Patents by Inventor Takatoshi Yamada
Takatoshi Yamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11964488Abstract: A recording apparatus includes a first absorbing member (extended absorbing member or the like) that absorbs a liquid discarded from a discharge head to an outer side of an end portion of a medium supported by a support section as a waste liquid. The recording apparatus includes a second absorbing member (waste liquid absorbing member) that absorbs the waste liquid sent from a cap, an accommodating section (waste liquid box) that holds the second absorbing member, and a delivery section that delivers the liquid between the first absorbing member and the second absorbing member. In a state where the accommodating section is inserted into an apparatus main body, the delivery section 141 is inclined downward from the first absorbing member toward the second absorbing member, and an inclination of the delivery section when the accommodating section is removed from the apparatus main body varies depending on an inserted state.Type: GrantFiled: October 26, 2021Date of Patent: April 23, 2024Assignee: Seiko Epson CorporationInventors: Katsumi Yamada, Takatoshi Yamazaki
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Patent number: 11964490Abstract: A recording apparatus includes a discard absorbing member (first absorbing member) that absorbs a liquid discarded from a discharge head to an outer side of an end portion of a medium supported by a support section as a waste liquid. Further, the recording apparatus includes: a cap which is an example of a waste liquid receiving section that receives the liquid ejected from the discharge head as a waste liquid; a waste liquid absorbing member (second absorbing member) that absorbs the waste liquid sent from the cap; and a waste liquid box (accommodating section) that holds the waste liquid absorbing member. The discard absorbing member and the waste liquid absorbing member 50A are coupled to each other such that the waste liquid can be delivered from the discard absorbing member to the waste liquid absorbing member.Type: GrantFiled: October 26, 2021Date of Patent: April 23, 2024Assignee: Seiko Epson CorporationInventors: Katsumi Yamada, Takatoshi Yamazaki
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Publication number: 20240117346Abstract: In an embodiment, an object of the present invention is to provide a double-stranded nucleic acid complex having a novel structure. In an embodiment, the present invention relates to a nucleic acid complex comprising a first nucleic acid strand and a second nucleic acid strand, wherein said first nucleic acid strand: (1) is capable of hybridizing to at least a part of a target transcriptional product; (2) has an antisense effect on the target transcriptional product; and (3) is a gapmer comprising a central region, and a 5? wing region and a 3? wing region, said second nucleic acid strand comprises at least one sugar-unmodified central region (first exposed region) consisting of one sugar-unmodified ribonucleoside or two or three contiguous sugar-unmodified ribonucleosides linked by an internucleoside bond, which is or are complementary to a part of said first nucleic acid strand, and said first nucleic acid strand is annealed to said second nucleic acid strand.Type: ApplicationFiled: October 9, 2020Publication date: April 11, 2024Applicants: National University Corporation Tokyo Medical and Dental University, Takeda Pharmaceutical Company LimitedInventors: Takanori Yokota, Tetsuya Nagata, Hiroki Yamada, Hideki Furukawa, Takatoshi Yogo, Kenichi Miyata, Akio Uchida, Naoki Tomita
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Patent number: 11460710Abstract: Ununiformity of a light intensity of a laser beam is appropriately reduced. An optical element receives a laser beam having a light intensity distribution and provides wavefront aberration of the received laser beam in a first direction orthogonal to a traveling direction larger than a diffraction limit, and provides wavefront aberration of the received laser beam in a second direction orthogonal to the traveling direction and the first direction equal to or smaller than the diffraction limit.Type: GrantFiled: November 9, 2017Date of Patent: October 4, 2022Assignee: AYASE CO., LTD.Inventor: Takatoshi Yamada
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Publication number: 20200241309Abstract: Ununiformity of a light intensity of a laser beam is appropriately reduced. An optical element receives a laser beam having a light intensity distribution and provides wavefront aberration of the received laser beam in a first direction orthogonal to a traveling direction larger than a diffraction limit, and provides wavefront aberration of the received laser beam in a second direction orthogonal to the traveling direction and the first direction equal to or smaller than the diffraction limit.Type: ApplicationFiled: November 9, 2017Publication date: July 30, 2020Inventor: Takatoshi YAMADA
