Patents by Inventor Takeshi Sakurai
Takeshi Sakurai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8056385Abstract: A press forming die assembly for press forming a blank material includes a draw forming portion that the blank material flows and a draw bead for controlling the amount of the blank material flowing into the draw forming portion. A first draw bead is provided at a periphery of the draw forming portion in a direction substantially parallel to an outer peripheral shape of the draw forming portion. A second draw bead extends from the first draw bead toward the outside of the draw forming portion in a direction intersecting the first draw bead. The blank material includes a thick sheet portion having a greater thickness than the other portion or a high rigidity portion having a higher rigidity than that of the other portion. The second draw bead is provided at a portion corresponding to the thick sheet portion or the high rigidity portion of the blank material.Type: GrantFiled: August 20, 2008Date of Patent: November 15, 2011Assignee: Honda Motor Co., Ltd.Inventors: Shiyouhei Okuzumi, Takeshi Sakurai, Shinichi Murakami, Tomio Hasegawa, Takashi Sera
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Publication number: 20110266035Abstract: [Object] To provide a conductive member which has a stable contact resistance, is difficult to be separated, and also decreases the inserting and drawing force when used for a connector. [Means to Solve Problems] A Cu—Sn intermetallic compound layer 3 and an Sn-based surface layer 4 are formed in this order on the surface of a Cu-based substrate 1 through an Ni-based base layer 2, and, furthermore, the Cu—Sn intermetallic compound layer 3 is composed of a Cu3Sn layer 5 arranged on the Ni-based base layer 2 and a Cu6Sn5 layer 6 arranged on the Cu3Sn layer 5; the Cu—Sn intermetallic compound layer 3 obtained by bonding the Cu3Sn layer 5 and the Cu6Sn5 layer 6 is provided with recessed and projected portions on the surface which is in contact with the Sn-based surface layer 4; thicknesses X of the recessed portions 7 are set to 0.05 ?m to 1.Type: ApplicationFiled: July 9, 2009Publication date: November 3, 2011Applicant: MITSUBISHI SHINDOH CO., LTD.Inventors: Takeshi Sakurai, Seiichi Ishikawa, Kenji Kubota, Takashi Tamagawa
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Publication number: 20110222240Abstract: An electrical component disposed on the top of battery modules includes an electrical component case for accommodating an inverter and a DC/DC converter, and heat sink units attached to the electrical component case on the side of the electrical component case opposite to the side with the battery modules, and constituted of a heat radiating plate having a plurality of radiating fins. In addition, a cooling path has a first cooling path for cooling the battery modules using cooling wind, and a second cooling path for cooling the heat sink units using the cooling wind having passed through the first cooling path. With this arrangement, there is provided a cooling structure for a vehicle power source unit capable of cooling the battery and the electrical component including the inverter with a compact configuration.Type: ApplicationFiled: October 23, 2009Publication date: September 15, 2011Applicant: HONDA MOTOR CO., LTD.Inventors: Masao Kawata, Harumi Takedomi, Takeshi Sakurai
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Publication number: 20110146855Abstract: A copper alloy material includes, by mass %, Mg of 0.3 to 2%, P of 0.001 to 0.1%, and the balance including Cu and inevitable impurities. An area fraction of such crystal grains that an average misorientation between all the pixels in each crystal grain is less than 4° is 45 to 55% of a measured area, when orientations of all the pixels in the measured area of the surface of the copper alloy material are measured by an EBSD method with a scanning electron microscope of an electron backscattered diffraction image system and a boundary in which a misorientation between adjacent pixels is 5° or more is considered as a crystal grain boundary, and a tensile strength is 641 to 708 N/mm2, and a bending elastic limit value is 472 to 503 N/mm2.Type: ApplicationFiled: June 4, 2010Publication date: June 23, 2011Applicant: Mitsubishi Shindoh Co., Ltd.Inventors: Takeshi Sakurai, Yoshihiro Kameyama, Yoshio Abe
