Abstract: A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator component (B) that generates acid on exposure, wherein the component (B) comprises at least one onium salt selected from the group consisting of onium salts having an anion represented by formula (b-0-1) or (b-0-2) shown below: wherein X represents an alkylene group having 2 to 6 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom; and each of Y and Z independently represents an alkyl group having 1 to 10 atoms, in which at least one hydrogen atom is substituted with a fluorine atom.

Abstract: A substrate for use as a disk substrate in a hard disk drive or the like, an information recording medium such as a magnetic disk, and a starting material glass plate which is a starting material of the substrate for information recording media. The forming conditions of the starting material glass plate are controlled such that the starting material glass plate has a long-wavelength waviness of not more than 6 nm. This starting material glass plate is polished so as to have a long-wavelength waviness of not more than 6 nm using CeO2 abrasive grains having a mean grain diameter of not less than 0.01 ?m and a 90% diameter of the volume grain size distribution of not less than 0.02 ?m. The resulting substrate for an information recording medium has an excellent planarity, can be obtained in a short time and with a low polishing amount, and the resulting information recording medium is able to cope with increased data zone recording density.

Abstract: A substrate for use as a disk substrate in a hard disk drive or the like, an information recording medium such as a magnetic disk, and a starting material glass plate which is a starting material of the substrate for information recording media. The forming conditions of the starting material glass plate are controlled such that the starting material glass plate has a long-wavelength waviness of not more than 6 nm. This starting material glass plate is polished so as to have a long-wavelength waviness of not more than 6 nm using CeO2 abrasive grains having a mean grain diameter of not less than 0.01 ?pm and a 90% diameter of the volume grain size distribution of not less than 0.02 ?m. The resulting substrate for an information recording medium has an excellent planarity, can be obtained in a short time and with a low polishing amount, and the resulting information recording medium is able to cope with increased data zone recording density.

Abstract: A light guide member in which a light that has entered one major face from an illuminant is emitted from the other major face, is characterized by comprising: a cut portion provided with a specified face inclined toward the other face at a section of one major face that faces the illuminant, and a reflecting portion, which reflects a light emitted from the illuminant, on the inclined face.

Abstract: A substrate for use as a disk substrate in a hard disk drive or the like, an information recording medium such as a magnetic disk, and a starting material glass plate which is a starting material of the substrate for information recording media. The forming conditions of the starting material glass plate are controlled such that the starting material glass plate has a long-wavelength waviness of not more than 6 nm. This starting material glass plate is polished so as to have a long-wavelength waviness of not more than 6 nm using CeO2 abrasive grains having a mean grain diameter of not less than 0.01 ?m and a 90% diameter of the volume grain size distribution of not less than 0.02 ?m. The resulting substrate for an information recording medium has an excellent planarity, can be obtained in a short time and with a low polishing amount, and the resulting information recording medium is able to cope with increased data zone recording density.

Abstract: A reflector frame, which is disposed on a light-emitting device mounting substrate on which a plurality of light-emitting devices is disposed in an array pattern, is characterized by comprising a plurality of opening portions corresponding to the disposed positions of the light-emitting devices.

Abstract: The luminous device mounting substrate, in which plural kinds of luminous devices with different luminance colors are mounted, is characterized by comprising a plurality of luminous device mounting portions each of which is for enclosing a luminous device corresponding to a luminance color, wherein the luminous device mounting portion has a configuration in which a plurality of luminous devices can be mounted on each luminous device mounting portion.

Abstract: A light guide member capable of reducing an unevenness of luminescent color and further a nonuniformity in luminance when obtaining a white color by a color mixture using a plurality of light sources, a flat light source device and a display device are provided. A protrusion 4 of a cylindrical shape is formed upward a plurality color of LED light sources 5R, 5G, 5B, e.g., RGB color at a backside face of a light guide member 1, and a conical depression 3 is disposed at the position directly over the protrusion. Lights of each color from LED light sources 5R, 5G, 5B are mixed at the protrusion 4, thereafter reflect at the depression 3 and propagates in a horizontal direction at a light guide portion 2.

