Patents by Inventor Takeyoshi Kano

Takeyoshi Kano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7849593
    Abstract: The invention provides a multi-layer circuit board sequentially having an insulating substrate, a first electrically conductive pattern arbitrarily formed, an insulating material layer and a second electrically conductive pattern formed by providing an electrically conductive material on a graft polymer pattern formed on the insulating material layer, and having an electrically conductive path which electrically connects the first electrically conductive pattern present on the insulating substrate and the second electrically conductive pattern. The graft polymer pattern includes a combination of a region where a graft polymer is present and a region where no graft polymer is present, or a combination of a region where a hydrophilic graft polymer is present and a region where a hydrophobic graft polymer is present.
    Type: Grant
    Filed: May 31, 2005
    Date of Patent: December 14, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Koichi Kawamura, Takeyoshi Kano
  • Publication number: 20100247880
    Abstract: There is provided a polymer containing a unit represented by the following Formula (1), and a unit represented by following Formula (2). In Formula (1) and Formula (2), R1 to R5 each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group; R6 represents an unsubstituted alkyl group, alkenyl group, alkynyl group or an aryl group; V and Z each independently represent a single bond, a substituted or unsubstituted divalent organic group, an ester group, an amide group or an ether group, and L1 and L2 each independently represent a substituted or unsubstituted divalent organic group.
    Type: Application
    Filed: March 30, 2010
    Publication date: September 30, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeyoshi KANO, Tomomi TATEISHI, Tokihiko MATSUMURA
  • Patent number: 7739789
    Abstract: The present invention provides a method for forming a surface graft, comprising the process of applying energy to the surface of a substrate containing polyimide having a polymerization initiating moiety in the skeleton thereof, to generate active points on the surface of the substrate and to generate a graft polymer that is directly bonded to the surface of the substrate starting from the active points and that has a polar group, and a surface graft material obtained thereby.
    Type: Grant
    Filed: March 24, 2005
    Date of Patent: June 22, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Takeyoshi Kano, Koichi Kawamura
  • Publication number: 20100080964
    Abstract: A composition including a polymer, the polymer having a non-dissociative functional group that interacts with a plating catalyst or a precursor thereof, a radical polymerizable group, and an ionic polar group; a method of producing a metal pattern material using the same: and a metal pattern material produced by the method.
    Type: Application
    Filed: July 21, 2009
    Publication date: April 1, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeyoshi KANO, Masataka SATO, Takatsugu KAWANO
  • Publication number: 20100003533
    Abstract: A process for producing a metal film-coated material, the process including: (a1) forming, on a substrate, a polymer layer formed from a polymer which has a functional group capable of interacting with a plating catalyst or a precursor thereof, and is directly chemically bonded to the substrate; (a2) providing a plating catalyst or a precursor thereof to the polymer layer; and (a3) performing plating with respect to the plating catalyst or a precursor thereof. The polymer layer satisfies all of specific requirements regarding the saturated water absorption coefficient, the saturated water absorption coefficient, the water absorption coefficient, and the surface contact angle of the polymer layer.
    Type: Application
    Filed: October 22, 2007
    Publication date: January 7, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Takeyoshi Kano, Hideo Nagasaki, Masataka Sato
  • Publication number: 20090269561
    Abstract: A method of producing a metal plated material, the method including: preparing a polymer solution containing a polymer; preparing a composition by mixing the polymer solution with a monomer at an amount of from 30% by mass to 200% by mass with respect to the polymer, at least one of the polymer or the monomer having a non-dissociative functional group that interacts with a plating catalyst or a precursor thereof, forming a cured layer on a substrate by applying the composition, drying the composition and curing the composition; applying the plating catalyst or the precursor thereof to the cured layer; and conducting plating with respect to the plating catalyst or the precursor thereof to form a plating film on the cured layer.
    Type: Application
    Filed: April 20, 2009
    Publication date: October 29, 2009
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeyoshi KANO, Kazuki YAMAZAKI, Masataka SATO
  • Publication number: 20090266583
    Abstract: The invention provides a photosensitive resin composition comprising: a polymer comprising a polymerizable group and a functional group that interacts with a plating catalyst or a precursor thereof so as to form a coordination bond; and at least one selected from the group consisting of a synthetic rubber, an epoxy acrylate monomer, and a polymerizable monomer having a benzyl alcohol group; a laminate; a method of producing a metal plated material; a metal plated material; a method of producing a metal pattern material; a metal pattern material; and a wiring substrate.
