Patents by Inventor Takeharu Tani

Takeharu Tani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7491923
    Abstract: A solid state imaging device has a semiconductor substrate with photodiodes and charge transfer sections formed thereon, transfer electrodes formed on the charge transfer sections across an insulating layer, and a light shielding layer to protect the charge transfer sections from light. The light shielding layer has openings to correspond the positions of the photodiodes. Disposed above the openings of the light shielding layer are microlenses, and a converging structure such as a converging lens is provided inside each opening. Incident light rays from the microlens are focused toward the photodiode effectively by the converging lens.
    Type: Grant
    Filed: December 26, 2006
    Date of Patent: February 17, 2009
    Assignee: Fujifilm Corporation
    Inventor: Takeharu Tani
  • Publication number: 20080272346
    Abstract: A multi-photon absorber medium is of a predetermined thickness and contains multi-photon absorber material. The medium causes photo-reaction by multi-photon absorption upon receipt of light projected inward from one side. The reactivity to the light of the medium gradually increases from the one side toward another side.
    Type: Application
    Filed: May 29, 2008
    Publication date: November 6, 2008
    Inventor: Takeharu Tani
  • Patent number: 7432036
    Abstract: A non-resonant two-photon absorbing material is provided, comprising a methine dye undergoing a non-resonant two-photon absorption, in which the methine dye is preferably a cyanine dye, a merocyanine dye or an oxonol dye, and a non-resonant two-photon absorbing material is provided, comprising a non-resonant two-photon absorbing compound undergoing non-resonant two-photon absorption in the intermolecular aggregation state.
    Type: Grant
    Filed: October 6, 2003
    Date of Patent: October 7, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Hiroo Takizawa, Takeharu Tani, Naoki Morinaga
  • Publication number: 20080189088
    Abstract: In an apparatus for analyzing an electromagnetic field in an analytical space: a range setting unit sets the range of the analytical space; an object-information setting unit sets a distribution-index value indicating the amount of particles distributed in the range, the dimensions of the particles, a first material-property value of a first material of which the particles are formed, and a second material-property value of a second material existing around the particles in the range; a model production unit produces a calculation model of an arrangement in which the particles are arranged at random positions in the range so as to realize the distribution-index value, the dimensions of the particles, the first material-property value, and the second material-property value which are set by the object-information setting unit; and an analysis unit analyzes the electromagnetic field in the range in accordance with the calculation model.
    Type: Application
    Filed: February 5, 2008
    Publication date: August 7, 2008
    Applicant: FUJIFILM CORPORATION
    Inventor: Takeharu TANI
  • Publication number: 20080079031
    Abstract: Light guides are formed above each light receiving element. These light guides are made of a high refractive index material, and surrounded by a material of lower refractive index. The light guides are each made up of a light introduction region leading with a constant width from a light entrance surface, and a tapered reduced region leading from the light introduction region to a light exit surface. The light introduction region totally reflects the incident light toward the reduced region. The reduced region, owing to its tapered shape, surely directs the light onto a light receiving element, and prevents the light from entering charge transfer paths around the light receiving element.
    Type: Application
    Filed: September 27, 2007
    Publication date: April 3, 2008
    Inventor: Takeharu Tani
  • Publication number: 20070263221
    Abstract: A new and novel sensor having a simple structure with high detection sensitivity. The sensor (S1) includes the following from measuring light (L1) input side in the order listed below: a first reflector (10) having semi-transmissive and semi-reflective properties; a translucent body (20); and a second reflector (30) having perfect reflection properties, or semi-transmissive and semi-reflective properties. The first reflector (10) and/or second reflector is brought into contact with a specimen, and the average complex refractive index varies with the specimen. Absorption properties for absorbing light having a particular wavelength are produced by these components, the properties of the measuring light (L1) are changed by the optical properties including the absorption properties, the output light (L2) is outputted from the first reflector (10) and/or second reflector (30), and the physical properties of the output light (L2) that vary according to the optical properties are detected.
    Type: Application
    Filed: June 14, 2006
    Publication date: November 15, 2007
    Applicant: FUJIFILM Corporation
    Inventors: Masayuki Naya, Takeharu Tani
  • Patent number: 7241550
    Abstract: A multiphoton-absorption exposure apparatus for exposing a multiphoton absorption material by applying light to the multiphoton absorption material so that the light converges at a predetermined convergence position, in which an exposure-condition control unit is provided for changing an exposure condition so that optical reactions are more likely to occur when the predetermined convergence position is located deeper in the multiphoton absorption material.
