Abstract: A control unit of an information processing device acquires a request to add an item to a vehicle, acquires first information that is information according to whether the vehicle has a structure for adding an item, determining a fee for adding the item to the vehicle based on the one piece of information and the information about the item, and outputting the information about the fee.

Abstract: An information processing device includes a control unit that executes: obtaining a request to add an item to a vehicle; obtaining first information that is information depending on whether the vehicle has a structure for adding an item; determining a factory that provides a service for adding the item to the vehicle based on the first information and information about the item; and outputting information about the factory.

Abstract: The present invention provides a method for inducing a hibernation-like state and an apparatus therefor. According to the present invention, provided is a method for decreasing a theoretical setpoint temperature of body temperature and a feedback gain of heat generation in a subject or a method for inducing a hibernation-like state in a subject, the method being a chemical and/or physical method including providing an excitatory stimulus to a pyroglutamylated RFamide peptide (QRFP)-producing neuron. According to the present invention, an apparatus used to practice this method is also provided.

Abstract: A method for inducing a hibernation-like state and a device for the same is described. The method is a chemical and physical method for reducing, in a subject, a theoretical set-point temperature of a body temperature and/or a feedback gain of heat production, or for inducing a hibernation-like state in the subject, the method including applying an excitatory stimulus to pyroglutamylated RFamide peptide (QRFP)-producing neurons. A device used to implement the method is also described.

Abstract: A voltage converting device includes: a DC/DC converter configured to step down a voltage of a power supply and output the stepped-down voltage to a low-voltage power supply having a voltage lower than a voltage of the power supply; a control device configured to control the DC/DC converter; and a determining unit configured to determine whether a voltage of the power supply input to the DC/DC converter is within a predetermined voltage range, wherein the control device switches, on the basis of a determination result of the determining unit, between a first control in which the DC/DC converter is caused to perform a step-down operation and electric power is supplied to a load connected to the low-voltage power supply and a second control in which a step-down operation of the DC/DC converter stops and electric power is supplied from the low-voltage power supply to the load.

Abstract: A voltage converting device includes: a DC/DC converter configured to step down a voltage of a power supply and output the stepped-down voltage to a low-voltage power supply having a voltage lower than a voltage of the power supply; a control device configured to control the DC/DC converter; and a determining unit configured to determine whether a voltage of the power supply input to the DC/DC converter is within a predetermined voltage range, wherein the control device switches, on the basis of a determination result of the determining unit, between a first control in which the DC/DC converter is caused to perform a step-down operation and electric power is supplied to a load connected to the low-voltage power supply and a second control in which a step-down operation of the DC/DC converter stops and electric power is supplied from the low-voltage power supply to the load.

Abstract: A substrate cleaning device 1 includes a substrate holding unit 10 configured to hold a substrate W, a first cleaning unit 11 having a first cleaning member 11a caused to come into contact with a first surface WA of the substrate W held by the substrate holding unit 10 to clean the first surface WA, a second cleaning unit 12 having a second cleaning member 12a caused to come into contact with the first surface WA of the substrate W held by the substrate holding unit 10 to clean the first surface WA, and a controller 50 configured to control the first and second cleaning units 11, 12 so that, when any one of the first cleaning member 11a and the second cleaning member 12a cleans the first surface WA of the substrate W held by the substrate holding unit 10, the other cleaning member is at a position apart from the substrate W held by the substrate holding unit 10.

Abstract: A voltage conversion device includes: a transformer including a primary coil provided on a primary side with a relatively high voltage and a secondary coil provided on a secondary side with a relatively low voltage; and a current sensor provided on the primary side. The inductance of the current sensor is used as an inductance component of a resonant circuit on the primary side.

Abstract: A voltage conversion device includes: a transformer including a primary coil provided on a primary side with a relatively high voltage and a secondary coil provided on a secondary side with a relatively low voltage; and a current sensor provided on the primary side. The inductance of the current sensor is used as an inductance component of a resonant circuit on the primary side.

Abstract: An artificial olfactory sensing system includes a sensor unit. The sensor unit includes a semiconductor device equipped with a transistor and a sensor cell in which an olfactory receptor is manifested on a lipid film. A proton adsorption film is formed on a gate electrode of the transistor. A physiological aqueous solution is disposed on the proton adsorption film. Then, the sensor cell is disposed in the physiological aqueous solution. A proton is adsorbed onto the proton adsorption film. When the olfactory receptor recognizes an odor molecule, the positive ions in the physiological aqueous solution flow from an ion channel of the olfactory receptor into the sensor cell. As a result, the proton is dissociated from the proton adsorption film into the physiological aqueous solution, and the potential of the gate electrode is changed.

Abstract: Methods and assays are disclosed for treating subjects with 22q13 deletion syndrome or SHANK3 deletion or duplication, mutation or reduced expression, where the methods comprise administering to the subject insulin-like growth factor 1 (IGF-1), IGF-1-derived peptide or analog, growth hormone, an AMPAkine, a compound that directly or indirectly enhances glutamate neurotransmission, including by inhibiting inhibitory (most typically GABA) transmission, or an agent that activates the growth hormone receptor or the insulin-like growth factor 1 (IGF-1) receptor, or a downstream signaling pathway thereof.

