Patents by Inventor Takashi Sugiyama

Takashi Sugiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • DEVICE FOR SETTING COLOR PRINT LIMIT MODE ACCORDING TO PREFERENCE SET ON PER-PAGE BASIS
    Publication number: 20100110458
    Abstract: An image processing system includes a preference designating unit and a printer. The preference designating unit is configured to designate one or more preferential print pages from pages included in a print job so as to be color printed preferentially to non-designated pages included in the print job. The printer performs color printing of the one or more preferential print pages.
    Type: Application
    Filed: October 23, 2009
    Publication date: May 6, 2010
    Applicant: BROTHER KOGYO KABUSHIKI KAISHA
    Inventor: Takashi Sugiyama
  • Gas pedal
    Patent number: 7703351
    Abstract: An accelerator pedal (100) includes a stopper member (30) fixed to the floor of the driver's seat, a pad member (20) fastened to the stopper member (30) and operated by the driver's depression force, an arm (4) engaged with the pad member (20) to transmit the depression force, and a bracket (5) engaged with the arm (4) to support the arm (4), wherein the stopper member (30) is provided with a pad fitting section (17) for fastening the pad member (20), and the pad member (20) is integrally molded by a single resin material.
    Type: Grant
    Filed: August 27, 2003
    Date of Patent: April 27, 2010
    Assignees: Honda Motor Co., Ltd., F-Tech Inc.
    Inventors: Tomohiro Sakuraba, Hideto Nebuya, Takashi Sugiyama, Shigeki Nomura, Koji Terasaki, Teruo Kato, Toshimi Kitamura, Tomoaki Abe, Yoshio Abe, legal representative
  • Monochromatic liquid crystal display with high contrast
    Patent number: 7667814
    Abstract: An STN liquid crystal display cell includes a liquid crystal layer sandwiched between a first and second transparent substrate, is outwardly provided with a first and second polarizers, and a monochromatic back light. Twist angle of the liquid crystal layer is 95° to 170° or 200° to 280°; a first angle between alignment direction of liquid crystal molecules contacting the first transparent substrate and polarization direction of the first polarizer and a second angle between an alignment direction of liquid crystal molecules contacting the second transparent substrate and polarization direction of the second polarizer are each larger than 0° and smaller than 90°; and sum of the first and second angles is 90°±7°.
    Type: Grant
    Filed: May 27, 2008
    Date of Patent: February 23, 2010
    Assignee: Stanley Electric Co., Ltd.
    Inventor: Takashi Sugiyama
  • REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
    Publication number: 20100035165
    Abstract: Provision of a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in the wavelength regions of EUV light and pattern inspection light and whose film composition and film thickness are easily controllable to desired ones. A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), boron (B) and silicon (Si), and in the absorber layer, the content of B is at least 1 at. % and less than 5 at. % and the content of Si is from 1 to 25 at. %, and wherein the absorber layer contains no nitrogen (N) or at most 10 at. % of N.
    Type: Application
    Filed: October 14, 2009
    Publication date: February 11, 2010
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: KAZUYUKI HAYASHI, KAZUO KADOWAKI, MASAKI MIKAMI, TAKASHI SUGIYAMA
  • MONOCHROMATIC LIQUID CRYSTAL DISPLAY
    Publication number: 20090322668
    Abstract: A liquid crystal display comprises a back light emitting monochromatic light, a liquid crystal display element comprising, a pair of opposing substrates, a nematic liquid crystal layer placed between the pair of opposing substrates, an electrode pattern formed on a nematic liquid crystal layer side of each substrate, a pair of polarizers placed outside the pair of substrates, and a controller which controls light emission of the back light and a voltage applied to the liquid crystal display element, wherein the controller restrain change in retardation of the liquid crystal display element by lowering non-selection voltage applied to the liquid crystal display element when environmental temperature increases and increasing non-selection voltage applied to the liquid crystal display element when environmental temperature decreases.
