Patents by Inventor Takayuki Ishii

Takayuki Ishii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220062943
    Abstract: A film forming apparatus is disclosed. The apparatus comprises a chamber; an exhaust unit configured to reduce the pressure in the chamber to a predetermined vacuum level; a holder disposed in the chamber and configured to hold a film forming target member on which a film is to be formed; a supply unit configured to supply a film forming material containing silicon to a surface of the film forming target member; and a heat source configured to perform heating at the predetermined vacuum level to melt the supplied film forming material.
    Type: Application
    Filed: August 27, 2021
    Publication date: March 3, 2022
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takayuki ISHII, Kazuya NAGASEKI, Michishige SAITO
  • Publication number: 20210391153
    Abstract: A stage includes a first member made of a material having a density of 5.0 g/cm3 or less, and a second member joined to the first member. The second member is made of a material having a linear expansion coefficient of 5.0×10?6/K or less and a thermal conductivity of 100 W/mK or more. A flow passage for a temperature control medium is formed in at least one of the first member and the second member.
    Type: Application
    Filed: June 3, 2021
    Publication date: December 16, 2021
    Inventors: Takayuki ISHII, Kazuya NAGASEKI, Michishige SAITO
  • Publication number: 20210242027
    Abstract: A substrate processing method of processing a substrate includes: forming a modification layer at least on a surface layer of a rear surface of the substrate or within the substrate by radiating a laser beam; and processing a front surface of the substrate in a state that the rear surface of the substrate is held. A modification device includes a laser irradiation unit configured to form a modification layer at least on a surface layer of the rear surface of the substrate or within the substrate by radiating a laser beam.
    Type: Application
    Filed: May 29, 2019
    Publication date: August 5, 2021
    Inventors: Norifumi Kohama, Takayuki Ishii
  • Publication number: 20210111005
    Abstract: A member to be used in a substrate processing apparatus is provided. The member is formed of aluminum containing silicon, and the silicon has a particle diameter of 1 ?m or less.
    Type: Application
    Filed: October 9, 2020
    Publication date: April 15, 2021
    Inventors: Takayuki Ishii, Kazuya Nagaseki, Michishige Saito, Shota Kaneko
  • Publication number: 20200255057
    Abstract: A gear housing for an electric power steering device has a front-side housing and a rear-side housing. The front-side housing has a worm wheel housing portion, a worm housing portion, and reinforcing ribs. The worm wheel housing portion has a worm wheel cylindrical portion and a ring shaped worm wheel bottom portion bent inward in a radial direction from a front end portion of the worm wheel cylindrical portion. The worm housing portion is provided on a part in a circumferential direction of an outer-diameter side portion of the worm wheel housing portion. The reinforcing ribs are provided on a front side surface of the front-side housing, extend in a direction in which an engagement reaction force acts between the worm wheel and a worm of the worm shaft, and span between the worm housing portion and the worm wheel bottom portion.
    Type: Application
    Filed: October 25, 2018
    Publication date: August 13, 2020
    Inventor: TAKAYUKI ISHII
  • Publication number: 20200168468
    Abstract: An etching method is provided. In the method, a substrate including an etching target film, a hard mask containing silicon and a patterned resist is provided. A protective film is formed on a surface of the substrate by generating a first plasma from one of a first gas containing carbon, fluorine and a dilute gas, and a second gas containing carbon, hydrogen and the dilute gas. The hard mask is etched by generating a second plasma from a third gas after performing the step of forming the protective film.
    Type: Application
    Filed: November 25, 2019
    Publication date: May 28, 2020
    Inventors: Takayuki ISHII, Taichi OKANO, Sho OIKAWA
  • Patent number: 10201826
    Abstract: Disclosed is a liquid coating method. The method executes processes of: coating a coating liquid in a spiral form on a surface of a substrate by ejecting the coating liquid from the ejection nozzle while moving the ejection nozzle in a predetermined direction between the rotary axis and a peripheral edge of the substrate during rotation of the substrate; making a linear velocity at an ejection position of the coating liquid from the ejection nozzle substantially constant by reducing a number of rotations of the substrate as the ejection position is positioned closer to the peripheral edge of the substrate; and making an ejection flow rate of the coating liquid ejected from the ejection nozzle substantially constant by changing a gap between the ejection port of the ejection nozzle and the surface of the substrate based on a flow rate of the coating liquid before ejection from the ejection nozzle.