    Type: Grant
    Filed: September 9, 2004
    Date of Patent: July 10, 2007
    Assignee: Fujifilm Corporation
    Inventor: Takeharu Tani
  • Publication number: 20070145241
    Abstract: A solid state imaging device has a semiconductor substrate with photodiodes and charge transfer sections formed thereon, transfer electrodes formed on the charge transfer sections across an insulating layer, and a light shielding layer to protect the charge transfer sections from light. The light shielding layer has openings to correspond the positions of the photodiodes. Disposed above the openings of the light shielding layer are microlenses, and a converging structure such as a converging lens is provided inside each opening. Incident light rays from the microlens are focused toward the photodiode effectively by the converging lens.
    Type: Application
    Filed: December 26, 2006
    Publication date: June 28, 2007
    Inventor: Takeharu Tani
  • Publication number: 20070134132
    Abstract: In a plating-thickness monitor apparatus, a base light irradiation unit irradiates a member to be plated with base light L. A detection unit detects the characteristic of reflection light Le emitted from the member to be plated by irradiation with the base light L. A plating-thickness monitor unit examines, based on a detection result obtained by the detection unit, the thickness of a plating material deposited in very small pores formed on the member to be plated during plating.
    Type: Application
    Filed: December 8, 2006
    Publication date: June 14, 2007
    Inventors: Takeharu Tani, Masayuki Naya, Yuichi Tomaru
  • Patent number: 7112616
    Abstract: A two-photon absorbing polymerizable composition contains at least a two-photon absorbing compound, a polymerization initiator and a polymerizable compound, the composition being photopolymerizable upon non-resonant two-photon absorption, wherein the two-photon absorbing compound is a methine dye containing a compound represented by the formula (1): wherein R1 to R5 each represents a hydrogen atom or a substituent and some of R1 to R4 may combine with each other to form a ring; n and m each independently represents an integer of 0 to 4, provided that n and m are not 0 at the same time; X1 and X2 each represents an aryl group, a heterocyclic group or a group represented by formula (2); R6 represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or a heterocyclic group, and Z1 represents an atomic group for forming a 5- or 6-membered ring.
    Type: Grant
    Filed: March 19, 2004
    Date of Patent: September 26, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroo Takizawa, Masaharu Akiba, Takeharu Tani
  • Patent number: 7012693
    Abstract: A sensor comprising a light source for emitting a light beam, and a measuring chip. The measuring chip includes a dielectric block transparent to the light beam, a thin film layer formed on the dielectric block, and a liquid-sample holding mechanism for holding a liquid sample. The sensor also comprises an optical system for making the light beam enter the dielectric block at an angle of incidence so that a total internal reflection condition is satisfied at an interface between the dielectric block and the thin film layer. The sensor further comprises a photodetector for detecting the intensity of the light beam totally reflected at the interface, and a measuring section for measuring a state of attenuated total reflection, based on the result of detection obtained by the photodetector. The irradiation energy of the light beam at the interface is 100 mJ/mm2 or less.
    Type: Grant
    Filed: September 11, 2002
    Date of Patent: March 14, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobufumi Mori, Takeharu Tani
  • Patent number: 7009706
    Abstract: A measuring chip comprising a dielectric block and a thin film layer formed on one surface of the dielectric block. The thin film layer is used for placing a sample thereon. The dielectric block is formed as a single block, which includes an entrance surface at which a light beam enters the dielectric block, an exit surface from which the light beam emerges, and the one surface on which the thin film layer is formed. In addition, the dielectric block is integrated with the thin film layer and formed from a resin whose photoelastic coefficient is less than 50×10?12 Pa?1.
    Type: Grant
    Filed: December 13, 2002
    Date of Patent: March 7, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobufumi Mori, Takeharu Tani, Atsushi Mukai
  • Patent number: 6992806
    Abstract: In an optical element, a propagation direction of incident light beam is largely changed and the direction-changed light beam is derived in a desirable direction without increasing a dimension and manufacturing cost thereof. The optical element includes photonic crystal having a refractive index which changes periodically depending on a location of the photonic crystal, wherein an angle defined between a first end face and a second end face thereof is determined in such a manner that a light beam incident upon the first end face at a predetermined incidence angle and having a predetermined wavelength is emitted from the second end face in a desirable direction.