    Type: Application
    Filed: June 22, 2009
    Publication date: December 31, 2009
    Applicant: Stanley Electric Co., Ltd.
    Inventor: Takashi SUGIYAMA
  • PROCESS FOR SMOOTHING SURFACE OF GLASS SUBSTRATE
    Publication number: 20090286166
    Abstract: There is provided a process for smoothing a substrate surface having a concave defect, such as a pit or a scratch. A process for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography, comprising disposing a thin film on a glass substrate; detecting a concave defect existing on the glass substrate; and locally heating or locally anodizing a portion of the thin film just above the detected concave defect to perform a chemical reaction accompanied by a volume increase in a material forming the thin film.
    Type: Application
    Filed: May 16, 2008
    Publication date: November 19, 2009
    Applicant: Asahi Glass Company, Limited
    Inventors: Takashi SUGIYAMA, Yoshiaki IKUTA, Masabumi ITO
  • Image Forming System and Image Forming Apparatus
    Publication number: 20090268225
    Abstract: An image forming system includes an information processing unit, an image forming apparatus that communicates with the information processing unit, a first memory unit that stores setting information of printing restriction on the image forming apparatus, a printing unit that executes a printing process of a print job in accordance with the setting information, a detection unit that detects a change request of the setting information, a job judging unit that judges whether there exists a print job in processing when the detection unit detects the change request, and a first permitting unit that permits change of the setting information in accordance with the change request when the job judging unit judges that there exists no print job in processing.
    Type: Application
    Filed: March 6, 2009
    Publication date: October 29, 2009
    Applicant: Brother Kogyo Kabushiki Kaisha
    Inventor: Takashi SUGIYAMA
  • REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND SUBSTRATE WITH FUNCTIONAL FILM FOR THE MASK BLANK
    Publication number: 20090253055
    Abstract: Provided are a substrate with a conductive film for an EUV mask blank in which the generation of particles due to abrasion between an electrostatic chuck and the substrate is prevented; and a substrate with a multilayer reflective film and an EUV mask blank each employing such a substrate with a conductive film. A substrate with a conductive film to be used for producing a reflective mask blank for EUV lithography, the conductive film containing chromium (Cr) and nitrogen (N), the average concentration of N in the conductive film being at least 0.1 atomic % and less than 40 atomic %, the crystal state of at least a surface of the conductive film being amorphous, the sheet resistance of the conductive film being at most 27 ?/?, and the surface roughness (rms) of the conductive film being at most 0.5 nm.
    Type: Application
    Filed: June 12, 2009
    Publication date: October 8, 2009
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama
  • LIQUID CRYSTAL DISPLAY APPARATUS
    Publication number: 20090225257
    Abstract: A liquid crystal display apparatus includes: a vertical alignment type liquid crystal cell including a first substrate formed with a first electrode, a second substrate formed with a second electrode, and a liquid crystal layer containing liquid crystal molecules given a pretilt angle; a pair of polarizer plates sandwiching the cell; and a driver device for applying a voltage of a multiplex driving waveform across the first and second electrodes, wherein in a display in-plane parallel to a surface of the first or second substrate, at least one of the first and second electrodes has a zigzag border alternately coupling a first border perpendicular to display in-plane components of directors of liquid crystal molecules in a middle area along a thickness direction of the liquid crystal layer in the absence of applied voltage and a second border extending along a direction crossing the first boarder.
    Type: Application
    Filed: March 4, 2009
    Publication date: September 10, 2009
    Applicant: STANLEY ELECTRIC CO., LTD.
    Inventors: Takashi Sugiyama, Masatoshi Horii
  • VEHICLE SHIFT LEVER SYSTEM AND METHOD
    Publication number: 20090165590
    Abstract: A shift lever assembly for a vehicle transmission can include an escutcheon body having a first guide rail and a second guide rail where the first and second guide rails are spaced apart from each other and are substantially parallel to each other. A slider body can be provided and can be movable with respect to the escutcheon body and include at least one spring member. The at least one spring member can include a contact structure, and a compression force can be applied via the contact structure to maintain the contact structure in compression with the guide rails.
