Patents by Inventor Takeshi Deguchi
Takeshi Deguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11929655Abstract: An embodiment includes: a first transport module on which a carriage moves; a second transport module that is configured to be able to move to a position for connecting to the first transport module and on which the carriage is able to move to and from the first transport module; a position detection unit that detects a position in a moving direction of the second transport module and outputs position information; a first control unit that controls motion of the carriage on the first transport module; a second control unit that controls motion of the carriage on the second transport module; a third control unit that controls motion of the second transport module; and a fourth control unit that controls the first to third control units. The fourth control unit corrects a position where the second transport module connects to the first transport module based on the position information.Type: GrantFiled: February 19, 2021Date of Patent: March 12, 2024Assignee: CANON KABUSHIKI KAISHIInventors: Hirohisa Ota, Takeshi Yamamoto, Satoru Deguchi, Takashi Shigemori, Kichinosuke Hirokawa, Ryota Okazaki
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Patent number: 11596719Abstract: This adhesion prevention film for medical devices is a single-layer or multilayer adhesion prevention film that is formed on the surface of a medical device. This adhesion prevention film for medical devices comprises an outermost layer that contains a plurality of conductive particles and a resin having a continuously usable temperature of 200° C. or higher. The surface of the outermost layer is provided with recesses and projections by having parts of the plurality of conductive particles exposed from the resin.Type: GrantFiled: August 20, 2018Date of Patent: March 7, 2023Assignee: OLYMPUS CORPORATIONInventors: Yu Murano, Takuya Fujihara, Takeshi Deguchi, Hiroaki Kasai, Kohei Shiramizu
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Publication number: 20190192212Abstract: A conductive adhesion preventing film for medical use, includes: a nonconductive base material; and a linear conductor having a length of 10 ?m or more and a diameter of more than 50 nm and contained in the conductive adhesion preventing film by an amount of 5% by mass or more and 40% by mass or less, wherein the conductive adhesion preventing film is formed on an electrode surface of a medical device performing at least one of incision, resection, coagulation, and ablation on living tissue by applying a high frequency voltage.Type: ApplicationFiled: March 1, 2019Publication date: June 27, 2019Applicant: OLYMPUS CORPORATIONInventors: Yu MURANO, Takuya FUJIHARA, Hiroaki KASAI, Takeshi DEGUCHI
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Publication number: 20190048205Abstract: An adhesion preventing film coated on a surface of a member, includes a surface layer with siloxane bonding as a main component; and protrusion particles, each protrusion particle having a protrusion part protruding from the surface layer, wherein a methyl group exists at least on a surface of the protrusion part of the protrusion particle.Type: ApplicationFiled: October 18, 2018Publication date: February 14, 2019Applicant: OLYMPUS CORPORATIONInventors: Hiroaki KASAI, Takeshi DEGUCHI, Takuya FUJIHARA
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Publication number: 20180353658Abstract: This adhesion prevention film for medical devices is a single-layer or multilayer adhesion prevention film that is formed on the surface of a medical device. This adhesion prevention film for medical devices comprises an outermost layer that contains a plurality of conductive particles and a resin having a continuously usable temperature of 200° C. or higher. The surface of the outermost layer is provided with recesses and projections by having parts of the plurality of conductive particles exposed from the resin.Type: ApplicationFiled: August 20, 2018Publication date: December 13, 2018Applicant: OLYMPUS CORPORATIONInventors: Yu MURANO, Takuya FUJIHARA, Takeshi DEGUCHI, Hiroaki KASAI, Kohei SHIRAMIZU
