Patents by Inventor Takenori Fujiwara

Takenori Fujiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film
    Publication number: 20060115766
    Abstract: This invention provides a positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant, used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. It is a positive photosensitive siloxane composition comprising a siloxane polymer, quinonediazide compound and solvent, characterized in that the light transmittance of the cured film formed of the composition per 3 ?m of film thickness at a wavelength of 400 nm is 95% or more.
    Type: Application
    Filed: November 15, 2005
    Publication date: June 1, 2006
    Applicant: Toray Industries, Inc.
    Inventors: Mitsuhito Suwa, Takenori Fujiwara, Masahide Senoo, Hirokazu Iimori