Abstract: Provided are a semiconductor device which enables reduction of diffusion of Si in the manufacturing process of an MIPS element and suppression of an increase in EOT, and a method of manufacturing the same. An embodiment of the present invention is a semiconductor device including a field effect transistor having a gate insulating film provided on a silicon substrate and a gate electrode provided on the gate insulating film. The gate electrode is a stack-type electrode including a conductive layer containing at least Ti, N, and O (oxygen) and a silicon layer provided on the conductive layer, and the concentration of oxygen in the conductive layer is highest in the side of the silicon layer.

Abstract: An electronic device (10) is capable of operating in water. The electronic device (10) has communication means (120), water detection means (35), and control means (100). The communication means (120) receives a radio wave. The water detection means (35) detects whether the electronic device (10) is immersed in water or not. The control means (100) makes the water detection means (35) operate in the case where intensity of a reception signal of the radio wave received by the communication means (120) is lower than a threshold level.

Abstract: A cosmetic composition is provided herein, the composition comprising: an ester of pentaerythritol and a benzoic acid having the formula (I) wherein R1 and R2 independently indicate a hydrogen atom or a linear or branched fatty acid residue having 1 to 24 carbon atoms or a benzoic acid residue, and a cosmetically acceptable carrier.

Abstract: An input device includes an insulation layer having a first main surface, and a second main surface positioned on the opposite side of the first main surface, a first detection electrode pattern provided on the first main surface of the insulation layer and arranged along a first direction, a second detection electrode pattern arranged along a second direction and having an intersection region provided on the second main surface of the insulation layer so as to intersect with the first detection electrode pattern in a plan view, and a detection region provided on the first main surface of the insulation layer, and a conductive electrode provided on the second main surface of the insulation layer, in which the conductive electrode has an opening, and the intersection region of the second detection electrode pattern is positioned in the opening.

Abstract: According to one embodiment of the invention, a display device comprises a display region including a plurality of pixel regions and a demarcating pattern of the pixel regions. The display device further comprises a first substrate having a first main surface; a plurality of first detection electrodes formed on the first main surface; and a plurality of second detection electrodes formed on the first main surface. The display device further comprises a plurality of first connection electrodes formed on the first main surface and a plurality of second connection electrodes formed on the first connection electrodes via the demarcating pattern. Each of the first connection electrodes connects the first detection electrodes adjacent to each other; and each of the second connection electrodes connects the second detection electrodes adjacent to each other.

Abstract: Provided is a makeup cosmetic which has a good feeling of use, without showing tautness or stiffness as in the case of using a silicone-based resin film or an offensive odor as in the case of using polyisoprene, and exhibits a good effect of preventing color migration. This makeup cosmetic is characterized by comprising polyisobutylene having a relative mass of 30,000-100,000 and a volatile hydrocarbon oil. Also provided are a top coating agent, which can be appropriately applied on the aforesaid makeup cosmetic, imparts glossiness and shows little color migration or blurring, a makeup kit comprising the aforesaid makeup cosmetic and the top coating agent, and a makeup method using the makeup kit.

Abstract: According to one aspect of the present invention, an input device includes: a substrate; first detection electrodes; second detection electrodes; a first connection electrode; an insulator; and a second connection electrode. The first detection electrodes are provided on or above the substrate and arrayed along a first direction. The second detection electrodes are provided on or above the substrate and arrayed along a second direction. The first connection electrode is provided on or above the substrate and connecting adjacent first detection electrodes. The insulator is provided on or above the substrate so as to cover the first connection electrode. The second connection electrode is provided on or above the insulator so as to straddle over the insulator, and connecting adjacent second detection electrodes. The portion of the first detection electrodes covers a portion of the insulator.

Abstract: The present invention provides a plasma treatment apparatus and a conditioning method capable of performing a conditioning for the whole vacuum chamber. A plasma treatment apparatus according to an embodiment of the present invention is provided with a moving means for moving a substrate holder (2) between a reaction chamber (8) and a transfer chamber (9) lying on the under side thereof. Moreover, it has such structure that the exhaust conductance of the reaction chamber (8) becomes large when the substrate holder (2) lies in the transfer chamber. Upon the conditioning, the substrate holder (2) is moved to the transfer chamber (9) to allow diffusing species to spread widely, thereby effectively performing the conditioning for both reaction chamber (8) and transfer chamber (9) in the vacuum chamber (1).

Abstract: A sputtering apparatus includes a target holder arranged in a vacuum chamber and holds a target to be deposited on a substrate, a substrate holder arranged in the vacuum chamber and supports the substrate, a shutter interposed between the target holder and the substrate holder, and that can set a closed state in which the shutter shields the substrate holder and target holder from each other, and an open state in which the shutter releases the space between the substrate holder and the target holder, a shutter support member which supports the shutter, and a joint mechanism interposed between the shutter support member and the shutter, and that can set a state in which the joint mechanism disconnects the shutter and shutter support member to be able to rotate the shutter, and a state in which the joint mechanism couples and fixes the shutter and shutter support member.

Abstract: An input device is provided with a substrate having a main surface, a first detecting electrode pattern provided on or above the main surface of the substrate, and a second detecting electrode pattern provided on or above the main surface of the substrate wherein a portion of the second detecting electrode pattern intersects the first detecting electrode pattern through an insulator; wherein the insulator, in cross-section taken along the second detecting electrode pattern, comprises a curved convex surface in a region from an end portion to an apex of the insulator.

