Abstract: The columnar structure film is formed on a surface of a substrate by vapor phase epitaxy, and is constituted of a plurality of columnar bodies extending in directions non-parallel to the surface of the substrate. In the columnar structure film, a relationship GSmax>2.0 GSmin is satisfied, where GSmax and GSmin are respectively a maximum value and a minimum value of average diameters of the columnar bodies taken in planes perpendicular to a thickness direction of the columnar structure film.

Abstract: An aspect of the present invention provides a mirror driving apparatus, including: a mirror section having a reflecting surface which reflects light; a pair of piezoelectric actuator sections arranged on either side of the mirror section; coupling sections which respectively connect one end of each of the piezoelectric actuator sections to an end portion of the mirror section which is distant from an axis of rotation of the mirror section in a direction along the reflecting surface and perpendicular to the axis of rotation; a fixing section which supports another end of each of the piezoelectric actuator sections; and a perpendicular movement suppressing structure which suppresses translational motion of the axis of rotation of the mirror section in a direction perpendicular to the reflecting surface, one end of the perpendicular movement suppressing structure being connected to the fixing section and another end thereof being connected to the mirror section.

Abstract: A piezoelectric film includes crystals of a complex oxide having a perovskite structure with (100)-preferred orientation and represented as: Pb1+?[(ZrxTi1-x)1-yNby]Oz, where x is a value in a range of 0<x<1, y is a value in a range of 0.13?y?0.25, and ? and z are values within ranges where the perovskite structure is obtained and ?=0 and z=3 are standard, wherein a ratio between a diffraction peak intensity I(100) from a perovskite (100) plane and a diffraction peak intensity I(200) from a perovskite (200) plane as measured by X-ray diffraction satisfies I(100)/I(200)?1.25.

Abstract: When a film containing constituent elements of a target is formed on a substrate through a vapor deposition process using plasma with placing the substrate and the target to face each other, a potential in a spatial range of at least 10 mm extending laterally from the outer circumference of the substrate is controlled to be equal to a potential on the substrate, and/or the substrate is surrounded with a wall surface having a potential controlled to be equal to the potential on the substrate.

Abstract: A piezoelectric actuator of the presently disclosed subject matter can include: a first actuator including a first piezoelectric driving part; and a second actuator including a second piezoelectric driving part. A central portion of the first actuator can be supported. The first actuator can be bent and deformed by applying a first driving voltage to the first piezoelectric driving part, so that both end portions of the first actuator can be displaced in a thickness direction of the first actuator. Both end portions of the second actuator can be coupled to the both end portions of the first actuator. The second actuator can be bent and deformed in the opposite direction to the first actuator by applying a second driving voltage to the second piezoelectric driving part, so that a central portion of the second actuator can be displaced in a thickness direction of the second actuator.

Abstract: A mirror driving device of an aspect can include: a mirror part; a pair of inner actuator parts; a pair of outer actuator parts; fixing and supporting parts; an inner actuator driving voltage supply part; and an outer actuator driving voltage supply part. A driving voltage with a frequency inducing oscillation of the mirror part in a rotating direction of the mirror part associated with resonance drive of the corresponding actuator parts can be supplied from one driving voltage supply part of the inner actuator driving voltage supply part and the outer actuator driving voltage supply part to the inner actuator parts or the outer actuator parts corresponding to the one driving voltage supply part. Simultaneously with the resonance drive, a driving voltage for inclining the mirror part without exciting resonance drive can be supplied from the other driving voltage supply part to corresponding actuator parts.

Abstract: When a film containing constituent elements of a target is formed on a substrate through a vapor deposition process using plasma with placing the substrate and the target to face each other, a potential in a spatial range of at least 10 mm extending laterally from the outer circumference of the substrate is controlled to be equal to a potential on the substrate, and/or the substrate is surrounded with a wall surface having a potential controlled to be equal to the potential on the substrate.

Abstract: When a film containing constituent elements of a target is formed on a substrate through a vapor deposition process using plasma with placing the substrate and the target to face each other, a potential in a spatial range of at least 10 mm extending laterally from the outer circumference of the substrate is controlled to be equal to a potential on the substrate, and/or the substrate is surrounded with a wall surface having a potential controlled to be equal to the potential on the substrate.

Abstract: A piezoelectric device includes a substrate; and a laminated film formed above the substrate. The laminated film includes a lower electrode layer, a piezoelectric layer, and an upper electrode layer formed in this order, and the lower electrode layer is a metal electrode layer containing as one or more main components one or more nonnoble metals and/or one or more nonnoble alloys. Preferably, the one or more main components are one or more of the metals Cr, W, Ti, Al, Fe, Mo, In, Sn, Ni, Cu, Co, and Ta, and alloys of the metals.

Abstract: A piezoelectric film is constituted of a perovskite oxide represented as: Pb1+?(ZrxTiy)1-a(MgbNb1-b)aOz, where ? and z are values within ranges where a perovskite structure is obtained and ?=0 and z=3 are standard, Pb is replaceable with another A site element in an amount of a range where the perovskite structure is obtained, b is a value in a range of 0.090?b?0.25, and a Nb ratio at a B site satisfies 0.13?a×(1?b).

Abstract: A piezoelectric film has a columnar crystal structure constituted of a plurality of columnar crystals, and contains a perovskite oxide represented by the following formula (P) as a main component: PbaAb[(ZrcTil-c)l-dBd]Oe,??(P) where Pb and A are A-site elements, and A is at least one element selected from a group consisting of Bi, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Ca, Sr and Ba; Zr, Ti and B are B-site elements, and B is at least one element selected from a group consisting of Nb, Ta and Sb; a is an amount of lead, b is an amount of the element A, c is a Zr/Ti ratio, d is an amount of the element B, e is an amount of oxygen; values of a, b and d satisfy a<1, a+b?1, and 0<d<b; and a value of e is within a range where the perovskite structure is obtained and e=3 is standard.