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Patent number: 9989687Abstract: A wave plate capable of increasing a birefringence quantity and being made into a thin film, and a method of manufacturing the wave plate. The wave plate includes a substrate, whereon convex portions and concave portions are formed with a period less than or equal to the wavelength of light that is used therewith, columnar portions, wherein fine grains of a dielectric material are layered by oblique vapor deposition of a dielectric material from two directions, in a columnar shape on the convex portions in the vertical direction relative to the surface of the substrate, and interstices that are located on the concave portions and disposed between the columnar portions. Using birefringence from the fine grains of the dielectric material and birefringence from the concave/convex portions of the substrate allows increasing the birefringence quantity and making a thin film.Type: GrantFiled: May 25, 2010Date of Patent: June 5, 2018Assignee: DEXERIALS CORPORATIONInventors: Akio Takada, Takatoshi Yamada, Nobuyuki Koike, Masatoshi Sasaki, Kazuyuki Shibuya
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Patent number: 9746206Abstract: Provided are a heat-absorbing material having high heat resistance and high wavelength selectivity, and a process for producing the same. The heat-absorbing material includes: a heat-resistant metal having the substantially same periodic structure in the light incidence plane as the wavelength of sunlight having a specific wavelength in the wavelength regions of visible light and near-infrared rays; and a cermet formed on the light incidence plane of the heat-resistant metal. Thus, there can be achieved desirable absorption and radiation characteristics being such that absorption is performed in the visible light region meanwhile reflection is performed in the infrared region. Furthermore, the cermet does not need complicated film-formation control, and therefore, the high heat resistance can be maintained.Type: GrantFiled: May 1, 2013Date of Patent: August 29, 2017Assignee: DEXERIALS CORPORATIONInventors: Takatoshi Yamada, Akio Takada, Hiroo Yugami, Fumitada Iguchi, Makoto Shimizu
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Patent number: 9156699Abstract: A technique for forming graphene which solves problems involved in formation of graphene by a thermal CVD method and a resin carbonization method that a high temperature is used and the treatment time is long and can form graphene at a lower temperature in a shorter time is provided. The above problems are solved by performing hydrogen plasma treatment on a copper foil substrate having an organic substance applied thereon by use of a surface wave microwave plasma treatment device and forming graphene on the copper foil substrate by the hydrogen plasma treatment.Type: GrantFiled: August 9, 2013Date of Patent: October 13, 2015Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: Takatoshi Yamada, Jaeho Kim, Masatou Ishihara, Yoshinori Koga, Masataka Hasegawa, Sumio Iijima
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Publication number: 20150219804Abstract: A heat radiation control element 11, which contains an inorganic layer 21 a surface of which has openings arranged two-dimensionally, and a reflecting film 22.Type: ApplicationFiled: February 3, 2015Publication date: August 6, 2015Inventors: Takatoshi Yamada, Koji Sasaki, Akio Takada, Yusuke Matsuno
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Publication number: 20150132596Abstract: Provided are a heat-absorbing material having high heat resistance and high wavelength selectivity, and a process for producing the same. The heat-absorbing material includes: a heat-resistant metal having the substantially same periodic structure in the light incidence plane as the wavelength of sunlight having a specific wavelength in the wavelength regions of visible light and near-infrared rays; and a cermet formed on the light incidence plane of the heat-resistant metal. Thus, there can be achieved desirable absorption and radiation characteristics being such that absorption is performed in the visible light region meanwhile reflection is performed in the infrared region. Furthermore, the cermet does not need complicated film-formation control, and therefore, the high heat resistance can be maintained.Type: ApplicationFiled: May 1, 2013Publication date: May 14, 2015Inventors: Takatoshi Yamada, Akio Takada, Hiroo Yugami, Fumitada Iguchi, Makoto Shimizu
