Abstract: A software system for use in an electronic control unit (ECU) is designed to facilitate its reuse without redesigning of triggers even when a target hardware is changed. The design of the software system includes a classification of trigger types into two categories, that is, a function trigger and a software trigger, and combination of the function trigger to the software tasks in addition to the association of the function triggers with the software triggers for hardware independent design of the software system.

Abstract: A display device includes: a display part containing a first display region visually recognized by a viewer; an object of view arranged in a second display region; an imaging optical system of real specular image for defining a first space in which the first display region exists and a second space in which the second display region exists, the imaging optical system of real specular image including a semitransparent substrate with a plane of symmetry, the imaging optical system of real specular image forming a real image of the object of view in the first space of the first display region with light passing through the substrate; and a half mirror arranged in the first space of the first display region, the half mirror reflecting light beams emitted from the imaging optical system of real specular image to guide the reflected light beams to the viewer, while allowing an image formed in the first display region to be seen by the viewer.

Abstract: A heat pump apparatus includes: a refrigerant circuit which includes a compressor, an utilization-side heat exchanger, a first expansion valve, and an outdoor heat exchanger; an injection pipe which includes a solenoid switching valve and a second expansion valve; and an objective supercooling degree table which stores objective supercooling degrees according to condensing pressure in the refrigerant circuit and rotation number of the compressor. In the heat pump apparatus, liquid refrigerant is injected to the compressor by way of the injection pipe. The heat pump apparatus switches between a first case where the liquid refrigerant is injected to the compressor and a second case where the liquid refrigerant is not injected, and a value of the objective supercooling degree is changed between the first case and the second case to control the first expansion valve based on the value of the objective supercooling degree.

Abstract: A heat pump apparatus includes: a refrigerant circuit which includes a compressor, a utilization-side heat exchanger for exchanging heat between water and refrigerant, an electronic expansion valve, and an outdoor heat exchanger; a controller which controls the compressor and the electronic expansion valve; a subcooling value calculating unit which calculates a subcooling value of the refrigerant circuit; a condensing pressure detector which detects condensing pressure of the compressor; a compressor rotation number detector which detects rotation number of the compressor; and an objective subcooling value extracting unit which selects and extracting an objective subcooling value stored in advance, from the condensing pressure and the rotation number of the compressor. The controller adjusts an opening degree of the electronic expansion valve so that the calculated subcooling value of the refrigerant circuit reaches the objective subcooling value.

Abstract: A head-up display device placed on an upper surface of a dashboard, includes: an object of view arranged in an inside space of the dashboard; an imaging optical system of real specular image for defining a space where a viewer exists and the inside space of the dashboard, the imaging optical system of real specular image including a semitransparent substrate with a plane of symmetry, the imaging optical system of real specular image forming a real image of the object of view in the space of the viewer with light passing through the substrate; and a reflective screen arranged in the space of the viewer, the reflective screen reflecting light beams of the real image of the object of view supplied from the imaging optical system of real specular image to guide the reflected light beams to the viewer, while allowing formation of an image to be seen by the viewer.

Abstract: To provide a reflective mask blank for EUV lithography having an absorber layer, which presents a low reflectance to a light in the wavelength ranges of EUV light and pattern inspection light, and which is easily controlled to have desired film composition and film thickness. A reflective mask blank for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), boron (B), silicon (Si) and nitrogen (N), and in the absorber layer, the B content is at least 1 at % and less than 5 at %, the Si content is from 1 to 25 at %, and the compositional ratio of Ta to N (Ta:N) is from 8:1 to 1:1.

Abstract: There is provided a process for smoothing a substrate surface having a concave defect, such as a pit or a scratch. A process for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography, comprising disposing a thin film on a glass substrate; detecting a concave defect existing on the glass substrate; and locally heating or locally anodizing a portion of the thin film just above the detected concave defect to perform a chemical reaction accompanied by a volume increase in a material forming the thin film.

Abstract: A printing device includes a printing unit that prints a print-object image corresponding to print data on a recording medium. A placing unit places restriction information on the recording medium if the print data is attached with the first restriction condition. The restriction information is used for attaching a second restriction condition to scanned data that is generated by reading the print-object image printed on the recording medium. The second restriction condition is for placing restrictions on the usage of the scanned data.

Abstract: A print system provided with an information processor and a printer communicably connected to the information processor. The information processor comprises a transmit section for transmitting a plural sets of print data. The printer comprises a receiving section for receiving the print data transmitted from the transmit section; a storage section for storing the print data received by the receiving section; a printing section for printing the print data stored in the storage section; a determination section for determining whether the printing by the printing section is completed or not; and a control section for controlling the printing section not to print the print data transmitted as the second set when the printing of the print data transmitted as the first set is completed, and to print the print data transmitted as the second set when the printing of the print data transmitted as the first set.

