (3L), which is a left side portion of the instep cover section (3), with one needle bed of the flat knitting machine and knitting a main body right portion (3R), which is a right side portion of the instep cover section (3), with the other needle bed of the flat knitting machine.Type: GrantFiled: March 28, 2014Date of Patent: May 22, 2018Assignee: SHIMA SEIKI MFG., LTD.Inventors: Kenta Terai, Takashi Kino, Masamitsu Ikenaka
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Patent number: 9675134Abstract: Provided is a footwear that excels in productivity and shape retaining property. Footwear is knitted seamlessly with a flat knitting machine having at least a pair of a front and a back needle bed and includes a base knit fabric portion having a mixed section knitted using a first knitting yarn and a second knitting yarn interwoven along the first knitting yarn. The first knitting yarn configuring the mixed section of the footwear is a knitting yarn that is not a heat-fusible yarn, and the second knitting yarn is a heat-fusible yarn having thermal adhesiveness and heat-shrinkable properties. The second knitting yarn preferably has a configuration including a core made from a material that contracts by heat, and a sheath made from a material having a lower fusing point than the core.Type: GrantFiled: December 7, 2012Date of Patent: June 13, 2017Assignee: SHIMA SEIKI MFG., LTD.Inventors: Tatsuya Kosui, Takashi Kino, Yohji Hamada
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Patent number: 9644292Abstract: There is provided a method for knitting a knitted fabric, different from a conventional method, of forming a suppressing section for suppressing a stretch in the knitting width direction of the knitted fabric in the knitting process of the knitted fabric. One side in a longitudinal direction of needle beds (FB, BB) is assumed as a moving direction (DR). A suppressing section (4) is formed by repeating performing of a bind-off process, in which a first stitch (11) held on one needle bed (FB) is overlapped with a second stitch (12) that is proximate in the moving direction (DR) and a retaining stitch (15) is knitted following in a wale direction of a double stitch (13) of the first stitch (11) and the second stitch (12), and forming of a new base stitch (14) branched from at least one of the first stitch (11) and the second stitch (12).Type: GrantFiled: March 28, 2014Date of Patent: May 9, 2017Assignee: SHIMA SEIKI MFG., LTD.Inventors: Takashi Kino, Masamitsu Ikenaka
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Patent number: 9551096Abstract: It is an objective of the present invention to provide a method for knitting a novel knitted fabric in which a stitch direction on an instep side is orthogonal to a stitch direction on a sole side using a flat knitting machine. In a sole section (4), a pickup stitch (8) in which a cover section (3) continues to a left side and a right side of the sole section (4) is formed while moving a stitch row of a BB, which becomes a part of a toe section (2), toward one side (right) in a knitting width direction. In the cover section (3), a three-dimensional cover section (3) is formed by carrying out a narrowing knitting while forming a new stitch following a stitch row of an FB of the toe section (2), a stitch row of an BB of the toe section (2) in which the pickup stitch (8) is formed on a left side (12) and a right side (13) of the sole section (4) while being moved toward the right, and a stitch row of the pickup stitch (8).Type: GrantFiled: March 28, 2014Date of Patent: January 24, 2017Assignee: Shima Seiki Mfg., Ltd.Inventors: Kazumi Nishino, Takashi Kino
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Publication number: 20160122913Abstract: There is provided a method for knitting a knitted fabric, different from a conventional method, of forming a suppressing section for suppressing a stretch in the knitting width direction of the knitted fabric in the knitting process of the knitted fabric. One side in a longitudinal direction of needle beds (FB, BB) is assumed as a moving direction (DR). A suppressing section (4) is formed by repeating performing of a bind-off process, in which a first stitch (11) held on one needle bed (FB) is overlapped with a second stitch (12) that is proximate in the moving direction (DR) and a retaining stitch (15) is knitted following in a wale direction of a double stitch (13) of the first stitch (11) and the second stitch (12), and forming of a new base stitch (14) branched from at least one of the first stitch (11) and the second stitch (12).Type: ApplicationFiled: March 28, 2014Publication date: May 5, 2016Applicant: SHIMA SEIKI MFG., LTD.Inventors: Takashi KINO, Masamitsu IKENAKA