Abstract: An input device includes a substrate having a first main surface and a second main surface located opposite to the first main surface; a protective member having an opposed surface opposite to the first main surface; a bonding member configured to bond the first main surface and the opposed surface to each other; a first coloring member disposed between the first main surface and the opposed surface, the first coloring member being in contact with the bonding member; and a second coloring member disposed on the second main surface and having a color different from a color of the first coloring member.

Abstract: A first aspect of the present invention provides a semiconductor manufacturing apparatus including: a load lock chamber; a transfer chamber; and a treatment chamber 1 and a treatment chamber 2 which carry out treatment using plasma, wherein, in the treatment chamber 2, an exhaust means is provided with a control means for making an oxygen partial pressure into 1*10?5 [Pa] or less.

Abstract: A pencil-form cosmetic composition which has a good stability at high temperature, an excellent smoothness during application, and an excellent long-lasting property, and also provides a cosmetic product thereof. The pencil-form cosmetic composition comprises (a) 15 to 50% by mass of volatile oil, (b) 5 to 25% by mass of heavy liquid isoparaffin, and (c) 5 to 30% by mass of rice wax.

Abstract: The object of the present invention is to provide a method of manufacturing high permittivity gate dielectrics for a device such as an MOSFET. A HfSiO film is formed by sputtering a Hf metal film on a SiO2 film (or a SiON film) on a Si wafer. A TiO2 film is formed by sputtering a Ti metal film on the HfSiO film and subjecting the Ti metal film to a thermal oxidation treatment. A TiN metal film is deposited on the TiO2 film. The series of treatments are performed continuously, without exposing the films and the wafer to atmospheric air. The resultant TiN/TiO2/HfSiO/SiO2/Si structure satisfies the conditions: EOT<1.0 nm, low leakage current, and hysteresis <20 mV.

Abstract: Stick-shaped solid cosmetic 10 comprises a wax with a melting point of 45° C. or higher and liquid oil, wherein the hardness of top portion 16 is 0.07 N to 0.38 N and the hardness of boundary portion 20, which is a border between a retained portion in inner holder 12 and a portion outside of the inner holder 12, is 0.03 N to 0.31 N higher than the hardness of the top portion, and wherein the hardness gradually increases from the top portion 16 to the boundary portion 20. Thus, the stick-shaped solid cosmetic 10 has smooth spreadability and excellent product strength.

Abstract: The present invention provides a plasma treatment apparatus and a conditioning method capable of performing a conditioning for the whole vacuum chamber. A plasma treatment apparatus according to an embodiment of the present invention is provided with a moving means for moving a substrate holder (2) between a reaction chamber (8) and a transfer chamber (9) lying on the under side thereof. Moreover, it has such structure that the exhaust conductance of the reaction chamber (8) becomes large when the substrate holder (2) lies in the transfer chamber. Upon the conditioning, the substrate holder (2) is moved to the transfer chamber (9) to allow diffusing species to spread widely, thereby effectively performing the conditioning for both reaction chamber (8) and transfer chamber (9) in the vacuum chamber (1).

Abstract: According to one embodiment of the invention, a display device comprises a display region including a plurality of pixel regions and a demarcating pattern of the pixel regions. The display device further comprises a first substrate having a first main surface; a plurality of first detection electrodes formed on the first main surface; and a plurality of second detection electrodes formed on the first main surface. The display device further comprises a plurality of first connection electrodes formed on the first main surface and a plurality of second connection electrodes formed on the first connection electrodes via the demarcating pattern. Each of the first connection electrodes connects the first detection electrodes adjacent to each other; and each of the second connection electrodes connects the second detection electrodes adjacent to each other.

Abstract: An input device includes a substrate including a first principal surface and a second principal surface opposite the first principal surface; a plurality of first detecting electrodes disposed on the second principal surface of the substrate; a plurality of second detecting electrodes disposed on the second principal surface of the substrate; at least one first connecting electrode disposed on the second principal surface of the substrate, the first connecting electrode being configured to connect adjacent first detecting electrodes to each other; at least one second connecting electrode including an intersection that is spaced from the second principal surface of the substrate and crosses the first connecting electrode, the second connecting electrode being configured to connect adjacent second detecting electrodes to each other; and a light diffusing member disposed at least in an area corresponding to the intersection.

Abstract: The present invention provides a pencil-form cosmetic composition which has a good stability at high temperature, an excellent smoothness during application, and an excellent long-lasting property, and also provides a cosmetic product thereof. The pencil-form cosmetic composition comprises (a) 15 to 50% by mass of volatile oil, (b) 5 to 25% by mass of heavy liquid isoparaffin, and (c) 5 to 30% by mass of rice wax.

Abstract: An input device has an input region and an outside region positioned outside the input region. The input device includes a base body having translucency, a detection electrode configured to detect an input position, and a wiring conductor configured to apply a voltage to the detection electrode. The detection electrode is provided in the input region and on the base body. The wiring conductor is provided in the outside region and on the base body. The input device further includes an insulation film which covers the wiring conductor and is provided in the outside region, and a conductor film provided on the insulation film so as to be opposed to the wiring conductor in a thickness direction of the insulation film.