Abstract: A semiconductor memory device includes a control circuit, first wirings, second wirings intersecting the first wirings, and memory cells formed between the first wirings and the second wirings. The control circuit is configured to supply, in a set operation, a set pulse between one of the first wirings and one of the second wirings, supply, in a reset operation, a reset pulse between one of the first wirings and one of the second wirings, and supply, in a first operation, a first pulse between one of the first wirings and one of the second wirings. The first pulse has an amplitude larger than a larger one of an amplitude of the set pulse or an amplitude of the reset pulse, or the same amplitude as the larger amplitude. The first pulse has a pulse width larger than a pulse width of the reset pulse.

Abstract: A semiconductor memory device includes: first wirings; second wirings intersecting the first wirings; and memory cells. Each of the memory cells is respectively formed between one of the first wirings and one of the second wirings. In a set operation, a set pulse is supplied between one of the first wirings and one of the second wirings. In a reset operation, a reset pulse is supplied between one of the first wirings and one of the second wirings. In a first operation, a first pulse is supplied between one of the first wirings and one of the second wirings. the first pulse has an amplitude equal to or greater than the greater of an amplitude of the set pulse and an amplitude of the reset pulse and has a pulse width greater than a pulse width of the set pulse.

Abstract: According to one embodiment, a semiconductor memory device includes a word line, a bit line crossing the word line, a memory cell, and a controller. The memory cell is provided at an intersection between the word and bit lines and includes a variable resistive element. The controller controls a voltage application and a read operation to the memory cell. The controller performs a first operation of applying a first voltage to the memory cell, and a first verification of verifying whether a resistance of the memory cell becomes equal to a first value or greater after the first operation. The controller performs a second operation of applying to the memory cell a second voltage set based on the first voltage, when the resistance of the memory cell becomes equal to the first value or greater in the first verification.

Abstract: A storage apparatus according to embodiments includes: a first interlayer insulating film extending in a first direction; a second interlayer insulating film extending in the first direction; a first conductive layer extending in the first direction and provided between the first interlayer insulating film and the second interlayer insulating film; a second conductive layer extending in a second direction intersecting the first direction; a resistance change layer including a first portion provided between the first interlayer insulating film and the second interlayer insulating film and including a second portion provided between the second conductive layer and the first interlayer insulating film, between the second conductive layer and the first conductive layer, and between the second conductive layer and the second interlayer insulating film; and a sidewall insulating film provided between the first portion and the first interlayer insulating film and between the first portion and the second interlayer i

Abstract: A storage apparatus according to embodiments includes: a first interlayer insulating film extending in a first direction; a second interlayer insulating film extending in the first direction; a first conductive layer extending in the first direction and provided between the first interlayer insulating film and the second interlayer insulating film; a second conductive layer extending in a second direction intersecting the first direction; a resistance change layer including a first portion provided between the first interlayer insulating film and the second interlayer insulating film and including a second portion provided between the second conductive layer and the first interlayer insulating film, between the second conductive layer and the first conductive layer, and between the second conductive layer and the second interlayer insulating film; and a sidewall insulating film provided between the first portion and the first interlayer insulating film and between the first portion and the second interlayer i

Abstract: A method for controlling a resistive memory device is described. The resistive memory device including a memory cell provided between a first interconnection and a second interconnection crossing the first interconnection, and the memory cell transitions reversibly between a first resistance state and a second resistance state. The method includes detecting a first current flowing through a memory cell by applying a first voltage between the first interconnection and the second interconnection; comparing a value of the first current with a first criteria value; and determining whether the memory cell is in the first resistance state or the second resistance state. The method further includes comparing the value of the first current with a second criteria value greater than the first criteria value; and setting a first flag for the memory cell when the value of the first current is greater than the second criteria value.

Abstract: A memory device includes a first interconnection extending in a first direction; a second interconnection crossing the first interconnection and extending in a second direction; a resistance change film provided between the first interconnection and the second interconnection, and an intermediate film provided between the second interconnection and the resistance change film. The intermediate film is in contact with the second interconnection, and includes an insulating material.

Abstract: A method for controlling a resistive memory device is described. The resistive memory device including a memory cell provided between a first interconnection and a second interconnection crossing the first interconnection, and the memory cell transitions reversibly between a first resistance state and a second resistance state. The method includes detecting a first current flowing through a memory cell by applying a first voltage between the first interconnection and the second interconnection; comparing a value of the first current with a first criteria value; and determining whether the memory cell is in the first resistance state or the second resistance state. The method further includes comparing the value of the first current with a second criteria value greater than the first criteria value; and setting a first flag for the memory cell when the value of the first current is greater than the second criteria value.

Abstract: A semiconductor memory device according to an embodiment includes a memory cell array and a control circuit. The memory cell array includes: a plurality of first conductive layers that are stacked; a memory layer provided on a side surface of the plurality of the first conductive layers; and a second conductive layer that contacts the side surface of the plurality of the first conductive layers via the memory layer. A thickness of the first conductive layer disposed at the first position is larger than a thickness of the first conductive layer disposed at the second position. The control circuit is configured to apply a first voltage to a selected first conductive layer. The control circuit changes a value of the first voltage based on a position of the selected first conductive layer.

Abstract: A semiconductor memory device according to an embodiment includes a memory cell array and a control circuit. The memory cell array includes: a plurality of first conductive layers that are stacked; a memory layer provided on a side surface of the plurality of the first conductive layers; and a second conductive layer that contacts the side surface of the plurality of the first conductive layers via the memory layer. A thickness of the first conductive layer disposed at the first position is larger than a thickness of the first conductive layer disposed at the second position. The control circuit is configured to apply a first voltage to a selected first conductive layer. The control circuit changes a value of the first voltage based on a position of the selected first conductive layer.

