Abstract: A storage box illumination device disposed under the seat of a compact vehicle such as motorcycles. The device provides illuminating to the interior of the storage box when the seat is opened. In an illumination device provided in the storage box to be disposed under the seat of a compact vehicle, an illumination switch for actuating the illumination fixture is provided on the seat closure holding member for holding the seat in the closed state.

Abstract: A plasma processing method for generating plasma in a vacuum chamber and processing a substrate placed on a substrate electrode, the plasma being generated by supplying a high-frequency power having a frequency of 50 MHz to 3 GHz to an antenna provided opposite to the substrate electrode while interior of the vacuum chamber is controlled to a specified pressure by supplying a gas into the vacuum chamber and exhausting the interior of the vacuum chamber, the method includes with a dielectric plate being sandwiched between the antenna and the vacuum chamber and both the antenna and the dielectric plate projecting into the vacuum chamber, controlling plasma distribution on the substrate with an annular and recessed slit provided between the antenna and the vacuum chamber, and processing the substrate in a state where the antenna cover is fixed by making both an inner side face of the slit and the antenna covered with an antenna cover, making a bottom face of the slit covered with a slit cover, supporting the ant

Abstract: A storage box illumination device disposed under the seat of a compact vehicle such as motorcycles. The device provides illuminating to the interior of the storage box when the seat is opened. In an illumination device provided in the storage box to be disposed under the seat of a compact vehicle, an illumination switch for actuating the illumination fixture is provided on the seat closure holding member for holding the seat in the closed state.

Abstract: A plasma processing method for generating plasma in a vacuum chamber and processing a substrate placed on a substrate electrode, the plasma being generated by supplying a high-frequency power having a frequency of 50 MHz to 3 GHz to an antenna provided opposite to the substrate electrode while interior of the vacuum chamber is controlled to a specified pressure by supplying a gas into the vacuum chamber and exhausting the interior of the vacuum chamber, the method includes with a dielectric plate being sandwiched between the antenna and the vacuum chamber and both the antenna and the dielectric plate projecting into the vacuum chamber, controlling plasma distribution on the substrate with an annular and recessed slit provided between the antenna and the vacuum chamber, and processing the substrate in a state where the antenna cover is fixed by making both an inner side face of the slit and the antenna covered with an antenna cover, making a bottom face of the slit covered with a slit cover, supporting the ant

Abstract: A plasma processing method includes exhausting interior of a vacuum chamber while supplying gas into the vacuum chamber, and while controlling the interior of the vacuum chamber to a pressure, applying a high-frequency power of 100 kHz to 100 MHz to a coil provided in a vicinity of a dielectric window provided so as to face a substrate placed on a substrate electrode in the vacuum chamber, and thus generating plasma in the vacuum chamber to process the substrate or a film on the substrate by the generated plasma while particles which tend to move straight from a surface of the substrate or from a surface of the film on the substrate toward a wall surface of the dielectric window inside the vacuum chamber are kept interrupted by a metal plate.

Abstract: While interior of a vacuum chamber is maintained to a specified pressure by introducing a specified gas from a gas supply unit into the vacuum chamber and simultaneously performing exhaustion by a pump as an exhauster, a high-frequency power of 100 MHz is supplied by an antenna use high-frequency power supply to an antenna provided so as to project into the vacuum chamber, by which plasma is generated in the vacuum chamber. The vacuum chamber grounded, and separated into a region on one side on which the substrate is present and a region on the other side on which the substrate is absent by a punching metal plate nearly all the peripheral portion of which is grounded.

Abstract: An apparatus for simultaneously measuring at least the width and thickness of a seamed portion of a can at the same point on the seamed portion. The apparatus comprises a measurement base for receiving the seamed portion of the can thereon, and a reference block secured to the measurement base the reference block including a reference contact portion to contact the outer surface of the seamed portion. A device for measuring the width of the seamed portion is mounted on the reference block and includes a measurement pin cooperating with the measurement base to clamp the seamed portion in the vertical direction. A device for measuring the thickness of the seamed portion is mounted on the reference block and includes a measurement block cooperating with the reference contact portion to clamp the seamed portion laterally. The apparatus may further comprise a device for measuring the can height and/or a device for measuring the countersink depth.

Abstract: A blank guide device for a resistance welding machine guides cylindrically-rolled blanks employed to produce can bodies to the welding point. The blank guide device includes a pair of blocks respectively constituting opposed L-shaped surfaces in place of a conventional Z-shaped guide portion.