Abstract: The invention provides a film formation apparatus that includes: a transfer unit that transfers a substrate; a film formation unit that forms an electrolyte film on a film formation region of the substrate transferred by the transfer unit; and an extraneous-material removal unit that comes into contact with the electrolyte film of the substrate transferred by the transfer unit after film formation of the film formation unit and thereby removes extraneous materials contained in the film formation region.

Abstract: An endoscope includes a prism disposed in a distal end portion of an insertion section and configured to change a direction of a field of view in an upward, downward, leftward, or rightward direction, an operation lever disposed in an operation section, being turnable from a neutral position around a third axis and a fourth axis that are perpendicular to each other, and including a second longitudinal axis, a cylindrical member disposed such that turning around a fourth axis of the lever is transmitted and configured to turn around the fourth axis by inclining the operation lever, a transmission wire configured to transmit turning around a first axis to the prism in response to an inclination operation around the third axis of the lever, and gears configured to transmit turning around a second axis to the prism in response to a turning operation around the fourth axis.

Abstract: An endoscope includes an insertion section configured to be inserted into a subject, an operation section configured to be consecutively provided on a proximal end side of the insertion section, a rigid partition wall provided inside the insertion section or inside the operation section and configured to maintain watertightness between a first space including an inside of the insertion section and a second space formed on a distal end side of the first space, and a first check valve provided in the partition wall and configured to block circulation of gas from the second space to the first space and circulate gas from the first space to the second space.

Abstract: An endoscope includes a prism disposed in a distal end portion of an insertion section and configured to change a direction of a field of view in an upward, downward, leftward, or rightward direction, an operation lever disposed in an operation section, being turnable from a neutral position around a third axis and a fourth axis that are perpendicular to each other, and including a second longitudinal axis, a cylindrical member disposed such that turning around a fourth axis of the lever is transmitted and configured to turn around the fourth axis by inclining the operation lever, a transmission wire configured to transmit turning around a first axis to the prism in response to an inclination operation around the third axis of the lever, and gears configured to transmit turning around a second axis to the prism in response to a turning operation around the fourth axis.

Abstract: An endoscope includes an insertion section configured to be inserted into a subject, an operation section configured to be consecutively provided on a proximal end side of the insertion section, a rigid partition wall provided inside the insertion section or inside the operation section and configured to maintain watertightness between a first space including an inside of the insertion section and a second space formed on a distal end side of the first space, and a first check valve provided in the partition wall and configured to block circulation of gas from the second space to the first space and circulate gas from the first space to the second space.

Abstract: Provided is a film-forming apparatus capable of cleaning a discharge apparatus under a state in which a film-forming space and a cleaning gas ambience are separated from each other while continuing to form a film on an object to be film-formed having a film-like shape.

Abstract: Provided is a low-cost vacuum processing apparatus which enables the miniaturization of the apparatus and achieves good productivity. An elongated sheet base material is transported through a vacuum processing chamber, and predetermined processing is performed on the sheet base material in this vacuum processing chamber. The vacuum processing chamber is provided with a single processing unit, and has an auxiliary vacuum chamber provided in continuation with the vacuum processing chamber. The auxiliary vacuum chamber is provided with a feed roller and a take-up roller. The vacuum processing apparatus includes a pair of first roller units provided on opposite sides across the processing unit in the vacuum processing chamber. Each of the first roller units has multiple rollers disposed at regular distances. The rollers are deviated from each other in the axial direction and arranged in such a staggered manner that the sheet base material is helically wound around the rollers.

Abstract: The present invention forms an organic thin film at a high film formation rate by vapor of an organic compound generated by heating. A film formation chamber is disposed in the interior of a buffer chamber; a part of the side surface of a center roller is inserted in the film formation chamber from a film formation chamber opening; and a base material film is run in close contact with the side surface in the part. The vapor is carried by a carrier gas from a vapor generation device connected to the film formation chamber; the center roller is cooled by a cooling device; the base material film is cooled to temperatures lower than the condensation temperature of the vapor; and an organic raw material layer is formed on the surface of the base material film by the vapor discharged into the film formation chamber, which is cured by the irradiation with an energy ray in the curing chamber while rotating the center roller.

Abstract: The present invention is to provide a technology for forming an organic compound film having a uniform thickness on a film at a high film formation speed while transporting the film in a vacuum chamber. In a vacuum chamber, a film reeled out from a mother roll is transported in contact with a center roller and an organic compound film is formed on the film. A vapor emission device disposed in a film deposition chamber provided in the vacuum chamber and having a vapor emission unit which emits and blows a vapor of an organic compound monomer to a film on the center roller, and an energy ray-emitting device for irradiating an organic compound monomer layer formed on the center roller with an energy ray so as to cure the organic compound layer are provided.

