Patents by Inventor Takashi Sawada

Takashi Sawada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070122754
    Abstract: A main object of the present invention is to provide a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously manufactured, their property varied patterns are each made into a target pattern form with high precision.
    Type: Application
    Filed: September 26, 2006
    Publication date: May 31, 2007
    Inventors: Kaori Yamashita, Takashi Sawada, Hironori Kobayashi
  • Publication number: 20070093386
    Abstract: The invention provides an image fading preventing agent capable of preventing the discoloration/fading of an image formed and stably retaining its image quality over a long period of time, as well as an image forming element, a recording medium, an image forming method and an image using the agent. The image fading preventing agent is used in a region in which an image is formed by a coloring material, and has a functional group to cause intramolecular proton transfer in its molecule. An image is formed by the image forming element, recording medium or image forming method using the agent.
    Type: Application
    Filed: December 7, 2006
    Publication date: April 26, 2007
    Applicant: Canon Kabushiki Kaisha
    Inventors: Takayuki Ishikawa, Takashi Sawada
  • Publication number: 20070072093
    Abstract: A main object of the present invention is to provide a manufacturing method of a pattern formed body which makes it possible to form property varied patterns having a desired line width, even when plural pattern formed bodies are manufactured. To achieve the object, the invention provides a manufacturing method of pattern formed bodies, comprising: a pattern-forming step of radiating vacuum-ultraviolet light onto a patterning substrate, a surface property of which is varied by the vacuum-ultraviolet light, through a photomask having at least a transparent substrate and a light shielding part to form a pattern formed body having a property varied pattern, in which the surface property of the patterning substrate is varied; and a step of repeating the pattern-forming step to manufacture a plurality of the pattern formed bodies, wherein an interval between the transparent substrate and the patterning substrate upon the pattern-forming step is set into the range of 0.1 ?m to 200 ?m.
    Type: Application
    Filed: September 15, 2006
    Publication date: March 29, 2007
    Inventors: Takashi Sawada, Masafumi Kamada, Kaori Yamashita, Hironori Kobayashi
  • Publication number: 20060218954
    Abstract: A heat storage apparatus includes heat storage panels having primary fluid passages formed therein; passage plates having secondary fluid passages formed therein; and heat reservoirs. The heat storage panels and the passage plates are layered alternately, and the heat reservoirs are interposed between the heat storage panels and the passage plates in such a manner that the heat reservoirs, the heat storage panels and the passage plates are adhered to one another. Protrusions are formed on surfaces of the heat storage panels in such a manner that the heat reservoirs are supported by the protrusions.
    Type: Application
    Filed: March 30, 2006
    Publication date: October 5, 2006
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Takashi Sawada, Hirotaka Kaneko
  • Publication number: 20060182906
    Abstract: Provided is an inkjet recording medium in which hydrated alumina and a sulfinic acid compound or thiosulfonic acid compound coexist in a pigment in an ink receiving layer, and which can prevent white-background yellowing during storage in a resin file holder or the like and ensure printing quality at the same time. The ink receiving layer of the inkjet recording medium contains the sulfinic acid compound or thiosulfonic acid compound, which functions to prevent yellowing, in a salt form or in a free form so as to be diffusible.
    Type: Application
    Filed: April 4, 2006
    Publication date: August 17, 2006
    Applicant: Canon Kabushiki Kaisha
    Inventors: Hisao Kamo, Masanori Ito, Takashi Sawada, Muneyoshi Sunada, Yasuyuki Ishida, Hiroshi Asakawa, Tsuyoshi Santo, Mariko Suzuki, Satoko Ito
  • Patent number: 7019396
    Abstract: An electronic chip component includes a component body and a plurality of terminal electrodes disposed on outer surfaces of the component body. At least one of the terminal electrodes includes a cured resin film including dispersed conductive particles, an outer conductive film formed on the cured resin film by electroplating, and additional conductive metallic particles being dispersed on an interface between the cured resin film and the outer conductive film.
    Type: Grant
    Filed: July 2, 2004
    Date of Patent: March 28, 2006
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Takashi Sawada, Shigekatsu Yamamoto
  • Patent number: 6848781
    Abstract: Disclosed herein is an image forming process for forming an image-recorded article having a coating layer on at least a part of an image formed, which includes the steps of providing a liquid composition containing a polymer, providing an image-recorded article formed on a recording medium by an ink-jet recording method, and applying the liquid composition to at least a part of an image of the recorded article to insolubilize the polymer contained in the liquid composition on the surface of the image, thereby forming the coating layer at a position to which the liquid composition has been applied, wherein the recording medium has a surface which insolubilizes the polymer.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: February 1, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroyuki Ogino, Motoo Urawa, Muneyoshi Sunada, Yoichi Takada, Masanori Ito, Hiroshi Asakawa, Hideki Takayama, Hitoshi Nagashima, Takashi Sawada
  • Publication number: 20050012200
    Abstract: An electronic chip component includes a component body and a plurality of terminal electrodes disposed on outer surfaces of the component body. At least one of the terminal electrodes includes a cured resin film including dispersed conductive particles, an outer conductive film formed on the cured resin film by electroplating, and additional conductive metallic particles being dispersed on an interface between the cured resin film and the outer conductive film.
    Type: Application
    Filed: July 2, 2004
    Publication date: January 20, 2005
    Applicant: Murata Manufacturing Co., Ltd.
    Inventors: Takashi Sawada, Shigekatsu Yamamoto
  • Publication number: 20050007436
    Abstract: Disclosed herein is an image forming process for forming an image-recorded article having a coating layer on at least a part of an image formed, which comprises the steps of providing a liquid composition containing a polymer, providing an image-recorded article formed on a recording medium by an ink-jet recording method, and applying the liquid composition to at least a part of an image of the recorded article to insolubilize the polymer contained in the liquid composition on the surface of the image, thereby forming the coating layer at a position to which the liquid composition has been applied, wherein the recording medium has a surface which insolubilizes the polymer.
    Type: Application
    Filed: August 13, 2004
    Publication date: January 13, 2005
    Applicant: Canon Kabushiki Kaisha
    Inventors: Hiroyuki Ogino, Motoo Urawa, Muneyoshi Sunada, Yoichi Takada, Masanori Ito, Hiroshi Asakawa, Hideki Takayama, Hitoshi Nagashima, Takashi Sawada
  • Publication number: 20040135864
    Abstract: Disclosed herein is an image forming process for forming an image-recorded article having a coating layer on at least a part of an image formed, which comprises the steps of providing a liquid composition containing a polymer, providing an image-recorded article formed on a recording medium by an ink-jet recording method, and applying the liquid composition to at least a part of an image of the recorded article to insolubilize the polymer contained in the liquid composition on the surface of the image, thereby forming the coating layer at a position to which the liquid composition has been applied, wherein the recording medium has a surface which insolubilizes the polymer.
    Type: Application
    Filed: September 26, 2003
    Publication date: July 15, 2004
    Applicant: Canon Kabushiki Kaisha
    Inventors: Hiroyuki Ogino, Motoo Urawa, Muneyoshi Sunada, Yoichi Takada, Masanori Ito, Hiroshi Asakawa, Hideki Takayama, Hitoshi Nagashima, Takashi Sawada
  • Patent number: 6677214
    Abstract: In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anisotropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.
    Type: Grant
    Filed: June 12, 2000
    Date of Patent: January 13, 2004
    Assignees: Mega Chips Corporation, Crystal Device Corporation
    Inventors: Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa
  • Patent number: 6377584
    Abstract: A transmission equipment decides in which, when a frame is received from each of networks, an output physical port corresponding to an output logical port decided by a path deciding section is decided by an output physical port deciding section, a transmitting frame is outputted to the output physical port, and when following received frames are successively transmitted, an output physical port number to which a transmitting frame is outputted by a port number increment section is incremented each time a frame is transmitted, and a destination to which a transmitting frame is outputted is switched among output physical ports.
    Type: Grant
    Filed: July 17, 1998
    Date of Patent: April 23, 2002
    Assignee: Fujitsu Limited
    Inventors: Shinya Kano, Akira Chugo, Takashi Sawada, Yasushi Kurokawa
  • Patent number: 6225668
    Abstract: In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anisotropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.
    Type: Grant
    Filed: August 25, 1997
    Date of Patent: May 1, 2001
    Assignees: Mega Chips Corporation, Silicon Technology Corporation
    Inventors: Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa
  • Patent number: 6186100
    Abstract: In each engine valve assembly (2) of intake and exhaust valve for an internal combustion engine, the engine valve is opened and closed according to a cooperation of electromagnetic forces and spring forces of a pair of electromagnets (5, 6) and a pair of spring members (7, 8), an actuator housing (3) in which the pair of electromagnets and pair of spring members are housed taking an engine oil structure having at least one oil passage (21) through which an engine oil external to the valve assembly is supplied to the actuator housing and at least one oil outlet hole (22) through which the engine oil in the oil passage is caused to flow onto a slidable portion of movable members of the valve assembly of a valve axle portion of the engine valve and an armature (4) and taking an oil heating structure (23), the oil heating structure being enabled to heat the oil within the oil passage due to a heat transfer action thereof by means of a simultaneous power supply to the pair of first and second electromagnets before
    Type: Grant
    Filed: November 12, 1999
    Date of Patent: February 13, 2001
    Assignee: Nissan Motor Co., Ltd.
    Inventor: Takashi Sawada
  • Patent number: 6177706
    Abstract: In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atoms currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anistropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.
    Type: Grant
    Filed: August 27, 1997
    Date of Patent: January 23, 2001
    Assignees: Mega Chips Corporation, Crystal Device Corporation
    Inventors: Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa
  • Patent number: 6137120
    Abstract: In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anisotropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.
    Type: Grant
    Filed: August 27, 1997
    Date of Patent: October 24, 2000
    Assignees: Mega Chips Corporation, Crystal Device Corporation
    Inventors: Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa
  • Patent number: 6115514
    Abstract: An optical waveplate includes a polyimide with a film thickness of 20 .mu.m or less.
    Type: Grant
    Filed: July 7, 1998
    Date of Patent: September 5, 2000
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Shinji Ando, Takashi Sawada, Yasuyuki Inoue
  • Patent number: 6106734
    Abstract: In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anisotropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diaphragm which is made of a single-crystalline material can be easily manufactured through no junction.
    Type: Grant
    Filed: August 25, 1997
    Date of Patent: August 22, 2000
    Assignees: Mega Chips Corporation, Crystal Device Corporation
    Inventors: Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa
  • Patent number: 6072920
    Abstract: An optical waveplate includes a polyimide with a film thickness of 20 .mu.m or less.
    Type: Grant
    Filed: July 29, 1999
    Date of Patent: June 6, 2000
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Shinji Ando, Takashi Sawada, Yasuyuki Inoue
  • Patent number: 6025252
    Abstract: In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anisotropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.
    Type: Grant
    Filed: August 25, 1997
    Date of Patent: February 15, 2000
    Assignee: Mega Chips Corporation
    Inventors: Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa