Patents by Inventor Takeshi Okino

Takeshi Okino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Silicone polymer composition, method of forming a pattern and method of forming an insulating film
    Patent number: 5962581
    Abstract: A method of forming a pattern comprising the steps of forming a film of an organosilane compound comprising a polysilane having a repeating unit represented by the following general formula (1) on a substrate, irradiating an actinic radiation onto a predetermined portion of the film of the organosilane compound formed on the substrate, and removing the predetermined portion of the film irradiated by the actinic radiation by dissolving it with an aqueous alkaline developing solution. ##STR1## wherein Ar is a substituted or non-substituted aryl group.
    Type: Grant
    Filed: April 26, 1996
    Date of Patent: October 5, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shuzi Hayase, Yoshihiko Nakano, Rikako Kani, Mao Ito, Satoshi Mikoshiba, Takeshi Okino, Sawako Fujioka
  • Resist for alkali development
    Patent number: 5932391
    Abstract: A resist for alkali development, which comprises an alicyclic compound attached with an acidic substituent group exhibiting pKa of 7 to 11 in an aqueous solution of 25.degree. C. This alicyclic compound is preferably a copolymer comprising as a comonomer component a vinyl compound and exhibiting a light absorbency of 3 or less per 1 .mu.m to the light of 193 nm in wavelength.
    Type: Grant
    Filed: August 16, 1996
    Date of Patent: August 3, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Toru Ushirogouchi, Koji Asakawa, Naoko Kihara, Makoto Nakase, Naomi Shida, Takeshi Okino
  • Photosensitive composition
    Patent number: 5837419
    Abstract: A photosensitive composition contains an acid-decomposable resin, a photo-acid-generating agent, and a naphthol novolak compound with a molecular weight of 2000 or less. The acid-decomposable resin is preferably a copolymer consisting of a polymerizable compound having an alicyclic skeleton as a monomer.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: November 17, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Toru Ushirogouchi, Koji Asakawa, Makoto Nakase, Naomi Shida, Takeshi Okino