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Patent number: 8845852Abstract: A polishing pad enabling a highly precise optical endpoint sensing during the polishing process and thus having excellent polishing characteristics (such as surface uniformity and in-plane uniformity) is disclosed. A polishing pad enabling to obtain the polishing profile of a large area of a wafer is also disclosed. A polishing pad of a first invention comprises a light-transmitting region having a transmittance of not less than 50% over the wavelength range of 400 to 700 nm. A polishing pad of a second invention comprises a light-transmitting region having a thickness of 0.5 to 4 mm and a transmittance of not less than 80% over the wavelength range of 600 to 700 nm. A polishing pad of a third invention comprises a light-transmitting region arranged between the central portion and the peripheral portion of the polishing pad and having a length (D) in the diametrical direction which is three times or more longer than the length (L) in the circumferential direction.Type: GrantFiled: November 27, 2003Date of Patent: September 30, 2014Assignee: Toyo Tire & Rubber Co., Ltd.Inventors: Masahiko Nakamori, Tetsuo Shimomura, Takatoshi Yamada, Kazuyuki Ogawa, Atsushi Kazuno, Masahiro Watanabe
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Patent number: 8842365Abstract: A phase difference element capable of reducing reflection of incident light and a manufacturing method for the phase difference element are disclosed. The phase difference element includes a transparent substrate 11, an interface anti-reflection film group 12 and an obliquely vapor deposited film 13. The interface anti-reflection film group is composed by one or more of alternately high and low refractive index films, with the film thicknesses of the respectively films being equal to or less than the wavelength of light in use. The obliquely vapor deposited film is formed by a plurality of layers of a dielectric material. These layers are alternately obliquely vapor deposited from two directions differing by 180° from each other. The refractive index of the interface anti-reflection film group 12 is higher than the refractive index of the transparent substrate 11 and lesser than that of the obliquely vapor deposited film 13.Type: GrantFiled: May 16, 2012Date of Patent: September 23, 2014Assignee: Dexerials CorporationInventors: Nobuyuki Koike, Masatoshi Sasaki, Naoki Hanashima, Akio Takada, Takatoshi Yamada
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Patent number: 8779020Abstract: A polishing pad generates very few scratches on a surface of a polishing object, and is excellent in planarization property. The polishing pad has a high polishing rate and is excellent in planarization property. The polishing pad grooves become very little clogged with abrasive grains or polishing swarf during polishing and, even when continuously used for a long period of time, the polishing rate is scarcely reduced.Type: GrantFiled: September 7, 2012Date of Patent: July 15, 2014Assignee: Toyo Tire & Rubber Co., Ltd.Inventors: Atsushi Kazuno, Kazuyuki Ogawa, Masahiko Nakamori, Takatoshi Yamada, Tetsuo Shimomura
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Patent number: 8735907Abstract: In a semiconductor diamond device, there is provided an ohmic electrode that is chemically and thermally stable and has an excellent low contact resistance and high heat resistance. A nickel-chromium alloy, or a nickel-chromium compound, containing Ni and Cr such as Ni6Cr2 or Ni72Cr18Si10, which is chemically and thermally stable, is formed on a semiconductor diamond by a sputtering process and so forth, to thereby obtain the semiconductor diamond device provided with an excellent ohmic electrode. If heat treatment is applied after forming the nickel-chromium alloy or compound, it is improved in characteristics.Type: GrantFiled: July 21, 2010Date of Patent: May 27, 2014Assignee: National Institute of Advanced Industrial Science and TechnologyInventors: Takatoshi Yamada, Somu Kumaragurubaran, Shinichi Shikata
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Publication number: 20140065426Abstract: The invention addresses the problem of prior methods, which formed a binder layer on a graphene film, that the shape of the substrate surface was transferred to the graphene layer. The purpose is to provide a technique for forming less cloudy, highly transparent conductive film laminates. The invention solves the problem, in methods that manufacture transparent conductive carbon films by forming a transparent conductive carbon film on a film forming substrate using the CVD method and then removing said film forming substrate from said transparent conductive carbon film, by preparing a film having an adhesive surface and providing a process of gluing the adhesive surface of said film to a portion and/or all of the surface of the transparent conductive carbon film prior to removal of the film forming substrate.Type: ApplicationFiled: November 5, 2013Publication date: March 6, 2014Applicant: National Institute of Advanced Industrial Science And TechnologyInventors: Masatou ISHIHARA, Takatoshi YAMADA, Yoshinori KOGA, Masataka HASEGAWA, Jaeho KIM