Abstract: An antenna unit equipped with a satellite radio tuner and a tuner-unequipped head unit are connected to each other through a serial bus cable. Equipped in the antenna unit, the satellite radio tuner has a tuner portion, a digital demodulating portion, an interface portion, and a CPU. The interface portion serves as a speech/serial converting portion for converting a digital speech signal into a serial signal. The head unit includes an interface portion for receiving the serial signal sent from the antenna unit through a serial bus cable. The interface portion serves as a serial/speech converting portion for converting the received serial signal into the speech signal.

Abstract: To provide a photosensitive resin which realizes formation of a pattern having a good shape, without involving a problem in terms of poor compatibility between an acid generator and a photoresist primary-component polymer having an acid dissociable group, and a photosensitive composition containing the photosensitive resin.

Abstract: A light guide member laminated on the upper face of a luminous device mounting substrate on which a luminous device is mounted and which is for diffusing and guiding upward light emitted from the luminous device. The light guide member includes a light reflecting portion formed on the bottom face of the light guide member in an area other than an area near the luminous device, and a section in which a light reflecting portion is not formed on the bottom face of the light guide member at a position near the luminous device. Also disclosed is a planar light source device provided with the light guide member, and a display apparatus using the planar light source device.

Abstract: Disclosed is a display device displaying a predetermined pattern comprising an organic electroluminescence element comprising a transparent anode, an organic electroluminescent compound layer, a cathode buffer layer patterned predetermined pattern and a cathode insulating substrate. The display device can display a predetermined pattern with high electrical power efficiency by a simple structure.

Abstract: A calixresorcinarene compound represented by the following formula (1): wherein eight Rs are n (n is an integer of 1 to 7) substituents that are one or more types of substituents selected from groups represented by the following formula (2), and m (m is an integer shown by 8-n) hydrogen atoms; and R's, which may be the same or different, are each a straight-chain aliphatic hydrocarbon group having 2 to 12 carbon atoms, a branched aliphatic hydrocarbon group having 3 to 12 carbon atoms, a phenyl group, a p-phenylphenyl group, a p-tert-butylphenyl group, and an aromatic group represented by the following formula (3), or a substituent formed by combining two or more of these substituents: wherein R? is a hydrogen atom or a substituent selected from the substituents represented by the formula (2).

Abstract: A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.

Abstract: According to one embodiment, a telephone system includes a plurality of telephone exchange apparatuses which execute exchange processing among a plurality of telephone terminals and a server apparatus which is connected to the plurality of telephone exchange apparatuses via transmission paths, receives a call information event to specify a plurality of telephone terminals to be call-connected, and executes a computer supported telephony application with prescribed standards regarding call state management of the plurality of telephone terminals, wherein the server apparatus includes a controller which returns a telephone terminal which has become an extra state of the standards to a state in the standards, when the sate in the standards changes into the extra state of the standards in a state in which call connections among a plurality of telephone terminals connected to telephone exchange apparatuses different from one another.

Abstract: A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.

Abstract: The present invention provides a hyperbranched polymer that is capable of being used as a polymer material for nanofabrication including lithography, has enhanced dry etching resistance, sensitivity and surface smoothness, has a core shell structure and has an acid degradable repeating unit of tert-butyl vinylbenzoate ester in a shell portion, and a resist composition containing the hyperbranched polymer.

Abstract: A light-emitting body comprising a primary luminescent unit and a secondary luminescent unit that emits light owing to light emitted from the primary luminescent unit, wherein the secondary luminescent unit contains an iridium compound. As the iridium compound, an iridium complex represented by L1L2L3Ir, (L1, L2 and L3 are organic bidentate ligands coordinated to iridium, and at least one of these ligands coordinates with a nitrogen atom and a carbon atom) preferably, represented by formula (2) can be cited. (In the formula, X represents an atom group that forms an aromatic chelate ligand together with a carbon atom and a nitrogen atom bonded with iridium, n is an integer of 2 or 3, and L represents a bidentate organic ligand wherein the atoms other than carbon atoms are bonded with iridium.

Abstract: A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator component (B) that generates acid on exposure, wherein the component (B) comprises at least one onium salt selected from the group consisting of onium salts having an anion represented by formula (b-0-1) or (b-0-2) shown below: wherein X represents an alkylene group having 2 to 6 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom; and each of Y and Z independently represents an alkyl group having 1 to 10 atoms, in which at least one hydrogen atom is substituted with a fluorine atom.

Abstract: A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.