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Publication number: 20140004277Abstract: A method of manufacturing an optical component by forming an optical thin film on a substrate made of resin using either an ion assisted deposition method or a plasma assisted deposition method, and by controlling a first parameter, which includes at least one of gas flow amount, irradiation duration, and applied power of the ion assisted method or the plasma assisted method, according to a second parameter relevant to a radius of curvature of the substrate.Type: ApplicationFiled: August 9, 2013Publication date: January 2, 2014Applicant: Olympus CorporationInventors: Takeshi Deguchi, Yoshito Ito, Kei Kikuchi, Nobuyoshi Toyohara
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Publication number: 20120200927Abstract: An optical element having anti-reflection film includes an anti-reflection film having a reflection characteristic expressed by a function Fm(x), which is on an mth optical surface, and an anti-reflection film having a reflection characteristic expressed by a function Fn(x), which is on an nth optical surface. At least one of the Fm(x) and Fn(x) functions has the maximum value of reflectance in a predetermined wavelength, and has a characteristic curve of W-shape, and the other of the Fm(x) and Fn(x) function has a wavelength that negates at least one maximum value of the Fm(x) and the Fn(x) functions. The anti-reflection film having reflection characteristic expressed by the function Fm(x) is on an optical surface on a side nearer to the light source, than the anti-reflection film having reflectance characteristic expressed by the function Fn(x), where, m and n are positive integers, and m<n.Type: ApplicationFiled: February 2, 2012Publication date: August 9, 2012Applicant: Olympus CorporationInventors: Takeshi Deguchi, Masanori Koyama, Ryo Sakurai, Nobuyoshi Toyohara
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Publication number: 20110217532Abstract: An optical component includes a multilayered optical thin film formed on a substrate. A critical load value of the optical thin film that includes at least one layer that is formed by a vacuum deposition method is greater than or equal to 30 mN. The critical load value is a value evaluated by a measurement method complying with JIS R3255 “Testing methods for adhesion of thin films on a glass substrate”.Type: ApplicationFiled: March 2, 2011Publication date: September 8, 2011Applicant: Olympus CorporationInventors: Takeshi Deguchi, Yoshito Ito, Kei Kikuchi, Nobuyoshi Toyohara
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Publication number: 20110217556Abstract: An optical component that includes a substrate and an optical thin film formed on the substrate. An internal stress ? (in units of MPa) satisfies Expression (1) given below when x=|E/R| is in the range of 0 to 3: ???30x??(1), where E is an effective optical diameter (in units of mm) of the substrate, R is a radius of curvature (in units of mm) of the substrate, and x is an absolute value of a ratio of E to R.Type: ApplicationFiled: March 2, 2011Publication date: September 8, 2011Applicant: Olympus CorporationInventors: TAKESHI DEGUCHI, Yoshito Ito, Kei Kikuchi, Nobuyoshi Toyohara
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Publication number: 20100143800Abstract: The present invention relates to a negative active material for a lithium secondary battery, a method of preparing the same, and a lithium secondary battery including the same. The negative active material for a lithium secondary battery includes a compound and a carbon composite represented by the following Chemical Formula 1. LiaVbMcO2+d ??[Chemical Formula 1] In the above Chemical Formula 1, a, b, c, and d represent a composition ratio, 0.1?a?2.5, 0.5?b?1.5, 0?c?0.5, 0?d?0.5, and M is Mg, Si, Sc, Cu, Zu, Nb, Y, or a combination thereof.Type: ApplicationFiled: October 27, 2009Publication date: June 10, 2010Applicants: Samsung SDI Co., Ltd., TAYCA CORPORATIONInventors: Katsuya SAWADA, Takeshi Deguchi, Naoya Kobayashi, Toru Inagaki, Sung-Soo Kim
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Patent number: 7126751Abstract: A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength ? being “(0.13˜0.35)×?/4” for the first layer, “(0.18˜0.75)×?/4” for the second layer, “(0.28˜2.31)×?/4” for the third layer, “(0.26˜0.92)×?/4” for the fourth layer, “(0.20˜0.37)×?/4” for the fifth layer, and “(1.09˜1.18)×?/4” for the sixth layer.Type: GrantFiled: May 12, 2006Date of Patent: October 24, 2006Assignee: Olympus CorporationInventors: Atsushi Yonetani, Kunihiko Uzawa, Ken Kawamata, Yorio Wada, Nobuyoshi Toyohara, Takeshi Deguchi