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Publication number: 20160066651Abstract: There is provided a method for producing a shoe upper with which a shoe upper can be produced with high productivity, and a shoe upper obtained with the method for producing the shoe upper. An instep cover section (3) and a sole cover section (2) are integrally knitted in a seamless manner by carrying out process ? and then carrying out process ? or by carrying out process ? and then carrying out process ? with a flat knitting machine including at least a pair of a front and a back needle bed. [Process ?] Knitting a main body left portion (3L), which is a left side portion of the instep cover section (3), with one needle bed of the flat knitting machine and knitting a main body right portion (3R), which is a right side portion of the instep cover section (3), with the other needle bed of the flat knitting machine.Type: ApplicationFiled: March 28, 2014Publication date: March 10, 2016Applicant: SHIMA SEIKI MFG., LTD.Inventors: Kenta TERAI, Takashi KINO, Masamitsu IKENAKA
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Publication number: 20160017524Abstract: It is an objective of the present invention to provide a method for knitting a novel knitted fabric in which a stitch direction on an instep side is orthogonal to a stitch direction on a sole side using a flat knitting machine. In a sole section (4), a pickup stitch (8) in which a cover section (3) continues to a left side and a right side of the sole section (4) is formed while moving a stitch row of a BB, which becomes a part of a toe section (2), toward one side (right) in a knitting width direction. In the cover section (3), a three-dimensional cover section (3) is formed by carrying out a narrowing knitting while forming a new stitch following a stitch row of an FB of the toe section (2), a stitch row of an BB of the toe section (2) in which the pickup stitch (8) is formed on a left side (12) and a right side (13) of the sole section (4) while being moved toward the right, and a stitch row of the pickup stitch (8).Type: ApplicationFiled: March 28, 2014Publication date: January 21, 2016Applicant: Shima Seiki Mfg., Ltd.Inventors: Kazumi NISHINO, Takashi KINO
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Publication number: 20150344625Abstract: A colorless transparent polyimide having a thickness of about 1 micrometer to about 250 micrometers, an average coefficient of thermal expansion measured in a machine direction and a transverse direction of less than or equal to about 80 parts per million/° C., an average in-plane retardation of less than or equal to about 20 nanometers, an average Yellowness Index of less than or equal to 6, and a transmittance for light at a wavelength of 370 nanometers to 740 nanometers of greater than or equal to about 80%.Type: ApplicationFiled: May 27, 2015Publication date: December 3, 2015Inventors: Takashi KINO, Hiroshi NAKASHIMA, Chan Jae AHN
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Publication number: 20150107307Abstract: Provided is a footwear that excels in productivity and shape retaining property. Footwear 1 is knitted seamlessly with a flat knitting machine having at least a pair of a front and a back needle bed and includes a base knit fabric portion 2 having a mixed section 20 knitted using a first knitting yarn and a second knitting yarn interwoven along the first knitting yarn. The first knitting yarn configuring the mixed section 20 of the footwear 1 is a knitting yarn that is not a heat-fusible yarn, and the second knitting yarn is a heat-fusible yarn having thermal adhesiveness and heat-shrinkable properties. The second knitting yarn preferably has a configuration including a core made from a material that contracts by heat, and a sheath made from a material having a lower fusing point than the core.Type: ApplicationFiled: December 7, 2012Publication date: April 23, 2015Applicant: SHIMA SEKI MFG., LTD.Inventors: Tatsuya Kosui, Takashi Kino, Yohji Hamada
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Patent number: D723106Type: GrantFiled: June 16, 2014Date of Patent: February 24, 2015Assignee: Royal Co., Ltd.Inventor: Takashi Kino
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Patent number: D733805Type: GrantFiled: June 16, 2014Date of Patent: July 7, 2015Assignee: Royal Co., Ltd.Inventor: Takashi Kino
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Patent number: D755307Type: GrantFiled: June 16, 2014Date of Patent: May 3, 2016Assignee: Royal Co., Ltd.Inventor: Takashi Kino
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Patent number: D761922Type: GrantFiled: June 16, 2014Date of Patent: July 19, 2016Assignee: Royal Co., Ltd.Inventor: Takashi Kino