    Type: Application
    Filed: March 19, 2008
    Publication date: July 2, 2009
    Inventors: TAKASHI SUGIYAMA, Alan Cheung
  • VEHICLE SHIFTER MOUNTING BRACKET SYSTEM AND METHOD
    Publication number: 20090166486
    Abstract: A shifter mounting bracket assembly is disclosed which can include an L-shaped flange body and an extension body extending from the L-shaped flange body. The extension body can include a first opening defined by at least one C-shaped extension portion and a second opening defined by the at least one C-shaped extension portion. The openings and C-shaped extension portions can be configured to provide a stress zone that is deformable when impact forces are applied to the shifter assembly. The extension body can have an L-shape and can be connected to the shifter assembly, while the L-shaped flange body is connected to the interior of the vehicle to hold the shifter assembly in place in the vehicle.
    Type: Application
    Filed: March 26, 2008
    Publication date: July 2, 2009
    Inventors: TAKASHI SUGIYAMA, Alan Cheung
  • SPUTTERING TARGET USED FOR PRODUCTION OF REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
    Publication number: 20090130574
    Abstract: To provide a sputtering target to be used for production of an EUV mask blank, capable of preventing particles by film peeling even when formation of a reflective multilayer film as a reflective layer and a Ru layer as a protective layer is carried out at a production level using actual machines for a large number of cycles. A sputtering target for forming a ruthenium (Ru) layer in a reflective layer for reflecting EUV light on a substrate, which contains Ru and at least one element selected from the group consisting of boron (B) and zirconium (Zr) in a total content of B and Zr of from 5 at % to 50 at %.
    Type: Application
    Filed: January 14, 2009
    Publication date: May 21, 2009
    Applicant: Asahi Glass Company, Limited
    Inventors: Kazuyuki Hayashi, Takashi Sugiyama
  • LIQUID CRYSTAL DISPLAY UNIT
    Publication number: 20090086132
    Abstract: A liquid crystal display unit has: a pair of opposing substrates; an electrode pattern formed on each of the substrates on an opposing surface side; a vertical alignment film formed on each of the substrates and covering the electrode pattern; a liquid crystal layer squeezed between the substrates; and a pair of polarizer plates formed on the substrates on an opposite side to the side of said liquid crystal layer, wherein an edge of the electrode pattern includes a zigzag pattern parallel to one of axis directions of the polarizer plates and a direction perpendicular the axis direction. Optical through can be reduced along an edge portion of a pixel of a vertical alignment LCD.
    Type: Application
    Filed: September 25, 2008
    Publication date: April 2, 2009
    Applicant: Stanley Electric Co., Ltd.
    Inventors: Masatoshi Horii, Takashi Sugiyama, Yoshihisa Iwamoto, Keiichi Hirata
  • MONOCHROMATIC LIQUID CRYSTAL DISPLAY WITH HIGH CONTRAST RATIO
    Publication number: 20090033828
    Abstract: An STN liquid crystal display, wherein a twist angle of liquid crystal molecules of the liquid crystal layer is 155° to 210°, and a first angle between a polarizing axis direction of the first polarizer and an alignment direction of liquid crystal molecules of the liquid crystal layer in contact with the first transparent substrate and a second angle between a polarizing axis direction of the second polarizer and an alignment direction of liquid crystal molecules of the liquid crystal layer in contact with the second transparent substrate are each larger than 0° and smaller than 90°, and a sum of the first and second angles is 90°±7°. The STN liquid crystal display is provided having a high contrast ratio and good characteristics of viewing angle.
    Type: Application
    Filed: July 3, 2008
    Publication date: February 5, 2009
    Applicant: Stanley Electric Co., Ltd.