Abstract: To provide a sputtering target to be used for production of an EUV mask blank, capable of preventing particles by film peeling even when formation of a reflective multilayer film as a reflective layer and a Ru layer as a protective layer is carried out at a production level using actual machines for a large number of cycles. A sputtering target for forming a ruthenium (Ru) layer in a reflective layer for reflecting EUV light on a substrate, which contains Ru and at least one element selected from the group consisting of boron (B) and zirconium (Zr) in a total content of B and Zr of from 5 at % to 50 at %.

Abstract: An image forming apparatus and an image forming system are provided. An image forming apparatus or system includes a reception unit configured to receive a print job; a print unit configured to execute the print job received by the reception unit to print an image; an adjustment unit configured to execute an image quality adjustment for the printing; a determination unit configured to determine whether an adjustment execution condition is to be met during the execution of the print job; and a control unit configured to execute a priority process which, when the determination unit determines that the adjustment execution condition is to be met, causes the adjustment unit to execute the image quality adjustment before a start of the execution of a condition meeting print job, for which the determination unit determines that the adjustment execution condition is to be met.

Abstract: To provide an EUV mask blank of which the decrease in the reflectance during EUV exposure is suppressed, and a substrate with a functional film to be used for production of such an EUV mask blank. A substrate with a reflective layer for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer formed in this order on the substrate, wherein the protective layer contains ruthenium (Ru) and at least one element selected from the group consisting of boron (B) and zirconium (Zr); and in the protective layer, the Ru content is from 70 at % to 95 at % and the total content of B and Zr is from 5 at % to 30 at %.

Abstract: An image forming apparatus comprises a print section, an accepting section for accepting a print request, and a control section which causes the print section to execute printing on the basis of a print request accepted by the accepting section and judges whether or not the image forming apparatus is busy when a print request is accepted by the accepting section. When the control section judges that the image forming apparatus is busy, the control section prohibits an execution of at least a part of printing based on a print request.

Abstract: A semiconductor optical communication module includes a semiconductor chip mounted on a chip carrier and a lens assembly having an end parallel to and facing the front edge of the chip carrier. The semiconductor chip has a front facet oriented at an acute angle to the front edge of the chip carrier. An optical waveguide in the semiconductor chip transmits an optical signal that propagates on an optical axis extending from the front facet of the semiconductor chip to the end of the lens assembly. The optical axis is orthogonal to the end of the lens assembly and the front edge of the chip carrier. The angled mounting of the semiconductor chip on the chip carrier allows the lens assembly to be placed close to the edge of the chip carrier, and to be moved for optical axis adjustment without striking the chip carrier.

Abstract: A multifunction printer receives a printing job. Then, the MFP acquires items of a printing log that is defined before the printing is started. For example, user name, date/time of execution, and job ID information correspond to the items of the printing log defined before the printing is started. Then, the MFP transmits at least one item of the printing log, which is defined before the printing is started, to the server before the printing is completed.

Abstract: [Problems] To provide a plastic cap having a pouring cylinder capable of pouring the content liquid smoothly maintaining a constant liquid width even in case the degree of inclination of a container is varied to some extent at the time of pouring the content liquid, and of easily adjusting the liquid quantity. [Means for Solution] A bill 20 is formed at an upper end portion of the pouring cylinder 11 provided in a top panel 5 of a cap body 1, the bill 20 protruding outward in an inclined manner, a lower end of the pouring cylinder 11 is forming a seal surface 17 of nearly a cylindrical shape, a groove 30 is formed in the inner surface of the bill 20 in the pouring cylinder 11 and is extending from an upper end portion of the seal surface 17 up to an upper end of the bill 20, and a seal ring 29 is formed on the inner surface of the upper lid 2 so as to come into close contact with the seal surface 17 which is the inner surface of the pouring cylinder 11 when the upper lid 2 is closed.

Abstract: An ultrasonograph capable of generating a transmission beam comprising a main beam having a uniform width over a wide range in an ultrasonic wave propagation direction by one-time transmission of an ultrasonic pulse. A weighted mean value of a plurality of transmission delay time values corresponding to focal lengths of transmission pulse waves having a plurality of focal points which are set in the ultrasonic wave propagation direction is calculated for each of elements constituting a transmission aperture and used as the delay time. The curvature of a transmitted wave front is close to a short focal length in the center portion of the transmit aperture and is close to a long focal length in the peripheral portion. Thus, a transmission beam including a relatively narrow main beam with a uniform width over a wide range in the ultrasonic wave propagation direction can be generated.

Abstract: To provide a substrate with a conductive film for an EUV mask blank having an increased surface hardness, and a substrate with a reflective multilayer film and an EUV mask blank using such a substrate with a conductive film. A substrate with a conductive film to be used for production of a reflective mask blank for EUV lithography, characterized in that the chief material of the conductive film is at least one member selected from the group consisting of Cr, Ti, Zr, Nb, Ni and V, and the conductive film contains B (boron) at an average concentration of from 1 to 70 at %.

Abstract: A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the content of Hf is from 20 to 60 at. % and the content of Ta is from 40 to 80 at. %, and wherein the absorber layer has a content of N being 0 to at most 35 at. %.

Abstract: To provide a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness. A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the content of Hf is from 20 to 60 at. % and the content of Ta is from 40 to 80 at. %.