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Patent number: 7939307Abstract: Modified CueO having excellent enzymatic activity and a composition for dyeing keratin fiber which contains the enzyme. A recombinant protein having an enzymatic activity for oxidizing p-phenylenediamine, the protein is obtained by removing from CueO at least one member selected from the group consisting of helix 5, helix 6, and helix 7; and the composition for dyeing keratin fiber containing the recombinant protein and an oxidation dye.Type: GrantFiled: April 14, 2006Date of Patent: May 10, 2011Assignees: National University Corporation Kanazawa University, Mandom CorporationInventors: Kaori Otsuka, Yoshio Tsujino, Yusuke Konno, Shinji Kurose, Kunishige Kataoka, Takeshi Sakurai
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Publication number: 20110094085Abstract: A method for producing a contour strip includes a rough rolling step for rolling a plate material to form a contour molding material, a slitting step for slitting the contour molding material at the middle position in the width direction of a thick portion or a thin portion at both side edge portions thereof to form a contour slit material, and a stretching step for stretching the contour slit material to obtain a contour strip. Rolling is carried out in the rough rolling step so that ?t is 0.01 or less, e is 0.15 or less, D1 is 0.Type: ApplicationFiled: May 20, 2009Publication date: April 28, 2011Applicant: Mitsubishi Shindoh Co., Ltd.Inventors: Takeshi Sakurai, Shunroku Sukumoda, Shinya Koike
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Publication number: 20110096391Abstract: To provide a broadband reflecting mirror having high reflectance within a wavelength band of 400 nm to 2500 nm and having excellent thermal resistance and damage resistance.Type: ApplicationFiled: June 30, 2009Publication date: April 28, 2011Applicant: NIPPON ELECTRIC GLASS CO., LTD.Inventors: Toshimasa Kanai, Takeshi Sakurai
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Publication number: 20100205754Abstract: Modified CueO having excellent enzymatic activity and a composition for dyeing keratin fiber which contains the enzyme. A recombinant protein having an enzymatic activity for oxidizing p-phenylenediamine, the protein is obtained by removing from CueO at least one member selected from the group consisting of helix 5, helix 6, and helix 7; and the composition for dyeing keratin fiber containing the recombinant protein and an oxidation dye.Type: ApplicationFiled: April 14, 2006Publication date: August 19, 2010Applicants: NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSIT, MANDOM CORPORATIONInventors: Kaori Otsuka, Yoshio Tsujino, Yusuke Konno, Shinji Kurose, Kunishige Kataoka, Takeshi Sakurai
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Publication number: 20100040910Abstract: A novel electrocatalyst made of an oxidase having high electron transfer efficiency and an enzymatic electrode using the same are provided. The electrocatalyst is made of CueO. The enzymatic electrode comprises a carbonaceous porous body and an electrocatalyst made of CueO supported on the surface of the carbonaceous porous body. CueO is preferably CueO from Escherichia coli. The carbonaceous porous body constituting the enzymatic electrode is preferably carbonaceous gel. Also, the enzymatic electrode may further comprise a mediator which facilitates transfer of electron between the carbonaceous porous body and said CueO.Type: ApplicationFiled: September 5, 2007Publication date: February 18, 2010Inventors: Tsutomu Kajino, Norihiko Setoyama, Keiko Uemura, Hisao Kato, Kenji Kano, Seiya Tsujimura, Takeshi Sakurai, Kunishige Kataoka
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Publication number: 20090049886Abstract: A press forming die assembly for press forming a blank material includes a draw forming portion that the blank material flows and a draw bead for controlling the amount of the blank material flowing into the draw forming portion. A first draw bead is provided at a periphery of the draw forming portion in a direction substantially parallel to an outer peripheral shape of the draw forming portion. A second draw bead extends from the first draw bead toward the outside of the draw forming portion in a direction intersecting the first draw bead. The blank material includes a thick sheet portion having a greater thickness than the other portion or a high rigidity portion having a higher rigidity than that of the other portion. The second draw bead is provided at a portion corresponding to the thick sheet portion or the high rigidity portion of the blank material.Type: ApplicationFiled: August 20, 2008Publication date: February 26, 2009Applicant: HONDA MOTOR CO., LTD.Inventors: Shiyouhei Okuzumi, Takeshi Sakurai, Shinichi Murakami, Tomio Hasegawa, Takashi Sera