Abstract: A semiconductor memory device according to an embodiment includes a memory cell array and a control circuit. The memory cell array includes: a plurality of first conductive layers that are stacked; a memory layer provided on a side surface of the plurality of the first conductive layers; and a second conductive layer that contacts the side surface of the plurality of the first conductive layers via the memory layer. A thickness of the first conductive layer disposed at the first position is larger than a thickness of the first conductive layer disposed at the second position. The control circuit is configured to apply a first voltage to a selected first conductive layer. The control circuit changes a value of the first voltage based on a position of the selected first conductive layer.

Abstract: A semiconductor memory device according to an embodiment described below comprises: first lines arranged in a first direction perpendicular to a main surface of a substrate and extending in a second direction crossing the first direction; second lines arranged in the second direction, extending in the first direction, and intersecting the first lines; memory cells disposed at intersections of the first lines and the second lines; and an interlayer insulating film provided between the second lines. The interlayer insulating film has an air gap extending continuously in the first direction so as to intersect at least some of the first lines aligned along the first direction. The interlayer insulating film also includes an insulating film positioned above the air gap and having a curved surface that protrudes toward a direction of the substrate.

Abstract: This semiconductor memory device comprises a memory cell array that includes: a plurality of first lines; a plurality of second lines intersecting the plurality of first lines; a plurality of memory cells each disposed at an intersection of the plurality of first lines and the plurality of second lines and including a variable resistance element; and a select transistor respectively connected to an end of the plurality of first lines. The select transistor includes a gate electrode, a gate insulating film, and a conductive layer. Moreover, one end of that conductive layer is connected to the end of the first line, and a non-linear resistance layer configured from a non-linear material is connected between the first line and the conductive layer.

Abstract: A semiconductor memory device comprises: first lines disposed in a first direction perpendicular to a substrate and extending in a second direction parallel to the substrate; second lines disposed in the second direction and configured to extend in the first direction, the second lines intersecting the first lines; and memory cells disposed at intersections of the first lines and the second lines and each including a variable resistance element. Furthermore, a third line extends in a third direction orthogonal to the first and second directions. A select transistor is connected between the second and third lines. A control circuit controls a voltage applied to the first and third lines, and the select transistor. The control circuit renders conductive at least one of the select transistors and thereby detect a current flowing in the third line, and determines a deterioration state of the select transistor according to a detection result.

Abstract: A device for creating a fragment model from a crystal model is equipped with a division position identifying section adapted for identifying multiple division atom pairs for multiple atoms contained in the crystal model. The atoms in the division atom pairs are contained in different fragment models. The device is additionally equipped with a model creating section adapted for identifying each of multiple atom groups each composed of atoms bonded to each other in the crystal model and for creating fragment models respectively corresponding to the identified atom groups.

Abstract: A nonvolatile semiconductor memory device according to an embodiment includes a control circuit configured to cause data to be stored in a memory cell by setting the memory cell to be included in one of resistance value distributions. The control circuit is configured to set a first resistance value distribution and a second resistance value distribution, the second resistance value distribution having a resistance value larger than that of the first resistance value distribution, and to set a second width to be larger than a first width, the second width being a width between a second upper limit value of the second resistance value distribution and a second lower limit value of the second resistance value distribution, and the first width being a width between a first upper limit value of the first resistance value distribution and a first lower limit value of the first resistance value distribution.

Abstract: According to an embodiment, a non-volatile memory device includes a first wiring extending in a first direction, a second wiring extending in a second direction orthogonal to the first direction. The device includes third wirings, and a first and a second memory. The third wirings extend in a third direction crossing the first direction and orthogonal to the second direction, and aligned in the second direction on both sides of the second wiring. The first memory is provided between one of third wiring pair and the second wiring, the pair of third wirings facing each other across the second wiring. The second memory is provided between another one of the third wiring pair and the second wiring. The second wiring has a block portion between a first portion in contact with the first memory and a second portion in contact with the second memory.

Abstract: First, a trench penetrating first conductive layers and interlayer insulating layers is formed. Next, a column-shaped conductive layer is formed to fill the trench via a side wall layer. Then, after formation of the side wall layer, by migration of oxygen atoms between the side wall layer and the first conductive layers or migration of oxygen atoms between the side wall layer and the interlayer insulating layers, a proportion of oxygen atoms in the side wall layer adjacent to the interlayer insulating layers is made larger than a proportion of oxygen atoms in the side wall layer adjacent to the first conductive layers, whereby the side wall layer adjacent to the first conductive layers is caused to function as the variable resistance element.

Abstract: A semiconductor memory device according to an embodiment includes a memory cell array and a control circuit. The memory cell array includes first lines and second lines intersecting each other, a third line commonly connecting to the first lines, memory cells disposed at intersections of the first lines and the second lines, respectively. The control circuit is configured to execute a state determining operation detecting a voltage of the third line, and adjust a voltage applied to the first lines and the second lines during a resetting operation or a setting operation based on a result of the state determining operation. The resetting operation raises a resistance value of the variable resistance element. The setting operation lowers the resistance value of the variable resistance element.

Abstract: A semiconductor memory device has a memory cell array including memory cells, the memory cell being disposed at an intersection of first lines and second lines, the second lines being disposed intersecting the first lines, and the memory cell including a variable resistance element; and a control circuit. The control circuit is configured to execute a forming operation sequentially on a plurality of the memory cells. The control circuit applies a forming voltage to a selected memory cell of the memory cells, and controls the forming voltage such that the forming voltage is lower as the forming operation progresses.