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Publication number: 20060203345Abstract: A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength ? being “(0.13˜0.35)×?/4” for the first layer, “(0.18˜0.75)×?/4” for the second layer, “(0.28˜2.31)×?/4” for the third layer, “(0.26˜0.92)×60 /4” for the fourth layer, “(0.20˜0.37)×?/4” for the fifth layer, and “(1.09˜1.18)×?/4” for the sixth layer.Type: ApplicationFiled: May 12, 2006Publication date: September 14, 2006Inventors: Atsushi Yonetani, Kunihiko Uzawa, Ken Kawamata, Yorio Wada, Nobuyoshi Toyohara, Takeshi Deguchi
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Patent number: 7075714Abstract: A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength ? being “(0.13˜0.35)×?/4” for the first layer, “(0.18˜0.75)×?/4” for the second layer, “(0.28˜2.31)×?/4” for the third layer, “(0.26˜0.92)×?/4” for the fourth layer, “(0.20˜0.37)×?/4” for the fifth layer, and “(1.09˜1.18)×?/4” for the sixth layer.Type: GrantFiled: September 2, 2004Date of Patent: July 11, 2006Assignee: Olympus CorporationInventors: Atsushi Yonetani, Kunihiko Uzawa, Ken Kawamata, Yorio Wada, Nobuyoshi Toyohara, Takeshi Deguchi
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Patent number: 7050224Abstract: A fluorescence observing apparatus has an excitation filter unit for transmitting only exciting light with particular wavelengths, of illuminating light, and an absorption filter unit for transmitting only fluorescent light produced from a specimen by irradiating the specimen with the exciting light to block the exciting light. In this case, the space between the half-value wavelength on the long-wavelength side of the excitation filter unit and the half-value wavelength on the short-wavelength side of the absorption filter unit is in the range of 6–12 nm, and variations in the half-value wavelengths of the excitation filter unit and the absorption filter unit where humidity is changed from 10% to 95% are within 0.5 nm. Whereby, faint fluorescent light is efficiently taken out and the observation can be made.Type: GrantFiled: November 7, 2003Date of Patent: May 23, 2006Assignee: Olympus CorporationInventors: Ken Kawamata, Yorio Wada, Nobuyoshi Toyohara, Takeshi Deguchi, Kunihiko Uzawa, Joji Sakamoto
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Publication number: 20050122576Abstract: A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength ? being “(0.13˜0.35)×?/4” for the first layer, “(0.18˜0.75)×?/4” for the second layer, “(0.28˜2.31)×?/4” for the third layer, “(0.26˜0.92)×?/4” for the fourth layer, “(0.20˜0.37)×?/4” for the fifth layer, and “(1.09˜1.18)×?/4” for the sixth layer.Type: ApplicationFiled: September 2, 2004Publication date: June 9, 2005Inventors: Atsushi Yonetani, Kunihiko Uzawa, Ken Kawamata, Yorio Wada, Nobuyoshi Toyohara, Takeshi Deguchi
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Publication number: 20050099677Abstract: A fluorescence observing apparatus has an excitation filter unit for transmitting only exciting light with particular wavelengths, of illuminating light, and an absorption filter unit for transmitting only fluorescent light produced from a specimen by irradiating the specimen with the exciting light to block the exciting light. In this case, the space between the half-value wavelength on the long-wavelength side of the excitation filter unit and the half-value wavelength on the short-wavelength side of the absorption filter unit is in the range of 6-12 nm, and variations in the half-value wavelengths of the excitation filter unit and the absorption filter unit where humidity is changed from 10% to 95% are within 0.5 nm. Whereby, faint fluorescent light is efficiently taken out and the observation can be made.Type: ApplicationFiled: November 7, 2003Publication date: May 12, 2005Inventors: Ken Kawamata, Yorio Wada, Nobuyoshi Toyohara, Takeshi Deguchi, Kunihiko Uzawa, Joji Sakamoto