    Type: Application
    Filed: April 21, 2009
    Publication date: October 29, 2009
    Applicant: FUJIFILM CORPORATION
    Inventors: Hideo Nagasaki, Takeyoshi Kano
  • Publication number: 20090214876
    Abstract: A process for producing a metal film-coated material, the process including: (a1) forming, on a substrate, a polymer layer formed from a polymer which has a functional group capable of interacting with a plating catalyst or a precursor thereof, and is directly chemically bonded to the substrate; (a2) providing a plating catalyst or a precursor thereof to the polymer layer; and (a3) performing plating with respect to the plating catalyst or a precursor thereof. The polymer layer satisfies all of the following requirements (1) to (4): (1) the saturated water absorption coefficient of the polymer layer as measured in an environment of temperature of 25° C. and relative humidity of 50% is 0.01 to 10% by mass; (2) the saturated water absorption coefficient of the polymer layer as measured in an environment of temperature of 25° C. and relative humidity of 95% is 0.05 to 20% by mass; (3) the water absorption coefficient of the polymer layer as measured after 1 hour of immersion in boiling water at 100° C. is 0.
    Type: Application
    Filed: April 30, 2009
    Publication date: August 27, 2009
    Applicant: FUJIFILM Corporation
    Inventors: Takeyoshi Kano, Hideo Nagasaki, Masataka Sato
  • Publication number: 20090022885
    Abstract: The invention provides a method of forming a metallic pattern including: (a) forming, in a pattern form on a substrate, a polymer layer which contains a polymer that has a functional group that interacts with an electroless plating catalyst or a precursor thereof; (b) imparting the electroless plating catalyst or precursor thereof onto the polymer layer; and (c) forming a metallic film in the pattern form by subjecting the substrate having the polymer layer to electroless plating using an electroless plating solution, wherein the substrate is treated using a solution comprising a surface charge modifier or 1×10?10 to 1×10?4 mmol/l of a plating catalyst poison before or during the (c) forming of the metallic film. The invention further provides a metallic pattern obtained thereby. Furthermore, the invention provides a printed wiring board and a TFT wiring board, each of which uses the metallic pattern as a conductive layer.
    Type: Application
    Filed: February 8, 2006
    Publication date: January 22, 2009
    Applicant: FUJIFILM Corporation
    Inventors: Kazuhiko Matsumoto, Koichi Kawamura, Takeyoshi Kano
  • Publication number: 20090004465
    Abstract: The present invention provides a metal film formed by applying an electroless plating catalyst or its precursor to a polymer layer on a base plate having a surface roughness of 500 nm or less and then carrying out electroless plating, the polymer layer containing a polymer which has a functional group capable of interacting with the electroless plating catalyst or its precursor and is chemically bonded directly to the base plate, wherein the adhesion strength between the base plate and the metal film is 0.2 kN/m or more.
    Type: Application
    Filed: January 13, 2006
    Publication date: January 1, 2009
    Applicant: Fujifilm Corporation
    Inventors: Takeyoshi Kano, Koichi Kawamura
  • Patent number: 7438950
    Abstract: The invention provides a metallic pattern forming method comprising: forming a region in which a graft polymer, that directly bonds to a surface of a base material that includes a polyimide and has a functional group that interacts with either an electroless plating catalyst or a precursor thereof, is generated in a pattern shape; imparting either an electroless plating catalyst or a precursor thereof and electroless plating so as to form a metallic film in the pattern shape, wherein the polyimide has at least one structural unit represented by the following Formula (1) or Formula (2) and has a polymerization initiating site in a skeleton thereof. R1 represents a bivalent organic group. R2 is represented by one of Formulae (3) to (6). R3, R4, R5 and R6 independently represents a bivalent organic group.
    Type: Grant
    Filed: June 1, 2005
    Date of Patent: October 21, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Takeyoshi Kano, Koichi Kawamura
  • Patent number: 7405035
    Abstract: The present invention relates to a pattern forming method comprising image-wise forming, on a surface of a substrate, a region having an ability to initiate polymerization, forming a graft polymer on the region by atom transfer radical polymerization, and adhering a substance to the graft polymer. The method can be applied for preparing an image forming material, a fine particle adsorption pattern material, a conductive pattern material, or the like by selecting a suitable substance.