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Publication number: 20070240637Abstract: A thin-film forming apparatus is provided capable of forming a thin-film by bringing ions of some degree in plasma into contact with the thin-film. This thin-film forming apparatus comprises a plasma generator disposed at a position corresponding to an opening of a vacuum chamber for producing plasma in the vacuum chamber, a base plate holder for holding a substrate in the vacuum chamber, and an ion quencher disposed between the plasma generator and the base plate holder. When the plasma generator is projected directly onto the base plate holder, the projection image of plasma generator shielded by the ion quencher has an area smaller than the residual image of plasma generator projected onto the base plate holder.Type: ApplicationFiled: August 5, 2005Publication date: October 18, 2007Inventors: Yizhou Song, Tetsuji Arai, Koki Chiba, Takeshi Sakurai, Yousong Jiang
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Publication number: 20060266291Abstract: A thin film deposition apparatus comprising gas introducer for introducing a reactive gas into the vacuum container, and plasma generator for generating a plasma of the reactive gas within the vacuum container. An insulator is deposited on the inner wall surface of the vacuum container. The gas introducer introduces a reactive gas and an inert gas into a region where a plasma is generated by the plasma generator.Type: ApplicationFiled: May 31, 2004Publication date: November 30, 2006Inventors: Yizhou Song, Takeshi Sakurai, Takanori Murata
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Publication number: 20060189046Abstract: A method of forming a thin film of the present invention comprises: an optical characteristic adjusting step of repeatedly conveying a substrate holder between a zone to perform an intermediate thin film forming step and a zone to perform a film composition converting step while controlling a conveying speed of the substrate holder for holding a substrate, and adjusting a film composition of a finally formed thin film to form the thin film having an optical characteristic value of a region where a hysteresis phenomenon occurs.Type: ApplicationFiled: June 2, 2004Publication date: August 24, 2006Inventors: Yizhou Song, Takeshi Sakurai
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Publication number: 20060124455Abstract: A thin film deposition apparatus of the present invention includes a vacuum container for maintaining a vacuum therein, gas introducer for introducing a reactive gas into the vacuum container, and plasma generator for generating a plasma of the reactive gas within the vacuum container. A wall surface within the vacuum container is coated with pyrolytic boron nitride. The plasma generator comprises a dielectric wall provided on an outer wall of the vacuum container, the first antenna having a spiral shape, the second antenna having a spiral shape, and the conductor wire for connecting the first and second antennas to an RF power supply, antenna fixing mechanism and position adjustor for antennas.Type: ApplicationFiled: June 2, 2003Publication date: June 15, 2006Inventors: Yizhou Song, Takeshi Sakurai, Takanori Murata
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Patent number: 6905400Abstract: A polishing cloth mounted on a turntable is dressed by bringing a dresser in contact with the polishing cloth for restoring the polishing capability of the polishing cloth. The dressing is performed by measuring heights of a surface of the polishing cloth at radial positions of the polishing cloth in a radial direction thereof determining a rotational speed of the dresser with respect to a rotational speed of the turntable on the basis of the measured heights, and dressing the polishing cloth by pressing the dresser are rotating. The dresser has an annular diamond grain layer or an annular SiC layer.Type: GrantFiled: February 1, 2002Date of Patent: June 14, 2005Assignee: Ebara CorporationInventors: Norio Kimura, You Ishii, Toyomi Nishi, Takayoshi Kawamoto, Takeshi Sakurai