Abstract: A piezoelectric film includes crystals of a complex oxide having a perovskite structure with (100)-preferred orientation and represented as: Pb1+?[(ZrxTi1-x)1-yNby]Oz, where x is a value in a range of 0<x<1, y is a value in a range of 0.13?y?0.25, and ? and z are values within ranges where the perovskite structure is obtained and ?=0 and z=3 are standard, wherein a ratio between a diffraction peak intensity I(100) from a perovskite (100) plane and a diffraction peak intensity I(200) from a perovskite (200) plane as measured by X-ray diffraction satisfies I(100)/I(200)?1.25.

Abstract: Provided is a perovskite-type oxide film having a perovskite-type crystal structure and containing lead as a chief component, which, when subjected to Raman microspectroscopy at a plurality of points on a surface thereof so as to measure Raman spectra upon application of an electric field of 100 kV/cm and upon application of no electric field, has a mean of absolute values of peak shift amounts that is 2.2 cm?1 or less, with the peak shift amounts being found between Raman spectra in a range of 500 to 650 cm?1 measured upon application of an electric field of 100 kV/cm and Raman spectra in the range of 500 to 650 cm?1 measured upon application of no electric field. A production process and an evaluation method for such a film as well as a device using such a film are also provided.

Abstract: A film depositing apparatus comprises: a process chamber; a target holder provided in the process chamber for holding a target; a substrate holder for supporting a deposition substrate such that the deposition substrate faces the target holder in the process chamber; a power supply for supplying electric power between the target holder and the substrate holder to generate plasma in the process chamber; and an anode provided between the target holder and the substrate holder for capturing ions and/or electrons in the plasma being generated within the process chamber, wherein the anode includes: a cylindrical member provided so as to surround an outer periphery of a side of the substrate holder that faces the target holder; and at least one annular plate member attached to an inside wall of the cylindrical member, the plate member having a central opening larger than a surface of the deposition substrate.

Abstract: An inorganic film formed of an inorganic material on a metal film having a surface including surface-oxidized areas. The surface-oxidized areas are surface oxidized to different degrees. For example, the surface-oxidized areas are one or more lowly-surface-oxidized areas and one or more highly-surface-oxidized areas. The inorganic film includes regions which are respectively formed on the surface-oxidized areas, and the regions have different crystal structures according to the different degrees of surface oxidation. For example, a patterned inorganic film constituted by one or more protruding portions arranged on one or more lowly-surface-oxidized areas of the surface of the metal film can be produced by removing the portions of the inorganic film formed on highly-surface-oxidized areas.

Abstract: A piezoelectric film is formed on a surface of a substrate by a vapor deposition process without generating grain boundaries which are substantially parallel to the surface of the substrate and are caused by lamination. A normal of a (100) plane of each of crystals constituting the piezoelectric film is inclined from a normal of the surface of the substrate by an angle of not smaller than 6° and not larger than 36°.

Abstract: A piezoelectric device having a piezoelectric film formed over a substrate through an electrode by vapor phase deposition using plasma, and constituted by columnar crystals of one or more perovskite oxides Pb(Tix, Zry, Mz)O3 (0<x<1, 0<y<1, 0?z<1, x+y+z=1) which extend nonparallel to the substrate. M represents one or more of Sn, Nb, Ta, Mo, W, Ir, Os, Pd, Pt, Re, Mn, Co, Ni, V, and Fe. The maximum diameters of the end faces of the columnar crystals are distributed from a value not exceeding 100 nm to a value of 500 nm or greater. The arithmetic average surface roughness of the columnar film is 10 nm or smaller, 20% or more of the columnar crystals have the maximum diameters not exceeding 100 nm, and 5% or more of the columnar crystals have the maximum diameters of 500 nm or greater.

Abstract: When a film containing constituent elements of a target is formed on a substrate through a vapor deposition technique using plasma with placing the substrate and the target to face each other, film formation is carried out with controlling variation of plasma potential Vs (V) in a plasma space in an in-plane direction of the substrate to be within ±10V at a distance of 2-3 cm from a surface of the target toward the substrate.

Abstract: A piezoelectric device, including the following on a substrate in the order listed below: a lower electrode, a piezoelectric film which contains a Pb containing perovskite oxide represented by a general expression (P) below, and an upper electrode, in which the piezoelectric film has a layer of pyrochlore oxide on the surface facing the lower electrode, and the average layer thickness of the pyrochlore oxide layer is not greater than 20 nm. AaBbO3??(P) where, A: at least one type of A-site element containing Pb as a major component, B: at least one type of B-site element selected from the group consisting of Ti, Zr, V, Nb, Ta, Cr, Mo, W, Mn, Sc, Co, Cu, In, Sn, Ga, Zn, Cd, Fe, and Ni, and O: an oxygen element.

Abstract: A method of driving a piezoelectric actuator including: a piezoelectric element containing a piezoelectric body having coercive field points on a negative field side and a positive field side respectively and having asymmetrical bipolar polarization—electric field hysteresis characteristics in which an absolute value of a coercive electric field on the negative field side and a coercive electric field value on the positive field side are mutually different, and a pair of electrodes for applying voltage to the piezoelectric body; and a diaphragm which externally transmits, as displacement, distortion produced in the piezoelectric body when the voltage is applied to the piezoelectric body, includes the step of driving the piezoelectric actuator between a positive drive voltage and a negative drive voltage in a range not exceeding the coercive electric field, from among the positive and negative coercive electric fields, which has the larger absolute value.