Patents by Inventor Takayuki Sakai
Takayuki Sakai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6991878Abstract: A photomask repair method including scanning an electron beam across a main surface of the photomask, thereby producing a pattern image of the photomask, identifying the position of a defective portion from the pattern image thus produced, and applying an electron beam to a region to be etched including a defective portion under an atmosphere of a gas capable of performing a chemical etching of a film material forming the photomask pattern, thereby removing a defect. In this method, the electron beam to be applied to the region to be etched is a shaped beam. The electron beam is set such that the side of the electron beam is applied in parallel to a borderline between a non-defective pattern and the defect.Type: GrantFiled: December 23, 2002Date of Patent: January 31, 2006Assignee: Kabushiki Kaisha ToshibaInventors: Shingo Kanamitsu, Takashi Hirano, Fumiaki Shigemitsu, Motosuke Miyoshi, Kazuyoshi Sugihara, Yuichiro Yamazaki, Makoto Sekine, Takayuki Sakai, Ichiro Mori, Katsuya Okumura
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Publication number: 20050284742Abstract: When an operator applies a removing force to turn a switch portion b in a direction C2, a projection a4 abuts against a slope b71 so that the removing force as a reaction is applied to the slope. The removing force is divided into a component working along the slope b71 and a component F working in a same direction as a center axis X. Thus, the removing force is converted into a force F in the same direction as the center axis X. By means of the force F in the same direction as the center axis X, a pushbutton support b6 is moved downward as accordingly moving a movable contacts b9 away from a fixed contacts b12 via a contact axis b5.Type: ApplicationFiled: September 4, 2003Publication date: December 29, 2005Applicant: IDEC IZUMI CORPORATIONInventors: Takashi Ishii, Masashi Fujimoto, Shigetoshi Fujitani, Takayuki Sakai, Atsushi Matsumoto, Takao Fukui
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Patent number: 6974311Abstract: A control valve for a variable displacement compressor has a solenoid, a pressure sensing mechanism, and a valve mechanism. The solenoid has a first end and a second end and a cylindrical body. The pressure sensing mechanism is located on the first end of the solenoid. The pressure sensing mechanism has a pressure sensing chamber and a diaphragm. The diaphragm is displaced in accordance with the pressure in the pressure sensing chamber. The valve mechanism is located on the second end of the solenoid. The cylindrical body has a support end, which supports the diaphragm.Type: GrantFiled: May 23, 2003Date of Patent: December 13, 2005Assignee: Pacific Industrial Co., Ltd.Inventors: Takayuki Sakai, Satoru Okada
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Patent number: 6971629Abstract: A control valve is disclosed in which a direct-moved shaft having one end abutted against a diaphragm is direct moved according to deformation of the diaphragm so that a valve element mounted on the other end of the direct-moved shaft is adhered to and separated from an opening edge of a passage, thereby controlling a flow rate of a fluid passing through the passage. The control valve includes a first body enclosing the direct-moved shaft, a second body enclosing the diaphragm, a compressive elastic member deformed when the second body is pressed against the first body, and a holder for holding the second body on the first body while the compressive elastic member is deformed by compression.Type: GrantFiled: July 25, 2003Date of Patent: December 6, 2005Assignee: Pacific Industrial Co., Ltd.Inventors: Satoru Okada, Takayuki Sakai, Takaaki Ichikawa
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Publication number: 20050230698Abstract: A semiconductor light emitting apparatus comprises: a semiconductor light emitting device; resin that seals the semiconductor light emitting device; and antireflective coating provided on a surface of the resin. The antireflective coating is made of material having an intermediate refractive index between the refractive index of the resin and the refractive index of air.Type: ApplicationFiled: March 1, 2005Publication date: October 20, 2005Applicant: KABUSHIKI KAISHA TOSHIBAInventor: Takayuki Sakai
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Publication number: 20050139299Abstract: There is provided a precipitation hardening Al alloy in which an average area of eutectic structures existing in the Al alloy is less than 4 ?m2. This Al alloy contains 6.5 to 7.5% by mass of Si, 0.36% by mass or less of Mg and 20 to 70 ppm of Sr, and is preferably used as a vehicle wheel. In heat treatment method of the precipitation hardening Al alloy, a work piece is subjected to solution treatment by being made to exist in a fluidized bed, and further a rate of solid solutions of Si and/or Mg into a phase is made to be 60% or more in the solution treatment and aging treatment is carried out at temperatures from 150° C. or more to less than 200° C. The precipitation hardening Al alloy to be obtained has well-balanced three mechanical properties of tensile strength, yield strength, and elongation, and is also excellent in fatigue strength.Type: ApplicationFiled: February 25, 2005Publication date: June 30, 2005Applicant: Asahi Tec CorporationInventor: Takayuki Sakai
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Publication number: 20050140975Abstract: A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.Type: ApplicationFiled: October 22, 2004Publication date: June 30, 2005Inventors: Takayuki Sakai, Masanobu Kibe, Tokuhisa Ohiwa