    Inventor: Takashi SUGIYAMA
  • REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
    Publication number: 20090011341
    Abstract: To provide a reflective mask blank for EUV lithography having an absorber layer, which presents a low reflectance to a light in the wavelength ranges of EUV light and pattern inspection light, and which is easily controlled to have desired film composition and film thickness. A reflective mask blank for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), boron (B), silicon (Si) and nitrogen (N), and in the absorber layer, the B content is at least 1 at % and less than 5 at %, the Si content is from 1 to 25 at %, and the compositional ratio of Ta to N (Ta:N) is from 8:1 to 1:1.
    Type: Application
    Filed: September 8, 2008
    Publication date: January 8, 2009
    Applicant: ASAHI GLASS CO., LTD.
    Inventors: Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama, Masaki Mikami
  • REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH FUNCTIONAL FILM FOR THE SAME
    Publication number: 20080318140
    Abstract: To provide an EUV mask blank of which the decrease in the reflectance during EUV exposure is suppressed, and a substrate with a functional film to be used for production of such an EUV mask blank. A substrate with a reflective layer for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer formed in this order on the substrate, wherein the protective layer contains ruthenium (Ru) and at least one element selected from the group consisting of boron (B) and zirconium (Zr); and in the protective layer, the Ru content is from 70 at % to 95 at % and the total content of B and Zr is from 5 at % to 30 at %.
    Type: Application
    Filed: August 27, 2008
    Publication date: December 25, 2008
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama, Masaki Mikami
  • MONOCHROMATIC LIQUID CRYSTAL DISPLAY WITH HIGH CONTRAST
    Publication number: 20080304001
    Abstract: An STN liquid crystal display cell includes a liquid crystal layer sandwiched between a first and second transparent substrate, is outwardly provided with a first and second polarizers, and a monochromatic back light. Twist angle of the liquid crystal layer is 95° to 170° or 200° to 280°; a first angle between alignment direction of liquid crystal molecules contacting the first transparent substrate and polarization direction of the first polarizer and a second angle between an alignment direction of liquid crystal molecules contacting the second transparent substrate and polarization direction of the second polarizer are each larger than 0° and smaller than 90°; and sum of the first and second angles is 90°±7°.
    Type: Application
    Filed: May 27, 2008
    Publication date: December 11, 2008
    Applicant: Stanley Electric Co., Ltd.
    Inventor: Takashi SUGIYAMA
  • Mobile digital devices
    Patent number: 7444163
    Abstract: A mobile digital device comprises a ten-key pad being comprised of a key mat 21 on which ten-key buttons 21a-21c with respective projections 21aa-21cc on the under surfaces thereof are laid out and a key circuit board on which respective contacts 22a-22c corresponding to the projections are laid out, an electrostatic capacity sensing pad 30 for sensing an electrostatic capacity change to detect a touched region and having through holes to be inserted the projections corresponding thereto and being provided with between the key mat 21 and the key circuit board 22, and a controller for selecting a function corresponded to a feature of the touched region detected by the electrostatic capacity sensing pad and executing the selected function. Owing to such constructions, a desired function can be selected by way of finger touching to the mobile digital device.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: October 28, 2008
    Assignee: Sanyo Electric Co., Ltd
    Inventors: Takeshi Ban, Atsushi Furukawa, Akiko Inami, Yachiyo Itou, Takashi Sugiyama, Noriyoshi Usui, Masao Nakada
  • REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
    Publication number: 20080199787
    Abstract: To provide a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness. A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the content of Hf is from 20 to 60 at. % and the content of Ta is from 40 to 80 at. %.
    Type: Application
    Filed: February 7, 2008
    Publication date: August 21, 2008
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama
  • REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
    Publication number: 20080182183
    Abstract: To provide a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness. A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the content of Hf is from 20 to 60 at. % and the content of Ta is from 40 to 80 at. %, and wherein the absorber layer has a content of N being 0 to at most 35 at. %.
    Type: Application
    Filed: February 8, 2008
    Publication date: July 31, 2008
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama