Abstract: According to one embodiment, a processing device is configured to acquire an image including a hand of a worker and a plurality of markers attached to a first tool for turning a screw. The processing device is further configured to calculate a first position of the first tool based on a plurality of positions of the plurality of markers in a case where the hand touches a virtual first object. The processing device is further configured to determine whether a screw is turned at a fastening location corresponding to the first object based on a first distance between the first object and the first position.

Abstract: According to one embodiment, a processing system is used for a task of turning a screw at a fastening location with a tool. The processing system comprises a display device and a processing device. The display device is configured to display a virtual first object around a region where the tool can be positioned during the task. The processing device is configured to estimate a position of the tool. The processing device is configured to issue an alert in a case where the tool is determined to be in contact with the first object based on the estimated position.

Abstract: According to one embodiment, a mixed reality device includes an imaging part and a processing part. The imaging part is configured to acquire an image. The processing part is configured to recognize, from the image, a hand of a worker performing a fastening task. The processing part is further configured to determine whether the fastening task is appropriate based on a first distance between a first position corresponding to a fastening location of a screw and a second position of the hand holding a first tool.

Abstract: According to one embodiment, a cross-reality comprises an imaging device, a display device, and a processing device. The imaging device is configured to acquire an image. The display device is configured to display a virtual space. The processing device is configured to detect a hand of a human from the image. the processing device is configured to generate an object in the virtual space in response to a command input by the human, and change a position and a size of the generated object in accordance with a movement of the hand.

Abstract: According to one embodiment, a mixed reality device is capable of superimposing a virtual space on a real space. The mixed reality device is configured to set a three-dimensional coordinate system in the virtual space based on a prescribed object imaged in the real space. The mixed reality device is further configured to display a virtual object at a predetermined position in the three-dimensional coordinate system. The mixed reality device is further configured to change a display direction of the virtual object according to a positional relationship between the virtual object and the mixed reality device.

Abstract: In a semiconductor device, a source region is made of an epitaxial layer so as to reduce variation in thickness of a base region and variation in a threshold value. Outside of a cell part, a side surface of a gate trench is inclined relative to a normal direction to a main surface of a substrate, as compared with a side surface of a gate trench in the cell part that is provided by the epitaxial layer of the source region being in contact with the base region.

Abstract: According to one embodiment, a processing device acquires an image, a coordinate, and dialog data communicated between a first device and a second device. The first device is used by a first person performing a task, and the second device is used by a second person. The processing device extracts at least one of a plurality of the coordinates based on the dialog data. The processing device associates the extracted at least one of the plurality of coordinates with the task.

Abstract: According to one embodiment, a processing system generates first graph data based on a pose of a worker. The pose is estimated based on a first image of the worker. The first graph data includes a plurality of first nodes corresponding respectively to a plurality of joints of the worker, and a plurality of first edges corresponding respectively to a plurality of skeletal parts of the worker. The processing system inputs the first graph data to a neural network including a graph neural network (GNN). The processing system estimates a task being performed by the worker, by using a result output from the neural network.

Abstract: According to one embodiment, a processing system estimates a pose of a worker based on a first image in which the worker and an article are visible. The processing system estimates at least one selected from a state of the article and a work location of the worker on the article, based on the first image. The processing system generates first graph data including a plurality of nodes and a plurality of edges, based on the pose and the at least one selected from the state and the work location. The processing system inputs the first graph data to a neural network including a graph neural network (GNN). The processing system estimates a task being performed by the worker, by using a result output from the neural network.

Abstract: According to one embodiment, an analysis device performs an analysis related to a plurality of tasks of a manufacturing process. The analysis device receives an image when each of the plurality of tasks is performed. The analysis device receives the images from an imaging device acquiring the images. The analysis device receives a detection signal from a tool used in at least one of the plurality of tasks. The detection signal is detected by the tool. The analysis device refers to end determination data for determining an end of each of the plurality of tasks. The analysis device determines the end of each of the plurality of tasks based on the images, the detection signal, and the end determination data.

Abstract: In a semiconductor device, a source region is made of an epitaxial layer so as to reduce variation in thickness of a base region and variation in a threshold value. Outside of a cell part, a side surface of a gate trench is inclined relative to a normal direction to a main surface of a substrate, as compared with a side surface of a gate trench in the cell part that is provided by the epitaxial layer of the source region being in contact with the base region.

Abstract: According to one embodiment, an analysis device performs an analysis related to a plurality of tasks of a manufacturing process. The analysis device receives an image when each of the plurality of tasks is performed. The analysis device receives the images from an imaging device acquiring the images. The analysis device receives a detection signal from a tool used in at least one of the plurality of tasks. The detection signal is detected by the tool. The analysis device refers to end determination data for determining an end of each of the plurality of tasks. The analysis device determines the end of each of the plurality of tasks based on the images, the detection signal, and the end determination data.

Abstract: A semiconductor device includes a semiconductor element having a substrate, a drift layer, a base region, a source region, trench gate structures, an interlayer insulating film, a source electrode, and a drain electrode. The substrate is made of silicon carbide. The drift layer is disposed on the substrate and has an impurity concentration lower than the substrate. The base region is made of silicon carbide and disposed on the drift layer. The source region is made of silicon carbide having an impurity concentration higher than the drift layer. Each trench gate structure has a gate trench, a gate insulating film, and a gate electrode. The interlayer insulating film covers the gate electrode and the gate insulating film. The source electrode is in ohmic-contact with the source region. The drain electrode is disposed on a rear surface of the substrate.

Abstract: An elevator device includes a guide rail (1), a car (3), and a guide device (4). The car (3) is movable in a horizontal direction at a specific height. The guide device (4) includes a supporting member (11) and a guide member (12). The guide member (12) is displaceable to a first position for restricting movement of the car (3) in the horizontal direction and guiding up-down movement of the car (3) and a second position where the guide member (12) does not come into contact with the guide rail (1) when the car (3) moves in the horizontal direction.

Abstract: A plasma processing apparatus includes a plasma processing chamber; a substrate support; a lower electrode; an RF power supply; and an upper electrode assembly. The upper electrode assembly includes a gas diffusion plate; an insulating plate; and an upper electrode plate arranged between the gas diffusion plate and the insulating plate, and having a plurality of first through holes and a plurality of second through holes. The insulating plate includes an inner annular protrusion and an outer annular protrusion protruding downward from a lower surface of the insulating plate, and the insulating plate has a plurality of first gas introduction holes, a plurality of second gas introduction holes, and a plurality of third gas introduction holes.

Abstract: According to one embodiment, a production management device acquires a first short-term plan generated based on a first long-term plan. The first long-term plan is of a plan of production in a prescribed period. The first short-term plan is of a plan of production in a first period. The device acquires first progress data of a progress in a task, and acquires first prediction data by using the first progress data. The first prediction data is of a prediction of a progress in the task. The device revises the first short-term plan based on the first prediction data, and acquires second prediction data by using second progress data. The second progress data is of a progress in the task. The second prediction data is of a prediction of a progress of the production in the prescribed period. The device generates a second long-term plan in the prescribed period.

Abstract: According to one embodiment, a processing device causes a display of a first object at a position separated from a fastening location of a screw. The first object is virtual and indicates the fastening location. The processing device associates first data and second data when a prescribed physical object contacts the first object and the first data is received from a tool turning the screw. The second data is related to the fastening location.

Abstract: According to one embodiment, a processing system estimates a pose of a worker, a position of an article, an orientation of the article, and a state of the article based on an image of the worker and the article. The processing system further estimates a work spot of the worker on the article based on an estimation result of the pose, an estimation result of the position, and an estimation result of the orientation. The processing system further estimates a task performed by the worker based on an estimation result of the work spot and an estimation result of the state.

Abstract: According to one embodiment, an analysis device performs an analysis related to a plurality of tasks of a manufacturing process. The analysis device receives an image when each of the plurality of tasks is performed. The analysis device receives the images from an imaging device acquiring the images. The analysis device receives a detection signal from a tool used in at least one of the plurality of tasks. The detection signal is detected by the tool. The analysis device refers to end determination data for determining an end of each of the plurality of tasks. The analysis device determines the end of each of the plurality of tasks based on the images, the detection signal, and the end determination data.

Abstract: A semiconductor device includes a semiconductor substrate having an active region in which a main switching element structure is formed, a current sense region in which a sense switching element structure is formed, and a peripheral region located around the active region and the current sense region. The semiconductor substrate is a 4H-SiC substrate having an off angle in a <11-20>direction. The current sense region is disposed in a range where the active region is not present when viewed along the <1-100>direction.