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Patent number: 6840765Abstract: There is provided a heat treatment unit which uses a multi-layered heat treatment furnace (1) comprising a layer of fluidized bed (2) composed of particles and another layer of atmosphere layer (3) composed of gases, the former being excellent in thermal efficiency and uniformity of heat distribution and the latter being positioned in the free board section over the fluidized bed (2), in which these layers operate at temperature levels different from each other, and the work piece is heat-treated by being partly immersed in the fluidized bed (2) having a given temperature with the other part being exposed in the atmosphere layer (3) also operating at a given temperature, according to desired mechanical properties of the work piece at each position. This heat treatment unit is improved from the conventional one in that it can give desired mechanical properties which are required by each part of metallic work requires without increasing the investment cost.Type: GrantFiled: December 18, 2001Date of Patent: January 11, 2005Assignee: Asahi Tec CorporationInventor: Takayuki Sakai
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Publication number: 20040211499Abstract: A non-Cu-based cast Al alloy contains substantially no Cu, and has a tensile strength of 305 MPa or more, a 0.2% yield strength of 220 MPa or more, and an elongation of 10% or more. In the heat treatment of the cast Al alloy, the solution treatment is performed using a fluidized bed 18, and the solution treatment is performed by rapid heating up to the solution treatment temperature in 30 minutes, and maintaining the solution treatment temperature in 3 hours or less. Because this method for heat treatment performs solution treatment at an increased speed of heating-up time, with small deviation of temperature, and at a higher temperature, total time for heat treatment can be shortened drastically in comparison with the conventional method. A non-Cu-based cast Al alloy having well-balanced mechanical properties of tensile strength, yield strength, and elongation can be provided.Type: ApplicationFiled: May 21, 2004Publication date: October 28, 2004Applicant: Asahi Tec CorporationInventor: Takayuki Sakai
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Publication number: 20040188651Abstract: A control valve is disclosed in which a direct-moved shaft having one end abutted against a diaphragm is direct moved according to deformation of the diaphragm so that a valve element mounted on the other end of the direct-moved shaft is adhered to and separated from an opening edge of a passage, thereby controlling a flow rate of a fluid passing through the passage. The control valve includes a first body enclosing the direct-moved shaft, a second body enclosing the diaphragm, a compressive elastic member deformed when the second body is pressed against the first body, and a holder for holding the second body on the first body while the compressive elastic member is deformed by compression.Type: ApplicationFiled: July 25, 2003Publication date: September 30, 2004Applicant: Pacific Industrial Co., Ltd.Inventors: Satoru Okada, Takayuki Sakai, Takaaki Ichikawa
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Patent number: 6773665Abstract: A non-Cu-based cast Al alloy contains substantially no Cu, and has a tensile strength of 305 MPa or more, a 0.2% yield strength of 220 MPa or more, and an elongation of 10% or more. In the heat treatment of the cast Al alloy, the solution treatment is performed using a fluidized bed 18, and the solution treatment is performed by rapid heating up to the solution treatment temperature in 30 minutes, and maintaining the solution treatment temperature in 3 hours or less. Because this method for heat treatment performs solution treatment at an increased speed of heating-up time, with small deviation of temperature, and at a higher temperature, total time for heat treatment can be shortened drastically in comparison with the conventional method. A non-Cu-based cast Al alloy having well-balanced mechanical properties of tensile strength, yield strength, and elongation can be provided.Type: GrantFiled: March 15, 2002Date of Patent: August 10, 2004Assignee: Asahi Tec CorporationInventor: Takayuki Sakai
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Patent number: 6746214Abstract: A highly accurate and relatively inexpensive control valve for a compressor. The control valve includes a pressure sensitive portion that has a metal diaphragm, which is machined with a relatively low cost. The diaphragm is held between flanges. The pressure sensitive portion is attached to a control valve portion after being subjected to a pressure leak test. The control valve portion has an engaging piece and a positioning surface. The flange contacts the positioning surface and is fixed by the engaging piece. The positioning surface is formed such that the interval between the diaphragm and the top of the valve chamber becomes a predetermined value.Type: GrantFiled: February 27, 2002Date of Patent: June 8, 2004Assignee: Pacific Industrial Co., Ltd.Inventors: Satoru Okada, Takayuki Sakai, Takaaki Ichikawa
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Publication number: 20040058533Abstract: A method for fabricating a pattern, includes: delineating a mask pattern on at least a portion of an underlying layer; etching a portion of the mask pattern; irradiating an incident light on the mask pattern to which the etching is performed and detecting a reflected light produced by reflecting the incident light after the incident light is transmitted through the mask pattern; obtaining a reflected interference spectrum; and calculating a pattern width of the mask pattern using data of the reflected interference spectrum, the reflected interference spectrum being in a wavelength range of not less than two times a pitch of the mask pattern.Type: ApplicationFiled: March 25, 2003Publication date: March 25, 2004Inventors: Takayuki Sakai, Tokuhisa Ohiwa, Masanobu Kibe