Abstract: Provided is a film-forming apparatus capable of cleaning a discharge apparatus under a state in which a film-forming space and a cleaning gas ambience are separated from each other while continuing to form a film on an object to be film-formed having a film-like shape.

Abstract: A take-up vacuum processing apparatus includes a chamber, a roller-shaped first electrode rotatably disposed within the chamber, a gas supply unit including a second electrode, and a third electrode. The first electrode causes the flexible processing target to travel by rotating. The third electrode is connected to an alternating-current source and does not contact the first electrode. An alternating-current voltage of the alternating-current source is applied between the third electrode and the first electrode. The chamber includes a divider plate for separating the chamber into a first room in which the second electrode is arranged and a second room in which the third electrode is arranged. Pressures of the first and second rooms are individually adjusted, such that plasma can be generated between the first electrode and the second electrode, and such that anomalous discharge is not generated between the first electrode and the third electrode.

Abstract: Provided is a low-cost vacuum processing apparatus which enables the miniaturization of the apparatus and achieves good productivity. An elongated sheet base material is transported through a vacuum processing chamber, and predetermined processing is performed on the sheet base material in this vacuum processing chamber. The vacuum processing chamber is provided with a single processing unit, and has an auxiliary vacuum chamber provided in continuation with the vacuum processing chamber. The auxiliary vacuum chamber is provided with a feed roller and a take-up roller. The vacuum processing apparatus includes a pair of first roller units provided on opposite sides across the processing unit in the vacuum processing chamber. Each of the first roller units has multiple rollers disposed at regular distances. The rollers are deviated from each other in the axial direction and arranged in such a staggered manner that the sheet base material is helically wound around the rollers.

Abstract: [Object] To provide a take-up vacuum processing apparatus that prevents breakage due to heat generation and occurrence of dielectric breakdown and is suitable for life extension. [Solving Means] An RF electrode (6) is arranged in a vacuum chamber (15). Therefore, for example, compared to the case where a rotation introduction unit such as a capacitor coupling is arranged in an atmospheric pressure, the occurrence of dielectric breakdown between a roller electrode (18) and the RF electrode (6) can be prevented if the inside of the vacuum chamber (15) is maintained in a predetermined degree of vacuum. Further, there are caused no problems of breakage due to heat generation in a conventional rotation introduction unit such as a rotary connector.

Abstract: The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33, 34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37).

Abstract: [Object] To enable a deposition area of a base film to be protected and realize stable film traveling performance. [Solving Means] A roll-to-roll vacuum deposition apparatus according to the present invention includes a guide unit including a guide roller and an auxiliary roller, the guide roller including a pair of annular guide portions that support side edge portions of a base film, the auxiliary roller being opposed to the guide roller and pressing the side edge portions of the base film against the pair of guide portions. As a result, a deposition area of the base film and roll surfaces of the guide roller and auxiliary roller of the guide unit can be prevented from being brought into contact with each other, and the deposition area) can thus be protected.

Abstract: To provide a take up type vacuum vapor deposition apparatus capable of suppressing generation of a thermally-affected area on a film without lowering productivity. A take-up type vacuum vapor deposition apparatus according to the present invention includes: a payout roller configured to successively pay out a film ; a take-up roller configured to take up the film paid out from the payout roller; a cooling roller disposed between the payout roller and the take-up roller and configured to cool the film by coming into close contact with the film ; an evaporation source that faces the cooling roller and configured to deposit an evaporation material on the film; and an electron beam irradiator disposed between the payout roller and the evaporation source and configured to irradiate the film with an electron beam while the film is traveling.

Abstract: [Object] To carry out high-quality deposition processing while effectively maintaining a function of cleaning a can roller by a cleaning unit. [Solving Means] In the present invention, prior to deposition onto a base film, a cleaning unit is brought into contact with a cooling can roller to clean the can roller rotating in a non-cooled state, whereby it becomes possible to prevent excessive cooling of the cleaning unit and inhibit fallaway of removed dust so that the cleaning unit can efficiently carry out dust removal processing of the cooling roller. In addition, by canceling an in-contact state of the cleaning unit and the can roller after the end of the cleaning, the cleaning unit can be prevented from being cooled by a cooling operation of the can roller during deposition, thus making it possible to hold the dust removed from a circumferential surface of the can roller without letting it fall away.

Abstract: The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33,34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37).