    Type: Grant
    Filed: October 8, 2003
    Date of Patent: January 31, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshihiko Baba, Takeharu Tani
  • Publication number: 20060001884
    Abstract: A measurement apparatus includes a dielectric block, a thin film layer formed on the dielectric block and brought into contact with a sample, a light source for generating a light beam, an optical incident system for causing the light beam to enter the dielectric block so that the light beam is totally reflected at the interface between the dielectric block and the thin film, and a two-dimensional light detection means for detecting the intensity of the light beam totally reflected at the interface. A predetermined pattern is formed within a region irradiated with the light beam on the dielectric block. The measurement apparatus includes a correction means for correcting an output from the two-dimensional light detection means, based on the pattern, so that an object on the face of the dielectric block is similar to the object detected by the two-dimensional detection means.
    Type: Application
    Filed: July 1, 2005
    Publication date: January 5, 2006
    Inventors: Takeharu Tani, Masayuki Naya
  • Publication number: 20050116207
    Abstract: A multi-photon absorber medium is of a predetermined thickness and contains multi-photon absorber material. The medium causes photo-reaction by multi-photon absorption upon receipt of light projected inward from one side. The reactivity to the light of the medium gradually increases from the one side toward another side.
    Type: Application
    Filed: September 9, 2004
    Publication date: June 2, 2005
    Inventor: Takeharu Tani
  • Publication number: 20050068597
    Abstract: In an optical element, a propagation direction of incident light beam is largely changed and the direction-changed light beam is derived in a desirable direction without increasing a dimension and manufacturing cost thereof. The optical element includes photonic crystal having a refractive index which changes periodically depending on a location of the photonic crystal, wherein an angle defined between a first end face and a second end face thereof is determined in such a manner that a light beam incident upon the first end face at a predetermined incidence angle and having a predetermined wavelength is emitted from the second end face in a desirable direction.
    Type: Application
    Filed: October 8, 2003
    Publication date: March 31, 2005
    Inventors: Toshihiko Baba, Takeharu Tani
  • Publication number: 20050057736
    Abstract: A multiphoton-absorption exposure apparatus for exposing a multiphoton absorption material by applying light to the multiphoton absorption material so that the light converges at a predetermined convergence position, in which an exposure-condition control unit is provided for changing an exposure condition so that optical reactions are more likely to occur when the predetermined convergence position is located deeper in the multiphoton absorption material.
    Type: Application
    Filed: September 9, 2004
    Publication date: March 17, 2005
    Inventor: Takeharu Tani
  • Patent number: 6841340
    Abstract: A highly accurate structure is optically fabricated simply and in a short time. Rough optical fabrication using an ultraviolet-irradiation optical fabrication process is carried out for a photo-curing resin by emission of a laser beam from a first light source, and thereafter, fine optical fabrication using a two-photon absorption optical fabrication process is carried out by emission of a laser beam from a second light source. As a result, it is possible to realize optical fabrication which allows fabrication of a fine structure using a two-photon absorption optical fabrication process while realizing high speed processing using the ultraviolet-irradiation optical fabrication process.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: January 11, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Takeharu Tani
  • Publication number: 20050003133
    Abstract: A two-photon absorbing optical recording material comprising at least one two-photon absorbing compound and a recording component is provided. Recording is made on it by utilizing the two-photon absorption of the two-photon absorbing compound in the material, and then the material is irradiated with light to thereby detect the difference in the reflectance between the recorded area and the unrecorded area thereof, and the recorded information is thereby reproduced from the material, and also provided are a photosensitive polymer composition and a photon-mode recording method for the material.
    Type: Application
    Filed: June 24, 2004
    Publication date: January 6, 2005
    Inventors: Masaharu Akiba, Takeharu Tani, Hiroo Takizawa, Yoshio Inagaki
  • Publication number: 20040204513
    Abstract: A two-photon absorbing polymerizable composition contains at least a two-photon absorbing compound, a polymerization initiator and a polymerizable compound, the composition being photopolymerizable upon non-resonant two-photon absorption, wherein the two-photon absorbing compound is a methine dye containing a compound represented by the formula (1): 1
    Type: Application
    Filed: March 19, 2004
    Publication date: October 14, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Hiroo Takizawa, Masaharu Akiba, Takeharu Tani