    Type: Grant
    Filed: June 3, 2015
    Date of Patent: February 12, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Katsunori Ichino, Takayuki Ishii, Kouzou Kawahara, Daisuke Simokawa, Kazuyuki Tashiro
  • Patent number: 9969420
    Abstract: At least one of the vehicle body side through holes and the column side through hole is an adjusting long hole which is long in a direction in which a position of the steering wheel can be adjusted. A base end portion of the adjusting lever includes a lever side through hole penetrating through the base end portion in the width direction. The adjusting rod is press-fitted into the lever side through hole.
    Type: Grant
    Filed: October 22, 2014
    Date of Patent: May 15, 2018
    Assignee: NSK LTD.
    Inventors: Takayuki Ishii, Seiichi Moriyama, Shin Mihara
  • Patent number: 9744551
    Abstract: Disclosed is a coating apparatus capable of enhancing the film thickness uniformity. The coating apparatus includes a nozzle and a moving mechanism. The nozzle includes a storage chamber that stores a coating liquid and a slit-like flow path that is in communication with the storage chamber, and discharges the coating liquid through a discharge port formed at a front end of the flow path. The moving mechanism moves the nozzle and the substrate relatively to each other along a surface of the substrate. Also, in the flow path provided in the nozzle, flow resistance at the central portion in the longitudinal direction is larger than that at both end portions in the longitudinal direction.
    Type: Grant
    Filed: June 18, 2013
    Date of Patent: August 29, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Takayuki Ishii, Takahiro Sakamoto, Takahiro Kitano, Shoichi Terada
  • Publication number: 20170072986
    Abstract: At least one of the vehicle body side through holes and the column side through hole is an adjusting long hole which is long in a direction in which a position of the steering wheel can be adjusted. A base end portion of the adjusting lever includes a lever side through hole penetrating through the base end portion in the width direction. The adjusting rod is press-fitted into the lever side through hole.
    Type: Application
    Filed: October 22, 2014
    Publication date: March 16, 2017
    Applicant: NSK LTD.
    Inventors: Takayuki ISHII, Seiichi MORIYAMA, Shin MIHARA
  • Patent number: 9405092
    Abstract: A control apparatus includes a first focus detection unit that performs focus detection by a phase difference method based on an image signal obtained from an image pickup element, a second focus detection unit that performs focus detection by a contrast method, and a control unit that performs focusing, the control unit performs the focusing, in a first mode, by using a detection result of the first focus detection unit, and performs the focusing, in a second mode, by selectively using one of the detection result of the first focus detection unit and a detection result of the second focus detection unit according to lens information, and the first mode is a mode in which the focusing is repeated, and the second mode is a mode in which a lens is stopped after the focusing.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: August 2, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Miyako Nakamoto, Satoshi Hirota, Takayuki Ishii
  • Patent number: 9349574
    Abstract: A plasma etching method includes a plasma process of plasma-processing a surface of a photoresist, which has a predetermined pattern with plasma generated from a hydrogen-containing gas. Further, the plasma etching method includes an etching process of etching a silicon-containing film with plasma generated from a CF-based gas and a gas containing a CHF-based gas by using the plasma-processed photoresist as a mask. Furthermore, in the plasma etching method, the plasma process and the etching process are repeated at least two or more times.
    Type: Grant
    Filed: August 5, 2013
    Date of Patent: May 24, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Ryoichi Yoshida, Takayuki Ishii, Ken Kobayashi
  • Patent number: 9324569
    Abstract: A groove shape can be improved. A plasma etching method includes plasma-processing a photoresist film that is formed on a mask film and has a preset pattern; exposing an organic film formed under the mask film by etching the mask film with the pattern of the plasma-processed photoresist film; and etching the organic film by plasma of a mixture gas containing O2 (oxygen), COS (carbonyl sulfate) and Cl2 (chlorine).
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: April 26, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Takayuki Ishii
  • Patent number: 9238245
    Abstract: A coating apparatus includes a nozzle, a moving mechanism, a pressure adjusting unit and a pressure control unit. The nozzle is provided with a storage chamber and a slit-like flow path, and configured to discharge the coating liquid from a discharge port formed at a front end of the flow path. The moving mechanism moves the nozzle and a substrate relatively to each other along the surface of the substrate. The pressure adjusting unit adjusts the pressure inside the storage chamber. The pressure control unit controls the pressure adjusting unit so as to adjust pressure inside the storage chamber. The pressure control unit controls the pressure adjusting unit such that the inside of the storage chamber becomes a negative pressure, and fills the coating liquid inside the storage chamber while slowly decreasing the negative pressure inside the storage chamber.