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Publication number: 20040048218Abstract: There is provided a heat treatment unit which uses a multi-layered heat treatment furnace (1) comprising a layer of fluidized bed (2) composed of particles and another layer of atmosphere layer (3) composed of gases, the former being excellent in thermal efficiency and uniformity of heat distribution and the latter being positioned in the free board section over the fluidized bed (2), in which these layers operate at temperature levels different from each other, and the work piece is heat-treated by being partly immersed in the fluidized bed (2) having a given temperature with the other part being exposed in the atmosphere layer (3) also operating at a given temperature, according to desired mechanical properties of the work piece at each position. This heat treatment unit is improved from the conventional one in that it can give desired mechanical properties which are required by each part of metallic work requires without increasing the investment cost.Type: ApplicationFiled: June 24, 2003Publication date: March 11, 2004Inventor: Takayuki Sakai
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Patent number: 6689699Abstract: There is disclosed a semiconductor processing apparatus comprising a process chamber treating a substrate, a process gas feeder feeding a process gas to the process chamber, a first vacuum pump exhausting the process chamber, a second vacuum pump inhaling gas on an exhaust side of the first vacuum pump, and a circulation path circulating at least a part of the process gas exhausted from the process chamber via the first vacuum pump into the process chamber, wherein the circulation path is provided with a dust trapping mechanism, the dust trapping mechanism being capable of substantially maintaining a conductance of the circulation path before and after the capture of dust.Type: GrantFiled: September 19, 2001Date of Patent: February 10, 2004Assignee: Kabushiki Kaisha ToshibaInventors: Itsuko Sakai, Takayuki Sakai, Tokuhisa Ohiwa
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Publication number: 20040011434Abstract: An aluminum alloy formed by precipitation hardening in which the eutectic structure present therein has an average area less than 4 m?2. The alloy contains 6.5 to 7.5 wt. % silicon, up to 0.36 wt. % magnesium, and 20 to 70 ppm strontium and is suitable for use as a vehicle wheel. The method for heat treatment of the aluminum alloy formed by precipitation hardening comprises: conducting a solution treatment by causing the work piece to be present in a fluidized bed so that at least 60% of the silicon and/or magnesium forms a solid solution in an a phase; and conducting an aging treatment at a temperature not lower than 150° C. but lower than 200° C. The aluminum alloy thus obtained has well-balanced three mechanical properties, i.e., tensile strength, proof stress, and elongation, and has excellent fatigue strength.Type: ApplicationFiled: February 10, 2003Publication date: January 22, 2004Inventor: Takayuki Sakai
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Publication number: 20030219344Abstract: A control valve for a variable displacement compressor has a solenoid, a pressure sensing mechanism, and a valve mechanism. The solenoid has a first end and a second end and a cylindrical body. The pressure sensing mechanism is located on the first end of the solenoid. The pressure sensing mechanism has a pressure sensing chamber and a diaphragm. The diaphragm is displaced in accordance with the pressure in the pressure sensing chamber. The valve mechanism is located on the second end of the solenoid. The cylindrical body has a support end, which supports the diaphragm.Type: ApplicationFiled: May 23, 2003Publication date: November 27, 2003Inventors: Takayuki Sakai, Satoru Okada
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Publication number: 20030215722Abstract: A photomask repair method including scanning an electron beam across a main surface of the photomask, thereby producing a pattern image of the photomask, identifying the position of a defective portion from the pattern image thus produced, and applying an electron beam to a region to be etched including a defective portion under an atmosphere of a gas capable of performing a chemical etching of a film material forming the photomask pattern, thereby removing a defect. In this method, the electron beam to be applied to the region to be etched is a shaped beam. The electron beam is set such that the side of the electron beam is applied in parallel to a borderline between a non-defective pattern and the defect.Type: ApplicationFiled: December 23, 2002Publication date: November 20, 2003Inventors: Shingo Kanamitsu, Takashi Hirano, Fumiaki Shigemitsu, Motosuke Miyoshi, Kazuyoshi Sugihara, Yuichiro Yamazaki, Makoto Sekine, Takayuki Sakai, Ichiro Mori, Katsuya Okumura
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Publication number: 20030173007Abstract: This invention provides a fluidized-bed furnace, in which the work piece is heat-treated in a fluidized bed formed by filling a vessel with particles and blowing hot air into the vessel to fluidize the particles. It includes a cantilevered dispersion tube disposed in the fluidized bed, and provided with air outlets directed downward, from which the hot air is blown out. This invention also provides a heat-treatment apparatus incorporating a rotary heat-treatment furnace, in which a work piece is heat-treated while being rotated in the fluidized bed, as the solution and/or aging treatment furnaces; removing dust from the exhaust gases discharged from the solution treatment furnace by a dust collector, and recovering the waste heat from the exhaust gases by an heat exchanger as the heat source for the aging treatment furnace; and also incorporating an automatic carrier which charges or discharges the work piece into or out of each furnace.Type: ApplicationFiled: February 10, 2003Publication date: September 18, 2003Inventor: Takayuki Sakai
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Publication number: 20020155724Abstract: In dry etching a semiconductor workpiece, a mixture of a carbon-free, fluorine-containing gas and a fluorine-free, carbon-containing gas is used as an etching gas.Type: ApplicationFiled: April 18, 2002Publication date: October 24, 2002Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Takayuki Sakai, Tokuhisa Ohiwa