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Patent number: 6413154Abstract: A polishing apparatus can produce a uniform quality of polished products by supplying a polishing solution consistently without being affected by any disturbances in the solution supply source. The polishing apparatus comprises: a polishing section for polishing a workpiece by pressing the same against a polishing tool; a solution piping assembly to be connected to an external solution supply device for transferring a polishing solution therefrom to the polishing section; and a solution suction device provided in the solution piping assembly for introducing the polishing solution from the solution supply device to the polishing section at a desired flow rate.Type: GrantFiled: September 11, 2000Date of Patent: July 2, 2002Assignees: Ebara Corporation, Kabushiki Kaisha ToshibaInventors: Tetsuji Togawa, Takeshi Sakurai, Nobuyuki Takada, Shoichi Kodama, Hiromi Yajima
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Publication number: 20020072300Abstract: A polishing cloth mounted on a turntable is dressed by bringing a dresser in contact with the polishing cloth for restoring polishing capability of the polishing cloth. The dressing is performed by measuring heights of a surface of the polishing cloth at radial positions of the polishing cloth in a radial direction thereof, determining a rotational speed of the dresser with respect to a rotational speed of the turntable on the basis of the measured heights, and dressing the polishing cloth by pressing the dresser against the polishing cloth while the turntable and the dresser are rotating. The dresser has an annular diamond grain layer or an annular SiC layer.Type: ApplicationFiled: February 1, 2002Publication date: June 13, 2002Inventors: Norio Kimura, You Ishii, Toyomi Nishi, Takayoshi Kawamoto, Takeshi Sakurai
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Patent number: 6364752Abstract: A polishing cloth mounted on a turntable is dressed by bringing a dresser in contact with the polishing cloth for restoring the polishing capability of the polishing cloth. The dressing is performed by measuring heights of a surface of the polishing cloth at radial positions of the polishing cloth in a radial direction thereof, determining a rotational speed of the dresser with respect to a rotational speed of the turntable on the basis of the measured heights, and dressing the polishing cloth by pressing the dresser against the polishing cloth while the turntable and the dresser are rotating. The dresser has an annular diamond grain layer or an annular SiC layer.Type: GrantFiled: June 25, 1997Date of Patent: April 2, 2002Assignee: Ebara CorporationInventors: Norio Kimura, You Ishii, Toyomi Nishi, Takayoshi Kawamoto, Takeshi Sakurai
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Patent number: 6319105Abstract: A polishing apparatus includes a cleaning device for critical cleaning of a top ring or a dressing tool to obtain high quality polishing by minimizing surface damage caused by contaminants originating from the top ring and/or dressing tool. The polishing apparatus includes a polishing table; a workpiece holding member for pressing a workpiece onto the polishing table; a dressing tool for conditioning a work surface provided on the polishing table. A cleaning device is provided for cleaning the dressing tool and/or the workpiece holding member. The cleaning device is provided with a spray nozzle for directing a cleaning solution toward at least an upper surface of the workpiece holding member or the dressing tool.Type: GrantFiled: June 8, 1999Date of Patent: November 20, 2001Assignee: Ebara CorporationInventors: Tetsuji Togawa, Takeshi Sakurai, Nobuyuki Takada
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Patent number: 6287430Abstract: The present invention is drawn to an apparatus for forming a thin film. The apparatus includes a vacuum chamber; a vacuum apparatus connected to the vacuum chamber; a holder placed in the vacuum chamber, which holder holds a substrate and is rotated by means of a rotating mechanism; a plasma CVD apparatus; and a sputtering apparatus, wherein the plasma CVD apparatus and the sputtering apparatus are placed in a single vacuum chamber and a thin film having an medium refractive index is formed on the substrate held by the holder, by means of the plasma CVD apparatus and the sputtering apparatus. The method making use of such an apparatus is also disclosed.Type: GrantFiled: December 21, 1999Date of Patent: September 11, 2001Assignee: Shincron Co., Ltd.Inventors: Shigeharu Matsumoto, Kazuo Kikuchi, Yizhou Song, Takeshi Sakurai, Shinichiro Saisho