    Type: Grant
    Filed: December 16, 2003
    Date of Patent: July 29, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Koichi Kawamura, Takeyoshi Kano
  • Patent number: 7354625
    Abstract: The invention provides a gas barrier film having a support including a hydrophilic surface or a non-ionic hydrophobic surface on which a graft polymer chain having a polar group is present, and an inorganic thin film formed on the surface.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: April 8, 2008
    Assignee: Fujifilm Corporation
    Inventors: Koichi Kawamura, Takeyoshi Kano, Miki Takahashi
  • Publication number: 20080029294
    Abstract: The invention provides a multi-layer circuit board sequentially having an insulating substrate, a first electrically conductive pattern arbitrarily formed, an insulating material layer and a second electrically conductive pattern formed by providing an electrically conductive material on a graft polymer pattern formed on the insulating material layer, and having an electrically conductive path which electrically connects the first electrically conductive pattern present on the insulating substrate and the second electrically conductive pattern. The graft polymer pattern includes a combination of a region where a graft polymer is present and a region where no graft polymer is present, or a combination of a region where a hydrophilic graft polymer is present and a region where a hydrophobic graft polymer is present.
    Type: Application
    Filed: May 31, 2005
    Publication date: February 7, 2008
    Applicant: FUJIFILM Corporation
    Inventors: Koichi Kawamura, Takeyoshi Kano
  • Patent number: 7306895
    Abstract: The invention provides a pattern forming method including providing a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support, and forming a pattern including a preparation zone and a non-preparation zone of a graft polymer by preparing the graft polymer on the surface of the polymerization initiation layer using graft polymerization, by contacting a compound having a polymerizable group on the polymerization initiation layer and supplying energy imagewise; an image forming method which applies the pattern forming method; a pattern forming material; and a planographic printing plate. A fine particle adsorption pattern forming method and a conductive pattern forming method are also provided.
    Type: Grant
    Filed: April 21, 2004
    Date of Patent: December 11, 2007
    Assignee: FUJIFILM Corporation
    Inventors: Takeyoshi Kano, Koichi Kawamura
  • Patent number: 7291427
    Abstract: A surface graft material including a substrate and a surface graft polymer chain, wherein the surface graft polymer chain includes a photocleavable moiety at one of its terminals, and the surface graft polymer chain is directly bonded to a surface of the substrate by a covalent bond between the photocleavable moiety and the substrate. A graft pattern formation method comprising exposing the graft material to cleave the photocleavable moiety in the exposed area, and removing the graft polymer chain from the exposed are to form a surface graft polymer chain pattern. A conductive pattern material and a metal particle pattern material using the graft pattern.
    Type: Grant
    Filed: March 21, 2005
    Date of Patent: November 6, 2007
    Assignee: Fujifilm Corporation
    Inventors: Koichi Kawamura, Takeyoshi Kano
  • Publication number: 20070246249
    Abstract: The present invention provides a method of forming a metal pattern and a metal pattern obtained by the method. The method includes the steps of (I) forming on a substrate a polymer layer in which a polymer having a functional group that interacts with an electroless plating catalyst or a precursor thereof is chemically bonded directly to the substrate in a pattern form, (II) adding the electroless plating catalyst or precursor thereof to the polymer layer, and (III) forming a metal layer in the pattern form by electroless plating.
    Type: Application
    Filed: November 29, 2004
    Publication date: October 25, 2007
    Inventors: Takeyoshi Kano, Koichi Kawamura
  • Patent number: 7279195
    Abstract: A method of forming a metal fine particle pattern including forming a polymerization initiation layer on a support, wherein a polymer which has, in its side chain, a cross-linking group and a functional group having the ability to initiate polymerization is fixed by a cross-linking reaction, forming a graft polymer region in a pattern on the surface of the polymerization initiation layer, wherein the graft polymer layer has the ability to contain a metal ion or a metal salt, adding a metal ion or a metal salt to the graft polymer layer, and thereafter reducing the metal ion or a metal ion in the metal salt to form a metal fine particle dispersion region; and a method of forming an electroconductive pattern using the method of forming a metal fine particle pattern.
    Type: Grant
    Filed: August 19, 2004
    Date of Patent: October 9, 2007
    Assignee: Fujifilm Corporation
    Inventors: Takeyoshi Kano, Koichi Kawamura
  • Publication number: 20070212883
    Abstract: The present invention provides a method for forming a surface graft, comprising the process of applying energy to the surface of a substrate containing polyimide having a polymerization initiating moiety in the skeleton thereof, to generate active points on the surface of the substrate and to generate a graft polymer that is directly bonded to the surface of the substrate starting from the active points and that has a polar group, and a surface graft material obtained thereby.
    Type: Application
    Filed: March 24, 2005
    Publication date: September 13, 2007
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeyoshi Kano, Koichi Kawamura
  • Patent number: 7189453
    Abstract: A functional surface member comprising a support having a surface on which a graft polymer chain having a nonionic polar group in the side chain thereof is bonded and provided thereon a layer comprising adsorbed fine particle capable of polarly bonding to the polar group.
    Type: Grant
    Filed: September 17, 2003
    Date of Patent: March 13, 2007
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Koichi Kawamura, Takeyoshi Kano