    Type: Grant
    Filed: June 19, 2013
    Date of Patent: January 19, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Takayuki Ishii, Kimio Motoda, Takashi Terada, Atsushi Yamashita, Shigeto Tsuruta
  • Publication number: 20150352587
    Abstract: Disclosed is a liquid coating method. The method executes processes of: coating a coating liquid in a spiral form on a surface of a substrate by ejecting the coating liquid from the ejection nozzle while moving the ejection nozzle in a predetermined direction between the rotary axis and a peripheral edge of the substrate during rotation of the substrate; making a linear velocity at an ejection position of the coating liquid from the ejection nozzle substantially constant by reducing a number of rotations of the substrate as the ejection position is positioned closer to the peripheral edge of the substrate; and making an ejection flow rate of the coating liquid ejected from the ejection nozzle substantially constant by changing a gap between the ejection port of the ejection nozzle and the surface of the substrate based on a flow rate of the coating liquid before ejection from the ejection nozzle.
    Type: Application
    Filed: June 3, 2015
    Publication date: December 10, 2015
    Inventors: Katsunori Ichino, Takayuki Ishii, Kouzou Kawahara, Daisuke Simokawa, Kazuyuki Tashiro
  • Publication number: 20150206715
    Abstract: A plasma etching method includes a plasma process of plasma-processing a surface of a photoresist, which has a predetermined pattern with plasma generated from a hydrogen-containing gas. Further, the plasma etching method includes an etching process of etching a silicon-containing film with plasma generated from a CF-based gas and a gas containing a CHF-based gas by using the plasma-processed photoresist as a mask. Furthermore, in the plasma etching method, the plasma process and the etching process are repeated at least two or more times.
    Type: Application
    Filed: August 5, 2013
    Publication date: July 23, 2015
    Applicant: Tokyo Electron Limited
    Inventors: Ryoichi Yoshida, Takayuki Ishii, Ken Kobayashi
  • Publication number: 20150096492
    Abstract: A coating apparatus includes: a slit nozzle that discharges a coating material from a discharge port in a slit shape; a moving mechanism that relatively moves the slit nozzle with respect to a substrate in a disk shape; and a control unit that controls the moving mechanism, wherein the control unit performs a first constant speed coating treatment of relatively moving the slit nozzle with respect to the substrate at a first speed, then an acceleration coating treatment of accelerating a relative moving speed of the slit nozzle with respect to the substrate to a second speed higher than the first speed, and then a second constant speed coating treatment of relatively moving the slit nozzle with respect to the substrate at the second speed.
    Type: Application
    Filed: September 10, 2014
    Publication date: April 9, 2015
    Inventor: Takayuki ISHII
  • Patent number: 8948439
    Abstract: An acoustic conversion device includes: a driving unit including a pair of magnets disposed so as to face each other, a yoke to which the pair of magnets are attached, a coil to which driving current is supplied, a vibrating portion which vibrates when driving current is supplied to the coil, and an armature disposed between the pair of magnets with the vibrating portion being passed through the coil; and a diaphragm unit including a diaphragm, and a beam portion for propagating the vibration of the vibrating portion to the diaphragm; with a coil attachment portion to which the coil is attached, located in a state in parallel with the vibrating portion, being provided to the armature.
    Type: Grant
    Filed: May 18, 2011
    Date of Patent: February 3, 2015
    Assignee: Sony Corporation
    Inventors: Tsutomu Nagumo, Koji Matsuda, Koji Nageno, Takeshi Hara, Takahiro Suzuki, Takayuki Ishii, Kenji Hiraiwa
  • Publication number: 20150004795
    Abstract: A groove shape can be improved. A plasma etching method includes plasma-processing a photoresist film that is formed on a mask film and has a preset pattern; exposing an organic film formed under the mask film by etching the mask film with the pattern of the plasma-processed photoresist film; and etching the organic film by plasma of a mixture gas containing O2 (oxygen), COS (carbonyl sulfate) and Cl2 (chlorine).
    Type: Application
    Filed: June 26, 2014
    Publication date: January 1, 2015
    Inventor: Takayuki ISHII
  • Publication number: 20140347549
    Abstract: A control apparatus includes a first focus detection unit that performs focus detection by a phase difference method based on an image signal obtained from an image pickup element, a second focus detection unit that performs focus detection by a contrast method, and a control unit that performs focusing, the control unit performs the focusing, in a first mode, by using a detection result of the first focus detection unit, and performs the focusing, in a second mode, by selectively using one of the detection result of the first focus detection unit and a detection result of the second focus detection unit according to lens information, and the first mode is a mode in which the focusing is repeated, and the second mode is a mode in which a lens is stopped after the focusing.
    Type: Application
    Filed: May 21, 2014
    Publication date: November 27, 2014
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Miyako Nakamoto, Satoshi Hirota, Takayuki Ishii