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Publication number: 20130327981Abstract: A technique for forming graphene which solves problems involved in formation of graphene by a thermal CVD method and a resin carbonization method that a high temperature is used and the treatment time is long and can form graphene at a lower temperature in a shorter time is provided. The above problems are solved by performing hydrogen plasma treatment on a copper foil substrate having an organic substance applied thereon by use of a surface wave microwave plasma treatment device and forming graphene on the copper foil substrate by the hydrogen plasma treatment.Type: ApplicationFiled: August 9, 2013Publication date: December 12, 2013Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: Takatoshi YAMADA, Jaeho KIM, Masatou ISHIHARA, Yoshinori KOGA, Masataka HASEGAWA, Sumio IIJIMA
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Patent number: 8530535Abstract: A polishing pad generates very few scratches on a surface of a polishing object, and is excellent in planarization property. The polishing pad has a high polishing rate and is excellent in planarization property. The polishing pad grooves become very little clogged with abrasive grains or polishing swarf during polishing and, even when continuously used for a long period of time, the polishing rate is scarcely reduced.Type: GrantFiled: May 13, 2011Date of Patent: September 10, 2013Assignee: Toyo Tire & Rubber Co., Ltd.Inventors: Atsushi Kazuno, Kazuyuki Ogawa, Masahiko Nakamori, Takatoshi Yamada, Tetsuo Shimomura
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Patent number: 8529696Abstract: A method for producing hexagonal boron nitride single crystals including mixing boron nitride crystals with a solvent thereby obtaining a mixture, heating and melting the mixture under high-temperature and high-pressure thereby obtaining a melted mixture, and recrystallizing the melted mixture thereby producing hexagonal boron nitride single crystals, wherein the solvent is boronitride of alkaline earth metal, or boronitride of alkali metal and the boronitride of alkaline earth metal.Type: GrantFiled: July 30, 2012Date of Patent: September 10, 2013Assignee: National Institute for Materials ScienceInventors: Kenji Watanabe, Takashi Taniguchi, Satoshi Koizumi, Hisao Kanda, Masayuki Katagiri, Takatoshi Yamada, Nesladek Milos
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Publication number: 20130177717Abstract: To produce a wavelength plate that is superior in durability and stability and has a high moisture resistant property. A dielectric material is obliquely vapor deposited on a substrate so as to form a birefringent layer that has columnar portions in each of which fine particles of the dielectric material are stacked in a columnar shape, and interstices that are respectively formed between the columnar portions, and the birefringent layer is subjected to an annealing treatment at a temperature within the range of 100° C. or more to 300° C. or less. Then, a protective film with low moisture permeability is formed on the annealed birefringent layer by forming an inorganic compound on the birefringent layer at high density.Type: ApplicationFiled: June 23, 2011Publication date: July 11, 2013Applicant: DEXERIALS CORPORATIONInventors: Nobuyuki Koike, Takatoshi Yamada, Akio Takada, Masatoshi Sasaki
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Publication number: 20130135727Abstract: A wave plate capable of increasing a birefringence quantity and being made into a thin film, and a method of manufacturing the wave plate. The wave plate includes a substrate, whereon convex portions and concave portions are formed with a period less than or equal to the wavelength of light that is used therewith, columnar portions, wherein fine grains of a dielectric material are layered by oblique vapor deposition of a dielectric material from two directions, in a columnar shape on the convex portions in the vertical direction relative to the surface of the substrate, and interstices that are located on the concave portions and disposed between the columnar portions. Using birefringence from the fine grains of the dielectric material and birefringence from the concave/convex portions of the substrate allows increasing the birefringence quantity and making a thin film.Type: ApplicationFiled: May 25, 2010Publication date: May 30, 2013Applicant: DEXERIALS CORPORATIONInventors: Akio Takada, Takatoshi Yamada, Nobuyuki Koike, Masatoshi Sasaki, Kazuyuki Shibuya