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Patent number: 6130187Abstract: A benzofuran-7-yl uracil derivative represented by the general formula (1): ##STR1## (wherein each of X and Y is a hydrogen atom, a halogen atom or the like, R.sup.1 is a hydrogen atom, an alkyl group or the like, R.sup.2 is a haloalkyl group or the like, R.sup.3 is a hydrogen atom, a halogen atom or the like, each of R.sup.4 and R.sup.5 which are independent of each other, is a hydrogen atom, an alkyl group, a haloalkyl group, a halogen atom, a cyano group, a phenyl group, a benzyl group, a nitro group or the like), and a herbicide containing it as an active ingredient.The compound of the present invention represented by the general formula (1) exhibits excellent herbicidal effects against various weeds which cause trouble in upland fields, such as, broad leaved weeds, gramineous weeds and perennial or annual cyperaceous weeds, over a wide range from the pre-emergence to the growing stage. It can further control annual weeds and perennial weeds growing in paddy fields.Type: GrantFiled: August 5, 1998Date of Patent: October 10, 2000Assignees: Kumiai Chemical Industry Co., Ltd., Ihara Chemical Industry Co., Ltd.Inventors: Masahiro Miyazaki, Takeshi Deguchi, Takayoshi Takehi, Masatoshi Tamaru, Yoshihiro Yamaji, Ryo Hanai, Sota Uotsu, Hideo Sadohara
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Patent number: 5536837Abstract: The present invention provides an N-sulfonyl carboxylic amide derivative including an N-containing 6-membered aromatic ring represented by formula [I]: ##STR1## wherein R.sup.1 represents an alkyl group, an alkenyl group, or the like, R.sup.2 represents a hydrogen atom, an alkyl group, or the like, R.sup.3 and R.sup.4 represent independently an alkyl group, alkoxy group, or the like, and X and Y represent independently a methyne group or a nitrogen atom; or the salt of the same, a method for producing the same, and a biocide containing the same as an active ingredient. The N-sulfonyl carboxylic amide derivative including an N-containing 6-membered aromatic ring according to the present invention exhibits superior effects against blight caused by plant pathogenic fungi belonging to Oomycetes such as downy mildew, late blight, or the like in a low concentration as well as controls weeds occurring in paddy fields and plowed fields.Type: GrantFiled: May 18, 1995Date of Patent: July 16, 1996Assignees: Kumiai Chemical Industry Co., Ltd., Ihara Chemical Industry Co., Ltd.Inventors: Ikumi Urushibata, Takumi Yoshimura, Takeshi Deguchi, Norihisa Yonekura, Junetsu Sakai, Shigeru Hayashi
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Patent number: 5478799Abstract: The present invention provides an N-sulfonyl carboxylic amide derivative including an N-containing 6-membered aromatic ring represented by formula [I]: ##STR1## wherein R.sup.1 represents an alkyl group, an alkenyl group, or the like, R.sup.2 represents a hydrogen atom, an alkyl group, or the like. R.sup.3 and R.sup.4 represent independently an alkyl group or a nitrogen atom; or the salt of the same, a method for producing the same, and a biocide containing the same as an active ingredient. The N-sulfonyl carboxylic amide derivative including an N-containing 6-membered aromatic ring according to the present invention exhibits superior effects against blight caused by plant pathogenic fungi belonging to Oomycetes such as downy mildew, late blight, or the like in a low concentration as well as controls weeds occurring in paddy fields and plowed fields.Type: GrantFiled: May 18, 1995Date of Patent: December 26, 1995Assignees: Kumiai Chemical Industry Co., Ltd., Ihara Chemical Industry Co., Ltd.Inventors: Ikumi Urushibata, Takumi Yoshimura, Takeshi Deguchi, Norihisa Yonekura, Junetsu Sakai, Shigeru Hayashi
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Patent number: 5444060Abstract: The present invention provides an N-sulfonyl carboxylic amide derivative including an N-containing 6-membered aromatic ring represented by formula [I]: ##STR1## wherein R.sup.1 represents an alkyl group, an alkenyl group, or the like, R.sup.2 represents a hydrogen atom, an alkyl group, or the like, R.sup.3 and R.sup.4 represent independently an alkyl group, alkoxy group, or the like, and X and Y represent independently a methyne group or a nitrogen atom; or the salt of the same, a method for producing the same, and a biocide containing the same as an active ingredient. The N-sulfonyl carboxylic amide derivative including an N-containing 6-membered aromatic ring according to the present invention exhibits superior effects against blight caused by plant pathogenic fungi belonging to Oomycetes such as downy mildew, late blight, or the like in a low concentration as well as controls weeds occurring in paddy fields and plowed fields.Type: GrantFiled: November 2, 1993Date of Patent: August 22, 1995Assignees: Kumiai Chemical Industry Co., Ltd., Ihara Chemical Industry Co., Ltd.Inventors: Ikumi Urushibata, Takumi Yoshimura, Takeshi Deguchi, Norihasa Yonekura, Junetsu Sakai, Shigeru Hayashi