Abstract: A substrate cleaning device 1 includes a substrate holding unit 10 configured to hold a substrate W, a first cleaning unit 11 having a first cleaning member 11a caused to come into contact with a first surface WA of the substrate W held by the substrate holding unit 10 to clean the first surface WA, a second cleaning unit 12 having a second cleaning member 12a caused to come into contact with the first surface WA of the substrate W held by the substrate holding unit 10 to clean the first surface WA, and a controller 50 configured to control the first and second cleaning units 11, 12 so that, when any one of the first cleaning member 11a and the second cleaning member 12a cleans the first surface WA of the substrate W held by the substrate holding unit 10, the other cleaning member is at a position apart from the substrate W held by the substrate holding unit 10.

Abstract: A substrate cleaning device 1 includes a substrate holding unit 10 configured to hold a substrate W, a first cleaning unit 11 having a first cleaning member 11a caused to come into contact with a first surface WA of the substrate W held by the substrate holding unit 10 to clean the first surface WA, a second cleaning unit 12 having a second cleaning member 12a caused to come into contact with the first surface WA of the substrate W held by the substrate holding unit 10 to clean the first surface WA, and a controller 50 configured to control the first and second cleaning units 11, 12 so that, when any one of the first cleaning member 11a and the second cleaning member 12a cleans the first surface WA of the substrate W held by the substrate holding unit 10, the other cleaning member is at a position apart from the substrate W held by the substrate holding unit 10.

Abstract: When a polishing pad is attached to a polishing table, the polishing pad can be easily positioned on and attached to the polishing table and air pockets are prevented from forming. As a position guide member 130 is inserted into a guide hole 109 with an attachment surface of a polishing pad 108 downward, the polishing pad 108 is positioned on and attached to a polishing table 110. At this time, the guide hole 109 of the polishing pad 108 is guided by the position guide member 130 and the polishing pad 108 is easily positioned so as to match the upper surface of the polishing table 110 with the outer periphery thereof. Then, as release paper is gradually peeled off from a rear surface of the polishing pad 108, the portion where the release paper is peeled off is attached to the polishing table 110.

Abstract: Provided is an anti-glare/antireflection member having excellent visibility. The anti-glare/antireflection member (1) includes a base material (10) and an antireflection layer (20). The base material (10) is provided in a surface layer thereof with an anti-glare layer (10a) having a concavo-convex configuration. The antireflection layer (20) is provided on the anti-glare layer (10a).

Abstract: A glass film transfer apparatus includes a wind-off section that winds off the glass film from a roll around which the glass film is wound, a long interleaf being laminated on the glass film; a glass film transfer section that transfers the glass film which is wound off from the wind-off section and is separated from the interleaf; a take-up section that takes up the glass film transferred by the glass film transfer section in the form of roll, while laminating the long interleaf on the glass film; and an interleaf transfer section that carries out the interleaf separated from the glass film which is wound off from the wind-off section, and carries in the interleaf toward the take-up section. Furthermore, the glass film transfer apparatus includes a take-up adjusting mechanism that adjusts a take-up state of the interleaf and the glass film in the take-up section.

Abstract: Provided is an anti-glare/antireflection member having excellent visibility. The anti-glare/antireflection member (1) includes a base material (10) and an antireflection layer (20). The base material (10) is provided in a surface layer thereof with an anti-glare layer (10a) having a concavo-convex configuration. The antireflection layer (20) is provided on the anti-glare layer (10a).

Abstract: Provided are a Cu—Zr-based copper alloy plate which retains satisfactory mechanical strength and, at the same time, has a good balance of bending formability and bending elastic limit at a high level and a process for manufacturing the Cu—Zr-based copper alloy plate. The copper alloy plate contains 0.05% to 0.2% by mass of Zr and a remainder including Cu and unavoidable impurities, and the average value of KAM values measured by an EBSD method using a scanning electron microscope equipped with a backscattered electron diffraction pattern system is 1.5° to 1.8°, the R/t ratio is 0.1 to 0.6 wherein R represents the minimum bending radius which does not cause a crack and t represents the thickness of the plate in a W bending test, and the bending elastic limit is 420 N/mm2 to 520 N/mm2.

Abstract: Provided is an anti-glare/antireflection member having excellent visibility. The anti-glare/antireflection member (1) includes a base material (10) and an antireflection layer (20). The base material (10) is provided in a surface layer thereof with an anti-glare layer (10a) having a concavo-convex configuration. The antireflection layer (20) is provided on the anti-glare layer (10a).

Abstract: The Cu—Ni—Si-based copper alloy plate contains 1.0 mass % to 3.0 mass % of Ni, and Si at a concentration of ? to ¼ of the mass % concentration of Ni with a remainder of Cu and inevitable impurities, in which, when the average value of the aspect ratio (the minor axis of crystal grains/the major axis of crystal grains) of each crystal grains in an alloy structure is 0.4 to 0.6, the average value of GOS in the all crystal grains is 1.2° to 1.5°, and the ratio (L?/L) of the total special grain boundary length L? of special grain boundaries to the total grain boundary length L of crystal grain boundaries is 60% to 70%, the spring bending elastic limit becomes 450 N/mm2 to 600 N/mm2, the solder resistance to heat separation is favorable and deep drawing workability is excellent at 150° C. for 1000 hours.