Abstract: A pattern formation method according to an embodiment includes providing a substrate in which protrusions each having a tapered shape are provided on a main surface. The method further includes supplying the main surface with spherical particles equal in diameter to make the spherical particles arrange in a triangular lattice form such that each of the protrusions is at least partially positioned within a region surrounded by the main surface and three of the spherical particles adjacent to one another.

Abstract: A pattern formation method according to an embodiment includes providing a substrate in which protrusions each having a tapered shape are provided on a main surface. The method further includes supplying the main surface with spherical particles equal in diameter to make the spherical particles arrange in a triangular lattice form such that each of the protrusions is at least partially positioned within a region surrounded by the main surface and three of the spherical particles adjacent to one another.

Abstract: A stamper of an embodiment includes: a base portion having a main surface; and a plurality of guides arranged on the main surface in mutually different first and second directions and serving as references of arrangement of a plurality of self-assembled dots. A distance between the guides in a third direction is within a range of an integer m1 ±0.05 times of a pitch of the plural self-assembled dots. The third direction corresponds to a third vector obtained by combining a first vector corresponding to the arrangement of the guides in the first direction and a second vector corresponding to the arrangement of the guides in the second direction. A distance between the plural guides in the first direction falls out of a range of an integer m2 ±0.15 times of the pitch of the plural self-assembled dots.

Abstract: In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

Abstract: A stamper of an embodiment includes: a base portion having a main surface; and a plurality of guides arranged on the main surface in mutually different first and second directions and serving as references of arrangement of a plurality of self-assembled dots. A distance between the guides in a third direction is within a range of an integer m1±0.05 times of a pitch of the plural self-assembled dots. The third direction corresponds to a third vector obtained by combining a first vector corresponding to the arrangement of the guides in the first direction and a second vector corresponding to the arrangement of the guides in the second direction. A distance between the plural guides in the first direction falls out of a range of an integer m2±0.15 times of the pitch of the plural self-assembled dots.

Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

Abstract: A magnetic disk according to an embodiment includes: a plurality of data regions each including a plurality of tracks, each of the tracks being arranged to extend in a circumferential direction; a servo region provided between the data regions, the servo region extending in a radial direction, the servo region including: a plurality of guide patterns each extending in the radial direction; and at least one line of dots arranged by post patterns in the radial direction at least on a side of one of adjacent guide patterns, the post patterns being arranged in the radial direction between the adjacent guide patterns.

Abstract: The present invention provides such a formation method that an antireflection structure having excellent antireflection functions can be formed in a large area and at small cost. Further, the present invention also provides an antireflection structure formed by that method. In the formation method, a base layer and particles placed thereon are subjected to an etching process. The particles on the base layer serve as an etching mask in the process, and hence they are more durable against etching than the base layer. The etching rate ratio of the base layer to the particles is more than 1 but not more than 5. The etching process is stopped before the particles disappear. It is also possible to produce an antireflection structure by nanoimprinting method employing a stamper. The stamper is formed by use of a master plate produced according to the above formation method.

Abstract: A stamper according to an embodiment includes a guide including: a first portion provided in regions to be boundaries between the servo region and the data regions in the bit-patterned medium, the first portion extending in a radial direction; and a second portion connected to the first portion, the second portion having protrusions regularly arranged at predetermined intervals in the radial direction, each of the protrusion having and being located on sides of regions to be the data regions, wherein, of angles formed between at least one of two sides of the triangular shape and a straight line extending in the radial direction, the smaller angle is in the range of 10 to 50 degrees, the two sides extending from a vertex of one of the protrusions.

Abstract: A stamper according to an embodiment includes a guide including: a first portion provided in regions to be boundaries between the servo region and the data regions in the bit-patterned medium, the first portion extending in a radial direction; and a second portion connected to the first portion, the second portion having protrusions regularly arranged at predetermined intervals in the radial direction, each of the protrusion having and being located on sides of regions to be the data regions, wherein, of angles formed between at least one of two sides of the triangular shape and a straight line extending in the radial direction, the smaller angle is in the range of 10 to 50 degrees, the two sides extending from a vertex of one of the protrusions.

Abstract: The present invention provides such a formation method that an antireflection structure having excellent antireflection functions can be formed in a large area and at small cost. Further, the present invention also provides an antireflection structure formed by that method. In the formation method, a base layer and particles placed thereon are subjected to an etching process. The particles on the base layer serve as an etching mask in the process, and hence they are more durable against etching than the base layer. The etching rate ratio of the base layer to the particles is more than 1 but not more than 5. The etching process is stopped before the particles disappear. It is also possible to produce an antireflection structure by nanoimprinting method employing a stamper. The stamper is formed by use of a master plate produced according to the above formation method.

Abstract: A magnetic disk according to an embodiment includes: a plurality of data regions each including a plurality of tracks, each of the tracks being arranged to extend in a circumferential direction; a servo region provided between the data regions, the servo region extending in a radial direction, the servo region including: a plurality of guide patterns each extending in the radial direction; and at least one line of dots arranged by post patterns in the radial direction at least on a side of one of adjacent guide patterns, the post patterns being arranged in the radial direction between the adjacent guide patterns.

Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

Abstract: In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

Abstract: The present invention provides such a formation method that an antireflection structure having excellent antireflection functions can be formed in a large area and at small cost. Further, the present invention also provides an antireflection structure formed by that method. In the formation method, a base layer and particles placed thereon are subjected to an etching process. The particles on the base layer serve as an etching mask in the process, and hence they are more durable against etching than the base layer. The etching rate ratio of the base layer to the particles is more than 1 but not more than 5. The etching process is stopped before the particles disappear. It is also possible to produce an antireflection structure by nanoimprinting method employing a stamper. The stamper is formed by use of a master plate produced according to the above formation method.

Abstract: An electron beam irradiating apparatus according to an embodiment includes: a deflector configured to perform blanking or deflecting of the electron beam emitted from an electron gun, the blanking being performed based on a blanking control signal, the deflecting being performed based on a deflection control signal, or blanking and deflecting being performed based on the blanking control signal and the deflection control signal; a first clock signal generation circuit configured to generate a first reference clock signal having cycles which vary with a drawing radial position on the stage; a second clock signal generation circuit configured to generate a second reference clock signal having cycles which are independent of the first reference clock signal; and a control signal generation circuit configured to generate a first control signal that is at least one of the blanking control signal and the deflection control signal, based on the first reference clock signal and the second reference clock signal.

Abstract: A magnetic recording apparatus has a magnetic recording media including a substrate and a magnetic layer containing magnetic patterns on the substrate, the magnetic layer including data zones to constitute recoding tracks and servo zones, the magnetic patterns of the servo zones being used as address bits, and a magnetic head configured to read signals from the magnetic recording media while flying over the magnetic recording media, in which, in a case where two magnetic patterns used as address bits on the servo zones corresponding to two adjacent recording tracks are arranged in such a manner that one corner of one magnetic pattern is closest to one corner of the other magnetic pattern, the corners of the two magnetic patterns are substantially separated from each other.

Abstract: It is made possible to fabricate a bit-patterned magnetic recording medium having a high recording density and making favorable address deciphering possible. An original disk fabrication method for irradiating a photosensitive resin film with an electron beam to draw a pattern, the method includes: irradiating the electron beam by using a plurality of blanking signals every rotation of a stage per bit unit, when drawing the pattern in a part corresponding to an address part on a photosensitive resin film.

Abstract: A magnetic disc medium according to an aspect of the present invention includes: a preamble part in a servo area of each of sectors obtained by dividing a surface of the medium in a circumference direction, the preamble part including strip-shaped patterns formed of a plurality of magnetic materials, and each of the strip-shaped patterns formed of the magnetic materials being divided by non-magnetic materials at periodic intervals.

Abstract: An imprint stamper for manufacturing a magnetic recording medium with a plurality of recording bits includes a plurality of first concave portions to form the recording bits, a wall portion provided so as to separate the first concave portions from each other, and a second concave portion provided to the wall portion so as to connect one of the first concave portions and the other of the first concave portions adjacent to one of the first concave portions.